公开(公告)号：WO2020194267A1

公开(公告)日：2020-10-01

申请号：PCT/IB2020/052954

申请日：2020-03-27

Applicant: EULITHA A.G. ,  CLUBE, Francis ,  AMREIN, Andreas ,  LEBUGLE, Maxime ,  SOLAK, Harun ,  WANG, Li

Inventor： CLUBE, Francis ,  AMREIN, Andreas ,  LEBUGLE, Maxime ,  SOLAK, Harun ,  WANG, Li

IPC: G03F7/20 ,  G02B5/18

Abstract: A method for forming a surface-relief grating with a desired spatial variation of duty cycle in a layer of photoresist, which method comprises providing a first mask (31) bearing a high-resolution grating of linear features (32), arranging said first mask at a first distance from a substrate (33), providing a second mask (28) bearing a variable-transmission grating of opaque and transparent linear features (27) that has a designed spatial variation of duty cycle, arranging said second mask at a distance before the first mask such that the linear features of the variable-transmission grating are orthogonal to the linear features of the high-resolution grating, illuminating the second mask while varying the first distance according to displacement Talbot lithography and also displacing the second mask at an angle to its linear features such that there is substantially no component of modulation with the period of the variable-transmission grating in the energy density distribution that exposes the photoresist.

公开(公告)号：WO2017103817A1

公开(公告)日：2017-06-22

申请号：PCT/IB2016/057623

申请日：2016-12-14

Applicant: EULITHA A.G. ,  CLUBE, Francis ,  SOLAK, Harun

Inventor： CLUBE, Francis ,  SOLAK, Harun

IPC: G03F7/20

CPC classification number: G03F7/70408 ,  G03F7/7035

Abstract: A method for printing a desired periodic pattern into a photosensitive layer on a substrate, which includes providing a mask bearing a periodic pattern whose period is a multiple of that of the desired pattern, disposing the substrate in proximity to the mask, providing at least one beam for illuminating said mask pattern to generate a transmitted light-field described by a Talbot distance, exposing the layer to time-integrated intensity distributions in a number of sub-exposures by illuminating the mask pattern with the at least one beam while changing the separation between substrate and mask by at least a certain fraction of, and less than, the Talbot distance, configuring the illumination or the substrate relative to the mask for the different sub-exposures so that the layer is exposed to the same time-integrated intensity distributions that are mutually laterally offset by a certain distance and in a certain direction.

Abstract translation: 一种用于将期望的周期性图案印刷到衬底上的光敏层中的方法，该方法包括提供承载其周期是期望图案的周期的倍数的周期性图案的掩膜，将衬底布置在邻近 提供至少一束用于照亮所述掩模图案的光束，以产生由Talbot距离描述的透射光场，通过用所述掩模图案照亮所述掩模图案，将所述层暴露于多次子曝光中的时间积分强度分布 至少一个光束，同时将基板和掩模之间的间隔改变Talbot距离的至少一小部分，并且小于Talbot距离，将照明或基板相对于用于不同子曝光的掩模配置成使得该层被曝光 到相同的时间积分强度分布，这些分布在一定距离和特定方向上相互横向偏移。

公开(公告)号：WO2014147562A3

公开(公告)日：2014-09-25

申请号：PCT/IB2014/059949

申请日：2014-03-18

Applicant: EULITHA A.G. ,  CLUBE, Francis ,  SOLAK, Harun ,  DAIS, Christian

Inventor： CLUBE, Francis ,  SOLAK, Harun ,  DAIS, Christian

IPC: G03F7/20

Abstract: A method for printing a periodic pattern of features into a photosensitive layer, which includes providing a mask bearing a periodic pattern, providing a substrate bearing the photosensitive layer, arranging the substrate substantially parallel to the mask, forming a beam of collimated monochromatic light for illuminating said mask pattern so that the light-field transmitted by the mask forms Talbot image planes separated by a Talbot distance, and performing N sub- exposures of the mask with said beam and changing the separation between sub-exposures so that the relative separation during the ith sub-exposure with respect to that during the first sub-exposure is given by (m i + n i /N) times the Talbot distance, and exposing the mask pattern to the same energy density of illumination for each sub-exposure, wherein the period is selected in relation to the wavelength so that only the zeroth and first diffraction orders are transmitted by the mask.

