CONTROLLED RANDOMIZATION OF ELECTROCHROMIC ABLATION PATTERNS

    公开(公告)号:US20210200052A1

    公开(公告)日:2021-07-01

    申请号:US17135739

    申请日:2020-12-28

    Abstract: Various embodiments relate to an electrochromic (EC) device that is structured with surface contour features arranged according to a randomized pattern. For example, one or more conductive layers of an EC device may be structured with such surface ablations. In some embodiments, the randomized ablation pattern may comprise a randomized variation in one or more geometrical characteristics of a group of segments. In some examples, the geometrical characteristic(s) may include a distance characteristic, an orientation characteristic, and/or a shape characteristic, etc. According to various embodiments, the randomized ablation pattern may be configured to reduce diffraction and/or scatter of light incident on the surface ablations as compared to some other ablation patterns.

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