公开(公告)号：JPS6134221B2

公开(公告)日：1986-08-06

申请号：JP15779077

申请日：1977-12-29

Applicant: NIPPON ELECTRON OPTICS LAB

Inventor： NAMAE TAKAO ,  SOMEYA TERUO

IPC: H01J37/153 ,  H01J37/21 ,  H01J37/28

公开(公告)号：JPS58138025A

公开(公告)日：1983-08-16

申请号：JP2041182

申请日：1982-02-10

Applicant: NIPPON ELECTRON OPTICS LAB

Inventor： NAMAE TAKAO

IPC: H01L21/02 ,  G03F9/00 ,  H01L21/027

Abstract: PURPOSE:To simply discriminate an identification mark from other marks and chip patterns in reading and to use a wafer effectively, by a method wherein an identification mark is applied to that position in the peripheral part of a substantially circular wafer having a cut part in a part thereof which is a predetermined distance away from the cut part, and the identification mark is read in relation to the detection of the cut part. CONSTITUTION:With a wafer 1 rotated by a motor 3 through a stage 2, when a point A in a cut portion S comes directly below a light source 4L, a control signal generator circuit 8 generates a control signal and continues to send the signal to a gate circuit 7 until a point B in the cut part S comes directly below the light source 4L. In the meantime, an identification mark provided on an imaginary circle F on the wafer (1) is irradiated with a light beam from a light source 5L, and a reflected light corresponding to the identification mark is detected by a photoelectric detector 5D. The output of the detector 5D is sent to the gate circuit 7 through a pulse generator 6. During the period in which the control signal is sent from the control signal generator circuit 8, the gate circuit 7 delivers to an electronic computer 9 a pulse signal corresponding to the identification mark sent from the pulse generator 6. The computer 9 decodes the pulse signal to identify the kind of the wafer.

公开(公告)号：JPS5868928A

公开(公告)日：1983-04-25

申请号：JP16691581

申请日：1981-10-19

Applicant: NIPPON ELECTRON OPTICS LAB

Inventor： NAMAE TAKAO

IPC: H01L21/027 ,  H01J37/302 ,  H01L21/30

Abstract: PURPOSE:To perform an electron beam exposure having high precision at a high speed by a method wherein discrepancies of formed patterns to the specified sizes are measured previously at respective every size, and the electron beam is corrected according to the measured values thereof. CONSTITUTION:An electron beam exposure device provided with an electron gun 1, a blanking device 4, a beam section variable device 6 containing slit plates 7, 8, and a projection lens 11, signals outputted from a computer 14 for control are sent to deflectors 2, 9, 13 through D-A converters 15-17 and amplifiers 18- 20 to expose the prescribed pattern. At this time, discrepacies between sizes of the specified beam sections and sizes of patterns drawn actually are measured previously at respective every size, and discrepacies thereof are stored in a memory 23 as the constants. The prescribed constant is read out according to the prescribed size sent to a beam type data register 21, and is multiplied into beam type data by a multiplying circuit 22. Accordingly, size of beam is corrected, and the precise exposure pattern can be obtained.

公开(公告)号：JPS57138138A

公开(公告)日：1982-08-26

申请号：JP2393881

申请日：1981-02-20

Applicant: NIPPON ELECTRON OPTICS LAB

Inventor： NAMAE TAKAO

IPC: H01L21/027 ,  H01J37/304 ,  H01L21/30

Abstract: PURPOSE:To facilitate adjustment uniformalizing the density of beam currents by differentiating and arithmetically processing the detecting signals of rectangular beams, extracting the slope and curvature of differntiation signals and correcting the central axis of electron rays and the position of crossover by the information. CONSTITUTION:Beams projected to a molding slit 4 are deflected and scanned on a knife edge 12, and detecting signals by a Faraday gage 13 are inputted to a calculator 18 through a differentiation circuit 15 and an A-D converter 17. Differentiation signals digitalized are approximated to a straight line and the slope is calculated, and the central axis 5 is adjusted through correction until the slope becomes zero by alignment coils 9, 10 and signals take a symmetrical wave-form to time. The exciting currents of the coils 9, 10 are fixed, the exciting intensity of an irradiating lens 3 is changed at every minute quantity and scanning and detection are repeated, a condition that makes the differentiation signals maximum (curature is made 0) is obtained, and a crossover image is adjusted so as to form on the aperture plate 8 of a projection lens 6. Accordingly, adjustment equalizing the distribution of the current density of a face scanning type device can be simplified.

公开(公告)号：JPS56114324A

公开(公告)日：1981-09-08

申请号：JP1732880

申请日：1980-02-15

Applicant: NIPPON ELECTRON OPTICS LAB

Inventor： NAMAE TAKAO

IPC: H01L21/027 ,  H01J37/304

Abstract: PURPOSE:To perform the operation by the mark signal in a short time by automatically selecting the operation process of the sensed signals based on the signal waveforms sensed from the marks. CONSTITUTION:If the waveform which is judged by scanning a metal mark 2(Mm) in the vicinity of a specimen 2 by an electron beam B1 indicates the simple increase, the waveform is obtained by amplifying 9 the signal from a Faraday cup 8. Differential operations 10 and 11 are performed by commanding 7 switches S1 and S2, and a beam width H1 is calculated. If the waveform judged by scanning a heavy metal mark 2(Mh) on the specimen by a beam B2 is a trapezoidal shape, the waveform is obtained by sensing 5 the reflected electrons and amplifying the sensed signal. Then, the differential operation 11 is performed by commanding the switches S1 and S2, and a beam width H2 is calculated. When the beam B3 scans a slot mark Mg on the specimen, the waveform is judged 7. The signal through the sensor 5 and the amplifier 6 is determined and differentated 10, and a beam width H3 is calculated. Thus, the processing circuit can be selected and exposure can be accomplished in a short time without the load for the worker.

