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公开(公告)号：JP2012124539A
公开(公告)日：2012-06-28
申请号：JP2012071249
申请日：2012-03-27
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： JACOBS JOHANNES HENRICUS WILHELMUS , TEN KATE NICOLAAS , LEENDERS MARTINUS HENDRIKUS ANTONIUS , LOOPSTRA ERIK ROELOF , VERHAGEN MARTINUS CORNELIS MARIA , BOOM HERMAN , JANSSEN FRANCISCUS JOHANNES JOSEPH , BOUCHOMS IGOR PETRUS MARIA , KEMPER NICOLAAS R , OTTENS JOOST JEROEN , KOEK YUECEL , VAN ES JOHANNES
IPC: H01L21/027
CPC classification number: G03F7/70341 , G03F7/70716 , G03F7/70875
Abstract: PROBLEM TO BE SOLVED: To provide a system that efficiently and effectively eliminates such energy loss in a lithographic apparatus as occurs by evaporation of a provided liquid which locally cools associated components leading to deformations and deterioration that may cause defocus and lens aberration in immersion lithography where a space between a projection system and a substrate is filled with an immersion liquid to increase the numerical aperture.SOLUTION: A timetable 34 is prepared which comprises information regarding the time and the position, the speed, the acceleration etc. of the substrate W at which evaporation of a provided liquid 11 is most likely to occur. A liquid evaporation controller 30 heats at least a part of the substrate W by a heater or sends humidified air to prevent local evaporation, according to the timetable 34.
Abstract translation: 要解决的问题：提供一种系统，其有效地和有效地消除光刻设备中的这种能量损失，如通过蒸发局部冷却相关部件的所提供的液体而发生的，导致变形和劣化，这可能导致散焦和透镜像差 浸没光刻，其中投影系统和衬底之间的空间被浸没液体填充以增加数值孔径。 解决方案：制备时间表34，其包括关于最可能发生所提供的液体11的蒸发的基板W的时间和位置，速度，加速度等的信息。 液体蒸发控制器30根据时间表34通过加热器加热至少一部分基板W或者发送加湿空气以防止局部蒸发。版权所有（C）2012，JPO＆INPIT
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公开(公告)号：JP2015015503A
公开(公告)日：2015-01-22
申请号：JP2014216375
申请日：2014-10-23
Applicant: エーエスエムエル ネザーランズ ビー.ブイ. , Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ. , エーエスエムエル ホールディング エヌ.ブイ. , Asml Holding Nv , エーエスエムエル ホールディング エヌ.ブイ.
Inventor： KEMPER NICOLAAS R , COX HENRIKUS HERMAN MARIE , DONDERS SJOERD NICOLAAS L , GRAAF ROELOF FREDERICK DE , HOOGENDAM CHRISTIAAN ALEXANDER , KATE NICOLAAS T , JEROEN JOHANNES SOPHIA MARIA MERTENS , VAN DER MEULEN FRITS , HERMAN MARIA TEUNISSEN FRANCISCUS JOHANNES , VAN DER TOORN JAN-GERARD C , VERHAGEN MARTINUS CORNELIS MARIA , BELFROID STEFAN PHILIP CHRISTIAAN , SMEULERS JOHANNES PETRUS MARIA , VOGEL HERMAN
IPC: H01L21/027
CPC classification number: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
Abstract: 【課題】基板の近くから液体を効果的に除去し、振動および他の外乱を起こさない装置を提供すること。【解決手段】不均一な流れを均一にするために、浸漬リソグラフィ投影装置の液体除去システムで、多孔性部材を使用する。多孔性部材の両端の圧力差は、多孔性部材の泡立ち点以下に維持することができ、そのため一相の液体の流れを得ることができる。これに代えて、多孔性部材を、二相流内の不均一を低減するために使用することもできる。【選択図】図1
Abstract translation: 要解决的问题：提供一种有效地从基板附近去除液体并且不引起振动和其他干扰的装置。解决方案：在浸没式光刻投影装置的液体去除系统中使用多孔构件以平滑 流量不均匀。 多孔构件的两端的压差可以保持在多孔构件的起泡点以下，从而可以获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。
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公开(公告)号：JP2011029657A
公开(公告)日：2011-02-10
申请号：JP2010220937
申请日：2010-09-30
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： JACOBS HERNES , GILISSEN NOUD JAN , JANSEN HANS , KATE NICOLAAS TEN , KEMPER NICOLAAS R , ANTONIUS LEENDERS MARTINUS HENDRIKUS , LOOPSTRA ERIK R , HUBERTUS MULKENS JOHANNES C , HARMEN KLAAS VAN DER SCHOOT , STAVENGA MARCO KOERT , STREEFKERK BOB , VERHAGEN MARTINUS CORNELIS MARIA , STEIJAART PETER PAUL , VERMAELEN MARKUS MARTINUS PETRUS ADRIANUS , VAN DER HOEVEN JAN CORNELIS
IPC: H01L21/027
CPC classification number: G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To moderate a defect induced by an immersion liquid in an immersion lithography projection apparatus where a liquid removal system surrounds a liquid supply system for providing liquid to a space between a projection system and a substrate.
