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    Barrier member and lithographic apparatus
    1.
    发明专利
    Barrier member and lithographic apparatus 有权
    障碍物成员和平面设备

    公开(公告)号：JP2012142625A

    公开(公告)日：2012-07-26

    申请号：JP2012099767

    申请日：2012-04-25

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BECKERS MARCEL ,  VAN DE KERKHOF MARCUS A ,  SIEBE LANDHEER ,  MAAS WOUTERUS JOHANNES PETRUS MARIA ,  BRUIJSTENS JEROEN PETER JOHANNES ,  THOMAS IVO ADAM JOHANNES ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  VAN OERLE BARTHOLOMEUS MATHIAS

    IPC: H01L21/027

    CPC classification number: G03F7/70341 ,  G03F7/70808 ,  G03F7/70958

    Abstract: PROBLEM TO BE SOLVED: To limit the movement of immersion liquid in a gap between immersion system structure and a projection system, and to reduce the quantity of immersion liquid that escapes the immersion system through the gap.SOLUTION: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The lithographic apparatus also includes a barrier member, surrounding a space between the projection system, and the substrate in use, to define in part with the projection system a reservoir for liquid. A radially outer surface of the barrier member facing a portion of the projection system and a radially outer surface of the portion of the projection system facing the barrier member each have a lyophobic outer surface. The lyophobic outer surface of the barrier member and/or the lyophobic outer surface of the portion of the projection system has an inner edge that defines in part the reservoir.

    Abstract translation: 要解决的问题：为了限制浸没液体在浸没系统结构和投影系统之间的间隙中的移动，并且减少通过间隙逸出浸没系统的浸液的量。 解决方案：光刻设备包括被配置为将图案化的辐射束投影到基板的目标部分上的投影系统。 光刻设备还包括围绕投影系统和使用中的基板之间的空间的阻挡构件，以部分地将投影系统限定为用于液体的储存器。 面向突出系统的一部分的阻挡构件的径向外表面和面向阻挡构件的突出系统的部分的径向外表面各自具有疏液外表面。 屏障构件的疏液外表面和/或突出系统部分的疏液外表面具有部分限定储存器的内边缘。 版权所有（C）2012，JPO＆INPIT

    Lithography device and method of operating lithography device
    2.
    发明专利
    Lithography device and method of operating lithography device 有权
    LITHOGRAPHY设备和操作LITHOGRAPHY设备的方法

    公开(公告)号：JP2010074159A

    公开(公告)日：2010-04-02

    申请号：JP2009208753

    申请日：2009-09-10

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BRUIJSTENS JEROEN PETER JOHANNES ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  SIEBE LANDHEER ,  MEESTER ARNOUT JOHANNES ,  JANSEN BAUKE ,  THOMAS IVO ADAM JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO ,  TANASA GHEORGHE

    IPC: H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To provide a system that reduces an influence of a droplet on a final optical element, or substantially avoids the formation of such a droplet. SOLUTION: This lithography device includes: a projection system PS; and a liquid confinement structure for at least partially confining an immersion liquid in an immersion space demarcated by the projection system, a liquid confinement structure 12, and also a substrate and/or a substrate table. A wet gas space for confining a wet gas is demarcated among the projection system, the liquid confinement structure, and the immersion liquid in the immersion space. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种降低液滴对最终光学元件的影响的系统，或基本避免形成这样的液滴。 解决方案：该光刻设备包括：投影系统PS; 以及用于至少部分地将浸没液体限制在由投影系统划分的浸没空间中的液体限制结构，液体限制结构12以及基底和/或基底台。 在投影系统，液体限制结构和浸没空间中的浸没液体之间划定用于限制湿气体的湿气空间。 版权所有（C）2010，JPO＆INPIT

    Lithographic apparatus, and method of operating the apparatus
    4.
    发明专利
    Lithographic apparatus, and method of operating the apparatus 有权
    平面设备和操作设备的方法

    公开(公告)号：JP2011018883A

    公开(公告)日：2011-01-27

    申请号：JP2010099338

    申请日：2010-04-23

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： THOMAS IVO ADAM JOHANNES ,  SIEBE LANDHEER ,  MEESTER ARNOUT JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO ,  TANASA GHEORGHE

    IPC: H01L21/027

    CPC classification number: G03F7/70341 ,  G03B27/52 ,  G03F7/70891

    Abstract: PROBLEM TO BE SOLVED: To provide a system for reducing the effect of an interface between a last optical element and droplets and/or a gas and a liquid, on the last optical element.SOLUTION: A lithographic apparatus includes: a projection system; and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or a substrate table. Here, a measure is taken to reduce the effect of droplets and/or a liquid film on the last optical element of the projection system.

