MULTI-LAYERED SUBSTRATE AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20180070458A1

    公开(公告)日:2018-03-08

    申请号:US15810343

    申请日:2017-11-13

    Abstract: A multilayered substrate in accordance with an aspect of the present disclosure may include an insulating layer, a conductive pattern embedded, at least partially, in the insulating layer, and a bump being electrically connected to the conductive pattern and penetrating the insulating layer. The bump may include a low melting point metal layer having a melting point lower than a melting point of the conductive pattern and a high melting point metal layer having a melting point higher than the melting point of the low melting point metal layer and having a latitudinal cross-sectional area smaller than a latitudinal cross-sectional area of the low melting point metal layer.

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