公开(公告)号：JP2013135217A

公开(公告)日：2013-07-08

申请号：JP2012259496

申请日：2012-11-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CATHARINA MARIA BEERENS RUUD ANTONIUS ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  VERMEULEN JOHANNES PETRUS MARTINUS ,  CADEE THEODORUS PETRUS MARIA ,  LAFARRE RAYMOND WILHELMUS LOUIS

IPC: H01L21/027 ,  G01B11/00 ,  H01L21/68

CPC classification number: G01B11/14 ,  G03F7/70008 ,  G03F7/70775

Abstract: PROBLEM TO BE SOLVED: To provide a displacement measuring system of high accuracy in a lithography device.SOLUTION: A displacement measuring system comprises at least one retroreflector, and a diffraction grating. The displacement measuring system is configured to measure displacement by providing a first radiation beam to a measuring system, and the diffraction grating diffracts the first radiation beam first time to form plural diffracted beams. At least one retroreflector sequentially turns the diffracted beams in a direction to diffract the beams on the diffraction grating second time. At least one reflector turns the diffracted beams on the diffraction grating at least third time before the diffracted beams are re-coupled to form a second beam. Then, a displacement system is provided with a sensor configured to receive the second beam and determine displacement according to a strength of the second beam.

Abstract translation: 要解决的问题：在光刻设备中提供高精度的位移测量系统。解决方案：位移测量系统包括至少一个后向反射器和衍射光栅。 位移测量系统被配置为通过向测量系统提供第一辐射束来测量位移，并且衍射光栅首先衍射第一辐射束以形成多个衍射光束。 至少一个后向反射器顺序地将衍射光束沿着衍射光束的方向第二次衍射到衍射光栅上。 在衍射光束被重新耦合以形成第二光束之前，至少一个反射器在衍射光栅上至少三次转动衍射光束。 然后，位移系统设置有被配置为接收第二光束并根据第二光束的强度确定位移的传感器。

公开(公告)号：JP2012175107A

公开(公告)日：2012-09-10

申请号：JP2012030538

申请日：2012-02-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： HOL SVEN ANTOIN JOHAN ,  JAN VAN EIJK ,  VERMEULEN JOHANNES PETRUS MARTINUS ,  NISSE GERARD JOHANNES PETER ,  YAN-SHAN HUANG ,  MICHAEL WILHELMUS THEODORUS KOOT ,  DE VOLEI JEROEN ,  MAARTEN HARTGER KIMMAN ,  ZHOU WEI ,  MARTINS SIMON BERNALDOS CORNELIS MARIA

IPC: H01L21/027 ,  G03F7/20 ,  G05D3/00 ,  H01L21/68

CPC classification number: H01F7/081 ,  G03F7/70758 ,  H01F7/122 ,  H01F7/1646

Abstract: PROBLEM TO BE SOLVED: To provide an improved electromagnetic actuator.SOLUTION: The electromagnetic actuator includes a first magnetic member and a second magnetic member which can mutually move and are so arranged as to form a magnetic circuit; and a coil which receives a current during use to generate magnetic flux passing through the magnetic circuit, and thereby generates force in a first direction between the first magnetic member and second magnetic member. The magnetic flux is transmitted during the use through a first plane of the first magnetic member and a second plane of the second magnetic member between the first magnetic member and second magnetic member, the first plane and second plane are separated from each other by an air gap, and the first plane and second plane are so mutually arranged as to extend in a second direction substantially perpendicular to the first direction with the external dimension of the first plane larger than the external dimension of the second plane.

