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    Lithography apparatus, radiation beam inspection device, method of inspecting radiation beam, and method of manufacturing device
    1.
    发明专利
    Lithography apparatus, radiation beam inspection device, method of inspecting radiation beam, and method of manufacturing device 有权
    光刻设备，辐射光束检测装置，检测辐射光束的方法和制造装置的方法

    公开(公告)号：JP2007013157A

    公开(公告)日：2007-01-18

    申请号：JP2006177416

    申请日：2006-06-28

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VENEMA WILLEM JURRIANUS

    IPC: H01L21/027 ,  G01T1/24 ,  G01T1/29 ,  G03F7/20 ,  G21K1/02

    CPC classification number: G03F7/7085 ,  G03F7/70275 ,  G03F7/70291

    Abstract: PROBLEM TO BE SOLVED: To provide a system and a method which can determine an error introduced to a spot array by the array of a focusing element in lithography apparatus. SOLUTION: The lithography apparatus has a radiation beam inspection device which includes: a barrier of a radiation beam having an opening allowing the passage of a part of the radiation beam; and a radiation sensor for determining an intensity of radiation passing through the opening, and a position of a point where radiation is incident on the radiation sensor relative to the opening. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种可以通过光刻设备中的聚焦元件的阵列来确定引入点阵列的误差的系统和方法。 解决方案：光刻设备具有辐射束检查装置，其包括：具有允许辐射束的一部分通过的开口的辐射束的屏障; 以及辐射传感器，用于确定穿过开口的辐射强度，以及辐射相对于开口入射到辐射传感器上的点的位置。 版权所有（C）2007，JPO＆INPIT

    Ultrasonic distance sensor
    4.
    发明专利
    Ultrasonic distance sensor 有权
    超声波传感器

    公开(公告)号：JP2010021569A

    公开(公告)日：2010-01-28

    申请号：JP2009237880

    申请日：2009-10-15

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BRUINSMA ANASTASIUS JACOBUS ANICETUS ,  VENEMA WILLEM JURRIANUS

    IPC: H01L21/027 ,  G01S15/08

    CPC classification number: G01S15/101 ,  G01S7/52004 ,  G01S7/52006 ,  G01S15/88 ,  G01S2007/52014

    Abstract: PROBLEM TO BE SOLVED: To provide a system and a method using a more effective distance sensor. SOLUTION: A lithographic apparatus includes: an illumination system; a support part configured to support a patterning device; and a projection system. In pixel grid imaging, a large number of small optical spots are imaged onto a substrate surface by using a micro-lens array (MLA). The z position of the MLA is adjustable in order to focus the spots on the substrate surface and/or to compensate differences in the height of the substrate surface. Convergence adjustment is performed based on an output of an ultrasonic distance sensor arranged in the vicinity of the substrate surface. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供使用更有效的距离传感器的系统和方法。 光刻设备包括：照明系统; 构造成支撑图案形成装置的支撑部; 和投影系统。 在像素网格成像中，通过使用微透镜阵列（MLA）将大量的小光斑成像到衬底表面上。 MLA的z位置是可调节的，以便将斑点聚焦在衬底表面上和/或补偿衬底表面的高度差异。 基于配置在基板表面附近的超声波距离传感器的输出进行会聚调整。 版权所有（C）2010，JPO＆INPIT

    Lithographic apparatus and device manufacturing method
    5.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2009141357A