SOLUTION: The liquid removal system 100 is moveable relative to the liquid supply system (partially shown as a barrier member 12) and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system (partially shown as the barrier member 12) and the liquid removal system 100 may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained so that the vapor pressure of liquid is relatively high.
COPYRIGHT: (C)2011,JPO&INPIT-
4.发明专利Lithography equipment and method of manufacturing device 有权LITHOGRAPHY EQUIPMENT AND METHODS MANUFACTURING DEVICE
公开(公告)号：JP2011029656A
公开(公告)日：2011-02-10
申请号：JP2010220936
申请日：2010-09-30
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： JACOBS HERNES , GILISSEN NOUD JAN , JANSEN HANS , KATE NICOLAAS TEN , KEMPER NICOLAAS R , ANTONIUS LEENDERS MARTINUS HENDRIKUS , LOOPSTRA ERIK R , HUBERTUS MULKENS JOHANNES C , HARMEN KLAAS VAN DER SCHOOT , STAVENGA MARCO KOERT , STREEFKERK BOB , VERHAGEN MARTINUS CORNELIS MARIA , STEIJAART PETER PAUL , VERMAELEN MARKUS MARTINUS PETRUS ADRIANUS , VAN DER HOEVEN JAN CORNELIS
IPC: H01L21/027
CPC classification number: G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To moderate a defect induced by an immersion liquid in an immersion lithography projection apparatus where a liquid removal system surrounds a liquid supply system for providing liquid to a space between a projection system and a substrate. SOLUTION: The liquid removal system 100 is moveable relative to the liquid supply system (partially shown as a barrier member 12) and controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system (partially shown as the barrier member 12) and the liquid removal system 100 may be covered and an atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained so that the vapor pressure of liquid is relatively high. COPYRIGHT: (C)2011,JPO&INPIT
Abstract translation: 要解决的问题：为了缓和浸没光刻投影装置中的浸没液体引起的缺陷，其中液体移除系统围绕用于向投影系统和基板之间的空间提供液体的液体供应系统。 解决方案：液体移除系统100可相对于液体供应系统（部分地示为阻挡构件12）移动并被控制为相对于移动的衬底台具有基本上零的速度。 可以覆盖液体供应系统（部分示为阻挡构件12）和液体移除系统100之间的间隙，并且可以保持液体供应系统和衬底台上方的液体移除系统之间的气氛，使得蒸气压 的液体比较高。 版权所有（C）2011，JPO＆INPIT
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公开(公告)号：JP2014027308A
公开(公告)日：2014-02-06
申请号：JP2013228111
申请日：2013-11-01
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： CADEE THEODORUS PETRUS MARIA , JACOBS JOHANNES HENRICUS WILHELMUS , NICOLAAS TEN KATE , LOOPSTRA ERIK ROELOF , ASHWIN RODEVICK HENDRICKS JOHANNES VAN MEHL , JEROEN JOHANNES SOPHIA MARIA MERTENS , CHRISTIANUS GERARDUS MARIA DE MOL , MUITJENS MARCEL JOHANNUS ELISABETH HUBERTUS , VAN DER NET ANTONIUS J , OTTENS JOOST JEROEN , QUAEDACKERS JOHANNES ANNA , REUHMAN-HUISKEN MARIA ELISABETH , MARCO COELHO STAUFEN , TINNEMANS PATRICIUS ALOYSIUS J , VERHAGEN MARTINUS CORNELIS MARIA , VERSPAIJ JACOBUS JOHANNUS LEONARDUS HENDRICUS , DE JONG FREDERIK EDUARD , GOORMAN KOEN , MENCHTCHIKOV BORIS , BOOM HERMAN , STOYAN NIHTIANOV , MOERMAN RICHARD , SMEETS MARTIN FRANS PIERRE , SCHOONDERMARK BART LEONARD PETER , JANSSEN FRANCISCUS JOHANNES JOSEPH , RIEPEN MICHEL