Abstract translation: 要解决的问题：提供改进的电磁致动器。 解决方案：电磁致动器包括第一磁性构件和第二磁性构件，其可以相互移动并被布置成形成磁路; 以及在使用期间接收电流以产生通过磁路的磁通，从而在第一磁性构件和第二磁性构件之间沿第一方向产生力的线圈。 在使用期间，磁通量通过第一磁性构件的第一平面和第二磁性构件的第二平面在第一磁性构件和第二磁性构件之间传递，第一平面和第二平面通过空气相互分离 间隙，并且第一平面和第二平面相互布置成在基本上垂直于第一方向的第二方向上延伸，第一平面的外部尺寸大于第二平面的外部尺寸。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010166037A

公开(公告)日：2010-07-29

申请号：JP2009281089

申请日：2009-12-11

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN EIJK JAN ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  VERMEULEN JOHANNES PETRUS MARTINUS

IPC: H01L21/027 ,  G01B21/00 ,  G01B21/22 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F1/44 ,  G03B27/42 ,  G03F7/704 ,  G03F7/70516 ,  G03F7/70775 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To provide a position measuring system to a patterning device of a lithographic apparatus wherein deviation between the patterning device and a patterning device support is considered. SOLUTION: The lithographic apparatus includes an illumination system constituted to adjust a radiation beam, the patterning device support constituted to support the patterning device, the patterning device capable of imparting a pattern to a radiation beam at its cross section to form a patterned radiation beam, a substrate support constituted to hold a substrate, a projection system constituted to project the patterned radiation beam to a target of the substrate, and an encoder-type measurement system constituted to continuously determine a position quantity of the patterning device supported on the patterning device support by using a grid or a grating provided on the patterning device at least during the projection of the patterned radiation beam to a target of the substrate. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种位置测量系统到光刻设备的图案形成装置，其中考虑了图案形成装置和图案形成装置支架之间的偏差。 解决方案：光刻设备包括被配置为调节辐射束的照明系统，所述图案形成装置支撑件构造成支撑图案形成装置，所述图案形成装置能够在其横截面处向辐射束施加图案以形成图案化 辐射束，被构造成保持基板的基板支撑体，将图案化的辐射束投影到基板的目标上的投影系统;以及编码器型测量系统，被构造成连续地确定支撑在基板上的图案形成装置的位置量 至少在将图案化的辐射束投射到基板的靶时，通过使用设置在图案形成装置上的栅格或栅格的图案形成装置支撑。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010098310A

公开(公告)日：2010-04-30

申请号：JP2009234675

申请日：2009-10-09

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KRUIJT-STEGEMAN YVONNE WENDELA ,  JEUNINK ANDRE BERNARDUS ,  VERMEULEN JOHANNES PETRUS MARTINUS

IPC: H01L21/027

CPC classification number: G03F7/0002 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70716 ,  G03F7/70725 ,  G03F7/70766 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To prevent misalignment resulting from residual strain in a substrate in a lithography apparatus.
SOLUTION: An imprint lithography apparatus and manufacturing method can lead to mechanical stress formed in a substrate to which an imprint pattern is applied. This may cause strain within the substrate leading to misalignment of a subsequent pattern with an earlier pattern in a portion of the substrate, which is strained. An apparatus and method is disclosed which allows for stress relaxation in the substrate prior to further patterning to reduce, minimize or prevent such misalignment from residual strain. This is achieved by locally unclamping a portion of the substrate (including optionally the entire substrate) from a corresponding portion of substrate holder so that mechanical stress leading to local strain may relax prior to further patterning. To overcome residual frictional force between the substrate and substrate holder, the substrate and substrate holder may be physically separated prior to further patterning.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了防止由光刻设备中的基板中的残余应变引起的不对准。 压印光刻设备和制造方法可以导致在施加印记图案的基板中形成的机械应力。 这可能导致衬底内的应变，导致后续图案与衬底的一部分中的早期图案的未对准，其被应变。 公开了一种装置和方法，其允许在进一步图案化之前在基板中施加应力松弛，以减少，最小化或防止这种从残余应变的偏移。 这是通过从衬底保持器的相应部分局部松开衬底的一部分（包括可选地整个衬底）来实现的，使得导致局部应变的机械应力在进一步图案化之前可能会松弛。 为了克服衬底和衬底保持器之间的残余摩擦力，衬底和衬底保持器可以在进一步构图之前物理分离。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2011086936A

