公开(公告)号：JP2005333152A

公开(公告)日：2005-12-02

申请号：JP2005172914

申请日：2005-05-17

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LALLEMANT NICOLAS A ,  VERHAGEN MARTINUS CORNELIS MAR ,  BECKERS MARCEL ,  STULTIENS RONALD ,  SMITS PASCAL A ,  HERTOG WLADIMIR FRANSISCUS GER ,  VAN DER PLAS DAVID THEODORUS W ,  KOELINK STEPHAN ,  KRUS HENK

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70933

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic system in which the area below a projection system is more properly covered by an air shower system.
SOLUTION: The lithographic apparatus comprises: a radiation system 1 for supplying projection beam of radiation; a first support structure for supporting a patterning means that serves to pattern the projection beam according to a desired pattern; a second support structure for supporting a substrate 3; a projection system for projecting the patterned beam onto a target portion of the substrate; and at least one gas generation structure 7 for generating gas flows 5S, 5T conditioned to attain to the volume defined between the projection system and the target portion of the substrate. The gas generation structure 7 is arranged to generate gas flows guided toward an upper volume located generally above the lower surface 4 of the projection system. This structure is further provided with a guiding element 8 for guiding the gas flows to the lower volume located generally below the lower surface of the projection system.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻系统，其中投影系统下方的区域被空气淋浴系统更适当地覆盖。 解决方案：光刻设备包括：辐射系统1，用于提供投影射束; 用于支撑用于根据期望图案对投影光束进行图案化的图案形成装置的第一支撑结构; 用于支撑衬底3的第二支撑结构; 投影系统，用于将图案化的光束投影到基板的目标部分上; 以及用于产生气体流5S，5T的至少一个气体产生结构7，其被调节到达到在投影系统和基板的目标部分之间限定的体积。 气体生成结构7被布置成产生朝向投影系统的大致在下表面4的上方定位的上部体积引导的气流。 该结构还设置有用于将气体流引导到大体位于投影系统的下表面下方的下部体积的引导元件8。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006060223A

公开(公告)日：2006-03-02

申请号：JP2005237216

申请日：2005-08-18

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： KEMPER NICOLAAS R ,  COX HENRIKUS HERMAN MARIE ,  DONDERS SJOERD NICOLAAS L ,  GRAAF ROELOF FREDERICK DE ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KATE NICOLAAS T ,  MERTENS JEROEN JOHANNES SOPHIA ,  VAN DER MEULEN FRITS ,  HERMAN MARIA TEUNISSEN FRANCIS ,  VAN DER TOORN JAN-GERARD C ,  VERHAGEN MARTINUS CORNELIS MAR ,  BELFROID STEFAN PHILIP CHRISTI ,  SMEULERS JOHANNES PETRUS MARIA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

Abstract: PROBLEM TO BE SOLVED: To provide a device which causes no vibration nor other disturbances by effectively removing a liquid from neighborhood of a substrate. SOLUTION: A porous member is used for a liquid removing system of an immersion lithography projector to make an inhomogeneous flow uniformly. A pressure difference between both ends of the porous member can be kept to a bubble point or below of the porous member, so that one-phase flow of the liquid is obtained. In place of this, the porous member can be used to reduce nonuniformity in two-phase flows. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：通过从衬底附近有效地除去液体来提供不产生振动或其它干扰的装置。 解决方案：一种多孔构件用于浸没式光刻投影仪的液体去除系统，以使均匀的流动均匀。 多孔构件的两端之间的压差可以保持在多孔构件的起泡点以下，从而获得液体的一相流动。 代替这一点，多孔构件可用于减少两相流中的不均匀性。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005079584A

公开(公告)日：2005-03-24

申请号：JP2004247635

申请日：2004-08-27

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： DIERICHS MARCEL MATHIJS THEODO ,  DONDERS SJOERD NICOLAAS LAMBER ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MAR ,  SEUNTIENS-GRUDA LEJLA

IPC: B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus, in which a liquid supply system maintains a liquid in a space between a final element of a projection system and a substrate with a liquid confinement system. SOLUTION: The liquid supply system further comprises a de-mineralizing unit, a distillation unit and a UV radiating source for the purification of an immersion liquid. Chemicals may be added to the immersion liquid for the inhibition of organism growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of organisms is reduced. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻投影装置，其中液体供应系统在具有液体限制系统的投影系统的最终元件和基板之间的空间中保持液体。 解决方案：液体供应系统还包括去矿化单元，蒸馏单元和用于净化浸液的UV辐射源。 可以将化学品加入到用于抑制生物体生长的浸液中，并且液体供应系统的组分可以由对可见光不透明的材料制成，使得生物体的生长减少。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2009105443A

