公开(公告)号：JP2013079939A

公开(公告)日：2013-05-02

申请号：JP2012167132

申请日：2012-07-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KOENEN WILLEM HERMAN GERTRUDA ANNA ,  EUSSEN EMIEL JOZEF MELANIE ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  ROBBERT EDGAR VAN LEEUWEN ,  KOEVOETS ADRIANUS HENDRIK

IPC: G01B21/00 ,  G01B11/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68

CPC classification number: H01L23/544 ,  G03F7/70 ,  G03F7/70775 ,  G03F9/7019 ,  H01L21/682 ,  H01L2223/5442 ,  H01L2223/54426 ,  H01L2223/54453 ,  H01L2223/5446 ,  H01L2924/0002 ,  H01L2924/00

Abstract: PROBLEM TO BE SOLVED: To provide a more accurate position measurement system using a calibration which takes less time than a conventional calibration method.SOLUTION: A position measurement system includes a first part EG, a second part ES and a computational unit. The first part and the second part determine a position of a first member relative to a second member by providing a position signal representing a position of the first part relative to the second part. The computational unit comprises an input terminal for receiving the position signal. The computational unit is configured to, in use, apply a conversion to the position signal to obtain a signal representing a position of the first member relative to the second member, and apply an adjustment to the conversion to at least partly compensate for a drift of the first part or the second part or both. The adjustment is based on a predetermined drift characteristic of the first part or the second part or both respectively. The predetermined drift characteristic includes one or more base shapes of the first part and/or the second part.

Abstract translation: 要解决的问题：提供使用比常规校准方法花费更少时间的校准的更精确的位置测量系统。 解决方案：位置测量系统包括第一部分EG，第二部分ES和计算单元。 第一部分和第二部分通过提供表示第一部分相对于第二部分的位置的位置信号来确定第一部件相对于第二部件的位置。 计算单元包括用于接收位置信号的输入端。 计算单元被配置为在使用中将转换应用于位置信号以获得表示第一构件相对于第二构件的位置的信号，并且对转换应用调整以至少部分地补偿 第一部分或第二部分或两者。 该调整基于第一部分或第二部分或两者的预定漂移特性。 预定漂移特性包括第一部分和/或第二部分的一个或多个基本形状。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2011211173A

公开(公告)日：2011-10-20

申请号：JP2011039324

申请日：2011-02-25

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS

IPC: H01L21/027 ,  G01B9/02 ,  G01B11/00 ,  H01L21/68

CPC classification number: G01B11/14 ,  G03B27/58

Abstract: PROBLEM TO BE SOLVED: To provide an improved lithographic apparatus of which positional accuracy performance is advanced.SOLUTION: The lithographic apparatus includes: a support being moveable relative to a reference structure in a direction; a first position measurement system configured to provide a first measurement signal in a first frequency range, the first measurement signal representative of a position of the support relative to the reference structure in the direction; a second position measurement system configured to provide a second measurement signal in a second frequency range, the second measurement signal representative of the position of the support relative to the reference structure in the direction; and a processor configured to (a) filter the first measurement signal so as to attenuate a signal component having a frequency in the second frequency range, (b) filter the second measurement signal so as to attenuate a signal component having a frequency in the first frequency range, and (c) combine the filtered first measurement signal and the filtered second measurement signal into a combined measurement signal representative of the position of the support relative to the reference structure in the direction.

Abstract translation: 要解决的问题：提供一种位置精度性能提高的改进的光刻设备。解决方案：光刻设备包括：支撑件可相对于参考结构在一个方向上移动; 第一位置测量系统，被配置为在第一频率范围内提供第一测量信号，所述第一测量信号表示所述支撑件相对于所述参考结构在所述方向上的位置; 第二位置测量系统，被配置为在第二频率范围内提供第二测量信号，所述第二测量信号表示所述支撑件相对于所述参考结构在所述方向上的位置; 以及处理器，其被配置为（a）对所述第一测量信号进行滤波，以便衰减具有在所述第二频率范围内的频率的信号分量，（b）滤除所述第二测量信号，以便衰减具有所述第一频率的信号分量 频率范围，以及（c）将滤波的第一测量信号和滤波的第二测量信号组合成表示支撑件相对于参考结构在该方向上的位置的组合测量信号。