公开(公告)日：2011-04-28

申请号：JP2010226129

申请日：2010-10-06

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CATHARINA MARIA BEERENS RUUD ANTONIUS ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  VAN DE VEN BASTIAAN LAMBERTUS WILHELMUS MARINUS ,  VERMEULEN JOHANNES PETRUS MARTINUS

IPC: H01L21/027 ,  G01B9/02 ,  G01B11/00

CPC classification number: G03F7/7085 ,  G01B9/02 ,  G01B9/02049 ,  G01B11/14 ,  G01B2290/70 ,  G03F7/70766 ,  G03F7/70775

Abstract: PROBLEM TO BE SOLVED: To provide a position measurement system configured so as to measure the position quantity of a movable object in a measurement direction.
SOLUTION: The position measurement system 1 includes a radiation source 4, a beam splitter 5 for splitting the radiation beam LB into a measurement beam MB and a reference beam RB, a first reflective surface 8 attached on the movable object 2 to receive the measurement beam MB; a second reflective surface 9 attached on a reference object to receive the reference beam RB; and a detector 6, arranged to receive a first reflected beam reflected by the first reflective surface 8 and a second reflected beam reflected by the second reflective surface 9 and configured so as to provide a signal representative of the position quantity of the movable object 2, based on the first and the second beams, wherein the radiation source 4 and the detector 6 are attached on an object other than the movable object 2 and the reference object 3.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种被配置为测量可移动物体在测量方向上的位置量的位置测量系统。 位置测量系统1包括辐射源4，用于将辐射束LB分成测量光束MB和参考光束RB的分束器5，​​附接在可移动物体2上以接收的第一反射表面8 测量光束MB; 附接在参考物体上以接收参考光束RB的第二反射表面9; 以及检测器6，其布置成接收由第一反射表面8反射的第一反射光束和由第二反射表面9反射的第二反射光束，并且被配置为提供表示可移动物体2的位置量的信号， 基于第一和第二光束，其中辐射源4和检测器6附接在除了可移动物体2和参考物体3之外的物体上。版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011023715A

公开(公告)日：2011-02-03

申请号：JP2010147032

申请日：2010-06-29

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JEUNINK ANDRE BERNARDUS ,  BANINE VADIM YEVGENYEVICH ,  BUTLER HANS ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  VERMEULEN JOHANNES PETRUS MARTINUS ,  KRUIJT-STEGEMAN YVONNE WENDELA

IPC: H01L21/027 ,  B29C59/02

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/00

Abstract: PROBLEM TO BE SOLVED: To avoid a problem related to expansion and contraction of a template. SOLUTION: The imprint lithography apparatus is arranged away from a substrate holder 58 and arranged between a structure 64 and the substrate holder 58 during the use of imprint template arrangements 50, 52. The structure 64 includes one or more arrays of lines or one or more encoders, and a substrate 56 or the substrate holder 58 and the imprint template have one or more encoders 68 that face the one or more arrays of lines or one or more arrays of lines that face the one or more encoders 68. The configuration determination arrangement is configured to determine a relative configuration between the substrate 56 or substrate holder 58 and the structure 64, and/or a relative configuration between the imprint template arrangements 50, 52 and the structure 64, and/or a relative configuration between the imprint template arrangements 50, 52 and the substrate 56 or substrate holder 58. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：避免与模板的伸缩有关的问题。 解决方案：压印光刻设备远离衬底保持器58布置，并且在使用压印模板布置50,52期间布置在结构64和衬底保持器58之间。结构64包括一个或多个线阵列或 一个或多个编码器以及衬底56或衬底保持器58和压印模板具有面向一个或多个线阵列或面向一个或多个编码器68的线阵列的一个或多个编码器68。 配置确定装置被配置为确定衬底56或衬底保持器58和结构64之间的相对配置，和/或压印模板布置50,52和结构64之间的相对配置，和/或其间的相对配置 压印模板布置50,52和基板56或基板支架58.版权所有：（C）2011，JPO＆INPIT

