公开(公告)号：JP2009033161A

公开(公告)日：2009-02-12

申请号：JP2008187823

申请日：2008-07-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HEN ,  VAN DER NET ANTONIUS JOHANNUS ,  WANTEN PETER FRANCISCUS ,  VAN DER DONCK JACQUES COR JOHA ,  WATSO ROBERT DOUGLAS ,  VAN DEN DOOL TEUNIS CORNELIS ,  SCHUH NADJA ,  CROMWIJK JAN WILLEM

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To prevent or reduce contamination in immersion lithographic apparatus.
SOLUTION: The immersion lithographic apparatus is cleaned by a cleaning liquid essentially consisting of ultra-pure water, and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide having a concentration of up to 5%, or (c) ozone having a concentration of up to 50 ppm, or (d) oxygen having a concentration of up to 10 ppm, or (e) an arbitrary combination selected from (a)-(d).
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：防止或减少浸没式光刻设备中的污染。 浸渍式光刻设备由基本上由超纯水组成的清洗液和（a）过氧化氢和臭氧的混合物或（b）浓度高达5％的过氧化氢清洗， 或（c）浓度高达50ppm的臭氧，或（d）浓度高达10ppm的氧，或（e）选自（a） - （d）的任意组合。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009267405A

公开(公告)日：2009-11-12

申请号：JP2009100475

申请日：2009-04-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE GRAAF ROELOF FREDERIK ,  VAN DER NET ANTONIUS JOHANNUS ,  STAVENGA MARCO KOERT ,  CUIJPERS JOHANNES WILHELMUS JA ,  VAN DEN HEUVEL MARTINUS WILHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70341 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To provide a method of detecting particles in liquid immersion fluid in a lithography device or in liquid immersion fluid from the lithography device. SOLUTION: The method includes, using a vacuum system, extracting a sample from a single phase flow of liquid immersion fluid of a fluid handling structure of a lithography device or from a fluid handling structure. The method includes detecting particles in a sample, and when detected particles exceed a particular threshold, starting a signal. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种检测光刻装置中的液浸液体或来自光刻装置的液浸液体中的颗粒的方法。 解决方案：该方法包括使用真空系统，从光刻装置的流体处理结构的液浸流体的单相流或从流体处理结构提取样品。 该方法包括检测样品中的颗粒，并且当检测到的颗粒超过特定阈值时，启动信号。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2011014902A

公开(公告)日：2011-01-20

申请号：JP2010142164

申请日：2010-06-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KRAMER PIETER JACOB ,  VAN DER NET ANTONIUS JOHANNUS ,  EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  KUIJPER ANTHONIE

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/7085 ,  G03F7/70991

Abstract: PROBLEM TO BE SOLVED: To provide a system for detecting a flow in a two-phase flow; and to provide a system for detecting a ratio of gas to liquid in a two-phase flow.SOLUTION: The lithographic device including a duct for running a two-phase flow therein is disclosed. A flow divider for dividing a two-phase flow into a gas flow and a liquid flow is provided. A flowmeter measures a flow rate of a fluid in a gas flow or liquid flow.

Abstract translation: 要解决的问题：提供一种用于检测两相流中的流量的系统; 并提供一种用于检测两相流中气体与液体的比率的系统。解决方案：公开了包括用于在其中运行两相流的管道的光刻设备。 提供了用于将两相流分成气流和液流的分流器。 流量计测量气流或液体流中的流体的流量。

公开(公告)号：JP2009033163A

公开(公告)日：2009-02-12

申请号：JP2008187826

申请日：2008-07-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HEN ,  VAN DER NET ANTONIUS JOHANNUS ,  WANTEN PETER FRANCISCUS ,  VAN DER DONCK JACQUES COR JOHA ,  WATSO ROBERT DOUGLAS ,  VAN DEN DOOL TEUNIS CORNELIS ,  SCHUH NADJA ,  CROMWIJK JAN WILLEM