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
Abstract: PROBLEM TO BE SOLVED: To provide a system that reduces lithography errors caused by immersion liquid.SOLUTION: A lithographic apparatus comprises: an illumination system configured to adjust a radiation beam; a support body configured to support a pattern forming device capable of imparting a pattern to the radiation beam in a cross section of the radiation beam to form a pattern formed radiation beam; a substrate table configured to hold a substrate; a projection system configured to project the pattern formed radiation beam onto a target portion of the substrate; a liquid supply system configured to fill at least a part of space between a final element of the projection system and the substrate with liquid; a seal member arranged to substantially contain the liquid within the space between the final element of the projection system and the substrate; and elements to control and/or compensate for evaporation of the immersion liquid from the substrate.
Abstract translation: 要解决的问题：提供减少由浸没液体引起的光刻误差的系统。解决方案：光刻设备包括：照明系统，被配置为调节辐射束; 支撑体，被配置为支撑图案形成装置，其能够在所述辐射束的横截面中赋予所述辐射束的图案以形成图案形成的辐射束; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案形成的辐射束投影到所述基板的目标部分上; 液体供应系统，其配置成用液体填充所述投影系统的最终元件和所述基板之间的至少一部分空间; 密封构件，其布置成基本上将所述液体容纳在所述投影系统的最终元件与所述基板之间的空间内; 以及用于控制和/或补偿来自衬底的浸没液体的蒸发的元件。
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Patent Agency Ranking
公开(公告)号：JP2010199619A
公开(公告)日：2010-09-09
申请号：JP2010116393
申请日：2010-05-20
Applicant: Asml Holding Nv , Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ. , エーエスエムエル ホールディング エヌ.ブイ.
Inventor： KEMPER NICOLAAS R , COX HENRIKUS HERMAN MARIE , DONDERS SJOERD NICOLAAS L , GRAAF ROELOF FREDERICK DE , HOOGENDAM CHRISTIAAN ALEXANDER , KATE NICOLAAS T , MERTENS JEROEN JOHANNES SOPHIA MARIA , VAN DER MEULEN FRITS , HERMAN MARIA TEUNISSEN FRANCISCUS JOHANNES , VAN DER TOORN JAN-GERARD C , VERHAGEN MARTINUS CORNELIS MARIA , BELFROID STEFAN PHILIP CHRISTIAAN , SMEULERS JOHANNES PETRUS MARIA , VOGEL HERMAN
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
Abstract: PROBLEM TO BE SOLVED: To provide a device that does not cause vibration and other disturbance by effectively removing liquid from the vicinity of a substrate. SOLUTION: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure difference across the porous member may be maintained at the bubble point or lower of the porous member so that a single-phase liquid flow can be obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow. COPYRIGHT: (C)2010,JPO&INPIT
Abstract translation: 要解决的问题：提供一种通过有效地从基板附近去除液体而不引起振动和其它干扰的装置。 解决方案：在浸没式光刻投影装置的液体去除系统中使用多孔构件以平滑不均匀流动。 跨越多孔构件的压差可以保持在多孔构件的起泡点或更低处，使得可以获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。 版权所有（C）2010，JPO＆INPIT