公开(公告)号：JP2011014907A

公开(公告)日：2011-01-20

申请号：JP2010147028

申请日：2010-06-29

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VERMEULEN JOHANNES PETRUS MARTINUS ,  JEUNINK ANDRE BERNARDUS ,  KRUIJT-STEGEMAN YVONNE WENDELA

IPC: H01L21/027 ,  H02K41/02 ,  H02K41/035

CPC classification number: B29C67/0051 ,  B29C64/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10S425/81

Abstract: PROBLEM TO BE SOLVED: To provide an imprint lithography apparatus whose throughput can be increased.SOLUTION: The imprint lithography apparatus is disclosed. The apparatus includes an electromagnetic Lorentz actuator arrangement configured to move an imprint template arrangement, the electromagnetic Lorentz actuator arrangement comprising: an array of magnets; and an array of conductors, each conductor configured to carry an electric current, one of the array of magnets or the array of conductors being moveable and connected to the imprint template arrangement, and the other of the array of magnets or the array of conductors extending at least partially around or forming a part of a substrate holder; the array of magnets and the array of conductors together being in a configuration which facilitates moving of the moveable one of the array of magnets or the array of conductors in six degrees of freedom, such that the imprint template arrangement is also movable in six degrees of freedom.

Abstract translation: 要解决的问题：提供可以提高生产量的压印光刻设备。解决方案：公开了压印光刻设备。 该设备包括配置成移动压印模板布置的电磁洛伦兹致动器装置，所述电磁洛伦兹致动器装置包括：磁体阵列; 以及导体阵列，每个导体被配置为承载电流，所述磁体阵列中的一个或所述导体阵列可移动并连接到所述压印模板装置，并且所述磁体阵列或所述导体阵列中的另一个延伸 至少部分地围绕或形成衬底保持器的一部分; 磁体阵列和导体阵列一起处于有利于以六个自由度移动磁体阵列或导体阵列中的可移动的一个的构造，使得印模模板布置也可以在六度 自由。

公开(公告)号：JP2010080918A

公开(公告)日：2010-04-08

申请号：JP2009143991

申请日：2009-06-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KRUIJT-STEGEMAN YVONNE WENDELA ,  VERMEULEN JOHANNES PETRUS MARTINUS ,  WUISTER SANDER FREDERIK ,  LAFARRE RAYMOND WILHELMUS LOUIS ,  JEUNINK ANDRE BERNARDUS ,  DE SCHIFFART CATHARINUS ,  JANSEN NORBERT ERWIN THERENZO

IPC: H01L21/027

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

Abstract: PROBLEM TO BE SOLVED: To provide an imprint lithography accurately controlling the force of a wide dynamic range actuator. SOLUTION: Disclosed is an imprint lithography apparatus including: a first support structure 21 for supporting a template 20; and a first actuator 22 mounted on the first support structure constituted in use such that it is disposed the first support structure and the template. The first actuator applies force to the template. The imprint lithography apparatus further includes a second support structure 40 and a second actuator 41 disposed between the second support structure and the first support structure. The second actuator applies force to the second support structure, and the moving range of the second actuator is larger than the moving range of the first actuator. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供精确控制宽动态范围致动器的力的压印光刻。 解决方案：公开了一种压印光刻设备，包括：用于支撑模板20的第一支撑结构21; 以及安装在第一支撑结构上的第一致动器22，所述第一致动器22构造在使用中，使得其布置在第一支撑结构和模板上。 第一个执行器对模板施加强制。 压印光刻设备还包括设置在第二支撑结构和第一支撑结构之间的第二支撑结构40和第二致动器41。 第二致动器对第二支撑结构施加力，并且第二致动器的移动范围大于第一致动器的移动范围。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2012019213A

