公开(公告)号：JP2012180498A

公开(公告)日：2012-09-20

申请号：JP2011202416

申请日：2011-09-15

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： TAZAKI TAICHI ,  OISHI YOHEI ,  MOTONARI MASAYUKI ,  GOTO YUTA ,  SUMIYA KOJI ,  HASEGAWA KOICHI

IPC: C08L83/06 ,  C08G59/20 ,  C08K5/105 ,  C08K5/11 ,  C08K5/3435 ,  G02B1/04

Abstract: PROBLEM TO BE SOLVED: To provide a curable composition that is excellent in heat resistance and light resistance, both are required on a practical side, and can form a cured product the transparency of which is not degraded under a high-temperature condition.SOLUTION: The curable composition comprises: polyorganosiloxane [A] that has an epoxy cyclohexyl group and a polystyrene-conversion weight average molecular weight of 500 to 100,000; a hindered phenol compound [B] that has a specific structure; a hindered amine compound [C] that has a specific structure.

Abstract translation: 要解决的问题：为了提供耐热性和耐光性优异的固化性组合物，实际上都需要两者，并且可以形成其透明性在高温条件下不劣化的固化产物 。 解决方案：可固化组合物包含：具有环氧环己基和聚苯乙烯换算重均分子量为500至100,000的聚有机硅氧烷[A] 具有特定结构的受阻酚化合物[B] 具有特定结构的受阻胺化合物[C]。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011248242A

公开(公告)日：2011-12-08

申请号：JP2010123392

申请日：2010-05-28

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： DEI SATOSHI ,  NAMAI HAYATO ,  YASUDA YOSHITOMO ,  HASEGAWA KOICHI

IPC: G03F7/40 ,  H01L21/027 ,  H01L21/3205

CPC classification number: B05D1/322 ,  C09D183/06 ,  G03F7/0392 ,  G03F7/094 ,  G03F7/38 ,  G03F7/405 ,  H01L21/02126 ,  H01L21/02137 ,  H01L21/0337 ,  H01L21/311 ,  H01L21/76801 ,  H01L21/76802 ,  H01L21/76807

Abstract: PROBLEM TO BE SOLVED: To provide an insulation pattern forming method and a resin composition capable of forming a multilayer structure easily without performing a complicated etching step, etc.SOLUTION: The insulation pattern formation method includes: [I] a process of forming organic patterns on a substrate; [II] a process of embedding insulation material among the organic patterns; [III] a process of removing the organic patterns and obtaining a reversal pattern composed of the insulation material; and [IV] a process of curing the obtained reversal pattern. The insulation pattern formation material for damascene processing to be used in the insulation pattern formation method is also provided.

Abstract translation: 解决方案：提供能够容易地形成多层结构的绝缘图案形成方法和树脂组合物，而不进行复杂的蚀刻步骤等。解决方案：绝缘图案形成方法包括：[I] 在基板上形成有机图案的工序; [II]在有机图案中嵌入绝缘材料的过程; [III]去除有机图案并获得由绝缘材料构成的反转图案的工艺; 和[IV]一种固化所获得的反转图案的方法。 还提供了用于绝缘图案形成方法中用于镶嵌加工的绝缘图案形成材料。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011237691A

公开(公告)日：2011-11-24

申请号：JP2010110575

申请日：2010-05-12

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HASEGAWA KOICHI ,  MIYATA HIROMU ,  YASUDA YOSHITOMO

IPC: G03F7/075 ,  C08F212/14 ,  C08F220/22 ,  C08F232/02 ,  C08G77/04 ,  C08G77/50 ,  G03F7/004 ,  G03F7/039 ,  G03F7/38 ,  G03F7/40 ,  H01L21/027

CPC classification number: C08F212/14 ,  C08G77/04 ,  C08G77/50 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0757 ,  G03F7/2041 ,  G03F7/40 ,  H01L21/02123

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition for liquid immersion exposure, a cured pattern forming method and a cured pattern which are suitably used in a liquid immersion exposure process for exposing a resist film via a liquid for liquid immersion exposure such as water.SOLUTION: The radiation-sensitive resin composition for liquid immersion exposure of the invention has a structure obtained by hydrolytic condensation of at least one selected from silane compounds represented by the formula [RSiX] and silane compounds represented by the formula [SiX], and contains a silicon-containing polymer having a weight average molecular weight of 1000 to 200000 according to GPC, a fluorine-containing polymer, an acid generator and a solvent. (In the formulas: Rrepresents a fluorine atom, an alkylcarbonyloxy group or an alkyl group having 1 to 20 carbon atoms; X represents a chlorine atom, a bromine atom or OR(where R is a monovalent organic group); and a represents an integer from 1 to 3.)

