公开(公告)号：JPH0530304B2

公开(公告)日：1993-05-07

申请号：JP18396985

申请日：1985-08-23

Applicant: CANON KK

Inventor： NAKAZATO HIROSHI ,  MATSUMURA TAKASHI ,  AKAMATSU TAKAHIRO ,  FUKUI KENJI

IPC: H01L21/68 ,  G03F7/20 ,  G05D3/00 ,  G05D3/12 ,  H01L21/67

公开(公告)号：JPS62106324A

公开(公告)日：1987-05-16

申请号：JP24760985

申请日：1985-11-05

Applicant: CANON KK

Inventor： SUZUKI TAKEHIKO ,  MATSUMURA TAKASHI

IPC: H01L21/30 ,  G01J1/42 ,  H01L21/027

Abstract: PURPOSE:To remove the effect of the change in the quantity of light due to the voltage variation of a power source, by detecting the light of a light source and processing light output detected corresponding to the information of the power source of the light source. CONSTITUTION:A moving apparatus (stepping motor) 17 is controlled by a stepping motor controller 15 to position a light detector 1 at a detection point 1. The quantity of the detected light is amplified and converted by an A/D converter 7 to be extracted at every DELTAt. In CPU13, only a cycle T or nT is added to the extracted data to store the same in memory RAM10. Therefore, the stored information is constant regardless of a detection period and luminous intensity being the time average thereof also becomes constant. After the completion of memory, order is issued to the moving apparatus 17 and the detector 1 is moved to the next measuring point and, after all of data were taken in, the irregularity of luminous intensity is calculated by CPU13. If the timewise irregularity at the same point is calculated, the detector 1 does not move. By this constitution, an apparatus not generating the variation in detected luminous intensity according to a detection period due to the effect of the voltage frequency of a power source is obtained.

公开(公告)号：JPS6245143A

公开(公告)日：1987-02-27

申请号：JP18397385

申请日：1985-08-23

Applicant: CANON KK

Inventor： NAKAZATO HIROSHI ,  AKAMATSU TAKAHIRO ,  MATSUMURA TAKASHI ,  FUKUI KENJI

IPC: H01L21/30 ,  G03F9/00 ,  G05D3/00 ,  G05D3/12 ,  H01L21/027 ,  H01L21/67 ,  H01L21/68

Abstract: PURPOSE:To position a disk boyd mechanically in a notch section with high precision by detecting a fine notch in the outer circumferential section of the disk body and pushing at least one of a plurality of positioning members capable of being fitted to the fine notch against the disk body. CONSTITUTION:A notch is positioned, and a wafer 1 is sucked and fixed to a table 4. A notch sensor unit 9 and pushing rollers 6 and 7 are moved toward the outside. Consequently, the table is made level. A pushing pin 11 is inserted to the notch section first. Insertion is completed, and the wafer is air-born on the table 4 by an air flow again. The pushing rollers 6 and 7 are pushed against the wafer, thus conducting theta positioning and central positioning. The wafer 1 is sucked and fixed to the table 4, and the pushing pin 11 and the pushing rollers 6 and 7 are moved toward the outside and the wafer is released. Accordingly, the operation of positioning is completed.

公开(公告)号：JPS6245041A

公开(公告)日：1987-02-27

申请号：JP18397185

申请日：1985-08-23

Applicant: CANON KK

Inventor： NAKAZATO HIROSHI ,  MATSUMURA TAKASHI ,  AKAMATSU TAKAHIRO ,  FUKUI KENJI

IPC: H01L21/68 ,  G03F7/20 ,  G05D3/12 ,  H01L21/67

Abstract: PURPOSE:To enable the positioning of a wafer with an excellent precision not in contact with the specified turning center by a method wherein a notch of wafer is image-formed on linear image sensors arranged in parallel with the tangential direction on the periphery of wafer. CONSTITUTION:A wafer 6 is adsorption-fixed on the surface of a base 7 supported on a turntable 8. The turntable 8 is stopped at the position wherein a fine notch is detected by a linear image sensor Ctheta. The eccentricity of wafer 6 from the turning center of turntable 8 is read by linear sensors Ca-Cd arranged slipping by 90 deg. in the radial direction on the wafer 6 to measure the eccentricity in X and Y directions respectively as DELTAx and DELTAy corresponding to the digital output difference of linear sensors Ca, Cc and Cb, Cd. Finally the adsorption of turntable 8 is released to move the base 7 thus made movable by DELTAx and DELTAy respectively in X and Y directions corresponding to the measured values of eccentricity for correcting the eccentricity of wafer 6 from the turning center O.