公开(公告)号：JP2013135217A

公开(公告)日：2013-07-08

申请号：JP2012259496

申请日：2012-11-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CATHARINA MARIA BEERENS RUUD ANTONIUS ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  VERMEULEN JOHANNES PETRUS MARTINUS ,  CADEE THEODORUS PETRUS MARIA ,  LAFARRE RAYMOND WILHELMUS LOUIS

IPC: H01L21/027 ,  G01B11/00 ,  H01L21/68

CPC classification number: G01B11/14 ,  G03F7/70008 ,  G03F7/70775

Abstract: PROBLEM TO BE SOLVED: To provide a displacement measuring system of high accuracy in a lithography device.SOLUTION: A displacement measuring system comprises at least one retroreflector, and a diffraction grating. The displacement measuring system is configured to measure displacement by providing a first radiation beam to a measuring system, and the diffraction grating diffracts the first radiation beam first time to form plural diffracted beams. At least one retroreflector sequentially turns the diffracted beams in a direction to diffract the beams on the diffraction grating second time. At least one reflector turns the diffracted beams on the diffraction grating at least third time before the diffracted beams are re-coupled to form a second beam. Then, a displacement system is provided with a sensor configured to receive the second beam and determine displacement according to a strength of the second beam.

Abstract translation: 要解决的问题：在光刻设备中提供高精度的位移测量系统。解决方案：位移测量系统包括至少一个后向反射器和衍射光栅。 位移测量系统被配置为通过向测量系统提供第一辐射束来测量位移，并且衍射光栅首先衍射第一辐射束以形成多个衍射光束。 至少一个后向反射器顺序地将衍射光束沿着衍射光束的方向第二次衍射到衍射光栅上。 在衍射光束被重新耦合以形成第二光束之前，至少一个反射器在衍射光栅上至少三次转动衍射光束。 然后，位移系统设置有被配置为接收第二光束并根据第二光束的强度确定位移的传感器。

公开(公告)号：JP2012191205A

公开(公告)日：2012-10-04

申请号：JP2012047558

申请日：2012-03-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  OTTENS JOOST JEROEN ,  EUSSEN EMIEL JOZEF MELANIE ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  WILLIAM PETER VAN DRENT ,  STAALS FRANK ,  MACHT LUKASZ JERZY ,  ERIK WILLEM BOGAART

IPC: H01L21/027 ,  G01B11/00 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70833 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus including a position measurement system for accurately measuring a substrate table position.SOLUTION: The lithographic apparatus comprises: a substrate table position measurement system for measuring a substrate table position; and a projection system position measurement system for measuring a projection system position. The substrate table position measurement system comprises: a substrate table reference element mounted on the substrate table; and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to a holding plane of a substrate on the substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.

Abstract translation: 要解决的问题：提供一种包括用于精确测量衬底台位置的位置测量系统的光刻设备。 光刻设备包括：用于测量衬底台位置的衬底台位置测量系统; 以及用于测量投影系统位置的投影系统位置测量系统。 衬底台位置测量系统包括：安装在衬底台上的衬底台参考元件; 和第一传感器头。 衬底台参考元件在基本上平行于衬底台上的衬底的保持平面的测量平面中延伸。 保持平面布置在测量平面的一侧，第一传感器头布置在测量平面的相对侧。 投影系统位置测量系统包括一个或多个投影系统参考元件和传感器组件。 传感器头和传感器组件或相关联的投影系统测量元件安装在传感器框架上。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2012049531A

公开(公告)日：2012-03-08

申请号：JP2011178217

申请日：2011-08-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VESTERAKEN JEAN STEVEN CHRISTIAN ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  STEIJAART PETER PAUL ,  FRANCISCUS VAN DE MAST ,  JANSSEN GERARDUS ARNOLDUS HENDRICUS FRANCISCUS

IPC: H01L21/027 ,  G01B11/00

CPC classification number: G03F7/70916 ,  G03F7/70341 ,  G03F7/70608 ,  G03F7/70683 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70908

Abstract: PROBLEM TO BE SOLVED: To reduce or remove risk of errors in sensor measurements.SOLUTION: The lithographic apparatus has a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet which is associated with the first outlet and provides a thermally conditioned fluid with a second flow characteristic different from the first flow characteristic, adjacent to the thermally conditioned fluid from the first outlet.