    公开(公告)日：2009-06-25

    申请号：JP2008307832

    申请日：2008-12-02

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： KATE NICOLAAS TEN ,  VENEMA WILLEM JURRIANUS ,  DER HAM RONALD V

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To remove unwanted droplets of an immersion fluid from a surface of a lithographic apparatus. SOLUTION: The immersion lithographic apparatus is provided which has an electrode set to remove unwanted droplets of an immersion fluid from a particular surface. Unwanted droplets of immersion fluid may form on a plurality of different surfaces of the immersion apparatus, such as on a liquid barrier member. If allowed to evaporate and/or dry, those droplets may cause a problem such as uncontrolled heat loading of the apparatus and/or staining of the surface. An electrode set is provided on a surface where the droplets are likely to be formed. A controlled voltage is applied to the electrodes within the electrode set to electrostatically remove the droplets from the surface. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：从光刻设备的表面去除浸没流体的不想要的液滴。 解决方案：提供浸没式光刻设备，其具有设置成从特定表面去除浸没流体的不想要的液滴的电极。 浸没液体的不希望的液滴可以形成在浸没设备的多个不同表面上，例如在液体屏障构件上。 如果允许蒸发和/或干燥，则这些液滴可能引起诸如装置的不受控制的热负荷和/或表面污染等问题。 在可能形成液滴的表面上设置电极组。 将受控电压施加到电极组中的电极，以从表面静电除去液滴。 版权所有（C）2009，JPO＆INPIT

    System and method for compensating thermal expansion of lithography apparatus or substrate
    7.
    发明专利
    System and method for compensating thermal expansion of lithography apparatus or substrate 有权
    用于补偿平版印刷装置或基板的热膨胀的系统和方法

    公开(公告)号：JP2007103941A

    公开(公告)日：2007-04-19

    申请号：JP2006270705

    申请日：2006-10-02

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VENEMA WILLEM JURRIANUS ,  BASELMANS JOHANNES JACOBUS MAT

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70875 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70466 ,  G03F7/70791 ,  H01L27/1296

    Abstract: PROBLEM TO BE SOLVED: To reduce errors caused by thermal expansion of a lithography apparatus and/or a substrate. SOLUTION: To prevent a substrate from expanding significantly to generate superposed errors an exposure operation takes place in two steps. A first step exposes boundary areas 11 and a second step exposes the larger, bulky areas 12. In one example, a portion of the substrate is held standstill and the substrate is exposed progressively from parts furthest from the held portions towards the held portion. In another example, a plurality of high velocity scans take place instead of a single slow scan, and the substrate is allowed to cool between the high velocity scans. In another example, a lithographic apparatus is heated in order to maintain a temperature differential between the apparatus and the surrounding environment, and to minimize any fluctuation due to the exposing radiation. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：减少由光刻设备和/或基板的热膨胀引起的误差。

    解决方案：为了防止基板显着膨胀以产生叠加误差，曝光操作分两步进行。 第一步骤暴露边界区域11，第二步骤暴露较大的体积大的区域12.在一个示例中，衬底的一部分保持静止，并且衬底从最远离被保持部分朝向保持部分的部分逐渐暴露。 在另一个示例中，进行多次高速扫描而不是单次慢扫描，并且允许衬底在高速扫描之间冷却。 在另一示例中，为了保持设备和周围环境之间的温度差，加热光刻设备，并且使由于曝光辐射引起的任何波动最小化。 版权所有（C）2007，JPO＆INPIT

    Variable lens and exposure system
    8.
    发明专利
    Variable lens and exposure system 有权
    可变镜头和曝光系统

    公开(公告)号：JP2006301630A

    公开(公告)日：2006-11-02

    申请号：JP2006112018

    申请日：2006-04-14

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： VENEMA WILLEM JURRIANUS

    IPC: G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/70275 ,  G02B3/0012 ,  G02B3/0056 ,  G02B3/14 ,  G02B26/005 ,  G03F7/70266

