公开(公告)号：JP2007235179A

公开(公告)日：2007-09-13

申请号：JP2007159104

申请日：2007-06-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARI ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  BIJLAART ERIK THEODORUS MARIA ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  VAN SANTEN HELMAR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion type lithography projection apparatus with improved functionality. SOLUTION: The lithography projection apparatus includes: a radiation system Ex, IL also equipped with a radiation source LA, for providing the projection beams PB of radiation; a first object table (mask table) MT connected to a first positioning means, for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to a second positioning means, for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of the radiated part of the mask MA on the target part C of the substrate W. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 光刻投影设备包括：辐射系统Ex，IL，其还配备有辐射源LA，用于提供辐射的投影光束PB; 连接到第一定位装置的第一目标表（掩模台）MT，用于相对于构件PL正确定位掩模; 连接到第二定位装置的第二对象台（衬底台）WT，用于相对于构件PL正确定位衬底; 以及用于在基板W的目标部分C上形成掩模MA的辐射部分的图像的投影系统PL。版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2010161421A

公开(公告)日：2010-07-22

申请号：JP2010097301

申请日：2010-04-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  BIJLAART ERIK THEODORUS MARIA ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  VAN SANTEN HELMAR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA MARIA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion type lithography projection apparatus with improved functionality. SOLUTION: The lithography projection apparatus includes: a radiation system Ex, IL also equipped with a radiation source LA, for providing the projection beams PB of radiation; a first object table (mask table) MT connected to a first positioning means, for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to a second positioning means, for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of the radiated part of the mask MA on the target part C of the substrate W. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 光刻投影设备包括：辐射系统Ex，IL，其还配备有辐射源LA，用于提供辐射的投影光束PB; 连接到第一定位装置的第一目标表（掩模台）MT，用于相对于构件PL正确定位掩模; 连接到第二定位装置的第二对象台（衬底台）WT，用于相对于构件PL正确定位衬底; 以及用于在基板W的目标部分C上形成掩模MA的辐射部分的图像的投影系统PL。版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2012114485A

公开(公告)日：2012-06-14

申请号：JP2012066781

申请日：2012-03-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  ALEXEI KOLESNE TCHENKO ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  KLAUS SIMON ,  DE SMIT JOANNES THEODOOR ,  ALEXANDER STOLE YALE ,  STREEFKERK BOB ,  ERIK THEODORUS MARIA BIJLAART ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  HELMAR VAN SANTEN ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  JEROEN JOHANNES SOPHIA MARIA MERTENS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion-type lithography projection device with improved functionality.SOLUTION: An immersion-type lithography projection device comprises: a radiation systems Ex, IL which are provided with a radiation source LA and supply projection beams PB of radiation; a first object table (mask table) MT connected to first positioning means for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to second positioning means for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of a radiated part of the mask MA on a target part C of a substrate W.

公开(公告)号：JP2012054601A

公开(公告)日：2012-03-15

申请号：JP2011243513

申请日：2011-11-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  ALEXEI KOLESNE TCHENKO ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  KLAUS SIMON ,  DE SMIT JOANNES THEODOOR ,  ALEXANDER STOLE YALE ,  STREEFKERK BOB ,  ERIK THEODORUS MARIA BIJLAART ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  HELMAR VAN SANTEN ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  JEROEN JOHANNES SOPHIA MARIA MERTENS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion-type lithographic projection apparatus with improved functionality.SOLUTION: The immersion-type lithographic projection apparatus comprises: a radiation system Ex which is provided with a radiation source LA and supplies a radiation projection beam PB; an illumination system IL; a first object table (mask table) MT connected to first positioning means for accurately positioning a mask to a member PL; a second object table (substrate table) WT connected to second positioning means for accurately positioning the substrate to the member PL; and a projection system PL for imaging an irradiated part of a mask MA on a target part C of a substrate W. This apparatus also includes at least one sensor that is disposed so as to be illuminated with a radiation projection beam that has passed through an immersion liquid.