Abstract translation: 要解决的问题：减少或消除传感器测量中的错误风险。 解决方案：光刻设备具有第一出口，以向至少部分传感器光束路径提供具有第一流动特性的热调节流体，以及与第一出口相关联并提供热调节流体的第二出口 具有与第一流动特性不同的第二流动特性，与来自第一出口的热调节流体相邻。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010166037A

公开(公告)日：2010-07-29

申请号：JP2009281089

申请日：2009-12-11

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN EIJK JAN ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  VERMEULEN JOHANNES PETRUS MARTINUS

IPC: H01L21/027 ,  G01B21/00 ,  G01B21/22 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F1/44 ,  G03B27/42 ,  G03F7/704 ,  G03F7/70516 ,  G03F7/70775 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To provide a position measuring system to a patterning device of a lithographic apparatus wherein deviation between the patterning device and a patterning device support is considered. SOLUTION: The lithographic apparatus includes an illumination system constituted to adjust a radiation beam, the patterning device support constituted to support the patterning device, the patterning device capable of imparting a pattern to a radiation beam at its cross section to form a patterned radiation beam, a substrate support constituted to hold a substrate, a projection system constituted to project the patterned radiation beam to a target of the substrate, and an encoder-type measurement system constituted to continuously determine a position quantity of the patterning device supported on the patterning device support by using a grid or a grating provided on the patterning device at least during the projection of the patterned radiation beam to a target of the substrate. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种位置测量系统到光刻设备的图案形成装置，其中考虑了图案形成装置和图案形成装置支架之间的偏差。 解决方案：光刻设备包括被配置为调节辐射束的照明系统，所述图案形成装置支撑件构造成支撑图案形成装置，所述图案形成装置能够在其横截面处向辐射束施加图案以形成图案化 辐射束，被构造成保持基板的基板支撑体，将图案化的辐射束投影到基板的目标上的投影系统;以及编码器型测量系统，被构造成连续地确定支撑在基板上的图案形成装置的位置量 至少在将图案化的辐射束投射到基板的靶时，通过使用设置在图案形成装置上的栅格或栅格的图案形成装置支撑。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2014135519A

公开(公告)日：2014-07-24

申请号：JP2014087903

申请日：2014-04-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN EIJK JAN ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  JOHANNES PETRUS MARTINUS BERNARDUS

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03B27/58 ,  G03F7/70716 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To reduce flexibility and resulting internal deformations by increasing stiffness and/or damping of a body of an object.SOLUTION: A positioning system to position a movable object having a body includes an object position measurement system, an object actuator, and an object controller. The positioning system further includes a stiffener to increase the stiffness and/or to damp relative movements within the body of the object. The stiffener includes: one or more sensors each arranged to determine a measurement signal representative of an internal strain or relative displacement in the body; one or more actuators each arranged to exert actuation force on a part of the body; and at least one controller configured to provide, on the basis of the measurement signal of at least one of the sensors, an actuation signal to at least one of the actuators to increase the stiffness and/or to damp movements within the body.

Abstract translation: 要解决的问题：通过增加物体的刚度和/或阻尼来减少柔性和产生的内部变形。解决方案：用于定位具有主体的可移动物体的定位系统包括物体位置测量系统，物体致动器， 和对象控制器。 定位系统还包括加强件，以增加刚度和/或抑制物体内部的相对运动。 加强件包括：一个或多个传感器，每个传感器被布置成确定表示身体内部应变或相对位移的测量信号; 一个或多个致动器，每个执行器被布置成在身体的一部分上施加致动力; 以及至少一个控制器，被配置为基于所述至少一个所述传感器的所述测量信号，向至少一个所述致动器提供致动信号，以增加所述刚度和/或抑制所述主体内的运动。

公开(公告)号：JP2013131776A

公开(公告)日：2013-07-04

申请号：JP2013057644

申请日：2013-03-21

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN EIJK JAN ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  VERMEULEN JOHANNES PETRUS MARTINUS

IPC: H01L21/027 ,  G01B11/16 ,  H01L21/68

CPC classification number: G03B27/58 ,  G03F7/70716 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To reduce flexibility and resulting internal deformations by increasing stiffness and/or damping of a body of an object.SOLUTION: A positioning system to position a movable object having a body includes an object position measurement system, an object actuator, and an object controller. The positioning system further includes a stiffener to increase the stiffness and/or to damp relative movements within the body of the object. The stiffener includes: one or more sensors each arranged to determine a measurement signal representative of an internal strain or relative displacement in the body; one or more actuators each arranged to exert actuation force on a part of the body; and at least one controller configured to provide, on the basis of the measurement signal of at least one of the sensors, an actuation signal to at least one of the actuators to increase the stiffness and/or to damp movements within the body.

