公开(公告)号：JP2014060959A

公开(公告)日：2014-04-10

申请号：JP2012208510

申请日：2012-09-21

Applicant: Toshiba Corp ,  株式会社東芝

Inventor： NAKAMURA NAOKO ,  ITO KEIKO ,  HASHIMOTO KOJI ,  MOTOMA NOBUHIRO ,  NIKAIDO MASARU

IPC: C12N15/09 ,  C12M1/00 ,  C12Q1/68

Abstract: PROBLEM TO BE SOLVED: To provide a multiple nucleic acid reaction tool, a nucleic acid analysis method and an assay kit, capable of carrying out amplification reaction and hybridization reaction in one reaction field.SOLUTION: The method includes the steps of: preparing a sample, a base substance 2, a primer set 7 for amplifying target nucleic acid, and a nucleic acid probe 6 for detecting an amplified product; coating salt 8 with hardened oil or wax 9; immobilizing a nucleic acid probe on the surface of the base substance; immobilizing the primer set at the same location as the nucleic acid probe; bringing reaction mixture containing the sample and the coated salt capsule into contact with the nucleic acid probe and the primer set on the base substance, thereby amplifying target nucleic acid; melting hardened oil or wax by elevating the temperature of the reaction mixture, and eluting the salt; hybridizing the amplified product obtained by the amplification reaction with the nucleic acid probe; and measuring a produced hybridization signal to detect the presence or absence and/or quantity of target nucleic acid in the sample.

Abstract translation: 要解决的问题：提供能够在一个反应​​场中进行扩增反应和杂交反应的多重核酸反应工具，核酸分析方法和测定试剂盒。方法：该方法包括以下步骤：制备样品 ，碱基物质2，用于扩增靶核酸的引物组7和用于检测扩增产物的核酸探针6; 用硬化油或蜡9涂覆盐8; 将核酸探针固定在基础物质的表面上; 将引物组固定在与核酸探针相同的位置; 使含有样品和包衣盐胶囊的反应混合物与核酸探针和底物上的引物组接触，从而扩增靶核酸; 通过升高反应混合物的温度和洗脱该盐来熔化硬化油或蜡; 将通过扩增反应获得的扩增产物与核酸探针杂交; 并测量产生的杂交信号以检测样品中靶核酸的存在或不存在和/或量。

公开(公告)号：JP2012060939A

公开(公告)日：2012-03-29

申请号：JP2010208537

申请日：2010-09-16

Applicant: Toshiba Corp ,  株式会社東芝

Inventor： KIZU KEIKO ,  TAKAHASHI MASAYOSHI ,  ITO KEIKO ,  HASHIMOTO MICHIE ,  HASHIMOTO KOJI ,  MOTOMA NOBUHIRO ,  TAKAHASHI KAZUAKI ,  MISHIRO TOSHIHARU

IPC: C12Q1/68 ,  C12N15/09 ,  G01N33/53 ,  G01N33/569

Abstract: PROBLEM TO BE SOLVED: To provide a means for detecting a drug resistant strain of HBV more conveniently and inexpensively in a short time.SOLUTION: A nucleic acid primer set to amplify a polymorphic sequence related to the drug resistance of a hepatitis B virus with LAMP contains at least one primer set selected from the group consisting of a primer set 1, that is FIP primer, BIP primer, F3 primer, and B3 shown by a specific sequence, and a primer set 2 that is FIP primer, BIP primer, F3 primer, and B3 primer shown by a specific sequence.

Abstract translation: 要解决的问题：提供一种在短时间内更方便，更便宜地检测HBV耐药菌株的方法。 解决方案：用LAMP扩增与乙型肝炎病毒的耐药性相关的多态性序列的核酸引物组含有至少一种选自引物组1，即FIP引物，BIP 引物，F3引物和B3，以及特异性序列所示的FIP引物，BIP引物，F3引物和B3引物的引物组2。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010087298A

公开(公告)日：2010-04-15

申请号：JP2008255635

申请日：2008-09-30

Applicant: Toshiba Corp ,  株式会社東芝

Inventor： HASHIMOTO KOJI

IPC: H01L21/3213 ,  H01L21/28

CPC classification number: H01L21/32139 ,  H01L21/0337 ,  H01L21/28123 ,  H01L21/28132