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影设备。 浸渍式光刻投影装置包括：放射线系统Ex，其设置有辐射源LA并提供辐射投射光束PB; 照明系统IL; 连接到第一定位装置的第一目标表（掩模台）MT，用于将掩模精确地定位到构件PL; 连接到第二定位装置的第二对象台（衬底台）WT，用于将衬底精确地定位到构件PL; 以及投影系统PL，用于对基板W的目标部分C上的掩模MA的照射部分进行成像。该装置还包括至少一个传感器，其布置成被辐射投影光束照射， 浸液 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012114484A

公开(公告)日：2012-06-14

申请号：JP2012066780

申请日：2012-03-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  ALEXEI KOLESNE TCHENKO ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  KLAUS SIMON ,  DE SMIT JOANNES THEODOOR ,  ALEXANDER STOLE YALE ,  STREEFKERK BOB ,  ERIK THEODORUS MARIA BIJLAART ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  HELMAR VAN SANTEN ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  JEROEN JOHANNES SOPHIA MARIA MERTENS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion-type lithography projection device with improved functionality.SOLUTION: An immersion-type lithography projection device comprises: a radiation systems Ex, IL which are provided with a radiation source LA and supply projection beams PB of radiation; a first object table (mask table) MT connected to first positioning means for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to second positioning means for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of a radiated part of the mask MA on a target part C of a substrate W.

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 解决方案：浸没型光刻投影装置包括：辐射系统Ex，IL，其设置有辐射源LA并且提供放射线的投影束PB; 连接到用于相对于构件PL正确定位掩模的第一定位装置的第一对象表（掩模台）MT; 连接到用于相对于构件PL正确定位衬底的第二定位装置的第二对象台（衬底台）WT; 以及用于在基板W的目标部分C上形成掩模MA的辐射部分的图像的投影系统PL。版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012054602A

公开(公告)日：2012-03-15

申请号：JP2011243516

申请日：2011-11-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  ALEXEI KOLESNE TCHENKO ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  KLAUS SIMON ,  DE SMIT JOANNES THEODOOR ,  ALEXANDER STOLE YALE ,  STREEFKERK BOB ,  ERIK THEODORUS MARIA BIJLAART ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  HELMAR VAN SANTEN ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  JEROEN JOHANNES SOPHIA MARIA MERTENS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion-type lithographic projection apparatus with improved functionality.SOLUTION: The immersion-type lithographic projection apparatus comprises: a radiation system Ex which is provided with a radiation source LA and supplies a radiation projection beam PB; an illumination system IL; a first object table (mask table) MT connected to first positioning means for accurately positioning a mask to a member PL; a second object table (substrate table) WT connected to second positioning means for accurately positioning the substrate to the member PL; and a projection system PL for imaging an irradiated part of a mask MA on a target part C of a substrate W. This apparatus also includes at least one sensor that is disposed so as to be illuminated with a radiation projection beam that has passed through an immersion liquid.

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影设备。 浸渍式光刻投影装置包括：放射线系统Ex，其设置有辐射源LA并提供辐射投射光束PB; 照明系统IL; 连接到第一定位装置的第一目标表（掩模台）MT，用于将掩模精确地定位到构件PL; 连接到第二定位装置的第二对象台（衬底台）WT，用于将衬底精确地定位到构件PL; 以及投影系统PL，用于对基板W的目标部分C上的掩模MA的照射部分进行成像。该装置还包括至少一个传感器，其布置成被辐射投影光束照射， 浸液 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011238961A

公开(公告)日：2011-11-24

申请号：JP2011164018

申请日：2011-07-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DE KERKHOF MARCUS ADRIANUS ,  SIEBE LANDHEER ,  BECKERS MARCEL ,  BRUIJSTENS JEROEN PETER JOHANNES ,  JANSSEN FRANCISCUS JOHANNES JOSEPH

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03B27/52

Abstract: PROBLEM TO BE SOLVED: To reduce a heat load applied to a projection system and/or an immersion system.SOLUTION: A lithographic apparatus comprises a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also comprises a barrier member surrounding a space between the substrate in use and the projection system, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further comprises a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.

Abstract translation: 要解决的问题：减少施加到投影系统和/或浸没系统的热负荷。 解决方案：光刻设备包括投影系统，该投影系统被配置为将图案化的辐射束投影到基板的目标部分上。 投影系统具有最终元素。 该装置还包括围绕使用中的基板和投影系统之间的空间的阻挡构件，以部分地限定最终元件用于液体的储存器。 阻挡构件与最终元件间隔开，以在它们之间形成间隙。 该装置还包括在最终元件的径向外表面和阻挡构件的径向外表面之间的可变形密封件。 可变形密封件被构造成基本上防止气体流过密封件朝向或远离液体容器流动。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2005005707A

