Abstract:
One object of the present invention is to provide an electrochromic device having improved insulating film structure to reduce electrical leakage. The improved structure includes a lower conductive layer, upper transparent conductive layer, an electrochromic electrode layer, a counter electrode layer, and at least one ion-conductor layer sandwiched between the electrochromic electrode layer and the counter electrode layer. The lower transport conductive layer is scribed and the gap formed from the scribing is filled with the layer(s) formed above the lower conductive layer, such as the electrode layer formed directly above the lower conductive layer. The effective linewidth of the scribe is greater than the migration length of the lithium ions intercalated into the electrode layer, such that the electrode materials occupying the gap do not convert the electrode layer into an electrically conductive region.
Abstract:
One object of the present invention is to provide an electrochromic device having improved insulating film structure to reduce electrical leakage. The improved structure includes a lower conductive layer, upper conductive layer, an electrochromic electrode layer, a counter electrode layer, and at least one ion-conductor layer sandwiched between the electrochromic electrode layer and the counter electrode layer. The lower conductive layer and the electrochromic electrode layer are scribed and the gap formed from the scribing is filled with the layers formed above the electrochromic electrode layer. In some aspects, the ion-conductor layer is also scribed with the lower conductor and electrochromic electrode layers and the gap formed from the scribing is filled with the layers formed above the ion-conductor layer. In further aspects, the insulating film may include one or more buffer layers formed above an ion-conductor layer, further separating the upper conductive layer from the lower conductive layer.
Abstract:
One object of the present invention is to provide an electrochromic device having improved insulating film structure to reduce electrical leakage. The improved structure includes a lower conductive layer, upper conductive layer, an electrochromic electrode layer, a counter electrode layer, and at least one ion-conductor layer sandwiched between the electrochromic electrode layer and the counter electrode layer. The lower conductive layer and the electrochromic electrode layer are scribed and the gap formed from the scribing is filled with the layers formed above the electrochromic electrode layer. In some aspects, the ion-conductor layer is also scribed with the lower conductor and electrochromic electrode layers and the gap formed from the scribing is filled with the layers formed above the ion-conductor layer. In further aspects, the insulating film may include one or more buffer layers formed above an ion-conductor layer, further separating the upper conductive layer from the lower conductive layer.
Abstract:
One object of the present invention is to provide an electrochromic device having improved insulating film structure to reduce electrical leakage. The improved structure includes a lower conductive layer, upper transparent conductive layer, an electrochromic electrode layer, a counter electrode layer, and at least one ion-conductor layer sandwiched between the electrochromic electrode layer and the counter electrode layer. The lower transport conductive layer is scribed and the gap formed from the scribing is filled with the layer(s) formed above the lower conductive layer, such as the electrode layer formed directly above the lower conductive layer. The effective linewidth of the scribe is greater than the migration length of the lithium ions intercalated into the electrode layer, such that the electrode materials occupying the gap do not convert the electrode layer into an electrically conductive region.
Abstract:
A heat treated electrochromic device comprising an anodic complementary counter electrode layer comprised of a mixed tungsten-nickel oxide and lithium, which provides a high transmission in the fully intercalated state and which is capable of long term stability, is disclosed. Methods of making an electrochromic device comprising an anodic complementary counter electrode comprised of a mixed tungsten-nickel oxide are also disclosed.
Abstract:
A heat treated electrochromic device comprising an anodic complementary counter electrode layer comprised of a mixed tungsten-nickel oxide and lithium, which provides a high transmission in the fully intercalated state and which is capable of long term stability, is disclosed. Methods of making an electrochromic device comprising an anodic complementary counter electrode comprised of a mixed tungsten-nickel oxide are also disclosed.
Abstract:
A heat treated electrochromic device comprising an anodic complementary counter electrode layer comprised of a mixed tungsten-nickel oxide and lithium, which provides a high transmission in the fully intercalated state and which is capable of long term stability, is disclosed. Methods of making an electrochromic device comprising an anodic complementary counter electrode comprised of a mixed tungsten-nickel oxide are also disclosed.
Abstract:
A heat treated electrochromic device comprising an anodic complementary counter electrode layer comprised of a mixed tungsten-nickel oxide and lithium, which provides a high transmission in the fully intercalated state and which is capable of long term stability, is disclosed. Methods of making an electrochromic device comprising an anodic complementary counter electrode comprised of a mixed tungsten-nickel oxide are also disclosed.