公开(公告)号：JP2013048258A

公开(公告)日：2013-03-07

申请号：JP2012220149

申请日：2012-10-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： TINNEMANS PATRICIUS ALOYSIUS J ,  BASELMANS JOHANNES JACOBUS MATHEUS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70191 ,  G03F7/70291 ,  G03F7/70433 ,  G03F7/70508

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus and a method, for executing maskless lithography more effectively.SOLUTION: The apparatus comprise a projection system, a pattern forming device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto a substrate as an array of sub-beams of the radiation. The pattern forming device modulates the sub-beams of the radiation to substantially generate a requested dose pattern on the substrate. The low-pass filter executes calculation of pattern data derived from the requested dose pattern, thereby forming a frequency-clipped target dose pattern mainly including only spatial frequency components below a selected threshold frequency. The data manipulation device generates a control signal including spot exposure intensities to be generated by the patterning device, on the basis of a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern.

Abstract translation: 要解决的问题：提供一种更有效地执行无掩模光刻的装置和方法。 解决方案：该装置包括投影系统，图案形成装置，低通滤波器和数据操作装置。 投影系统将辐射束投射到衬底上作为辐射的子束的阵列。 图案形成装置调制辐射的子光束，以基本上在衬底上产生所要求的剂量图案。 低通滤波器执行从所请求的剂量图案导出的图案数据的计算，从而形成主要仅包括低于选定阈值频率的空间频率分量的限幅目标剂量图案。 数据处理装置基于斑点曝光强度与限幅目标剂量图案的直接代数最小二乘拟合，生成包括由图案形成装置产生的点曝光强度的控制信号。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2009200530A

公开(公告)日：2009-09-03

申请号：JP2009138068

申请日：2009-06-09

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MERTENS JEROEN JOHANNES SOPHIA ,  DONDERS SJOERD NICOLAAS L ,  DE GRAAF ROELOF FREDERIK ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  VAN DER NET ANTONIUS J ,  TEUNISSEN FRANCISCUS JOHANNES ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MAR ,  VERSPAY JACOBUS JOHANNUS LEONA ,  VAN GOMPEL EDWIN AUGUSTINUS MA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an improved system and method for evacuating a mixture of liquid and gas from components in a lithographic apparatus. SOLUTION: The lithographic apparatus includes a liquid supply system configured to fill a space between a projection system and a substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, wherein the evacuation system has a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain stable pressure within the non-liquid-filled region. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于从光刻设备中的组件抽空液体和气体的混合物的改进的系统和方法。 解决方案：光刻设备包括液体供应系统，其配置成用液体填充投影系统和基底之间的空间，出口构造成去除液体和气体的混合物，其通过液体和液体的液体限制结构之间的间隙 所述液体供应系统和所述基板以及被配置为通过所述出口抽吸所述混合物的抽空系统，其中所述抽空系统具有布置成将液体与所述混合物中的气体分离的分离器罐和分离器箱压力控制器， 分离罐的充满液体的区域，被配置为在非液体填充区域内保持稳定的压力。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007329506A

公开(公告)日：2007-12-20

申请号：JP2007218716

申请日：2007-08-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： TINNEMANS PATRICIUS ALOYSIUS J ,  BUIS EDWIN JOHAN ,  DONDERS SJOERD NICOLAAS LAMBER ,  VAN ELP JAN ,  HOOGKAMP JAN FREDERIK ,  VAN MEER ASCHWIN LODEWIJK HEND ,  SMULDERS PATRICK JOHANNES CORN ,  SPANJERS FRANCISCUS ANDREAS CO ,  VERMEULEN JOHANNES PETRUS MART ,  VISSER RAIMOND ,  TEGENBOSCH HENRICUS GERARDUS ,  VAN DEN BERG JOHANNES CHARLES ,  VAN DE SANDE HENRICUS JOHANNES ,  VERVOORT THIJS

IPC: B08B1/00 ,  H01L21/677 ,  B25J13/08 ,  B65G49/07 ,  G03F7/20 ,  H01L21/027 ,  H01L21/304 ,  H01L21/683 ,  H02N13/00

CPC classification number: G03F7/70741 ,  B25J13/089 ,  G03F7/7075 ,  G03F7/70925 ,  H01L21/6833 ,  H02N13/00