Abstract translation: 一种用于将特征的周期性图案印刷到感光层中的方法，该方法包括提供承载周期性图案的掩模，提供承载感光层的基板，将基板布置为基本平行于掩模，形成 用于照射所述掩模图案的准直单色光束，使得由掩模透射的光场形成以Talbot距离分开的Talbot图像平面，并且利用所述光束执行掩模的N次曝光并且改变子像素之间的间隔， 以使第i次曝光期间的相对分离度相对于第一次曝光期间的相对分离度由（m×i + n×i / N）倍给出 Talbot距离，并且将掩模图案暴露于对于每个子曝光相同的照射能量密度，其中相对于波长选择该周期，使得只有掩膜透射第零和第一衍射级。

公开(公告)号：WO2016103132A1

公开(公告)日：2016-06-30

申请号：PCT/IB2015/059790

申请日：2015-12-18

Applicant: EULITHA A.G. ,  SOLAK, Harun H. ,  DAIS, Christian ,  CLUBE, Francis

Inventor： SOLAK, Harun H. ,  DAIS, Christian ,  CLUBE, Francis

IPC: G03F7/00 ,  G03F7/20

CPC classification number: G03F7/70466 ,  G02B5/008 ,  G02B5/1809 ,  G02B5/204 ,  G03F7/0007 ,  G03F7/40 ,  G03F7/70408 ,  G03F7/7045 ,  G03F7/70558

Abstract: A method for forming a pattern of metallic nanofeatures that generates by plasmonic resonance a desired image having a distribution of colours, which method includes providing a substrate having a layer of photosensitive material, exposing the layer to a high-resolution periodic pattern of dose distribution, determining at least one low-resolution pattern of dose distribution such that the sum of the at least one low-resolution pattern of dose distribution and the high-resolution periodic pattern of dose distribution is suitable for forming the pattern of metallic nanofeatures, wherein the lateral dimensions of said metallic nanofeatures have a spatial variation across the pattern that corresponds to the distribution of colours in the desired image, exposing the layer of photosensitive material to said at least one low-resolution pattern of dose distribution, developing the layer of photosensitive material to produce a pattern of nanostructures in the developed photosensitive material, processing the pattern of nanostructures so that the pattern of metallic nanofeatures is formed with said spatial variation of lateral dimension across the pattern that corresponds to the distribution of colours in the desired image.

Abstract translation: 一种用于形成通过等离子体共振产生具有颜色分布的期望图像的金属纳米尺度图案的方法，该方法包括提供具有感光材料层的基底，将该层暴露于剂量分布的高分辨率周期性图案， 确定剂量分布的至少一个低分辨率图案，使得剂量分布的至少一个低分辨率图案和剂量分布的高分辨率周期性图案的总和适合于形成金属纳米膜的图案，其中侧向 所述金属纳米尺度的尺寸具有对应于期望图像中的颜色分布的图案的空间变化，将感光材料层暴露于所述至少一种低分辨率图案的剂量分布，将感光材料层显影为 在显影的感光材料中产生纳米结构的图案， 处理纳米结构的图案，使得金属纳米膜的图案形成有跨越图案的横向尺寸的空间变化，其对应于期望图像中的颜色分布。

公开(公告)号：WO2012066489A2

公开(公告)日：2012-05-24

申请号：PCT/IB2011/055133

申请日：2011-11-16

Applicant: EULITHA A.G. ,  SOLAK, Harun, H. ,  CLUBE, Francis

Inventor： SOLAK, Harun, H. ,  CLUBE, Francis

IPC: G03F7/20

CPC classification number: G03F7/70058 ,  G03F1/28 ,  G03F7/70408

Abstract: A method for printing a periodic pattern having a first symmetry and a first period into a photosensitive layer that includes providing a mask bearing a pattern of at least two overlapping sub-patterns which have a second symmetry and a second period, the features of each sub-pattern being formed in a transmissive material, providing a substrate bearing the layer, arranging the mask with a separation from the substrate, providing light having a central wavelength for illuminating the mask to generate a light-field in which light of the central wavelength forms a range of intensity distributions between Talbot planes, illuminating said mask pattern with said light whilst maintaining the separation or changing it by a distance whereby the photosensitive layer is exposed to an average of the range of intensity distributions, wherein the light transmitted by each sub-pattern is shifted in phase relative to that transmitted by another sub-pattern.