Abstract translation: 要解决的问题：提供一种用于液浸曝光的辐射敏感性树脂组合物，固化图案形成方法和固化图案，其适用于通过液体液体曝光抗蚀剂膜的液浸曝光工艺 浸入式曝光如水。 解决方案本发明的浸渍曝光用辐射敏感性树脂组合物具有通过水解缩合获得的结构，所述结构选自由式[R 1 = 硅烷化合物[SiX 4]表示的硅烷化合物 ]，并且根据GPC，含氟聚合物，酸产生剂和溶剂含有重均分子量为1000〜200000的含硅聚合物。 （式中，R 1 表示氟原子，烷基羰氧基或碳原子数1〜20的烷基; X表示氯原子，溴原子或OR（ 其中R是一价有机基团）;和a表示1至3的整数。）版权所有：（C）2012，JPO＆INPIT

公开(公告)号：JP2011118373A

公开(公告)日：2011-06-16

申请号：JP2010240174

申请日：2010-10-26

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： DEI KEI ,  YASUDA YOSHITOMO ,  HASEGAWA KOICHI

IPC: G03F7/40 ,  C08G77/04 ,  H01L21/027

CPC classification number: C08K5/06 ,  C08K5/05 ,  G03F7/40 ,  H01L21/0331 ,  C08L83/04

Abstract: PROBLEM TO BE SOLVED: To provide a polysiloxane resin composition for forming a reversed pattern and being properly embedded in a gap of a mask pattern which is excels in resistance to dry etching and in preservation stability, without being mixed with a mask pattern formed on a substrate to be processed, and to provide a method for forming the inverted pattern which uses the composition. SOLUTION: The method for forming a reversed pattern includes (1) a mask pattern forming step of forming a mask pattern on a substrate to be processed, (2) an embedding step of burying a polysiloxane resin composition in gaps of the mask pattern, and (3) a reversed pattern forming step of removing the mask pattern and forming a reversed pattern. The polysiloxane resin composition contains [A] polysiloxane having a specific structure, and [B] a organic solvent having a specific structure. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于形成反转图案的聚硅氧烷树脂组合物，并且适当地嵌入到耐干蚀刻和保存稳定性优异的掩模图案的间隙中，而不与掩模图案混合 形成在待加工的基板上，并且提供一种形成使用该组合物的反转图案的方法。 解决方案：用于形成反转图案的方法包括（1）在待加工基板上形成掩模图案的掩模图案形成步骤，（2）将聚硅氧烷树脂组合物掩埋在掩模的间隙中的嵌入步骤 图案，（3）去除掩模图案并形成反转图案的反转图案形成步骤。 聚硅氧烷树脂组合物含有具有特定结构的[A]聚硅氧烷，[B]具有特定结构的有机溶剂。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010282031A

公开(公告)日：2010-12-16

申请号：JP2009135552

申请日：2009-06-04

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KISHIDA TAKANORI ,  DEI KEI ,  YASUDA YOSHITOMO ,  HASEGAWA KOICHI

IPC: G03F7/075 ,  G03F7/004 ,  G03F7/038 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a negative radiation-sensitive composition suitable for forming a cured pattern constituting an interlayer insulating film with a low relative dielectric constant and a high elastic modulus. SOLUTION: The radiation-sensitive composition includes a polysiloxane obtained by hydrolytic condensation of a silane compound comprising an organosilicon compound represented by formula (1) and an organosilicon compound represented by formula (2), an acid generator, a solvent, and an acid diffusion inhibitor, wherein R 1 and R 5 represent H, F, alkoxyl, alkyl, cyano, cyanoalkyl or alkylcarbonyloxy; R 2 , R 4 and R 7 represent a monovalent organic group; and R 3 represents a single bond, arylene, methylene or alkylene. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供适于形成具有低相对介电常数和高弹性模量的构成层间绝缘膜的固化图案的负辐射敏感组合物。 解决方案：辐射敏感性组合物包括通过包含由式（1）表示的有机硅化合物和由式（2）表示的有机硅化合物的硅烷化合物水解缩合获得的聚硅氧烷，酸产生剂，溶剂和 酸扩散抑制剂，其中R 1和R 2代表H，F，烷氧基，烷基，氰基，氰基烷基或烷基羰基氧基; R 2 ，R 4 和R 7 表示一价有机基团; 且R“3”表示单键，亚芳基，亚甲基或亚烷基。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2009156999A