公开(公告)日：2005-01-06

申请号：JP2004169275

申请日：2004-06-08

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARI ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  BIJLAART ERIK THEODORUS MARIA ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  VAN SANTEN HELMAR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion type lithography projection apparatus with improved functionality. SOLUTION: The highlights of this invention are that the lithography apparatus is equipped with a radiation system Ex to provide the projection beams PB of radiation including a radioactive source LA, a primary object table (mask table) MT connected to a primary positioning means to correctly position a mask against IL and a member PL, a secondary object table (substrate table) WT connected to a secondary positioning means to correctly position a substrate against the member PL, and a projection system PL to form an image of the irradiated part of the mask MA on the target part of the substrate W. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 解决方案：本发明的亮点在于，光刻设备配备有辐射系统Ex以提供包括放射源LA的辐射投影束PB，连接到主要定位的主要物体台（掩模台）MT 用于将掩模正确地定位在IL和构件PL上的装置，连接到二次定位装置以将衬底正确地定位在构件PL上的第二对象台（衬底台）WT，以及用于形成照射的图像的投影系统PL 在基板W的目标部分上的掩模MA的一部分。版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004186691A

公开(公告)日：2004-07-02

申请号：JP2003404012

申请日：2003-12-03

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VAN DE KERKHOF MARCUS ADRIANUS ,  DE BOEIJ WILHELMUS PETRUS ,  HEMERIK MARCEL MAURICE

IPC: G21K5/00 ,  G01J1/42 ,  G01J1/58 ,  G01T1/20 ,  G02B5/26 ,  G03F7/20 ,  G21K5/02 ,  H01L21/027

CPC classification number: G03F7/70558 ,  G01J1/429 ,  G01J1/58 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To improve the detection property of a present photodetector having a transformation layer so as to achieve the higher yield and restrain the generation of any ghost. SOLUTION: A lithography projector is provided with a radiation system for supplying a projection beam of primary radiation, a supporting structure for supporting a patterning means which acts to patternize a projection beam according to the required pattern, a substrate table for holding a substrate, a projection system for projecting the patternized beam on the target part of the substrate, and a radiation sensor which can move in a path in which the projection beam traverses, to accept the primary radiation from the projection beam. The sensor is provided with a radiation sensitive material which converts the incident primary radiation into the secondary radiation, a sensing means which can detect the secondary radiation from the radiation sensitive material, and a filter material for substantially blocking the secondary radiation from propagating in the direction that the secondary radiation gets away from the sensing means. COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：WO2006133907A3

公开(公告)日：2007-03-08

申请号：PCT/EP2006005684

申请日：2006-06-13

Applicant: ASML NETHERLANDS BV ,  VAN DE KERKHOF MARCUS ADRIANUS ,  DE BOEIJ WILHELMUS PETRUS ,  VAN GREEVENBROEK HENDRIKUS ROB ,  KLAASSEN MICHEL FRANSOIS HUBER ,  KOK HAICO VICTOR ,  WEHRENS MARTIJN GERARD DOMINIQ ,  UITTERDIJK TAMMO ,  ROOIJAKKERS WILHELMUS JACOBUS ,  KUIPER JOHANNES MARIA ,  VAN DOOREN LEON ,  SONNEVELD JACOB ,  GILING ERWIN JOHANNES MARTINUS

Inventor： VAN DE KERKHOF MARCUS ADRIANUS ,  DE BOEIJ WILHELMUS PETRUS ,  VAN GREEVENBROEK HENDRIKUS ROB ,  KLAASSEN MICHEL FRANSOIS HUBER ,  KOK HAICO VICTOR ,  WEHRENS MARTIJN GERARD DOMINIQ ,  UITTERDIJK TAMMO ,  ROOIJAKKERS WILHELMUS JACOBUS ,  KUIPER JOHANNES MARIA ,  VAN DOOREN LEON ,  SONNEVELD JACOB ,  GILING ERWIN JOHANNES MARTINUS

IPC: G03F7/20

CPC classification number: G01J4/04 ,  G03F7/70091 ,  G03F7/70566 ,  G03F7/70591 ,  G03F7/70716

Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens.

Abstract translation: 光刻设备包括被配置为调节辐射束的照明系统; 至少部分地配置为耦合到掩模版平台的偏振传感器，其中所述光罩极化传感器的部件可以以用于常规掩模版的方式在光刻设备中加载和卸载。 在一种配置中，有源掩模版工具包括可旋转延迟器，其被配置为改变施加到照明系统中的场点所接收的偏振光的延迟。 在另一种配置中，被动掩模版工具被配置为偏振传感器模块的阵列，其中由固定延迟器施加到接收光的延迟量根据偏振传感器模块的位置而变化。 因此，可以测量在给定场点处接收的光的多个延迟条件，其中可以确定在给定场点处的光的偏振状态的完全确定。 在另一种配置中，偏振传感器被配置为测量投影透镜对通过投影透镜的光的偏振状态的影响。