    Abstract translation: 要解决的问题：提供一种用于减少最后光学元件与液滴和/或气体和液体之间的界面对最后光学元件的影响的系统。解决方案：光刻设备包括：投影系统; 以及液体限制结构，其被配置为至少部分地将浸没液体限制在由所述投影系统，所述液体限制结构以及衬底和/或衬底台限定的浸没空间中。 这里，采取措施来减少液滴和/或液膜对投影系统的最后一个光学元件的影响。

    Lithographic apparatus and method of operating the apparatus
    5.
    发明专利
    Lithographic apparatus and method of operating the apparatus 有权
    平面设备和操作设备的方法

    公开(公告)号：JP2010258446A

    公开(公告)日：2010-11-11

    申请号：JP2010093598

    申请日：2010-04-15

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： SANDERSE LAURENS ANTHONY ,  VUGTS JOSEPHUS CORNELIUS JOHANNES ANTONIUS ,  THOMAS IVO ADAM JOHANNES

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic apparatus in which an imaging error and/or focusing error of the projection system, caused by movement of the meniscus, is reduced, if not eliminated. SOLUTION: The apparatus has a projection system which is configured to project a patterned radiation beam onto a target portion of the substrate, and having a lower surface. The apparatus also has a liquid confinement structure defining, in use, in part with the lower surface and the substrate and/or substrate table, an immersion space, and the immersion space has, in use, a liquid meniscus between a part of the lower surface facing a surface of the liquid confinement structure and a facing surface of the liquid confinement structure facing the part of the lower surface. The apparatus also has a pinning surface having a plurality of meniscus pinning features, the pinning surface being part of or on the part of the lower surface, or part of or on the facing surface of the liquid confinement structure, or part of or on both. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种浸没式光刻设备，其中由于弯液面的移动引起的投影系统的成像误差和/或聚焦误差降低，如果不消除。 解决方案：该装置具有投影系统，该投影系统被配置为将图案化的辐射束投影到基板的目标部分上并且具有下表面。 该装置还具有液体限制结构，其在使用中部分地与下表面和衬底和/或衬底台定义，浸没空间，并且浸没空间在使用中具有在下部的一部分之间的液体弯液面 面向液体限制结构的表面的表面和面向下表面的一部分的液体限制结构的面对表面。 该装置还具有钉扎表面，其具有多个弯液面钉扎特征，钉扎表面是液面限制结构的下表面的一部分或部分上的部分或部分或相对的表面上，或两者的一部分或两者上 。 版权所有（C）2011，JPO＆INPIT

    Lithographic apparatus and device manufacturing method
    7.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2013135215A

    公开(公告)日：2013-07-08

    申请号：JP2012257937

    申请日：2012-11-26

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： THOMAS IVO ADAM JOHANNES ,  SIEBE LANDHEER

    IPC: H01L21/027 ,  G02B19/00 ,  G03F7/20

    CPC classification number: G03F7/70641

    Abstract: PROBLEM TO BE SOLVED: To provide systems and methods for providing the use of a two- or three-plate Alvarez lens located in a focal plane of a projection lens of a lithographic apparatus.SOLUTION: The Alvarez lens can be used to modify the shape of the focal plane to match a previously determined surface topography, while at the same time the Alvarez lens can be designed to include a built-in correction for astigmatism and other residual Zernike errors that would otherwise be introduced.

    Abstract translation: 要解决的问题：提供用于提供位于光刻设备的投影透镜的焦平面中的二或三板Alvarez透镜的系统和方法。解决方案：可以使用Alvarez透镜来改变形状 的焦平面以匹配先前确定的表面形貌，而同时Alvarez透镜可以被设计成包括内置的散光校正和否则将被引入的其他残余Zernike误差。

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