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公开(公告)号：JP2009033201A
公开(公告)日：2009-02-12
申请号：JP2008274728
申请日：2008-10-24
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC , BASELMANS JOHANNES JACOBUS MAT , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , JANSEN HANS , JEROEN JOHANNES SOPHIA MARIA M , MULKENS JOHANNES CATHARINUS HU , PEETERS FELIX GODFRIED PETER , STREEFKERK BOB , TEUNISSEN FRANCISCUS JOHANNES , VAN SANTEN HELMAR
IPC: H01L21/027 , G03F7/20 , H01L21/683
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of an immersion lithographic apparatus configured to prevent contamination with immersion liquid. SOLUTION: The substrate table WT includes a drainage groove, i.e. a barrier 40 which surrounds an outer peripheral edge of the substrate W and a barrier 100 which surrounds another object 20 like a sensor present on substantially the same plane with a top surface of the substrate. The barriers 40 and 100 can collect any liquid which is spilt from the liquid supply system while the substrate W is exposed to reduce the risk of contamination of delicate components of the lithographic projection apparatus. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：提供一种浸没式光刻设备的基板台，其被配置为防止浸没液体的污染。 解决方案：衬底台WT包括排水槽，即围绕衬底W的外围边缘的阻挡层40，以及围绕另一物体20的阻挡层100，如同位于基本相同的平面上的传感器，顶表面 的基底。 屏障40和100可以收集从液体供应系统溢出的任何液体，同时暴露基板W，以降低光刻投影设备的精密部件污染的风险。 版权所有（C）2009，JPO＆INPIT
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公开(公告)号：JP2009044185A
公开(公告)日：2009-02-26
申请号：JP2008274716
申请日：2008-10-24
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC , BASELMANS JOHANNES JACOBUS MAT , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , JANSEN HANS , JEROEN JOHANNES SOPHIA MARIA M , MULKENS JOHANNES CATHARINUS HU , PEETERS FELIX GODFRIED PETER , STREEFKERK BOB , TEUNISSEN FRANCISCUS JOHANNES , VAN SANTEN HELMAR
IPC: H01L21/027 , G03F7/20 , H01L21/683
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of an immersion lithographic apparatus which is configured to prevent contamination with immersion liquid. SOLUTION: The substrate table WT is provided with a drainage ditch or barrier 40 surrounding an outer circumferential edge of the substrate W and a barrier 100 surrounding other objects 20 like sensors positioned in the same plane substantially as the upper surface of the substrate W. The barriers 40 and 100 are configured to collect all of liquid spilled from a liquid supply system while the substrate W is exposed, so thereby reducing the risk of contamination of fine components in the lithographic projection apparatus. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：提供一种浸没式光刻设备的基板台，其被配置为防止浸没液体的污染。 解决方案：衬底台WT设置有围绕衬底W的外周边缘的排水沟或障壁40，以及围绕其它物体20的阻挡物100，其围绕基本上与衬底的上表面位于同一平面中的传感器 阻挡层40和100构造成在衬底W暴露的同时收集从液体供应系统溢出的所有液体，从而降低光刻投影设备中精细部件污染的风险。 版权所有（C）2009，JPO＆INPIT
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公开(公告)号：JP2008004969A
公开(公告)日：2008-01-10
申请号：JP2007247082
申请日：2007-09-25
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
IPC: G06F7/20 , H01L21/027 , G03F7/20
CPC classification number: G03F7/70933
Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus which can reduce the consumption of purge gas. SOLUTION: In a purge system of the lithographic projection apparatus, a flow rate of the purge gas to the system is reduced substantially once a contamination level has fallen below a threshold level. The control is performed on the basis of a detected level of contamination or a timetable. COPYRIGHT: (C)2008,JPO&INPIT