公开(公告)日：2012-01-26

申请号：JP2011146942

申请日：2011-07-01

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： HOL SVEN ANTOINE JOHANN ,  ANGENENT WILHELMUS HENRICUS THEODORUS MARIA ,  CRYCEN GEORGE WILHELMS JOHANNES ,  ACKERMANS JOHANNES ANTONIUS GERARDUS ,  TER VEIL JACOB CORNELIS ,  DE VOLEI JEROEN ,  VERMEULEN JOHANNES PETRUS MARTINUS

IPC: H01L21/027

CPC classification number: G03F7/70758 ,  G03F7/70775

Abstract: PROBLEM TO BE SOLVED: To provide a variable reluctance device or an electromagnetic device that can more precisely control power.SOLUTION: A variable reluctance device includes first and second magnetic members, a coil, a measurement coil, and a control unit. The first and second magnetic members are displaceable relative to each other to provide a magnetic circuit having a variable reluctance. The coil can, in use, receive a current for generating a magnetic flux through the magnetic circuit. The measurement coil generates a measurement signal representative of the magnetic flux through the magnetic circuit. The measurement coil is arranged to substantially enclose the magnetic flux through the magnetic circuit. The control unit is arranged to receive the flux signal at an input terminal and, in response, provide a control signal based on the measurement signal at an output terminal for controlling an amplitude of the current or a force of a further device. The device can e.g., be applied in a stage apparatus or a lithographic apparatus.

Abstract translation: 要解决的问题：提供可以更精确地控制功率的可变磁阻装置或电磁装置。 解决方案：可变磁阻装置包括第一和第二磁性部件，线圈，测量线圈和控制单元。 第一和第二磁性构件可相对于彼此移动以提供具有可变磁阻的磁路。 在使用中，线圈可以接收通过磁路产生磁通量的电流。 测量线圈产生表示通过磁路的磁通量的测量信号。 测量线圈被布置成基本上包围通过磁路的磁通量。 控制单元被布置成在输入端子处接收通量信号，并且作为响应，基于输出端子处的测量信号来提供控制信号，用于控制另一设备的电流或力的幅度。 该装置可以例如应用于平台装置或光刻设备中。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011035392A

公开(公告)日：2011-02-17

申请号：JP2010165421

申请日：2010-07-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN EIJK JAN ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  VERMEULEN JOHANNES PETRUS MARTINUS

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03B27/58 ,  G03F7/70716 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To reduce flexibility and internal deformation by increasing rigidity of an object body and/or dampening vibration.
SOLUTION: A positioning system is provided for positioning a movable object having a body. The positioning system includes: an object position measurement system for measuring a position of the object; an object actuator; an object controller; and a stiffener which increases rigidity and/or dampens relative movement inside the object body. The stiffener includes: a plurality of sensors each of which is arranged to determine a measured signal representing internal deformation or relative displacement of the body; one or more actuators each of which is arranged to apply actuating force to a part of the body; and at least one of controller which is configured to deliver an actuation signal to at least one of the actuators based on the measured signal determined by at least one of the sensors so as to increase rigidity and/or dampen movement inside the body.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：通过增加物体的刚性和/或减振来降低柔性和内部变形。 解决方案：提供一种定位系统，用于定位具有身体的可移动物体。 定位系统包括：用于测量物体位置的物体位置测量系统; 物体致动器; 对象控制器 以及增强刚性和/或抑制物体内部的相对运动的加强件。 加强件包括：多个传感器，每个传感器布置成确定表示身体的内部变形或相对位移的测量信号; 一个或多个致动器，每个致动器被布置成向身体的一部分施加致动力; 以及至少一个控制器，其被配置为基于由所述传感器中的至少一个确定的测量信号将致动信号传递给至少一个所述致动器，以增加所述主体内的刚性和/或抑制所述主体内的运动。 版权所有（C）2011，JPO＆INPIT