Abstract:
PROBLEM TO BE SOLVED: To provide a radiation-emitting semiconductor chip with an improved light extraction efficiency.SOLUTION: The invention relates to a radiation-emitting semiconductor chip (1), comprising an active zone (2) for generating radiation having a wavelength λ and a patterned region (3) having irregularly arranged pattern elements. The pattern elements contain a first material having a first refractive index n, and are surrounded by a medium comprising a second material having a second refractive index n. The invention relates to a method for producing the radiation-emitting semiconductor chip.
Abstract:
PROBLEM TO BE SOLVED: To provide a semiconductor layer structure having a superlattice with which electrical and optical properties have been improved, and to provide an opto-electronics device having the semiconductor layer structure. SOLUTION: This semiconductor layer structure includes multiple layers of superlattice containing a predetermined concentration of dopant. The concentration of this dopant differs at least in two layers of the same composition in the superlattice. The dopant of at least one layer of the superlattice is in a gradient of concentration, and the superlattice has a layer doped by a different kind of dopant. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a semiconductor laser having not only comparatively high radiation quality but also improved in electrical characteristics. SOLUTION: There is provided the semiconductor laser 1 having: a semiconductor layer 2 in a row direction including an active region 3 to generate electromagnetic radiations; and an absorption region 4 to attenuate the higher mode. The absorption region 4 is disposed on the semiconductor layer 2 in the row direction or adjacent thereto. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a method for manufacturing an optoelectronics device using an ion-assisted application method, and to provide the optoelectronics device. SOLUTION: The method includes: a step (A) of providing a semiconductor layer sequence that has at least one active area, wherein the active area is suitable for emitting electromagnetic radiation during operations; and a step (B) of applying at least one layer on the first surface of the semiconductor sequence by the ion-assisted application method. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a semiconductor layer structure in which the electrical characteristics and the optical characteristics are improved, and to provide an optoelectronics device having such a semiconductor layer structure. SOLUTION: In the semiconductor layer structure, the thickness of a first type layer and the thickness of a second type layer increases layer by layer as the distance from an active layer increases. An optoelectronics device having such a semiconductor layer structure is also provided. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a method of manufacturing an optical semiconductor device capable of improving quantum efficiency. SOLUTION: An indium content of at least one well layer is increased in a step of growing the well layer. In the optical semiconductor device, the well layer has a first composition based on a nitride semiconductor material with first electron energy, and a barrier layer has a second composition based on the nitride semiconductor material with second electron energy higher than the first electron energy. A beam activated quantum well layer is grown on the barrier layer. Non-radiative well layers and the barrier layers form a superlattice for the beam activated quantum well layer. The layer thickness of the beam activated quantum well layer is larger than the layer thickness of the well layer of the superlattice. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a semiconductor laser diode with a stabilized forward property by improving an aging property. SOLUTION: The semiconductor laser diode is provided with a semiconductor existing on a nitride joint semiconductor substrate having an active layer which emits photon, a resonator contact formed on the semiconductor, and a connector contact surface electrically connected to the resonator contact. A space area with no coating is arranged adjacent to the resonator contact on the surface of the semiconductor. Hole contact can be eliminated without deteriorating contact resistance by leaking hydrogen from the semiconductor in the space area. COPYRIGHT: (C)2004,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide a solution for achieving high image-forming quality even if the luminance is the same. SOLUTION: An optical device comprises at least a first light-emitting device (LE1) and a second light-emitting device (LE2), and at least a light adder (1). The optical device is constituted such that the lights from the first and second light-emitting devices (LE1, LE2) are added to form one light beam. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a semiconductor layer structure in which the electrical characteristics and the optical characteristics are improved, and to provide an optoelectronics device having such a semiconductor layer structure. SOLUTION: In the semiconductor layer structure, adjoining layers of different type in a superlattice have a different composition of at least one element, at least two layers of the same type in the superlattice have a different content of at least one element, the content of at least one element is gradient in the layer of the superlattice which contains a doping material at a predetermined concentration, and the superlattice has a layer doped by a different doping material. An optoelectronics device having such a semiconductor layer structure is also provided. COPYRIGHT: (C)2008,JPO&INPIT