Abstract translation: 要解决的问题：提供可以减少吹扫气体的消耗的光刻投影设备。 解决方案：在光刻投影设备的吹扫系统中，一旦污染水平降低到阈值水平以下，则净化气体到系统的流量就会大大降低。 基于检测到的污染水平或时间表执行控制。 版权所有（C）2008，JPO＆INPIT
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公开(公告)号：JP2006295173A
公开(公告)日：2006-10-26
申请号：JP2006105789
申请日：2006-04-07
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
IPC: H01L21/027 , G03F7/20
CPC classification number: B01J39/04 , C02F1/42 , G03F7/70341 , G03F7/70925
Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device provided with a liquid storage between a projection system and a substrate and a method for monitoring a liquid silicon dioxide level held in the liquid storage to remove silicon oxide in a defecator. SOLUTION: Two defecators are disposed in series along a conduit in which water used in a dipping system is stored. Although the two defecators each absorb carbon dioxide and silicon dioxide, they include an ion-exchange resin of stronger affinity to carbon dioxide. A conductivity sensor or a carbon dioxide sensor between the two defecators is disposed. The upstream defecator absorbs carbon dioxide and silicon dioxide until saturated and selectively desorbs silicon dioxide at a saturation point. Silicon dioxide advances downstream in the conduit, and is absorbed by the downstream defecator. Carbon dioxide appears in a liquid flowing downstream if the upstream defecator saturates carbon dioxide, and is absorbed by the downstream defecator. The sensor senses carbon dioxide to initiate demanding to wash or exchange the defecator. COPYRIGHT: (C)2007,JPO&INPIT
Abstract translation: 要解决的问题：提供一种在投影系统和基板之间设置有液体存储器的光刻设备以及用于监视保持在液体存储器中的液体二氧化硅水平以除去除垢器中的氧化硅的方法。
解决方案：沿着导管将两个排便器串联放置，其中存储浸渍系统中使用的水。 虽然两个排便器各自吸收二氧化碳和二氧化硅，但它们包括对二氧化碳具有更强亲和力的离子交换树脂。 设置两个排便装置之间的电导率传感器或二氧化碳传感器。 上游除垢器吸收二氧化碳和二氧化硅直到饱和，并在饱和点选择性地解吸二氧化硅。 二氧化硅在导管的下游进入，并被下游除垢器吸收。 如果上游除垢器饱和二氧化碳，二氧化碳就会出现在下游流动的液体中，并被下游排污器吸收。 传感器感应二氧化碳以开始要求洗涤或更换排便器。 版权所有（C）2007，JPO＆INPIT
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公开(公告)号：JP2006121078A
公开(公告)日：2006-05-11
申请号：JP2005301607
申请日：2005-10-17
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： MERTENS JEROEN JOHANNES SOPHIA , DONDERS SJOERD NICOLAAS L , DE GRAAF ROELOF FREDERIK , HOOGENDAM CHRISTIAAN ALEXANDER , VAN DER NET ANTONIUS J , TEUNISSEN FRANCISCUS JOHANNES , TINNEMANS PATRICIUS ALOYSIUS J , VERHAGEN MARTINUS CORNELIS MAR , VERSPAY JACOBUS JOHANNUS LEONA , VAN GOMPEL EDWIN AUGUSTINUS MA
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70716 , G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To provide an upgraded system as well as a method that discharges a mixture of liquid and gas from a component of lithography equipment. SOLUTION: This is lithography equipment including a liquid supply system for immersing, in liquid, a space between a projection system and a substrate, an outlet for eliminating a mixture of liquid and and gas that passes a gap between a liquid sealing structure of the liquid supply system and the substrate, and a discharge system for taking out the mixture through the outlet, wherein the discharge system includes a separator tank for separating the liquid from the gas in the mixture, and a separator tank pressure controller connected to a non-liquid immersion area of the separator tank and maintaining stable pressure in the non-liquid immersion area. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract translation: 要解决的问题：提供升级系统以及从光刻设备的部件排出液体和气体的混合物的方法。 解决方案：这是一种光刻设备，其包括用于在液体中浸入投影系统和基板之间的空间的液体供应系统，用于消除液体和气体混合物的出口，该出口通过液体密封结构 的液体供给系统和基板，以及用于通过出口取出混合物的排出系统，其中排出系统包括用于将液体与混合物中的气体分离的分离罐，以及分离罐压力控制器，其连接到 分离罐的非液浸区域，并且在非液浸区域保持稳定的压力。 版权所有（C）2006，JPO＆NCIPI