Abstract translation: 要解决的问题：通过增加物体的刚度和/或阻尼来减少柔性和产生的内部变形。解决方案：用于定位具有主体的可移动物体的定位系统包括物体位置测量系统，物体致动器， 和对象控制器。 定位系统还包括加强件，以增加刚度和/或抑制物体内部的相对运动。 加强件包括：一个或多个传感器，每个传感器被布置成确定表示身体内部应变或相对位移的测量信号; 一个或多个致动器，每个执行器被布置成在身体的一部分上施加致动力; 以及至少一个控制器，被配置为基于所述至少一个所述传感器的所述测量信号，向至少一个所述致动器提供致动信号，以增加所述刚度和/或抑制所述主体内的运动。

公开(公告)号：JP2012124534A

公开(公告)日：2012-06-28

申请号：JP2012063346

申请日：2012-03-21

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KOENEN WILLEM HERMAN GERTRUDA ANNA ,  EUSSEN EMIEL JOZEF MELANIE ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70775 ,  G03F7/70508 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To improve stage position measurement accuracy of a stage.SOLUTION: A position measurement system to measure a position of a movable stage includes: a reference plate; a plurality of sensors configured such that, corresponding to the position of the movable stage relative to the reference plate, at least a subset of the plurality of sensors cooperates with the reference plate to provide for each sensor in the subset respective sensor signals representative of the positions of the respective sensors relative to the reference plate; and a processor which determines from the sensor signals a stage position. When the stage is at a position where an over-determined number of sensor signals are provided by at least the subset of the sensors in operational cooperation with the reference plate, the processing device (a) determines the stage position from a subset of the over-determined number of sensor signals, and (b) corrects the sensor signal of one or more of the sensors from a discrepancy between the determined stage position and the remaining sensor signals.

Abstract translation: 要解决的问题：提高舞台的舞台位置测量精度。 解决方案：用于测量可移动台的位置的位置测量系统包括：参考板; 多个传感器被配置为使得对应于可移动台相对于参考板的位置，多个传感器中的至少一个子集与参考板协作以提供该子集中的每个传感器， 相应传感器相对于参考板的位置; 并且从传感器确定舞台位置的处理器。 当舞台处于与参考板操作协作时由至少传感器的子集提供超过数量的传感器信号的位置时，处理装置（a）从过度的子集确定舞台位置 确定的传感器信号数量，以及（b）根据所确定的平台位置和其余传感器信号之间的差异来校正一个或多个传感器的传感器信号。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011097073A

公开(公告)日：2011-05-12

申请号：JP2010283303

申请日：2010-12-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DER WIJST MARC WILHELMUS MARIA ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  ZAAL KOEN JACOBUS J M

IPC: H01L21/027 ,  G01B11/00

CPC classification number: G03F7/7085 ,  G03F7/70425 ,  G03F7/70775 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To provide favorably an encoder type highly accurate measurement system configured to measure a position dependent signal of a movable object with almost no substantial influence of the motion of the moving object on measuring accuracy.
SOLUTION: The encoder type measurement system is configured to measure the position dependent signal of the movable object and includes at least one sensor attachable onto the movable object, a sensor target attachable onto a substantially stationary frame, and an attaching device configured to attach the sensor target onto the substantially stationary frame. It further includes a compensation device configured to compensate for movement and/or deformation of a sensor target object relative to the substantially stationary frame. The compensation device may include a passive type or active type damping device and/or a feedback position control system. In a substitute embodiment, the compensation device includes a gripping device fixing the position of the sensor target object.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了提供一种编码器型高精度测量系统，其被配置为测量可移动物体的位置相关信号，几乎不会对移动物体的运动产生实质影响的测量精度。 解决方案：编码器类型测量系统被配置为测量可移动物体的位置相关信号，并且包括可附接到可移动物体上的至少一个传感器，可附接到基本上固定的框架上的传感器目标，以及被配置为 将传感器目标物附接到基本上固定的框架上。 其还包括补偿装置，其被配置为补偿传感器目标物体相对于基本上静止的框架的移动和/或变形。 补偿装置可以包括无源型或主动型阻尼装置和/或反馈位置控制系统。 在替代实施例中，补偿装置包括固定传感器目标物体的位置的夹持装置。 版权所有（C）2011，JPO＆INPIT