公开(公告)号：US11999868B2

公开(公告)日：2024-06-04

申请号：US17143159

申请日：2021-01-07

Applicant: eChem Solutions Corp.

Inventor： Yu-Wen Chen ,  Yi-Lun Chiu ,  Chia-Hao Lou ,  Chen-Wen Chiu

IPC: C09D4/06 ,  C08F2/50 ,  C08F283/08 ,  C08F290/06 ,  C08G63/197 ,  C08K3/04 ,  C08K3/08 ,  G02B5/20 ,  B82Y20/00 ,  B82Y30/00 ,  B82Y40/00 ,  C08F2/44 ,  C08K3/22

CPC classification number: C09D4/06 ,  C08F2/50 ,  C08F283/08 ,  C08F290/067 ,  C08G63/197 ,  C08K3/04 ,  C08K3/08 ,  G02B5/20 ,  B82Y20/00 ,  B82Y30/00 ,  B82Y40/00 ,  C08F2/44 ,  C08K2003/0881 ,  C08K2003/2237 ,  C08K2201/005 ,  C09K2323/031 ,  C09D4/06 ,  C08F290/067 ,  C08F290/067 ,  C08F222/1006 ,  C08F283/08 ,  C08F222/1006

Abstract: A resin composition and a filter element are provided. The resin composition includes a black coloring agent (A), an ethylenically-unsaturated monomer (B), a solvent (C), a resin (D), and a photoinitiator (E). The black coloring agent (A) includes a titanium black (A-1) and a carbon black (A-2). Based on a total usage amount of 100 parts by weight of the titanium black (A-1) and the carbon black (A-2), a usage amount of the titanium black (A-1) is 50 parts by weight to 75 parts by weight.

公开(公告)号：US20210221946A1

公开(公告)日：2021-07-22

申请号：US17143159

申请日：2021-01-07

Applicant: eChem Solutions Corp.

Inventor： Yu-Wen Chen ,  Yi-Lun Chiu ,  Chia-Hao Lou ,  Chen-Wen Chiu

IPC: C08G63/197 ,  C08F2/50 ,  G02B5/20 ,  C08K3/04 ,  C08K3/08

Abstract: A resin composition and a filter element are provided. The resin composition includes a black coloring agent (A), an ethylenically-unsaturated monomer (B), a solvent (C), a resin (D), and a photoinitiator (E). The black coloring agent (A) includes a titanium black (A-1) and a carbon black (A-2). Based on a total usage amount of 100 parts by weight of the titanium black (A-1) and the carbon black (A-2), a usage amount of the titanium black (A-1) is 50 parts by weight to 75 parts by weight.

公开(公告)号：US20230099041A1

公开(公告)日：2023-03-30

申请号：US17938944

申请日：2022-09-07

Applicant: eChem Solutions Corp.

Inventor： Jui-Yu Hsu ,  Chia-Hao Lou ,  Chen-Wen Chiu

IPC: G03F7/075 ,  G03F7/00

Abstract: A photosensitive resin composition, an optical film and a method of producing the same are provided. The photosensitive resin composition includes a thiol compound (A) having two or more groups represented by formula (I-a), a polyether-modified polysiloxane (B), an ethylenically unsaturated group-containing compound (C) having one or two aromatic rings, a bisphenol fluorene oligomer (D) having one or two (meth)acryloyl groups, and a photoinitiator (E).

公开(公告)号：US20200225581A1

公开(公告)日：2020-07-16

申请号：US16741682

申请日：2020-01-13

Applicant: eChem Solutions Corp.

Inventor： Jui-Yu Hsu ,  Chia-Hao Lou ,  Chen-Wen Chiu

IPC: G03F7/038 ,  G03F7/16 ,  G03F7/004 ,  C08F20/30 ,  C08F20/32 ,  G02B1/04

Abstract: A photosensitive resin composition, an optical film, and a method of producing an optical film are provided. The photosensitive resin composition includes an ethylenically unsaturated group-containing compound (A) having one or two aromatic rings; a bisphenol fluorene oligomer (B) having one or two (meth)acryloyl groups; and a photoinitiator (C), wherein the weight ratio of the ethylenically unsaturated group-containing compound (A) to the bisphenol fluorene oligomer (B) is from 0.50 to 0.95.