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Patent Agency Ranking
公开(公告)号：JP2009060127A
公开(公告)日：2009-03-19
申请号：JP2008274725
申请日：2008-10-24
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC , BASELMANS JOHANNES JACOBUS MAT , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , JANSEN HANS , JEROEN JOHANNES SOPHIA MARIA M , MULKENS JOHANNES CATHARINUS HU , PEETERS FELIX GODFRIED PETER , STREEFKERK BOB , TEUNISSEN FRANCISCUS JOHANNES , VAN SANTEN HELMAR
IPC: H01L21/027 , G03F7/20 , H01L21/683
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of an immersion lithographic apparatus, which is so configured as to prevent contamination with immersion liquid. SOLUTION: A substrate table WT is provided with a drainage ditch, namely, a barrier 40 surrounding an outer peripheral edge of a substrate W, and a barrier 100 surrounding another object 20 like a sensor existing on practically the same plane as an upper face of the substrate W. Since the barriers 40 and 100 can collect any liquid spilt from a liquid supply system during exposure of the substrate W, the risk of contamination of delicate components of a lithographic projection apparatus is reduced. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：提供浸没式光刻设备的基板台，其被设置为防止浸没液体的污染。 解决方案：衬底台WT设置有排水沟，即围绕衬底W的外围边缘的阻挡层40，以及围绕另一物体20的阻挡物100，像传感器存在于与实际上相同的平面上的传感器 由于障碍物40和100可以收集在衬底W暴露期间从液体供应系统溢出的任何液体，所以降低了光刻投影设备的微妙部件污染的风险。 版权所有（C）2009，JPO＆INPIT
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公开(公告)号：JP2009044186A
公开(公告)日：2009-02-26
申请号：JP2008274721
申请日：2008-10-24
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC , BASELMANS JOHANNES JACOBUS MAT , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , JANSEN HANS , JEROEN JOHANNES SOPHIA MARIA M , MULKENS JOHANNES CATHARINUS HU , PEETERS FELIX GODFRIED PETER , STREEFKERK BOB , TEUNISSEN FRANCISCUS JOHANNES , VAN SANTEN HELMAR
IPC: H01L21/027 , G03F7/20 , H01L21/683
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of an immersion lithographic apparatus which is configured to prevent contamination with immersion liquid. SOLUTION: The substrate table WT is provided with a drainage ditch or barrier 40 surrounding an outer circumferential edge of the substrate W and a barrier 100 surrounding other objects 20 like sensors positioned in the same plane substantially the upper surface of the substrate W. The barriers 40 and 100 are configured to collect all of liquid spilled from a liquid supply system while the substrate W is exposed, so thereby reducing the risk of contamination of fine components in the lithographic projection apparatus. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：提供一种浸没式光刻设备的基板台，其被配置为防止浸没液体的污染。 解决方案：衬底台WT设置有围绕衬底W的外周边缘的排水沟或屏障40，以及围绕基本上位于衬底W的上表面的同一平面中的诸如传感器的其它物体20的阻挡层100 挡板40和100被配置为在基板W暴露的同时收集从液体供应系统溢出的所有液体，从而降低光刻投影装置中的细小部件污染的风险。 版权所有（C）2009，JPO＆INPIT
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公开(公告)号：JP2009033200A
公开(公告)日：2009-02-12
申请号：JP2008274726
申请日：2008-10-24
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC , BASELMANS JOHANNES JACOBUS MAT , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , JANSEN HANS , JEROEN JOHANNES SOPHIA MARIA M , MULKENS JOHANNES CATHARINUS HU , PEETERS FELIX GODFRIED PETER , STREEFKERK BOB , TEUNISSEN FRANCISCUS JOHANNES , VAN SANTEN HELMAR
IPC: H01L21/027 , G03F7/20 , H01L21/683