Abstract translation: 一种用于将具有第一对称性和第一周期的周期性图案印刷到感光层中的方法，该方法包括提供掩模，该掩模承载具有第二对称性的至少两个重叠子图案的图案和 第二周期，每个子图案的特征以透射材料形成，提供承载该层的衬底，将掩模与衬底分开布置，提供具有中心波长的光以照亮掩模以产生光场 其中中心波长的光形成Talbot平面之间的强度分布范围，用所述光照射所述掩模图案，同时保持分离或将其改变一定距离，由此使感光层暴露于强度分布范围的平均值， 其中由每个子图案发射的光相对于由另一个子图案发射的光移相。

公开(公告)号：WO2012049638A1

公开(公告)日：2012-04-19

申请号：PCT/IB2011/054509

申请日：2011-10-12

Applicant: EULITHA A.G. ,  SOLAK, Harun ,  CLUBE, Francis ,  DAIS, Christian

Inventor： SOLAK, Harun ,  CLUBE, Francis ,  DAIS, Christian

IPC: G03F7/20

CPC classification number: G03F7/7035 ,  G03F7/70408

Abstract: A method for printing a pattern of features including the steps of providing a substrate having a recording layer disposed thereon, providing a mask bearing a periodic pattern of features, arranging the substrate parallel to the mask and with a separation having an initial value, providing an illumination system for illuminating the mask with an intensity of monochromatic light to generate a transmitted light-field for exposing the recording layer, and illuminating the mask for an exposure time whilst changing the separation by a distance having a desired value and with a rate of change of separation, wherein at least one of the rate of change of separation and the intensity of light are varied during the change of separation, whereby the mask is illuminated by an energy density per incremental change of separation that varies over said distance.

Abstract translation: 一种用于印刷特征图案的方法，包括以下步骤：提供具有设置在其上的记录层的基底，提供具有周期性图案特征的掩模，将基底平行于掩模并且具有初始值的分离， 用于以单色光的强度照亮掩模的照明系统以产生用于曝光记录层的透射光场，并且在将分离改变具有期望值的距离和变化率的同时将曝光时间照亮曝光时间 的分离，其中在分离改变期间分离变化率和光强度中的至少一个变化，由此每隔增加的间隔变化的能量密度照射所述掩模，所述能量密度在所述距离上变化。

公开(公告)号：WO2012095795A3

公开(公告)日：2012-07-19

申请号：PCT/IB2012/050128

申请日：2012-01-10

Applicant: EULITHA A.G. ,  CLUBE, Francis ,  SOLAK, Harun

Inventor： CLUBE, Francis ,  SOLAK, Harun

IPC: G03F7/20

Abstract: A method for printing a desired periodic pattern, which includes providing a mask bearing a pattern of features having a period, providing a substrate bearing a photosensitive layer, arranging the substrate with a separation from the mask, generating collimated light with a wavelength and an intensity, at least the former of which may be temporally varied to deliver a spectral distribution of energy density, illuminating the mask pattern with said light whilst varying at least its wavelength so as to deliver a spectral distribution of energy density, such that the light-field transmitted by the mask is instantaneously composed of a range of transversal intensity distributions between Talbot planes, and whereby the layer is exposed to a time-integrated intensity distribution that prints the desired pattern, wherein the separation, spectral distribution and period are arranged so that the time-integrated intensity distribution corresponds to an average of the range of transversal intensity distributions.