Abstract: PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device with high reliability which has a pattern of desired size. SOLUTION: The method for manufacturing the semiconductor device includes: sequentially forming a first film 101 and a second film 102 on a base film 100; processing the second film 102, thereby forming a second pattern 104; processing the first film 101 with the second pattern 104 as a mask, thereby forming a first pattern 105; removing the second pattern 104; depositing a third film 106 on the base film and on the first pattern 105; processing the third film 106, thereby forming a third sidewall pattern 107 on a sidewall of the first pattern 105; removing the first pattern 105; and processing the base film with the third sidewall pattern 107 as a mask, thereby forming a pattern 108 on the base film so that the size of the pattern 108 formed on the base film 100 become smaller than the space size of the pattern 108 formed in the base film 100. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种具有高可靠性的具有所需尺寸图案的半导体器件的制造方法。 解决方案：制造半导体器件的方法包括：在基膜100上依次形成第一膜101和第二膜102; 处理第二膜102，从而形成第二图案104; 用第二图案104作为掩模处理第一膜101，从而形成第一图案105; 去除第二图案104; 在基膜和第一图案105上沉积第三膜106; 处理第三膜106，从而在第一图案105的侧壁上形成第三侧壁图案107; 去除第一图案105; 并且用第三侧壁图案107作为掩模处理基膜，从而在基膜上形成图案108，使得形成在基膜100上的图案108的尺寸变得小于形成在基膜100上的图案108的空间尺寸 基片100。（C）2010，JPO＆INPIT

公开(公告)号：JP2009268370A

公开(公告)日：2009-11-19

申请号：JP2008119297

申请日：2008-04-30

Applicant: Toshiba Corp ,  株式会社東芝

Inventor： NAKAMURA NAOKO ,  HASHIMOTO KOJI ,  MOTOMA NOBUHIRO

IPC: C12Q1/68 ,  C12N15/09 ,  G01N33/53

CPC classification number: C12Q1/6832 ,  C12Q1/6837 ,  C12Q2527/101 ,  C12Q2525/204 ,  C12Q2565/501

Abstract: PROBLEM TO BE SOLVED: To provide a method for detecting a target nucleic acid by which even the target nucleic acid requiring similar sequences to be differentiated can be detected in good accuracy by developing a method for detecting abnormality in a cleaning step.
SOLUTION: The method for detecting the target nucleic acid includes a step of testing whether the cleaning step is carried out normally or not. A nucleic acid probe for monitoring the cleaning level is used in the invention. The probe changes the signal intensity obtained from the probe by the cleaning while changing the cleaning temperature within the optimum cleaning temperature range optimum to the cleaning of the target nucleic acid and the temperature range at the proximity thereof.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 待解决的问题：提供一种用于检测目标核酸的方法，通过开发用于检测清洁步骤中的异常的方法，可以以高精度检测需要相似序列的目标核酸的目标核酸。 解决方案：用于检测靶核酸的方法包括测试清洁步骤是否正常进行的步骤。 用于监测清洁水平的核酸探针用于本发明。 探针通过清洗改变从探针获得的信号强度，同时在最适于清洁靶核酸的最佳清洁温度范围内和在其附近的温度范围内改变清洁温度。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009213465A

公开(公告)日：2009-09-24

申请号：JP2008275200

申请日：2008-10-27

Applicant: Toshiba Corp ,  株式会社東芝

Inventor： TAKAHASHI MASAYOSHI ,  HASHIMOTO MICHIE ,  ITO KEIKO ,  KIZU KEIKO ,  MISHIRO TOSHIHARU ,  TAKAHASHI KAZUAKI ,  MIYAZAKI KAZUNORI ,  HASHIMOTO KOJI ,  MOTOMA NOBUHIRO

IPC: C12Q1/68 ,  C12N15/09

CPC classification number: C12Q1/706

Abstract: PROBLEM TO BE SOLVED: To provide a nucleic acid primer set capable of detecting a drug resistant strain of hepatitis B virus (HBV) in a short time, more simply and inexpensively, an assay kit and a method for detecting the drug resistant strain of hepatitis B virus. SOLUTION: This method for detecting the drug resistant strain of hepatitis B virus is equipped with a process of LAMP-amplifying the hepatitis B viral nucleic acid in a sample solution by using the primer set, and a process of hybridizing the amplified product, a probe containing a polynucleotide originated from the drug resistant strain and a probe containing a polynucleotide originated from a non-drug resistant strain, and detecting the drug resistant strain of the hepatitis B strain. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了提供能够在更短的时间内更简单且更廉价地检测乙型肝炎病毒（HBV）的耐药菌株的核酸引物组，可以使用检测试剂盒和检测耐药性的方法 乙型肝炎病毒株。 解决方案：用于检测乙型肝炎病毒的药物抗性菌株的方法配备了通过使用引物组在样品溶液中LAMP扩增乙型肝炎病毒核酸的方法，以及将扩增产物 ，含有源自耐药菌株的多核苷酸的探针和含有源自非耐药性菌株的多核苷酸的探针，以及检测所述乙型肝炎病毒株的药物抗性菌株。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008271806A