公开(公告)日：2009-05-14

申请号：JP2009024156

申请日：2009-02-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CADEE THEODORUS PETRUS MARIA ,  JACOBS JOHANNES HENRICUS WILHE ,  KATE NICOLAAS TEN ,  LOOPSTRA ERIK ROELOF ,  VAN MEER ASCHWIN LODEWIJK HEND ,  MERTENS JEROEN JOHANNES SOPHIA ,  DE MOL CHRISTIANUS GERARDUS MA ,  MUITJENS MARCEL JOHANNUS ELISA ,  VAN DER NET ANTONIUS J ,  OTTENS JOOST JEROEN ,  QUAEDACKERS JOHANNES ANNA ,  REUHMAN-HUISKEN MARIA ELISABET ,  STAVENGA MARCO KOERT ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MAR ,  VERSPAIJ JACOBUS JOHANNUS LEON ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  BOOM HERMAN ,  NIHTIANOV STOYAN ,  MOERMAN RICHARD ,  SMEETS MARTIN FRANS PIERRE ,  SCHOONDERMARK BART LEONARD PET ,  JANSSEN FRANCISCUS JOHANNES JO ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system reducing lithography errors arising from the immersion liquid. SOLUTION: A lithographic apparatus includes: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern to its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between a final element of the projection system and the substrate with liquid; a seal member arranged to substantially contain the liquid within the space between the final element of the projection system and the substrate; and elements to control and/or compensate for evaporation of immersion liquid from the substrate. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供减少由浸没液体引起的光刻误差的系统。 光刻设备包括：被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够将辐射束赋予其横截面图案以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 液体供应系统，被配置为至少部分地用液体填充所述投影系统的最终元件和所述基板之间的空间; 密封构件，其布置成基本上将所述液体容纳在所述投影系统的最终元件与所述基板之间的空间内; 以及用于控制和/或补偿来自基底的浸没液体的蒸发的元件。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008135769A

公开(公告)日：2008-06-12

申请号：JP2007339406

申请日：2007-12-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DIERICHS MARCEL MATHIJS THEODO ,  DONDERS SJOERD NICOLAAS LAMBER ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MAR ,  SEUNTIENS-GRUDA LEJLA

IPC: H01L21/027 ,  B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  G03F7/20

CPC classification number: G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, in which a liquid supply system maintains a liquid in a space between a final element of a projection system and a substrate with a liquid confinement system. SOLUTION: A liquid supply system 180 further comprises a de-mineralizing unit 130, a distillation unit 120 and a UV radiating source 145 for the purification of an immersion liquid. Chemicals can be added to the immersion liquid for the inhibition of organism growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of organisms is reduced. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，其中液体供应系统使用液体限制系统在投影系统的最终元件和基板之间的空间中保持液体。 解决方案：液体供应系统180还包括去矿化单元130，蒸馏单元120和用于净化浸液的UV辐射源145。 可以将化学品添加到用于抑制生物体生长的浸液中，并且液体供应系统的组分可以由对可见光不透明的材料制成，使得生物体的生长减少。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008010864A

公开(公告)日：2008-01-17

申请号：JP2007158123

申请日：2007-06-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS HERNES ,  GILISSEN NOUD JAN ,  JANSEN HANS ,  KATE NICOLAAS TEN ,  KEMPER NICOLAAS R ,  ANTONIUS LEENDERS MARTINUS HEN ,  LOOPSTRA ERIK R ,  HUBERTUS MULKENS JOHANNES C ,  HARMEN KLAAS VAN DER SCHOOT ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MAR ,  STEIJAART PETER PAUL ,  VERMAELEN MARKUS MARTINUS PETR ,  VAN DER HOEVEN JAN CORNELIS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithography projection apparatus in which a liquid removal system surrounds a liquid supply system that supplies a liquid to a space between a projection system and a substrate. SOLUTION: The liquid removal system is capable of moving with respect to the liquid supply system and is controlled so that is has substantially a relative velocity of zero with respect to a moving substrate table. A gap between the liquid supply system and the liquid removal system can be covered and the atmosphere on the substrate table can be maintained so that the liquid vapor pressure becomes relatively high between the liquid supply system and the liquid removal system. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种浸没式光刻投影装置，其中液体移除系统围绕向投影系统和基板之间的空间提供液体的液体供应系统。 解决方案：液体移除系统能够相对于液体供应系统移动并且被控制为使得相对于移动的基板台具有基本相对的零速度。 可以覆盖液体供应系统和液体移除系统之间的间隙，并且可以保持基板台上的气氛，使得液体供应系统和液体移除系统之间的液体蒸气压力变得相对较高。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2006237608A