公开(公告)号：WO2012085845A1

公开(公告)日：2012-06-28

申请号：PCT/IB2011/055827

申请日：2011-12-20

Applicant: EULITHA A.G. ,  SOLAK, Harun ,  CLUBE, Francis

Inventor： SOLAK, Harun ,  CLUBE, Francis

IPC: G03F7/20

CPC classification number: G03F7/201 ,  G03F7/70408

Abstract: A method and apparatus for printing a pattern of periodic features into a photosensitive layer, including the steps of providing a substrate bearing the layer, providing a mask, arranging the substrate such that it has a tilt angle with respect to the substrate in a first plane orthogonal thereto, providing collimated light for illuminating the mask pattern so as to generate a transmitted light-field composed of a range of transversal intensity distributions between Talbot planes separated by a Talbot distance, and so that said transmitted light-field has an intensity envelope in the first plane, illuminating the mask with said light whilst displacing the substrate relative to the mask in a direction parallel to the first plane and to the substrate, wherein the tilt angle and the intensity envelope are arranged so that the layer is exposed to an average of the range of transversal intensity distributions.

Abstract translation: 一种用于将周期性特征图案印刷到感光层中的方法和装置，包括以下步骤：提供承载该层的基底，提供掩模，布置基底，使得其在第一平面中相对于基底具有倾斜角 提供用于照亮掩模图案的准直光，以产生由Talbot距离分离的Talbot平面之间的横向强度分布范围组成的透射光场，并且使得所述透射光场具有强度包络 所述第一平面，用所述光照亮所述掩模，同时沿平行于所述第一平面的方向相对于所述掩模移位所述基板和所述基板，其中所述倾斜角度和所述强度包络被布置成使得所述层暴露于平均值 的横向强度分布范围。

公开(公告)号：WO2019202551A1

公开(公告)日：2019-10-24

申请号：PCT/IB2019/053239

申请日：2019-04-18

Applicant: EULITHA A.G. ,  CLUBE, Francis ,  SOLAK, Harun

Inventor： CLUBE, Francis ,  SOLAK, Harun

IPC: G03F7/20

Abstract: A method for printing a periodic pattern of linear features into a photosensitive layer which includes providing a mask bearing a pattern of linear features, arranging the substrate parallel to the mask, generating an elongated beam for illuminating the mask with a range of angles of incidence in a plane parallel to the linear features and with a uniform power per incremental distance along the length of the beam except at its ends where the power per incremental distance falls to zero according to first and second profiles over a fall-off distance, scanning said beam in first and second sub-exposures to print first and second parts of the desired pattern such that the first and second parts overlap by the fall-off distance, wherein the first and second profiles are selected so that their summation across the fall-off distance produces a uniform power per incremental distance.

公开(公告)号：WO2012164539A1

公开(公告)日：2012-12-06

申请号：PCT/IB2012/052778

申请日：2012-06-01

Applicant: EULITHA A.G. ,  SOLAK, Harun ,  CLUBE, Francis ,  DAIS, Christian

Inventor： SOLAK, Harun ,  CLUBE, Francis ,  DAIS, Christian

IPC: G03F7/20

CPC classification number: G03F7/70075 ,  G03F7/70408

Abstract: A method for printing a periodic pattern (19) of features into a photosensitive layer (21), which method includes providing a mask (18) bearing a mask pattern, providing a substrate (20) bearing the layer, arranging the substrate parallel to the mask, providing a number of lasers (1) having a plurality of peak wavelengths, forming from said light a beam for illuminating the mask with a spectral distribution of exposure dose and a degree of collimation, illuminating the mask with said beam such that the light of each wavelength transmitted by the mask pattern forms a range of transversal intensity distributions between Talbot planes and exposes the photosensitive layer to an image component, wherein the separation and spectral distribution are arranged so that the superposition of said components is equivalent to an average of the range of transversal intensity distributions formed by light of one wavelength and the collimation is arranged so that the features are resolved.

Abstract translation: 一种用于将特征的周期性图案（19）印刷到感光层（21）中的方法，该方法包括提供具有掩模图案的掩模（18），提供承载该层的基底（20），将基底平行于 掩模，提供多个具有多个峰值波长的激光器（1），从所述光线形成用于以曝光剂量的光谱分布和准直程度照射所述掩模的光束，用所述光束照射所述掩模，使得所述光 由掩模图案传输的每个波长形成Talbot平面之间的横向强度分布范围，并将感光层暴露于图像分量，其中分离和光谱分布被布置成使得所述组件的叠加等价于 布置由一个波长的光和准直形成的横向强度分布的范围，使得特征被解决。