Abstract: PROBLEM TO BE SOLVED: To provide a method of effectively compensating for a positional shift including a tilt between a substrate and a supporting structure and a vertical displacement when moving the substrate in a lithographic projection apparatus using the supporting structure.
SOLUTION: By providing compliant parts (14, 26) in the supporting structure for holding and moving a substrate (W), for example, a supporting frame (18) of a robot arm (10) adaptable to the tilt and/or the vertical displacement. Clamps (20, 22, 24) that the supporting frame (18) comprises may be a Johnson-Raybeck effect type clamp that requires a stringent positional precision, and the cleaning of the inside of the projection apparatus is carried out by using only one substrate.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种有效地补偿包括基板和支撑结构之间的倾斜的位置偏移以及在使用支撑结构在光刻投影装置中移动基板时的垂直位移的方法。 解决方案：通过在用于保持和移动衬底（W）的支撑结构中提供柔性部件（14,26），例如适用于倾斜和/或倾斜的机器人臂（10）的支撑框架（18） 或垂直位移。 支撑框架（18）包括的夹具（20,22,24）可以是要求严格的位置精度的Johnson-Raybeck效果型夹具，并且通过仅使用一个基板来执行投影装置的内部的清洁 。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2006179921A

公开(公告)日：2006-07-06

申请号：JP2005367785

申请日：2005-12-21

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： TINNEMANS PATRICIUS ALOYSIUS J ,  BASELMANS JOHANNES JACOBUS MAT ,  VENEMA WILLEM J

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70275 ,  G03F7/70291

Abstract: PROBLEM TO BE SOLVED: To provide a system and a method which are used to improve maskless lithography technology. SOLUTION: The apparatus and system form a hexagonal and exposed spot grid on a substrate 214. The spot grid is attained by using a patterning device 204 which turns the patterned beam on a micro lens array 240 in which a spot is formed by Fourier transform of the beam patterned in the substrate. The spot from the micro lens array forms the hexagonal and exposed spot grid on the substrate (a) through at least one of the movement of the substrate patterned by the patterning device and/or the change of the frequency of the beam of radiation, or (b) through hexagonal configuration of the patterning device and the micro lens array. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供用于改进无掩模光刻技术的系统和方法。 该装置和系统在基板214上形成六边形和暴露的点格栅。通过使用图案形成装置204来获得点格栅，图案形成装置204将图案化的光束在微透镜阵列240上转动，其中通过 在衬底中图案化的光束的傅里叶变换。 来自微透镜阵列的斑点通过由图案形成装置图案化的衬底的运动和/或辐射束的频率的变化中的至少一个运动，在衬底（a）上形成六边形和暴露的点格栅，或 （b）通过图案形成装置和微透镜阵列的六边形构造。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2004343076A

公开(公告)日：2004-12-02

申请号：JP2004102395

申请日：2004-03-31

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： TINNEMANS PATRICIUS ALOYSIUS J ,  BUIS EDWIN JOHAN ,  DONDERS SJOERD NICOLAAS LAMBER ,  VAN ELP JAN ,  HOOGKAMP JAN FREDERIK ,  VAN MEER ASCHWIN LODEWIJK HEND ,  SMULDERS PATRICK JOHANNES CORN ,  SPANJERS FRANCISCUS ANDREAS CO ,  VERMEULEN JOHANNES PETRUS MART ,  VISSER RAIMOND ,  TEGENBOSCH HENRICUS GERARDUS ,  VAN DEN BERG JOHANNES CHARLES ,  VAN DE SANDE HENRICUS JOHANNES ,  VERVOORT THIJS

IPC: B08B1/00 ,  B25J13/08 ,  B65G49/07 ,  G03F7/20 ,  H01L21/027 ,  H01L21/304 ,  H01L21/677 ,  H01L21/683 ,  H02N13/00 ,  H01L21/68

CPC classification number: G03F7/70741 ,  B25J13/089 ,  G03F7/7075 ,  G03F7/70925 ,  H01L21/6833 ,  H02N13/00