    Abstract: PROBLEM TO BE SOLVED: To provide a variable lens and an exposure system in a micro lens array exposing device. SOLUTION: The variable lens is equipped with cylindrical electrodes 2 forming capillary tubes, which are sealed with a transparent front element 4 and a transparent rear element 6 so as to form a fluid chamber 5 containing two fluids. The two fluids A and B are immiscible with each other, are separated into two fluid portions, and form a meniscus 14. When a low voltage V1 is applied to the electrode 2, the contact angle is 140°. A shape of the meniscus 14 can be changed with the applied voltage. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：在微透镜阵列曝光装置中提供可变透镜和曝光系统。 解决方案：可变透镜配备有形成毛细管的圆柱形电极2，其用透明前元件4和透明后元件6密封，以形成包含两种流体的流体室5。 两个流体A和B彼此不混溶，被分离成两个流体部分并形成弯液面14.当将低电压V1施加到电极2时，接触角为140°。 弯液面14的形状可以随着施加的电压而改变。 版权所有（C）2007，JPO＆INPIT

    Lithographic apparatus, radiation beam inspection device, method of inspecting beam of radiation and device manufacturing method
    9.
    发明专利
    Lithographic apparatus, radiation beam inspection device, method of inspecting beam of radiation and device manufacturing method 有权
    光刻设备，辐射光束检测装置，检测辐射束的方法和器件制造方法

    公开(公告)号：JP2010206221A

    公开(公告)日：2010-09-16

    申请号：JP2010132652

    申请日：2010-06-10

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VENEMA WILLEM JURRIANUS

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/7085 ,  G03F7/70275 ,  G03F7/70291

    Abstract: PROBLEM TO BE SOLVED: To provide a system and a method which can determine an error introduced to a spot array by the array of a focusing element in a lithography apparatus. SOLUTION: The lithographic apparatus has a radiation beam inspection device including: a barrier to the beam of radiation, the barrier having an aperture through which a portion of the beam of radiation passes; and a radiation sensor that determines the intensity of the radiation passing through the aperture and the position, relative to the aperture, of the point at which the radiation is incident on the radiation sensor. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种可以通过光刻设备中的聚焦元件的阵列来确定引入到点阵列的误差的系统和方法。 解决方案：光刻设备具有辐射束检查装置，其包括：辐射束的屏障，所述屏障具有孔，辐射束的一部分穿过该孔; 以及辐射传感器，其确定穿过孔的辐射的强度和辐射入射到辐射传感器上的点相对于孔的位置。 版权所有（C）2010，JPO＆INPIT

    Lithographic apparatus and device manufacturing method utilizing 2d run length encoding for image data compression
    10.
    发明专利
    Lithographic apparatus and device manufacturing method utilizing 2d run length encoding for image data compression 有权
    利用二维运行长度编码进行图像数据压缩的平面设备和设备制造方法

    公开(公告)号：JP2010033067A

    公开(公告)日：2010-02-12

    申请号：JP2009253100

    申请日：2009-11-04

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： MAKAROVIC ANDREJ ,  VENEMA WILLEM JURRIANUS ,  KESSELS LAMBERTUS G M ,  BONTEKOE MARCEL

    IPC: G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/70291 ,  G03F7/70508 ,  G03F7/70558

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus equipped with an array of individually controllable elements, and a data processing pipeline. SOLUTION: The array of individually controllable elements modulates a beam of radiation. The data processing pipeline converts a first representation of a requested dose pattern to a sequence of control data suitable for controlling the array of individually controllable elements so as to substantially form the requested dose pattern on a substrate. The data processing pipeline compresses an offline preprocessing device and an online rasterizer. The offline pre-processing device converts the first representation of the requested dose pattern to an intermediate representation, which is rasterized in a fewer number of operations than the first representation. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种装备有独立可控元件阵列的光刻设备和数据处理管线。 解决方案：独立可控元件的阵列调制辐射束。 数据处理流水线将所请求的剂量模式的第一表示转换成适合于控制独立可控元件的阵列的控制数据序列，以便在衬底上基本上形成所请求的剂量图案。 数据处理流水线压缩离线预处理设备和在线光栅器。 离线预处理设备将所请求的剂量模式的第一表示转换为中间表示，其以比第一表示少的操作被光栅化。 版权所有（C）2010，JPO＆INPIT

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