公开(公告)日：2009-07-16

申请号：JP2007333341

申请日：2007-12-25

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HASEGAWA KOICHI ,  SHINOHARA NOBUYASU

IPC: G02B1/04 ,  C08F290/06

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-curable resin composition capable of giving an optical member (for example, a Fresnel lens of a microdisplay type projection television) which comprises a cured product having a high refractive index, capable of maintaining adhesion to various plastic substrates even in a hot humid environment, and having excellent storage stability and light yellowing resistance (property of suppressing yellowing due to light).
SOLUTION: The radiation-curable resin composition for the optical member includes (A) a urethane (meth)acrylate which is the reaction product of (a) a hydroxyl group-containing (meth)acrylate, (b) an aliphatic polyisocyanate and (c) a polyol, (B) an epoxy group-containing (meth)acrylate, (C) an ethylenically unsaturated group-containing compound other than the components (A) and (B), and (D) a tertiary phosphine.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种能够提供光学部件（例如，微型显示器型投影式电视机的菲涅尔透镜）的辐射固化树脂组合物，其包括具有高折射率的固化产物，能够保持 即使在炎热潮湿的环境下，也能够粘附到各种塑料基材上，具有优异的储存稳定性和耐光黄变性（由于光抑制黄变性）。 解决方案：用于光学部件的辐射固化树脂组合物包括（A）作为（a）含羟基的（甲基）丙烯酸酯，（b）脂肪族多异氰酸酯的（a）的反应产物的氨基甲酸酯（甲基）丙烯酸酯 和（c）多元醇，（B）含环氧基的（甲基）丙烯酸酯，（C）除（A）和（B）成分以外的含烯键式不饱和基团的化合物，（D）叔膦。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008249916A

公开(公告)日：2008-10-16

申请号：JP2007090018

申请日：2007-03-30

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HASEGAWA KOICHI ,  TONSHO SHINJI ,  INAMI HAJIME ,  SHINOHARA NOBUYASU ,  KUROSAWA TAKAHIKO

IPC: G02B1/04 ,  B29C39/02 ,  B29K33/04 ,  B29L11/00 ,  C08F290/06 ,  C08G18/67

Abstract: PROBLEM TO BE SOLVED: To provide a radiation curable resin composition for an optical member capable of forming a cured product having a high refractive index and such a moderate hardness (Young's modulus) as to suppress the distortion of a surface relief structure of a Fresnel lens or the like, and less liable to cause yellowing due to light.
SOLUTION: The radiation curable resin composition for an optical member includes: (A) 5-70 mass% of a urethane (meth)acrylate which is a reaction product of (a) a hydroxyl group-containing (meth)acrylate, (b) an aliphatic polyisocyanate and (c) a polyol; and (B) 10-80 mass% of an ethylenically unsaturated group-containing compound other than the component (A).
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种能够形成具有高折射率和适度硬度（杨氏模量）的固化产物的光学部件的辐射固化树脂组合物，以抑制表面浮雕结构的变形 菲涅尔透镜等，并且由于光而不易引起黄变。 解决方案：用于光学部件的辐射固化树脂组合物包括：（A）5-70质量％的（a）含羟基的（甲基）丙烯酸酯的反应产物的氨基甲酸酯（甲基）丙烯酸酯， （b）脂族多异氰酸酯和（c）多元醇; 和（B）10-80质量％的除（A）成分以外的含烯属不饱和基团的化合物。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2005320412A

公开(公告)日：2005-11-17

申请号：JP2004138792

申请日：2004-05-07

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MITA MICHIHIRO ,  KUROSAWA TAKAHIKO ,  HASEGAWA KOICHI ,  SEKIGUCHI MANABU

IPC: C08L83/04 ,  H01L21/312

Abstract: PROBLEM TO BE SOLVED: To provide a film-forming composition which is excellent in flattening effect and is useful as a material for an interlayer insulating film used in a semiconductor element etc., a method for forming the insulating film, the insulating film and a semiconductor device. SOLUTION: The film-forming composition contains (A) a hydrolytic condensate obtained by hydrolyzing and condensing an alkoxysilane in the presence of water and at least one of a metal chelate compound and an acid catalyst, (B) a hydrolysis condensate obtained by hydrolyzing and condensing an alkoxysilane in the presence of an alkali catalyst and water, an organic solvent and water. The weight ratio of component (A) is greater than that of component (B). COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种成膜性优异的成膜组合物，其可用作半导体元件等中使用的层间绝缘膜的材料，形成绝缘膜的方法，绝缘膜 薄膜和半导体器件。 解决方案：成膜组合物含有（A）在水和至少一种金属螯合化合物和酸催化剂存在下水解和缩合烷氧基硅烷获得的水解缩合物，（B）获得的水解缩合物 在碱催化剂和水，有机溶剂和水的存在下水解和缩合烷氧基硅烷。 组分（A）的重量比大于组分（B）的重量比。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005120355A

