Absorption spectroscopic analyzer for semiconductor manufacturing process
    1.
    发明公开
    Absorption spectroscopic analyzer for semiconductor manufacturing process 无效
    用于半导体制造工艺的吸收光谱分析仪

    公开(公告)号:KR20100095369A

    公开(公告)日:2010-08-30

    申请号:KR20100008254

    申请日:2010-01-29

    Abstract: PURPOSE: An optical extinction analyzing device for a semiconductor manufacturing process is provided to prevent the attaching of particles to the inside of an analyzing device. CONSTITUTION: An optical extinction analyzing device for a semiconductor manufacturing process comprises a fluid path converting mechanism(50) and a spectrophotometer(51). A fluid path converting mechanism is connected to the exhaust channel of the process chamber of the semiconductor manufacturing process. The spectrophotometer is connected to the exhaust channel. The spectrophotometer comprises cell and optical system. The spectrophotometer measures the moisture concentration among the process gas. A particle counter measuring particle is included in the process chamber. The fluid path converting mechanism comprises a controller.

    Abstract translation: 目的:提供一种用于半导体制造工艺的光学消光分析装置,以防止颗粒附着到分析装置的内部。 构成:用于半导体制造工艺的光学消光分析装置包括流体路径转换机构(50)和分光光度计(51)。 流体路径转换机构连接到半导体制造工艺的处理室的排气通道。 分光光度计连接到排气通道。 分光光度计包括电池和光学系统。 分光光度计测量工艺气体中的水分浓度。 颗粒计数器测量颗粒包含在处理室中。 流体路径转换机构包括控制器。

    SLIT MECHANISM FOR MONOCHROMATOR
    4.
    发明专利

    公开(公告)号:GB2131200B

    公开(公告)日:1986-01-22

    申请号:GB8327842

    申请日:1983-10-18

    Applicant: SHIMADZU CORP

    Abstract: A slit mechanism for use in a monochromator which is capable of changing not only the slit width but also the slit height. The slit mechanism is provided with a plurality of pairs of slits formed in a disk rotatable about an axis. The two slits in each pair have the same width and the same height, and each pair of slits have a different width from those of the other pairs of slits. The slit mechanism is further provided with at least one additional pair of slits having the same width as the width of, and a different height from the height of, a predetermined pair of the plurality of pairs of slits. All the pairs of slits are arranged circumferentially of a circle on the disk concentric with the axis of rotation of the disk, so that each pair of slits are positioned diametrically opposite to each other on the circle so as to serve as an entrance and an exit slit, respectively, for the monochromator. The slits may also be arranged on a disk circumferentially of two circles of different diameters concentric with each other and the axis of rotation of the disk, so that one slit in each pair is on one of the two circles while the other slit in the pair is on the other circle diametrically opposite to the one slit.

    DOUBLE-BEAM SPECTROPHOTOMETER
    5.
    发明专利

    公开(公告)号:GB2128359B

    公开(公告)日:1986-11-12

    申请号:GB8307375

    申请日:1983-03-17

    Applicant: SHIMADZU CORP

    Inventor: AKIYAMA OSAMU

    Abstract: A double-beam spectrophotometer which uses an integrating sphere for measurement of the total reflected light from a sample or only the diffuse reflection component thereof. The sphere is provided with a first pair of windows in which a sample and a reference are detachably and exchangeably set and a second pair of windows through one of which one of a sample and a reference light beam enters the integrating sphere so as to impinge perpendicularly on said sample or reference set in one of said first pair of windows, while through the other of said second pair of windows the other of said sample and reference light beams enters said integrating sphere to impinge aslant on said reference or sample set in the other of said first pair of windows. The positions of said sample and reference are exchanged in accordance with the type of measurement to be made.

    APPARATUS FOR MEASURING ABSOLUTE REFLECTANCE

    公开(公告)号:CA1203399A

    公开(公告)日:1986-04-22

    申请号:CA439966

    申请日:1983-10-28

    Applicant: SHIMADZU CORP

    Inventor: AKIYAMA OSAMU

    Abstract: Apparatus for measuring the absolute reflectance of a sample, which comprises an integrating sphere provided with four windows the centers of which lie in a plane including the center of the integrating sphere. A first one of the four windows has its center coinciding with a diametrical line of the integrating sphere included in the plane while a second and a third window are arranged symmetrically with respect to the diametrical line, with a sample set in the fourth window so as to face inwardly of the integrating sphere. A light source is so arranged as to introduce a beam of light into the integrating sphere and a light measuring device is so arranged as to receive the light emerging from the integrating sphere. The integrating sphere is rotatable for 180.degree. about an axis coinciding with the above-mentioned diametrical line so that the integrating sphere selectively takes two positions thereby to change the operative positions of the second and third windows relative to the light source or the light measuring device. The data measured at each of the two positions of the integrating sphere are processed so as to obtain the absolute reflectance of the sample. The positions of the light source and the light measuring device relative to the windows of the integrating sphere may be exchanged to obtain a different type of absolute reflectance.

    SPECTROPHOTOMETER
    8.
    发明专利

    公开(公告)号:GB2101299B

    公开(公告)日:1985-02-27

    申请号:GB8208115

    申请日:1982-03-19

    Applicant: SHIMADZU CORP

    Abstract: A double-beam spectrophotometer comprising a light source, a monochromator, optical means for causing the monochromatic light beam from the monochromator to alternately advance along a pair of optical paths, the axes of which intersect generally perpendicularly to each other, a pair of cells each disposed in one of the two optical paths, and a photoelectric detector disposed at or adjacent the point of intersection of the pair of optical paths.

    DOUBLE-BEAM SPECTROPHOTOMETER
    9.
    发明专利

    公开(公告)号:GB2128359A

    公开(公告)日:1984-04-26

    申请号:GB8307375

    申请日:1983-03-17

    Applicant: SHIMADZU CORP

    Inventor: AKIYAMA OSAMU

    Abstract: A double-beam spectrophotometer which uses an integrating sphere for measurement of the total reflected light from a sample or only the diffuse reflection component thereof. The sphere is provided with a first pair of windows in which a sample and a reference are detachably and exchangeably set and a second pair of windows through one of which one of a sample and a reference light beam enters the integrating sphere so as to impinge perpendicularly on said sample or reference set in one of said first pair of windows, while through the other of said second pair of windows the other of said sample and reference light beams enters said integrating sphere to impinge aslant on said reference or sample set in the other of said first pair of windows. The positions of said sample and reference are exchanged in accordance with the type of measurement to be made.

    10.
    发明专利
    未知

    公开(公告)号:DE3311954A1

    公开(公告)日:1984-03-01

    申请号:DE3311954

    申请日:1983-03-31

    Applicant: SHIMADZU CORP

    Inventor: AKIYAMA OSAMU

    Abstract: A double-beam spectrophotometer which uses an integrating sphere for measurement of the total reflected light from a sample or only the diffuse reflection component thereof. The sphere is provided with a first pair of windows in which a sample and a reference are detachably and exchangeably set and a second pair of windows through one of which one of a sample and a reference light beam enters the integrating sphere so as to impinge perpendicularly on said sample or reference set in one of said first pair of windows, while through the other of said second pair of windows the other of said sample and reference light beams enters said integrating sphere to impinge aslant on said reference or sample set in the other of said first pair of windows. The positions of said sample and reference are exchanged in accordance with the type of measurement to be made.

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