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To prevent or reduce contamination in immersion lithographic apparatus. SOLUTION: The lithographic apparatus has an in-situ ozonizer used for generating ozone gas by the UV radiation of gas containing oxygen. Ozone generated in this manner is dissolved in ultra-pure water and becomes a cleaning liquid by allowing the ozone to come into contact with the ultra-pure water through a permeable membrane. The cleaning liquid passes through an immersion hood to remove contamination on the surface of an immersion space. The used cleaning liquid is fed to an outlet system from the immersion hood with air and ozone gas confined in the immersion hood. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：防止或减少浸没式光刻设备中的污染。 解决方案：光刻设备具有用于通过含氧气体的紫外线辐射产生臭氧气体的原位臭氧发生器。 以这种方式产生的臭氧被溶解在超纯水中，并且通过允许臭氧通过可渗透膜与超纯水接触而变成清洁液体。 清洗液通过浸没罩以去除浸没空间表面上的污染物。 使用的清洁液体从浸没罩被供给到出口系统，空气和臭氧气体限制在浸没罩中。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2011199304A

公开(公告)日：2011-10-06

申请号：JP2011115335

申请日：2011-05-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  VAN DER NET ANTONIUS JOHANNUS ,  WANTEN PETER FRANCISCUS ,  VAN DER DONCK JACQUES COR JOHAN ,  WATSO ROBERT DOUGLAS ,  VAN DEN DOOL TEUNIS CORNELIS ,  SCHUH NADJA ,  CROMWIJK JAN WILLEM

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To prevent or reduce contamination of an immersion lithographic apparatus.SOLUTION: The immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).

Abstract translation: 要解决的问题：防止或减少浸没式光刻设备的污染。解决方案：浸没式光刻设备通过使用基本上由超纯水组成的清洗液和（a）过氧化氢和臭氧的混合物或 （b）浓度高达5％的过氧化氢，或（c）浓度高达50ppm的臭氧，或（d）浓度高达10ppm的氧，或（e）选自（ 广告）。

公开(公告)号：JP2011199284A

公开(公告)日：2011-10-06

申请号：JP2011055343

申请日：2011-03-14

Applicant: Asml Holding Nv ,  Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  エーエスエムエル ホールディング エヌ.ブイ.

Inventor： GOSEN JEROEN GERARD ,  VAN DER NET ANTONIUS JOHANNUS ,  PAARHUIS BART DINAND ,  VAN BOXTEL FRANK JOHANNES JACOBUS ,  LI JINGGAO

IPC: H01L21/027

CPC classification number: G03F7/70916

Abstract: PROBLEM TO BE SOLVED: To reduce or eliminate a risk of contamination in a lithographic apparatus.SOLUTION: A gas curtain is provided to separate a component of the lithographic apparatus from contaminated gas. The gas curtain is supplied by an opening. The opening is at a boundary of a protection environment with which a surface of the component comes into contact. The gas curtain may separate the component from a moving part of the apparatus.

Abstract translation: 要解决的问题：减少或消除光刻设备中污染的风险。解决方案：提供气幕以将光刻设备的组件与污染气体分离。 气幕由开口提供。 开口处于组件表面接触的保护环境的边界。 气幕可以将组件与设备的移动部分分离。

公开(公告)号：JP2011082511A

公开(公告)日：2011-04-21

申请号：JP2010212952

申请日：2010-09-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： HOEKERD KORNELIS TIJMEN ,  DE GRAAF ROELOF FREDERIK ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  VAN DER NET ANTONIUS JOHANNUS ,  KRAMER PIETER JACOB ,  KUIJPER ANTHONIE ,  MARTENS ARJAN HUBRECHT JOSEF ANNA ,  VAN DER GRAAF SANDRA ,  PADIY ALEXANDRE VIKTOROVYCH

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/304

CPC classification number: G03F7/70925 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To supply a cleaning liquid, having a rate of a base liquid and an emulsified component within a desirable work region, to an immersion system to be cleaned. SOLUTION: A cleaning liquid supply apparatus is configured to supply an emulsified cleaning fluid to an immersion lithographic apparatus. The apparatus includes a mixer configured to mix an additive fluid from an additive fluid supply section and an immersion liquid from an immersion supply section so as to prepare the emulsified cleaning fluid, a sensor system configured to sense physical characteristics of the emulsified cleaning fluid, and a controller connected to the sensor and mixer. The controller controls the supply of the additive fluid from the additive fluid supply section to the mixer and physical characteristics of the emulsified cleaning fluid. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：将要在所需工作区域中的基础液体和乳化成分的比率的清洗液供给到要清洁的浸渍系统。 解决方案：清洁液体供给装置构造成将乳化的清洁流体供应到浸没式光刻设备。 该装置包括混合器，其被配置为将来自添加剂流体供应部分的添加剂流体和来自浸没供应部分的浸没液体混合以制备乳化清洁流体;被配置为感测乳化清洁流体的物理特性的传感器系统，以及 连接到传感器和混合器的控制器。 控制器控制添加剂流体从添加剂流体供应部分到混合器的供应以及乳化清洁流体的物理特性。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2013084934A