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of an immersion lithographic apparatus configured to prevent contamination with immersion liquid. SOLUTION: The substrate table WT includes a drainage groove, i.e. a barrier 40 which surrounds an outer peripheral edge of the substrate W and a barrier 100 which surrounds another object 20 like a sensor present on substantially the same plane with a top surface of the substrate. The barriers 40 and 100 can collect any liquid which is spilt from the liquid supply system while the substrate W is exposed to reduce the risk of contamination of delicate components of the lithographic projection apparatus. COPYRIGHT: (C)2009,JPO&INPIT
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公开(公告)号：JP2009200530A
公开(公告)日：2009-09-03
申请号：JP2009138068
申请日：2009-06-09
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： MERTENS JEROEN JOHANNES SOPHIA , DONDERS SJOERD NICOLAAS L , DE GRAAF ROELOF FREDERIK , HOOGENDAM CHRISTIAAN ALEXANDER , VAN DER NET ANTONIUS J , TEUNISSEN FRANCISCUS JOHANNES , TINNEMANS PATRICIUS ALOYSIUS J , VERHAGEN MARTINUS CORNELIS MAR , VERSPAY JACOBUS JOHANNUS LEONA , VAN GOMPEL EDWIN AUGUSTINUS MA
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70716 , G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To provide an improved system and method for evacuating a mixture of liquid and gas from components in a lithographic apparatus. SOLUTION: The lithographic apparatus includes a liquid supply system configured to fill a space between a projection system and a substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, wherein the evacuation system has a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain stable pressure within the non-liquid-filled region. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：提供一种用于从光刻设备中的组件抽空液体和气体的混合物的改进的系统和方法。 解决方案：光刻设备包括液体供应系统，其配置成用液体填充投影系统和基底之间的空间，出口构造成去除液体和气体的混合物，其通过液体和液体的液体限制结构之间的间隙 所述液体供应系统和所述基板以及被配置为通过所述出口抽吸所述混合物的抽空系统，其中所述抽空系统具有布置成将液体与所述混合物中的气体分离的分离器罐和分离器箱压力控制器， 分离罐的充满液体的区域，被配置为在非液体填充区域内保持稳定的压力。 版权所有（C）2009，JPO＆INPIT
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公开(公告)号：JP2005303316A
公开(公告)日：2005-10-27
申请号：JP2005115241
申请日：2005-04-13
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC , BASELMANS JOHANNES JACOBUS MAT , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , JANSEN HANS , JEROEN JOHANNES SOPHIA MARIA M , MULKENS JOHANNES CATHARINUS HU , PEETERS FELIX GODFRIED PETER , STREEFKERK BOB , TEUNISSEN FRANCISCUS JOHANNES , VAN SANTEN HELMAR
IPC: G03F7/20 , H01L21/027
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of a immersion lithographic equipment which is made so as to prevent contamination due to an immersion liquid.
SOLUTION: A substrate table WT is provided with a drainage groove, i.e. a barrier 40 which surrounds an outer periphery of a substrate W and a barrier 100 which surrounds another object 20 such as a sensor which exists in the substantially same surface as the upper surface of the substrate W. Since the barriers 40 and 100 can collect all liquid which falls from a liquid feed system while exposing the substrate W, a risk that fine components of the lithographic projection equipment is contaminated is reduced.
COPYRIGHT: (C)2006,JPO&NCIPIAbstract translation: 要解决的问题：提供浸没式光刻设备的基板台，其被制成以防止由于浸没液体而引起的污染。 解决方案：衬底台WT设置有排水槽，即围绕衬底W的外周的阻挡层40和围绕另一物体20的阻挡物100，例如传感器，其存在于基本相同的表面中 基板W的上表面。由于阻挡层40和100可以收集从液体供给系统落下的所有液体同时暴露基板W，所以降低了光刻投影设备的精细分量被污染的风险。 版权所有（C）2006，JPO＆NCIPI
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