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公开(公告)号：JP2010010707A
公开(公告)日：2010-01-14
申请号：JP2009234094
申请日：2009-10-08
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： JACOBS JOHANNES HENRICUS WILHELMUS , TEN KATE NICOLAAS , LEENDERS MARTINUS HENDRIKUS ANTONIUS , LOOPSTRA ERIK ROELOF , VERHAGEN MARTINUS CORNELIS MARIA , BOOM HERMAN , JANSSEN FRANCISCUS JOHANNES JOSEPH , BOUCHOMS IGOR PETRUS MARIA , KEMPER NICOLAAS R , OTTENS JOOST JEROEN , KOEK YUECEL , VAN ES JOHANNES
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70341 , G03F7/70716 , G03F7/70875
Abstract: PROBLEM TO BE SOLVED: To provide a system that efficiently and effectively eliminate energy loss in a lithographic apparatus where a related component is locally cooled by evaporation of a supplied liquid and may be deformed and change in quality to possibly cause defocusing and lens aberrations during immersion lithography in which the part between a projection system and a substrate is filled with an immersion liquid so as to increase a numerical aperture. SOLUTION: A schedule table 34 is prepared which contains information regarding time when the supplied liquid 11 is most apt to evaporate, the position, speed, acceleration, etc. of the substrate, and a liquid evaporation controller 30 heats at least part of the substrate W by a heater or sends humidifying air according to the schedule table 34 to prevent local evaporation. COPYRIGHT: (C)2010,JPO&INPIT
Abstract translation: 要解决的问题：提供一种系统，其有效地和有效地消除光刻设备中的能量损失，其中相关部件通过供应液体的蒸发局部冷却，并且可能变形并且质量变化以可能引起散焦和透镜 浸渍光刻期间的像差，其中投影系统和衬底之间的部分被浸没液体填充以增加数值孔径。 解决方案：准备一个计划表34，其中包含关于所供应的液体11最易蒸发的时间的信息，基板的位置，速度，加速度等，并且液体蒸发控制器30加热至少部分 或者根据附表表34发送加湿空气以防止局部蒸发。 版权所有（C）2010，JPO＆INPIT
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公开(公告)号：JP2012147015A
公开(公告)日：2012-08-02
申请号：JP2012083578
申请日：2012-04-02
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： MARCO COELHO STAUFEN , JACOBS JOHANNES HENRICUS WILHELMUS , JANSEN HANS , VERHAGEN MARTINUS CORNELIS MARIA
IPC: H01L21/027 , G02B21/26
CPC classification number: G03F7/70341 , G03F7/709
Abstract: PROBLEM TO BE SOLVED: To provide various types of pressure regulation means for reducing a pressure gradient in a liquid supply system of a lithographic apparatus.SOLUTION: The liquid supply system has a liquid confinement structure configured to at least partially confine a liquid between a projection system and a substrate table of the lithographic apparatus. A high pressure gradient may cause particulate contamination in the liquid supply system and/or liquid confinement structure. A pressure gradient can be reduced by, for example, the use of slow switching in one or more valves, a bleed flow around or through one or more valves, diversion of liquid to a drain rather than or in addition to switching a valve off, a pressure regulator or flow restrictor to prevent shock waves, and a buffer liquid/damper to compensate for pressure fluctuation.