Abstract: PROBLEM TO BE SOLVED: To provide a method capable of effectively compensating an inclination between a substrate and a support structure or a misregistration including a displacement in the vertical direction when the substrate is moved by the support structure in a lithographic projection apparatus. SOLUTION: By providing a support structure for holding and moving a substrate (W), for example, flexible sections (14, 26) in a support frame (18) of a robot arm (10), it can be adapted to the tilt and/or a displacement in the vertical direction. Clamps (20, 22, 24) provided on the support frame (18) may be a Johnson-Raybeck effect type clamp, which requires the severe position accuracy, and can perform a cleaning treatment in a projection apparatus by only one substrate. COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2012064982A

公开(公告)日：2012-03-29

申请号：JP2011285516

申请日：2011-12-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CADEE THEODORUS PETRUS MARIA ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  KATE NICOLAAS TEN ,  LOOPSTRA ERIK ROELOF ,  ASHWIN RODEVICK HENDRICKS JOHANNES VAN MEHL ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  CHRISTIANUS GERARDUS MARIA DE MOL ,  MUITJENS MARCEL JOHANNUS ELISABETH HUBERTUS ,  VAN DER NET ANTONIUS J ,  OTTENS JOOST JEROEN ,  QUAEDACKERS JOHANNES ANNA ,  REUHMAN-HUISKEN MARIA ELISABETH ,  MARCO COELHO STAUFEN ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MARIA ,  VERSPAIJ JACOBUS JOHANNUS LEONARDUS HENDRICUS ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  BOOM HERMAN ,  STOYAN NIHTIANOV ,  MOERMAN RICHARD ,  SMEETS MARTIN FRANS PIERRE ,  SCHOONDERMARK BART LEONARD PETER ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system that reduces lithography errors arising from an immersion liquid.SOLUTION: A lithographic apparatus includes: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device capable of imparting a pattern to the radiation beam in its cross section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between a final element of the projection system and the substrate with a liquid; a seal member arranged to substantially contain the liquid within the space between the final element of the projection system and the substrate; and elements to control and/or compensate for evaporation of the immersion liquid from the substrate.

Abstract translation: 要解决的问题：提供减少由浸没液体引起的光刻误差的系统。 光刻设备包括：被配置为调节辐射束的照明系统; 支撑构造以支撑能够在其横截面中将辐射束赋予图案以形成图案化辐射束的图案形成装置; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 液体供应系统，被配置为至少部分地用液体填充所述投影系统的最终元件和所述基板之间的空间; 密封构件，其布置成基本上将所述液体容纳在所述投影系统的最终元件与所述基板之间的空间内; 以及用于控制和/或补偿来自衬底的浸没液体的蒸发的元件。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010206225A

公开(公告)日：2010-09-16

申请号：JP2010138208

申请日：2010-06-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CHRISTIAAN ALEXANDER HOOGENDAM ,  STREEFKERK BOB ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  BIJLAART ERIK THEODORUS MARIA ,  KOLESNYCHENKO ALEKSEY YURIEVICH ,  LOOPSTRA ERIK ROELOF ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  SLAGHEKKE BERNARDUS ANTONIUS ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VAN SANTEN HELMAR

IPC: G03F7/20 ,  H01L21/027 ,  B05C11/00 ,  G03B27/42 ,  G03B27/52 ,  H01L21/00

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/70808

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus with a liquid supply system minimized in liquid pressure fluctuation and/or temperature variation without unnecessary disturbance by mechanical vibration. SOLUTION: Liquid is supplied from an inlet 21 into a reservoir 10 disposed between a substrate and the final element of a projection system PS. A liquid above a given height is removed by an overflow. The overflow is held above the inlet so that the liquid is constantly refreshed and a liquid pressure is substantially kept constant. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为光刻设备提供在液压波动和/或温度变化下最小化的液体供应系统，而不会因机械振动而不必要的干扰。 解决方案：液体从入口21供应到设置在基板和投影系统PS的最终元件之间的储存器10中。 高于给定高度的液体被溢流除去。 溢流被保持在入口的上方，使得液体不断刷新并且液体压力基本保持恒定。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010187029A

公开(公告)日：2010-08-26

申请号：JP2010123442

申请日：2010-05-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JEROEN JOHANNES SOPHIA MARIA MERTENS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSSEN HENDRICUS WILHELMUS A ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VAN DEN SCHOOR LEON JOSEPH MARIE ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  STREEFKERK BOB