公开(公告)日：2008-11-13

申请号：JP2007117346

申请日：2007-04-26

Applicant: Toshiba Corp ,  株式会社東芝

Inventor： NAKAMURA NAOKO ,  ITO KEIKO ,  TAKAHASHI MASAYOSHI ,  HASHIMOTO KOJI ,  MOTOMA NOBUHIRO

IPC: C12N15/09 ,  C12M1/00 ,  C12Q1/02 ,  C12Q1/68

CPC classification number: C12Q1/6853 ,  C12Q2531/119 ,  C12Q2525/155

Abstract: PROBLEM TO BE SOLVED: To provide a nucleic acid primer and a detection probe in order to provide a method for easily and inexpensively detecting the single nucleotide polymorphisms of SAA1 gene. SOLUTION: A nucleic acid primer set for LAMP amplification for detecting genotypes in the single nucleotide polymorphisms C-13T, C2995T and T3010C of SAA1 gene is provided. A nucleic acid probe for detecting a product amplified by the above primer set is also provided. Further, a method for detecting the genotypes in the single nucleotide polymorphisms C-13T, C2995T and T3010C of SAA1 gene using the above primer set is provided. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供核酸引物和检测探针，以提供容易且廉价地检测SAA1基因的单核苷酸多态性的方法。 解决方案：提供了用于检测SAA1基因的单核苷酸多态性C-13T，C2995T和T3010C中基因型的LAMP扩增的核酸引物组。 还提供了用于检测由上述引物组扩增的产物的核酸探针。 此外，提供了使用上述引物组检测SAA1基因的单核苷酸多态性C-13T，C2995T和T3010C中的基因型的方法。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008237140A

公开(公告)日：2008-10-09

申请号：JP2007084289

申请日：2007-03-28

Applicant: Toshiba Corp ,  株式会社東芝

Inventor： NAKAMURA NAOKO ,  ITO KEIKO ,  HASHIMOTO KOJI ,  MOTOMA NOBUHIRO

IPC: C12Q1/68 ,  C12M1/00 ,  C12N15/09

CPC classification number: C12Q1/6883 ,  C12Q2600/156

Abstract: PROBLEM TO BE SOLVED: To provide a nucleic acid primer and a nucleic acid probe for use in a method for easily and inexpensively detecting the single nucleotide polymorphism of a NAT2 gene. SOLUTION: The nucleic acid primer set for LAMP amplification for detecting genotypes in the single nucleotide polymorphisms G590A, G857A and T341C of the NAT2 gene is provided. A nucleic acid probe for detecting amplification products amplified by the nucleic acid primer set is also provided. Besides, a method for detecting genotypes in the single nucleotide polymorphisms G590A, G857A and T341C of the NAT2 gene using the nucleic acid primer set is provided. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供用于容易且廉价地检测NAT2基因的单核苷酸多态性的方法中的核酸引物和核酸探针。 解决方案：提供了用于检测NAT2基因的单核苷酸多态性G590A，G857A和T341C中基因型的LAMP扩增的核酸引物组。 还提供了用于检测由核酸引物组扩增的扩增产物的核酸探针。 此外，提供了使用核酸引物组检测NAT2基因的单核苷酸多态性G590A，G857A和T341C中的基因型的方法。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008233383A