公开(公告)日：2006-09-07

申请号：JP2006043899

申请日：2006-02-21

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： STAVENGA MARCO KOERT ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  VERHAGEN MARTINUS CORNELIS MAR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide various pressure adjusting means for reducing pressure gradient in a liquid supply system of a lithographic apparatus. SOLUTION: The liquid supply system has a liquid confinement structure constituted to at least partially confine a liquid between a projection system of the lithography apparatus and a substrate table. High pressure gradient may cause particulate contamination within the liquid supply system and/or the liquid confinement structure. The pressure gradient, for example, can be reduced by the use of slow switching in one or more valves, a bleed flow around or through one or more valves, diversion of liquid to a drain rather than or in addition to switching a valve off, a pressure regulator or flow restrictor for preventing shock waves, and a buffer volume/damper for compensating pressure fluctuation. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供用于减小光刻设备的液体供应系统中的压力梯度的各种压力调节装置。 解决方案：液体供应系统具有液体限制结构，其构造成至少部分地限制光刻设备的投影系统和基板台之间的液体。 高压梯度可能导致液体供应系统和/或液体限制结构内的颗粒污染。 例如，压力梯度可以通过在一个或多个阀中使用缓慢的切换，或者通过一个或多个阀周围的排出流或通过一个或多个阀的流出而被减少，而不是或者除了切断阀之外， 用于防止冲击波的压力调节器或限流器以及用于补偿压力波动的缓冲容积/阻尼器。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2009246384A

公开(公告)日：2009-10-22

申请号：JP2009169087

申请日：2009-07-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAVENGA MARCO KOERT ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  VERHAGEN MARTINUS CORNELIS MAR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To disclose varieties of pressure adjusting means in order to reduce pressure gradient in a liquid supply system of a lithography apparatus. SOLUTION: The liquid supply system includes a liquid sealing structure constituted so as to at least partially close liquid between a projection system of a lithography apparatus and a substrate table. There is the possibility that high pressure gradient might cause particulate contamination in the liquid supply system/in sealing liquid structure. The pressure gradient is reduced for example by means of the use of slow switching of one valve or a plurality of valves, by means of the use of an extraction flow detouring one valve or a plurality of valves or passing through the valve, not switching the valve to a closed position or additionally to by means of the use of a branch for liquid flowing to a liquid discharge passage, by means of the use of a pressure control device or a flow rate limiter for preventing shock waves, and by means of the use of liquid/damper of a buffering capacity for compensating pressure variation. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了降低光刻设备的液体供应系统中的压力梯度，公开各种压力调节装置。 解决方案：液体供应系统包括液体密封结构，其构造成在光刻设备的投影系统和基板台之间至少部分地关闭液体。 高压梯度有可能导致液体供应系统/密封液体结构中的颗粒污染。 例如，通过使用一个阀或多个阀的缓慢切换，通过使用迂回一个阀或多个阀或通过阀的提取流来降低压力梯度，而不切换 阀门到关闭位置，或另外通过使用液体流向液体排放通道的分支，借助于使用压力控制装置或流量限制器来防止冲击波，并借助于 使用缓冲能力的液体/阻尼器来补偿压力变化。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009164622A

公开(公告)日：2009-07-23

申请号：JP2009043678

申请日：2009-02-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VERHAGEN MARTINUS CORNELIS MAR ,  JANSEN HANS ,  STAVENGA MARCO KOERT ,  VERSPAY JACOBUS JOHANNUS L H

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70808

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, and to provide a device manufacturing method. SOLUTION: A liquid supply system is configured to supply a liquid to a region between a substrate W and a projection system PL of the lithographic apparatus, and has a liquid confinement structure 12 fixed in a plane substantially perpendicular to an optical axis of the projection system PL and configured to hold the substrate W in order to restrict the liquid to a region above an upper surface of a substrate table WT so that a side of the substrate W to be exposed is substantially covered with the liquid during exposure. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，并提供一种器件制造方法。 解决方案：液体供应系统被配置为将液体供应到基板W和光刻设备的投影系统PL之间的区域，并且具有固定在基本上垂直于光刻设备的光轴的平面中的液体限制结构12 投影系统PL并且被配置为保持基板W，以便将液体限制在基板台WT的上表面上方的区域，使得在曝光期间待暴露的基板W的一侧基本上被液体覆盖。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009076951A

公开(公告)日：2009-04-09

申请号：JP2009007038

申请日：2009-01-15

Applicant: Asml Holding Nv ,  Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  エーエスエムエル ホールディング エヌ.ブイ.

Inventor： KEMPER NICOLAAS R ,  COX HENRIKUS HERMAN MARIE ,  DONDERS SJOERD NICOLAAS L ,  GRAAF ROELOF FREDERICK DE ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KATE NICOLAAS T ,  MERTENS JEROEN JOHANNES SOPHIA ,  VAN DER MEULEN FRITS ,  HERMAN MARIA TEUNISSEN FRANCIS ,  VAN DER TOORN JAN-GERARD C ,  VERHAGEN MARTINUS CORNELIS MAR ,  BELFROID STEFAN PHILIP CHRISTI ,  SMEULERS JOHANNES PETRUS MARIA ,  VOGEL HERMAN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus which does not cause vibration and other disturbances by effectively removing a liquid from neighborhood of a substrate. SOLUTION: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at the bubble point or below of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种通过从衬底附近有效地除去液体而不引起振动和其它干扰的装置。 解决方案：在浸没式光刻投影设备的液体去除系统中使用多孔构件以平滑不均匀流动。 跨越多孔构件的压差可以保持在多孔构件的起泡点或下方，从而获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。 版权所有（C）2009，JPO＆INPIT