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a liquid supply system capable of supplying an immersion liquid in a space between a final element of a projection lens and a substrate at an extremely stable flow rate and with a minimum pressure variation in an immersion lithography apparatus. SOLUTION: In the immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of the liquid. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种液体供应系统，其能够以非常稳定的流速和浸没式光刻中的最小压力变化在投影透镜的最终元件和基板之间的空间中提供浸没液体 仪器。 解决方案：在浸没式光刻设备中，浸渍液体通过限流器从罐中提供。 保持在罐中的液体保持在限流器上方基本上恒定的高度，以确保液体的恒定流动。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009272624A

公开(公告)日：2009-11-19

申请号：JP2009108622

申请日：2009-04-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： TINNEMANS PATRICIUS ALOYSIUS J ,  BASELMANS JOHANNES JACOBUS MAT

IPC: H01L21/027

CPC classification number: G03F7/70141 ,  G03F7/70108 ,  G03F7/70116 ,  G03F7/70566

Abstract: PROBLEM TO BE SOLVED: To improve control of a polarized state and/or a pupil plane distribution of a radiation projected on a substrate. SOLUTION: A lithographic apparatus includes an illumination system configured to condition a radiation beam. The illumination system has a Pockels cell arranged to control the polarization of the radiation beam, and an array of individually controllable reflective elements arranged to control the pupil plane distribution of the radiation beam. The Pockels cell is used to correct polarization of the radiation beam, and the array of individually controllable reflective elements is used to give a pupil plane distribution to the radiation beam, and a patterning device is used to give a pattern to the radiation beam, and a projection system is used to project the radiation beam having had the pattern given thereto, to the substrate. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：改善投射在基板上的辐射的偏振态和/或光瞳平面分布的控制。 解决方案：光刻设备包括被配置为调节辐射束的照明系统。 照明系统具有布置成控制辐射束的偏振的普克尔斯单元，以及被布置为控制辐射束的光瞳平面分布的独立可控反射元件的阵列。 普克尔斯单元用于校正辐射束的偏振，并且使用单独可控的反射元件的阵列来给予辐射束的光瞳平面分布，并且使用图案形成装置给辐射束提供图案，以及 使用投影系统将具有给定图案的辐射束投射到基板。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009105443A

公开(公告)日：2009-05-14

申请号：JP2009024156

申请日：2009-02-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CADEE THEODORUS PETRUS MARIA ,  JACOBS JOHANNES HENRICUS WILHE ,  KATE NICOLAAS TEN ,  LOOPSTRA ERIK ROELOF ,  VAN MEER ASCHWIN LODEWIJK HEND ,  MERTENS JEROEN JOHANNES SOPHIA ,  DE MOL CHRISTIANUS GERARDUS MA ,  MUITJENS MARCEL JOHANNUS ELISA ,  VAN DER NET ANTONIUS J ,  OTTENS JOOST JEROEN ,  QUAEDACKERS JOHANNES ANNA ,  REUHMAN-HUISKEN MARIA ELISABET ,  STAVENGA MARCO KOERT ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MAR ,  VERSPAIJ JACOBUS JOHANNUS LEON ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  BOOM HERMAN ,  NIHTIANOV STOYAN ,  MOERMAN RICHARD ,  SMEETS MARTIN FRANS PIERRE ,  SCHOONDERMARK BART LEONARD PET ,  JANSSEN FRANCISCUS JOHANNES JO ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system reducing lithography errors arising from the immersion liquid. SOLUTION: A lithographic apparatus includes: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern to its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between a final element of the projection system and the substrate with liquid; a seal member arranged to substantially contain the liquid within the space between the final element of the projection system and the substrate; and elements to control and/or compensate for evaporation of immersion liquid from the substrate. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供减少由浸没液体引起的光刻误差的系统。 光刻设备包括：被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够将辐射束赋予其横截面图案以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 液体供应系统，被配置为至少部分地用液体填充所述投影系统的最终元件和所述基板之间的空间; 密封构件，其布置成基本上将所述液体容纳在所述投影系统的最终元件与所述基板之间的空间内; 以及用于控制和/或补偿来自基底的浸没液体的蒸发的元件。 版权所有（C）2009，JPO＆INPIT