-
公开(公告)号:US11947233B2
公开(公告)日:2024-04-02
申请号:US17135739
申请日:2020-12-28
Applicant: SAGE Electrochromics, Inc.
Inventor: Benjamin Treml , Jean-Christophe Giron , Yigang Wang , Robert Newcomb
IPC: G02F1/155 , B23K26/352 , B23K26/362 , G02F1/153
CPC classification number: G02F1/155 , G02F1/1533 , B23K26/355 , B23K26/362
Abstract: Various embodiments relate to an electrochromic (EC) device that is structured with surface contour features arranged according to a randomized pattern. For example, one or more conductive layers of an EC device may be structured with such surface ablations. In some embodiments, the randomized ablation pattern may comprise a randomized variation in one or more geometrical characteristics of a group of segments. In some examples, the geometrical characteristic(s) may include a distance characteristic, an orientation characteristic, and/or a shape characteristic, etc. According to various embodiments, the randomized ablation pattern may be configured to reduce diffraction and/or scatter of light incident on the surface ablations as compared to some other ablation patterns.
-
公开(公告)号:US20210200052A1
公开(公告)日:2021-07-01
申请号:US17135739
申请日:2020-12-28
Applicant: SAGE Electrochromics, Inc.
Inventor: Benjamin Treml , Jean-Christophe Giron , Yigang Wang , Robert Newcomb
IPC: G02F1/153 , B23K26/57 , G02F1/1523
Abstract: Various embodiments relate to an electrochromic (EC) device that is structured with surface contour features arranged according to a randomized pattern. For example, one or more conductive layers of an EC device may be structured with such surface ablations. In some embodiments, the randomized ablation pattern may comprise a randomized variation in one or more geometrical characteristics of a group of segments. In some examples, the geometrical characteristic(s) may include a distance characteristic, an orientation characteristic, and/or a shape characteristic, etc. According to various embodiments, the randomized ablation pattern may be configured to reduce diffraction and/or scatter of light incident on the surface ablations as compared to some other ablation patterns.
-