公开(公告)号：JPS60187803A

公开(公告)日：1985-09-25

申请号：JP4282184

申请日：1984-03-08

Applicant: CANON KK

Inventor： AYADA NAOKI ,  MATSUMURA TAKASHI

IPC: G01B11/00 ,  G03F9/00

Abstract: PURPOSE:To detect a position precisely, by selecting only a light-receiving element not containing an unnecessary optical signal caused by the prism effect of a resist layer or the like, out of a plurality of light-receiving elements, and by obtaining a detection signal therefrom. CONSTITUTION:This is an apparatus which detects lights from a first substance having a first discrimination mark and a second substance having a second discrimination mark and detects the relative positional relationship between the first and second substances based thereon. This apparatus has a light-receiving means comprising a plurality of light-receiving elements each receiving a light, and a means of selecting a light-receiving element not containing an unnecessary optical signal caused by the prism effect of a resist layer or the like. By this means, an optimum light-receiving element for signal detection can be selected, and thus an efficient and precise detection of a position can be executed according to a required precision.

公开(公告)号：JPS62212504A

公开(公告)日：1987-09-18

申请号：JP5465686

申请日：1986-03-14

Applicant: CANON KK

Inventor： MATSUMURA TAKASHI

IPC: G03F9/00 ,  G01B11/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/67 ,  H01L21/68

Abstract: PURPOSE:To attain an improvement S/N ratio and to enhance signal detection efficiency by attenuating a pedestal, by blocking irradiation beam other than a period when a desired signal is present. CONSTITUTION:Laser beam 11 passes through an acoustooptical element 31 to scan a leticle 1 and a wafer 4 by the rotation of a rotary polygonal mirror 8. Because the positions of a window signal and an alignment signal before alignment operation (after the completion of stepping driving to the next shot region) are determined by the feed accuracy of a wafer stage 5, the delay time from the generation of the window signal to the alignment signal is almost constant at every shot region and change at every step is fine. Then, a controller 32 can block the beam 11 incident to the wafer 4 by the element 31 on the basis of the alignment signal in the previous shot region at positions other than the positions of alignment marks 6, 6', 7, 7'. If a proper slice level is set and binarization is performed, only the signals of the alignment marks 6, 6', 7, 7' can be detected and signal detection efficiency can be enhanced.

公开(公告)号：JPS6245142A

公开(公告)日：1987-02-27

申请号：JP18397285

申请日：1985-08-23

Applicant: CANON KK

Inventor： AKAMATSU TAKAHIRO ,  NAKAZATO HIROSHI ,  MATSUMURA TAKASHI ,  FUKUI KENJI

IPC: H01L21/30 ,  G03F7/20 ,  G03F9/00 ,  G05D3/12 ,  H01L21/027 ,  H01L21/67 ,  H01L21/68

Abstract: PURPOSE:To position a notch section by comparing pulse width obtained by binary-coding the signal of change of the shape of an end section in a disk body at a predetermined slice level with a fixed value and stopping the disk body at the center of a fine notch. CONSTITUTION:A slice level is determined from the maximum value of an output from a photoelectric element 101 at a time when a disk body 1 such as a semiconductor wafer, to one part of the periphery thereof a fine notch is shaped, makes a turn, and the output from the photoelectric element 101 is compared with the slice level and binary-coded. Binary-coded pulse width is calculated by output pulses from a pulse generator rotated interlocked with a wafer driving roller 2, and the value of the pulse width is compared with a set value and the notch is detected. Said set value is set at a value equal to the discrete value of the pulse width of an orientation flat, thus detecting the orientation flat. When the notch is detected, and disk body is decelerated and stopped, and positioned precisely at the central position of the notch.

