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公开(公告)号：JP2009235414A
公开(公告)日：2009-10-15
申请号：JP2009138295
申请日：2009-06-09
Applicant: Internatl Business Mach Corp
, Sumitomo Bakelite Co Ltd , インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation , 住友ベークライト株式会社 Inventor： JAYARAMAN SAIKUMAR , GOODALL BRIAN L , RHODES LARRY F , SHICK ROBERT A , VICARI RICHARD , ROBERT D ALLEN , JULIAN OPITZ , RATONAMU SOORIYAKUMARAN , WALLOW THOMAS
IPC: C08F232/00 , C08F4/80 , C08F32/08 , C08F232/08 , C08G61/06 , C08G61/08 , G03F7/004 , G03F7/038 , G03F7/039
CPC classification number: C08F232/08 , C08G61/08 , G03F7/0045 , G03F7/0382 , G03F7/039 , Y10S430/115
Abstract: PROBLEM TO BE SOLVED: To provide a polycyclic polymer and a polycyclic resist composition useful for a photoresist composition transparent to a short wavelength of image focusing irradiation, and having resistance in a dry etching method. SOLUTION: The present invention uses the resist composition comprising the polycyclic polymer containing repeated aromatic pendant groups along a polymer principal chain. The polymer exhibits a light transparent property with respect to a deep UV wavelength, and is useful for an application to a high resolution photolithography. The polymer is useful, in particular, in chemically amplified positive and negative type gradation resists. COPYRIGHT: (C)2010,JPO&INPIT
Abstract translation: 要解决的问题：提供一种可用于对短波长图像聚焦照射透明的光致抗蚀剂组合物的多环聚合物和多环抗蚀剂组合物，并且在干蚀刻方法中具有电阻。 解决方案：本发明使用包含沿着聚合物主链含有重复芳族侧基的多环聚合物的抗蚀剂组合物。 该聚合物相对于深UV波长显示出透光性，并且可用于高分辨率光刻的应用。 该聚合物特别适用于化学放大的正型和负型层压抗蚀剂。 版权所有（C）2010，JPO＆INPIT
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公开(公告)号：DE69916434T2
公开(公告)日：2005-03-24
申请号：DE69916434
申请日：1999-02-19
Applicant: SUMITOMO BAKELITE CO , IBM
Inventor： JAYARAMAN SAIKUMAR , BENEDIKT M , RHODES F , VICARI RICHARD , ALLEN D , DIPIETRO A , SOORIYAKUMARAN RATNAM , WALLOW THOMAS
Abstract: The present invention relates to cyclic polymers and their use in photolithographic applications. The cyclic polymers contain a pendant acid labile functional group and a functional group containing a protected hydroxyl moiety. The polymers are post modified by deprotecting the pendant hydroxyl moiety and reacting the deprotected hydroxyl containing moiety with a coreactant. The post-functionalized polymers find application in chemically amplified photoresist compositions.
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公开(公告)号：AU3524800A
公开(公告)日：2000-09-28
申请号：AU3524800
申请日：2000-03-09
Applicant: GOODRICH CO B F , IBM
Inventor： JAYARAMAN SAIKUMAR , GOODALL BRIAN L , VICARI RICHARD , LIPIAN JOHN-HENRY , ALLEN ROBERT D , OPITZ JULIANN , WALLOW THOMAS I
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公开(公告)号：AU2872499A
公开(公告)日：1999-09-06
申请号：AU2872499
申请日：1999-02-19
Applicant: GOODRICH CO B F , IBM
Inventor： JAYARAMAN SAIKUMAR , BENEDIKT GEORGE M , RHODES LARRY F , VICARI RICHARD , ALLEN ROBERT D , DIPIETRO RICHARD A , SOORIYAKUMARAN RATNAM , WALLOW THOMAS
Abstract: The present invention relates to cyclic polymers and their use in photolithographic applications. The cyclic polymers contain a pendant acid labile functional group and a functional group containing a protected hydroxyl moiety. The polymers are post modified by deprotecting the pendant hydroxyl moiety and reacting the deprotected hydroxyl containing moiety with a coreactant. The post-functionalized polymers find application in chemically amplified photoresist compositions.
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公开(公告)号：AU747516C
公开(公告)日：2003-07-24
申请号：AU9219998
申请日：1998-09-03
Applicant: GOODRICH CO B F , IBM
Inventor： GOODALL BRIAN L , JAYARAMAN SAIKUMAR , SHICK ROBERT A , RHODES LARRY F , ALLEN ROBERT DAVID , PIETRO RICHARD ANTHONY DI , WALLOW THOMAS
Abstract: The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source.