公开(公告)日：2008-10-02

申请号：JP2007071031

申请日：2007-03-19

Applicant: Toshiba Corp ,  株式会社東芝

Inventor： ITO KENJI ,  TANAKA SATOSHI ,  KOTANI TOSHIYA ,  FUJISAWA TADAHITO ,  HASHIMOTO KOJI

IPC: G03F1/68

CPC classification number: G03F1/00

Abstract: PROBLEM TO BE SOLVED: To provide a pattern forming method with which a fine pattern formed by applying a side wall leaving process is efficiently and easily formed. SOLUTION: An endmost pattern 3a among a plurality of integrated circuit patterns 3 is selected. A first closest pattern 3b which is closest to the endmost pattern 3a is extracted from the respective integrated circuit patterns 3. A pattern 4 is generated which is circumscribed with the endmost pattern 3a and first closest pattern 3b. A non-overlap pattern 5 excluding portions overlapping with the endmost pattern 3a and first closest pattern 3b is generated from the circumscribed pattern 4. A second closest pattern 6 which is closest to the non-overlap pattern 5 is extracted from the respective integrated circuit patterns 3. Steps from the one of extracting the first closest pattern 3b from a second layer to the one of extracting the second closest pattern 6 are repeated until all the data of the respective integrated circuit patterns 3 are completely followed. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种图案形成方法，通过该图案形成方法能够有效且容易地形成通过施加侧壁离开处理而形成的精细图案。

解决方案：选择多个集成电路图案3中的最终图案3a。 从各集成电路图案3提取最靠近最终图案3a的第一最近图案3b。产生与最末端图案3a和第一最近图案3b相切的图案4。 从外接图案4生成除了与最终图案3a和第一最近图案3b重叠的部分的不重叠图案5.从各个集成电路图案中提取最接近非重叠图案5的第二最近图案6 重复将从第二层提取第一最近图案3b到提取第二最近图案6的步骤之间的步骤，直到完全遵循各个集成电路图案3的所有数据。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008145441A

公开(公告)日：2008-06-26

申请号：JP2008000829

申请日：2008-01-07

Applicant: Toshiba Corp ,  株式会社東芝

Inventor： HASHIMOTO KOJI ,  ITO KEIKO ,  MISHIRO TOSHIHARU ,  ISHIMORI YOSHIO

IPC: G01N27/327 ,  C12M1/00 ,  C12N15/09 ,  C12Q1/68 ,  G01N27/416 ,  G01N33/53

Abstract: PROBLEM TO BE SOLVED: To provide an electrode, a detection device and a sensor exhibiting superior reproducibility and quantitativeness, capable of economically detecting nucleic acid. SOLUTION: This electrode is equipped with a substrate; a conductive body arranged on the substrate; an insulator formed by coating the conductive body surface, while securing a connecting region with respect to the outside; a circular opening part provided on the conductive body so as to expose the conductor; and the nucleic acid that is immobilized on the conductor exposed from the opening part. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供能够经济地检测核酸的电极，检测装置和表现出优异的再现性和定量性的传感器。

解决方案：该电极配备有基板; 布置在所述基板上的导电体; 绝缘体，其通过在固定连接区域相对于外部的同时涂覆导电体表面而形成; 设置在导电体上以露出导体的圆形开口部; 以及固定在从开口部露出的导体上的核酸。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008135649A

公开(公告)日：2008-06-12

申请号：JP2006322039

申请日：2006-11-29

Applicant: Toshiba Corp ,  株式会社東芝

Inventor： KATO HIROKAZU ,  HASHIMOTO KOJI ,  SHIOBARA HIDESHI ,  MUKAI HIDEFUMI

IPC: H01L21/3205 ,  G03F7/11 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a semiconductor device manufacturing method capable of simplifying pattern formation. SOLUTION: A first pattern 105 is formed on a film 100 to be processed. A reflection preventing film 106 and a resist film 107 are successively formed on the film 100 to be processed including a region with the first pattern 105 formed thereon. A resist pattern 103 is formed by processing the resist film 107. The reflection preventing film 106 exposed beneath the resist pattern 108 is processed with a development liquid being the same as that used for processing the resist film 107, thereby exposing a part of the film 100 to be processed and at least a part of the first pattern 105. The film 100 to be processed is processed with the first pattern 105 and the resist pattern 108 as masks, so that a wiring pattern 110, etc., is formed on the film 100 to be processed. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 解决的问题：提供能够简化图案形成的半导体器件制造方法。 解决方案：第一图案105形成在待加工的膜100上。 反射防止膜106和抗蚀剂膜107依次形成在被加工的膜100上，其中包括形成有第一图案105的区域。 通过加工抗蚀剂膜107形成抗蚀剂图案103.在抗蚀剂图案108下方暴露的防反射膜106与用于加工抗蚀剂膜107的显影液相同的显影液进行处理，从而使部分膜 100被处理和第一图案105的至少一部分。被处理的膜100用第一图案105和抗蚀剂图案108作为掩模进行处理，使得布线图案110等形成在 电影100被处理。 版权所有（C）2008，JPO＆INPIT