Abstract translation: 要解决的问题：提供用于降低光刻设备的液体供应系统中的压力梯度的各种类型的压力调节装置。 解决方案：液体供应系统具有液体限制结构，其被配置为至少部分地将液体限制在光刻设备的投影系统和衬底台之间。 高压梯度可能导致液体供应系统和/或液体限制结构中的颗粒污染。 压力梯度可以通过例如在一个或多个阀门中使用缓慢的切换，绕过或通过一个或多个阀门的泄放流量来减少，而不是或者除了切换阀门之外将液体转移到排水管， 压力调节器或限流器，以防止冲击波，以及缓冲液/阻尼器来补偿压力波动。 版权所有（C）2012，JPO＆INPIT
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公开(公告)号：JP2012094892A
公开(公告)日：2012-05-17
申请号：JP2011285622
申请日：2011-12-27
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： VERHAGEN MARTINUS CORNELIS MARIA , JANSEN HANS , MARCO COELHO STAUFEN , JACOBUS JOHANNUS LEONARDUS HENDRICUS VERSPAY
IPC: H01L21/027
CPC classification number: G03F7/70341 , G03F7/70808
Abstract: PROBLEM TO BE SOLVED: To protect an immersion fluid from an atmospheric environment in an immersion lithographic apparatus.SOLUTION: A lithographic apparatus is disclosed in which a liquid supply system is configured to supply a liquid to a region between a substrate W and a projection system PL of the lithographic apparatus and which has a liquid confinement structure fixed in a plane substantially perpendicular to an optical axis of the projection system PL and configured to hold the substrate W in order to restrict the liquid to a region above an upper surface of a substrate table WT so that a side of the substrate W to be exposed is substantially covered in the liquid during exposure.
Abstract translation: 要解决的问题：为了在浸没式光刻设备中保护浸没液体免受大气环境的影响。 解决方案：公开了一种光刻设备，其中液体供应系统被配置为将液体供应到基板W和光刻设备的投影系统PL之间的区域，并且具有固定在平面中的液体限制结构 垂直于投影系统PL的光轴并被配置为保持衬底W，以便将液体限制在衬底台WT的上表面上方的区域，使得待暴露的衬底W的一侧基本上覆盖在 液体在曝光期间。 版权所有（C）2012，JPO＆INPIT
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公开(公告)号：JP2012064982A
公开(公告)日：2012-03-29
申请号：JP2011285516
申请日：2011-12-27
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： CADEE THEODORUS PETRUS MARIA , JACOBS JOHANNES HENRICUS WILHELMUS , KATE NICOLAAS TEN , LOOPSTRA ERIK ROELOF , ASHWIN RODEVICK HENDRICKS JOHANNES VAN MEHL , JEROEN JOHANNES SOPHIA MARIA MERTENS , CHRISTIANUS GERARDUS MARIA DE MOL , MUITJENS MARCEL JOHANNUS ELISABETH HUBERTUS , VAN DER NET ANTONIUS J , OTTENS JOOST JEROEN , QUAEDACKERS JOHANNES ANNA , REUHMAN-HUISKEN MARIA ELISABETH , MARCO COELHO STAUFEN , TINNEMANS PATRICIUS ALOYSIUS J , VERHAGEN MARTINUS CORNELIS MARIA , VERSPAIJ JACOBUS JOHANNUS LEONARDUS HENDRICUS , DE JONG FREDERIK EDUARD , GOORMAN KOEN , MENCHTCHIKOV BORIS , BOOM HERMAN , STOYAN NIHTIANOV , MOERMAN RICHARD , SMEETS MARTIN FRANS PIERRE , SCHOONDERMARK BART LEONARD PETER , JANSSEN FRANCISCUS JOHANNES JOSEPH , RIEPEN MICHEL
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
Abstract: PROBLEM TO BE SOLVED: To provide a system that reduces lithography errors arising from an immersion liquid.SOLUTION: A lithographic apparatus includes: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device capable of imparting a pattern to the radiation beam in its cross section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between a final element of the projection system and the substrate with a liquid; a seal member arranged to substantially contain the liquid within the space between the final element of the projection system and the substrate; and elements to control and/or compensate for evaporation of the immersion liquid from the substrate.
Abstract translation: 要解决的问题：提供减少由浸没液体引起的光刻误差的系统。 光刻设备包括：被配置为调节辐射束的照明系统; 支撑构造以支撑能够在其横截面中将辐射束赋予图案以形成图案化辐射束的图案形成装置; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 液体供应系统，被配置为至少部分地用液体填充所述投影系统的最终元件和所述基板之间的空间; 密封构件，其布置成基本上将所述液体容纳在所述投影系统的最终元件与所述基板之间的空间内; 以及用于控制和/或补偿来自衬底的浸没液体的蒸发的元件。 版权所有（C）2012，JPO＆INPIT
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