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Patent Agency Ranking
公开(公告)号：AT542837T
公开(公告)日：2012-02-15
申请号：AT08170128
申请日：1999-02-19
Applicant: SUMITOMO BAKELITE CO , IBM
Inventor： JAYARAMAN SAIKUMAR , GOODALL BRIAN L , RHODES LARRY F , SHICK ROBERT A , VICARI RICHARD , ALLEN ROBERT D , OPITZ JULIANN , SOORIYAKUMARAN RATNAM , WALLOW THOMAS
IPC: C08F32/08 , C08F4/70 , C08F4/80 , C08F232/08 , C08G61/06 , C08G61/08 , G03F7/004 , G03F7/038 , G03F7/039
Abstract: The invention relates to a cyclic 2,3-addition polymer obtained from a monomer composition consisting of one or more polycyclic monomers having a pendant aromatic substituent, in combination with a monomer selected from the group consisting of one or more polycyclic monomers having a pendant acid labile substituent. The invention further relates to a photoresist composition comprising a photoacid initiator, an optional dissolution inhibitor, and said cyclic 2,3-addition polymer.
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公开(公告)号：HK1035199A1
公开(公告)日：2001-11-16
申请号：HK01105885
申请日：2001-08-21
Applicant: IBM , SUMITOMO BAKELITE CO
Inventor： JAYARAMAN SAIKUMAR , GOODALL BRIAN L , RHODES LARRY F , SHICK ROBERT A , VICARI RICHARD , ALLEN ROBERT D , OPITZ JULIANN , SOORIYAKUMARAN RATNAM , WALLOW THOMAS
IPC: C08F4/80 , C08F32/08 , C08F232/08 , C08G61/06 , C08G61/08 , G03F7/004 , G03F7/038 , G03F7/039 , C08F , C08G , G03F
Abstract: The invention relates to a cyclic 2,3-addition polymer obtained from a monomer composition consisting of one or more polycyclic monomers having a pendant aromatic substituent, in combination with a monomer selected from the group consisting of one or more polycyclic monomers having a pendant acid labile substituent. The invention further relates to a photoresist composition comprising a photoacid initiator, an optional dissolution inhibitor, and said cyclic 2,3-addition polymer.
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公开(公告)号：AU3303599A
公开(公告)日：1999-09-06
申请号：AU3303599
申请日：1999-02-19
Applicant: GOODRICH CO B F , IBM
Inventor： JAYARAMAN SAIKUMAR , GOODALL BRIAN L , RHODES LARRY F , SHICK ROBERT A , VICARI RICHARD , ALLEN ROBERT D , OPITZ JULIANN , SOORIYAKUMARAN RATNAM , WALLOW THOMAS
Abstract: The invention relates to a cyclic 2,3-addition polymer obtained from a monomer composition consisting of one or more polycyclic monomers having a pendant aromatic substituent, in combination with a monomer selected from the group consisting of one or more polycyclic monomers having a pendant acid labile substituent. The invention further relates to a photoresist composition comprising a photoacid initiator, an optional dissolution inhibitor, and said cyclic 2,3-addition polymer.
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公开(公告)号：AU9219998A
公开(公告)日：1999-04-05
申请号：AU9219998
申请日：1998-09-03
Applicant: GOODRICH CO B F , IBM
Inventor： GOODALL BRIAN L , JAYARAMAN SAIKUMAR , SHICK ROBERT A , RHODES LARRY F , ALLEN ROBERT DAVID , PIETRO RICHARD ANTHONY DI , WALLOW THOMAS
Abstract: The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source.
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公开(公告)号：DE69916434D1
公开(公告)日：2004-05-19
申请号：DE69916434
申请日：1999-02-19
Applicant: SUMITOMO BAKELITE CO , IBM
Inventor： JAYARAMAN SAIKUMAR , BENEDIKT M , RHODES F , VICARI RICHARD , ALLEN D , DIPIETRO A , SOORIYAKUMARAN RATNAM , WALLOW THOMAS
Abstract: The present invention relates to cyclic polymers and their use in photolithographic applications. The cyclic polymers contain a pendant acid labile functional group and a functional group containing a protected hydroxyl moiety. The polymers are post modified by deprotecting the pendant hydroxyl moiety and reacting the deprotected hydroxyl containing moiety with a coreactant. The post-functionalized polymers find application in chemically amplified photoresist compositions.
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