公开(公告)号：JPS56107185A

公开(公告)日：1981-08-25

申请号：JP1074480

申请日：1980-01-31

Applicant: NIPPON ELECTRON OPTICS LAB

Inventor： NAMAE TAKAO

IPC: G01T1/29 ,  H01L21/027

Abstract: PURPOSE:To make possible easy and accurate measurement of beam characteristics by enlarging only detection information corresponding to a part necessary for properties to be measured. CONSTITUTION:A charged beam rendered to a required shape cross section with the help of an aperture plate 3 is deflected by means of a deflector 9 and then is scanned by a knifeedge 6. In response to this scanning, a Faraday gauge 7 detects a beam generates a detection waveform formed by curvatures A, B at a position corresponding to a beam width and an inclination part C with varying inclination complying to a beam intensity distribution, etc. Therefore, if the amplitude of a selection amplifier 14 is controlled through CPU8, only an output selected, either a detection output from a cage 7 on the curvatures A, B or a detection output from the inclination part C, is enlarged and memorized by a memory 13. Based on this memorized content, a beam width, a beam intensity distribution, etc. are accurately measured under a simple constitution which does not require increasing of a memory capacity, by means of a differential signal level F of detection value of the inclination part C and detection peak value interval H of the curvatures A, B.

公开(公告)号：JPS551037A

公开(公告)日：1980-01-07

申请号：JP7448178

申请日：1978-06-20

Applicant: NIPPON ELECTRON OPTICS LAB

Inventor： NAMAE TAKAO

IPC: H01J37/22 ,  H04N5/57

Abstract: PURPOSE:To obtain image having optimum contrast and luminance by regulating the amplification degree and level of the image amplification system by detecting both the minimum and maximum values of image signal as a deviation from the central level of reference level. CONSTITUTION:An image signal from the amplifier 8 and also a signal of the central level (A+B)/2 from the first operating circuit 13 are sent out to the detection circuit 12 to detect the deviation a of the minimum value from the central level and also the deviation b of the maximum value of the image signal within a definite period from the central level, and then the deviations thus detected are sent out through the gate circuit 14 to the second operating circuit, where an amplification degree correction signal and a level correction signal are obtained from the deviation signals a and b sent from the detection circuit and the signal A-B sent from the operating circuit 13. The correction signals are sent to the amplification degree and level control circuit 9 to regulate the image signal. Thus, the automatic control of amplifier and level so as to give image optimum contrast and luminance with highly simpified circuit constitution is made possible.

公开(公告)号：JPS5349939A

公开(公告)日：1978-05-06

申请号：JP12459476

申请日：1976-10-18

Applicant: NIPPON ELECTRON OPTICS LAB

Inventor： NAMAE TAKAO

IPC: H01J37/22 ,  H01J37/28

Abstract: PURPOSE:To obtain a good-quality image of an appropriate luminance and contrast by photographing the sample image with a camera while observing the band width displayed on the screen.

公开(公告)号：JPS642201B2

公开(公告)日：1989-01-17

申请号：JP70882

申请日：1982-01-05

Applicant: NIPPON ELECTRON OPTICS LAB

Inventor： NAMAE TAKAO

IPC: G01B15/00 ,  G01B15/04 ,  G01B21/02 ,  G01B21/20 ,  H01L21/027

公开(公告)号：JPS60161514A

公开(公告)日：1985-08-23

申请号：JP1678084

申请日：1984-02-01

Applicant: NIPPON ELECTRON OPTICS LAB

Inventor： NAMAE TAKAO

IPC: G01B15/00

Abstract: PURPOSE:To enhance the reproducibility of measurement, by selecting two scanning positions on the basis of the scanning position, which corresponds to the signal with predetermined intensity among signals obtained on the bais of electron beam scanning corresponding to an arc, and a cursor position and measuring the distance between both positions. CONSTITUTION:Electron beam generated from an electron gun 1 is condensed by a condensing lens 2 and performs the digital scanning of a material by the scanning signal from a digital scanning signal generation circuit 5 through a magnification setting circuit 6 and a deflection coil 4. The reflected electron thereof is detected by a detector 7 and the detection signal is sent to a cathod ray tube 10 to which the scanning signal is supplied from the circuit 5 through an amplifier 8 and an adder circuit 9. A mark and two cursor signals are also supplied to the cathod ray tube 10 from a mark and cursor position setting circuit 14 and a coincidence circuit. A computer 12 takes in the scanning signal corresponding to a mark M on the basis of the mark position signal from the circuit 14. The width of an object can be calculated with good reproducibility from the distance between points N1, N4 near to cursor positions M1-M2 in the scanning positions N1-N4 of data points D1-D4 on set levels I1, I2.