公开(公告)号：JPS6245040A

公开(公告)日：1987-02-27

申请号：JP18397085

申请日：1985-08-23

Applicant: CANON KK

Inventor： NAKAZATO HIROSHI ,  AKAMATSU TAKAHIRO ,  MATSUMURA TAKASHI ,  FUKUI KENJI

IPC: H01L21/68 ,  G03F7/20 ,  G05D3/12 ,  H01L21/67

Abstract: PURPOSE:To enable the positioning of a wafer with an excellent precision not in contact with the specified turning center by a method wherein the shape of wafer and the interval between the first and the second reference positions are calculated; the slip of wafer from the first reference position is detected; and a base loaded with the wafer is alignment-controlled by the output of photoelectric conversion element. CONSTITUTION:A wafer 6 is adsorption-fixed on the surface of a base 7 adsorption-supported on a turntable 8. The turntable 8 is stopped at the position wherein a fine notch 6a is detected by a linear image sensor Ctheta. The wafer 6 is made eccentric from the turning center and the eccentricity is read by 4 each of linear image sensors Ca-Cd arranged slipping by 90 deg. in the radial direction. Finally the adsorption of turntable is released to move the base 7 thus made movable by DELTAx and DELTAy respectively in X and Y directions corresponding to the measured values of eccentricity for correcting the eccentricity of wafer 6 from the turning center O.

公开(公告)号：JPS60187804A

公开(公告)日：1985-09-25

申请号：JP4282284

申请日：1984-03-08

Applicant: CANON KK

Inventor： AYADA NAOKI ,  MATSUMURA TAKASHI

IPC: G01B11/00 ,  G03F9/00

Abstract: PURPOSE:To detect a position precisely, by setting the number of output signals to be selected simultaneously out of the output signals of a plurality of light- receiving elements, and by thus obtaining detection signals in accordance with the intensity of reflected lights and a required precision. CONSTITUTION:An output pulse signal PLS of a voltage comparator circuit 104 is pulse-counted 108, and a count value thereof is delivered to a select signal generating circuit 103. Under the control of MPU106, the circuit 103 delivers select signals SEL one by one to a signal synthesizing-selecting circuit 102 according to the count value. After optical scans by right and left detectors are ended, the data stored in a pulse interval measuring circuit 107 are read to calculate gaps of marks and the amounts of deviation thereof. A mode setting means 109 is so designed that it can set the form of a wafer alignment mark to be missing pattern 110A or remaining pattern 110B and set the number of light- receiving elements to be selected simultaneously from groups of the light-receiving elements, each of which comprises four light-receiving elements.

公开(公告)号：JPS62169330A

公开(公告)日：1987-07-25

申请号：JP30302586

申请日：1986-12-19

Applicant: CANON KK

Inventor： TSUTSUI SHINJI ,  MATSUMURA TAKASHI

IPC: H01L21/30 ,  G03F7/20 ,  H01L21/027

Abstract: PURPOSE:To perform a highly exact positioning on the whole surface of a wafer, by providing a mask chuck or a wafer chuck with both a heating means and a cooling means, and making it possible to cool the heating means and the chuck. CONSTITUTION:This apparatus comprises a mask 1, a wafer 2, a mask chuck 3 and a wafer chuck 4. The wafer chuck 4 fixes and holds the wafer 2 by means of vacuum adsorption. In the wafer chuck, a temperature measuring platinum resister 6 for temperature detection and a heating resister 7 as a means to rise temperature are arranged, and a cooling air of ordinary temperature always circulates therein. The heating resister 7 is arranged in the wafer chuck 4 and situated in the circulating part of the cooling air, which can effectively cool the heating resister 7 together with the wafer chuck 4. Thus the temperature of at heat either one of the mask 1 and the wafer 2 is controlled, so that the magnification error in the case where a mask pattern is transferred on the wafer 2 can be eliminated, and highly accurate positioning on the whole surface of the wafer can be attained.