公开(公告)日：2005-05-12

申请号：JP2004273469

申请日：2004-09-21

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： AKIYAMA MASAHIRO ,  HATTORI SEITARO ,  KOO MASAKI ,  HASEGAWA KOICHI

IPC: B05D3/02 ,  B05D3/04 ,  B05D3/06 ,  B05D7/24 ,  C08F299/08 ,  C08G77/46 ,  C09D7/12 ,  C09D133/04 ,  C09D171/02 ,  C09D183/02 ,  C09D183/04 ,  C09D183/14

Abstract: PROBLEM TO BE SOLVED: To provide a composition for forming a film which can form a film having a low relative dielectric constant and exhibiting excellent chemical resistance. SOLUTION: The composition for forming the film comprises a hydrolyzate condensate (I) obtained by hydrolytically condensing (A) at least one silane compound, selected from among a compound (A-1) represented by general formula (1): R a Si(OR 1 ) 4-a , a compound (A-2) represented by general formula (2): Si(OR 2 ) 4 and a compound (A-3) represented by general formula (3): R 3 b (R 4 O) 3-b Si-(R 7 ) d -Si(OR 5 ) 3-c R 6 c , and (B) a cyclic silane compound represented by general formula (4), a compound (II) which is compatible with or dispersible in the hydrolyzate condensate (I) and has a boiling point or a decomposition temperature of 200-400°C, and an organic solvent (III). COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 解决的问题：提供一种能够形成具有低相对介电常数并且具有优异的耐化学性的膜的薄膜形成用组合物。 解决方案：用于形成膜的组合物包含通过水解缩合（A）至少一种选自通式（1）表示的化合物（A-1）中的至少一种硅烷化合物获得的水解产物缩合物（I）：R 通式（2）表示的化合物（A-2）：Si（OR 1） SP> 2 ）和通式（3）表示的化合物（A-3）：R 3 b [R 4 O） 3-b SI-（R 7 ）ð -Si（OR 5 （B）由通式（4）表示的环状硅烷化合物，（b）由通式（4）表示的环状硅烷化合物， 与水解缩合物（I）相容或分散并具有200-400℃的沸点或分解温度的化合物（II）和有机溶剂（III）。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005089699A

公开(公告)日：2005-04-07

申请号：JP2003328287

申请日：2003-09-19

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HASEGAWA KOICHI ,  KOO MASAKI ,  KUROSAWA TAKAHIKO

IPC: C08L33/04 ,  C08L83/04 ,  C09D5/25 ,  C09D133/04 ,  C09D183/02 ,  C09D183/04 ,  C09D183/14 ,  H01L21/312

Abstract: PROBLEM TO BE SOLVED: To provide a film-forming composition which has a low permittivity and is excellent in surface flatness and improved in moisture absorption and useful for an interlayer insulation film in a semiconductor device or the like. SOLUTION: The film-forming composition contains (A) a hydrolysis condensation product obtained by hydrolyzing and condensating at least one kind of silane compound selected from the group consisting of a compound expressed by general formula (1), a compound expressed by general formula (2) and a compound expressed by general formula (3) in the presence of an acidic or a basic catalyst or a metal chelate compound, (B) a (meth)acrylic copolymer obtained by polymerizing a compound which is expressed by general formulas (4) and (5) and miscible with or dispersible in component (A) and (C) an organic solvent. R a Si(OR 1 ) 4-a (1), Si(OR 2 ) 4 (2), R 3 (3), CH 2 =CR 8 COOR 9 (4), CH 2 =CR 10 COOR 11 (5). COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 解决的问题：提供一种薄膜形成组合物，其具有低介电常数，表面平坦度优异和吸湿性改善，并且可用于半导体器件等中的层间绝缘膜。 解决方案：成膜组合物含有（A）通过水解和缩合至少一种选自由通式（1）表示的化合物，由通式（1）表示的化合物，由 通式（2）表示的化合物和由通式（3）表示的化合物在酸性或碱性催化剂或金属螯合物的存在下，（B）通过将通式 式（4）和（5）可与组分（A）和（C）混合或分散于有机溶剂中。 （1）Si（OR SP＆gt; 2＆lt; SP＆gt;＆lt; SP＆gt; （2），R 3 （3），CH 2 = CR 8 （4），CH 2 = CR 10 （5）。 版权所有（C）2005，JPO＆NCIPI