公开(公告)日：2013-05-09

申请号：JP2012206553

申请日：2012-09-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： FRANK JOHANNES JACOBUS VAN BOXTEL ,  VAN DER NET ANTONIUS JOHANNUS ,  LEONARDA HENDRIKA VAN DEN HEUVEL

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70875 ,  G03F7/70891 ,  G03F7/70991

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus with a cooling system.SOLUTION: A lithographic apparatus includes a component and a local cooler to apply a local cooling load to the component. The local cooler has a gas passageway, which includes a flow restrictor upstream of the component and is configured to direct a flow of gas exiting from the flow restrictor to cool a surface of the component.

Abstract translation: 要解决的问题：为光刻设备提供冷却系统。 解决方案：光刻设备包括部件和局部冷却器，以将局部冷却负载施加到部件上。 本地冷却器具有气体通道，其包括在部件上游的限流器，并且构造成引导从限流器排出的气体流以冷却部件的表面。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2012195584A

公开(公告)日：2012-10-11

申请号：JP2012050993

申请日：2012-03-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： FRANK JOHANNES JACOBUS VAN BOXTEL ,  DE GRAAF ROELOF FREDERIK ,  VAN DER NET ANTONIUS JOHANNUS ,  JOHANNES ANTONIUS MARIA MARTINA VAN UIJTREGT ,  LEONARDA HENDRIKA VAN DEN HEUVEL

IPC: H01L21/027

CPC classification number: G03F7/70858

Abstract: PROBLEM TO BE SOLVED: To provide various configurations of a projection system, a lithographic apparatus, and a device manufacturing method.SOLUTION: According to a disclosed configuration, the projection system is configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes an optical element having a first face and a second face. The first face is configured to be exposed to an external gas environment connected to the outside of the lithographic apparatus. The second face is configured to be exposed to an internal gas environment which is substantially isolated from the external gas environment. The projection system further includes a pressure compensation system configured to adjust the pressure in the internal gas environment in response to a change in pressure in the external gas environment or a pressure difference between the internal gas environment and the external gas environment.

Abstract translation: 要解决的问题：提供投影系统，光刻设备和器件制造方法的各种配置。 解决方案：根据所公开的配置，投影系统被配置为将图案化的辐射束投影到基板的目标部分上。 投影系统包括具有第一面和第二面的光学元件。 第一面构造成暴露于连接到光刻设备外部的外部气体环境。 第二面构造成暴露于与外部气体环境基本隔离的内部气体环境。 投影系统还包括压力补偿系统，其被配置为响应于外部气体环境中的压力变化或内部气体环境与外部气体环境之间的压力差来调节内部气体环境中的压力。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2011199305A

公开(公告)日：2011-10-06

申请号：JP2011123361

申请日：2011-06-01

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DER NET ANTONIUS JOHANNUS

IPC: H01L21/027 ,  G02B21/26

CPC classification number: G03F7/70933 ,  C10J1/06 ,  C10J1/10 ,  G03F7/70341 ,  Y10S261/65

Abstract: PROBLEM TO BE SOLVED: To provide a humidifying apparatus and a humidifying method for use in combination with a lithographic apparatus, and a method for manufacturing a device.SOLUTION: Disclosed is a humidifying apparatus in which gas is supplied to a first side of a membrane and liquid is supplied to a second side of the same membrane. The membrane is non-porous with respect to the liquid but porous with respect to the vapor of the liquid and liquidphilic with respect to the liquid.

Abstract translation: 要解决的问题：提供一种与光刻设备组合使用的加湿装置和加湿方法及其制造方法。本发明公开了一种加湿装置，其中向膜的第一侧供应气体 并且液体被供应到同一膜的第二侧。 该膜相对于液体是无孔的，但相对于液体的蒸气是多孔的，并且相对于液体是液体的。