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    Colour Switching Temperature Indicator
    111.
    发明申请
    Colour Switching Temperature Indicator 审中-公开
    彩色开关温度指示器

    公开(公告)号：US20080192802A1

    公开(公告)日：2008-08-14

    申请号：US11576906

    申请日：2005-10-07

    Applicant: Eduard Johannes Meijer ,  Rene Theodorus Wegh ,  Ralph Kurt

    Inventor： Eduard Johannes Meijer ,  Rene Theodorus Wegh ,  Ralph Kurt

    IPC: G01K11/00

    CPC classification number: G01K11/12

    Abstract: A temperature indicator (101) is adapted to be provided on a surface (116) for providing a first type of light emission and a second type of light emission (L2). The temperature indicator (101) comprises a light-emitting diode (108) for providing said first type of light emission and a light-emitting electrochemical cell (109) for providing said second type of light emission (L2). The light-emitting electrochemical cell (109) has a first electrode (120), a second electrode (121) and a second light-emitting layer (113) being sandwiched between them and comprising a matrix and ions being movable in the matrix, the mobility of said ions in said matrix being temperature dependent. A power source (105) is adapted for driving the cell (109) with an AC voltage, the frequency of which is tuned in such a way that the cell (109) provides said second type of light emission (L2) when the surface temperature exceeds a certain level.

    Abstract translation: 温度指示器（101）适于设置在用于提供第一类型发光和第二类型发光（L 2）的表面（116）上。 温度指示器（101）包括用于提供所述第一类型发光的发光二极管（108）和用于提供所述第二类型发光（L 2）的发光电化学电池（109）。 发光电化学电池（109）具有第一电极（120），第二电极（121）和夹在它们之间的第二发光层（113），并且包括基质和能够在基体中移动的离子， 所述基质中所述离子的迁移率是温度依赖性的。 电源（105）适于用交流电压驱动电池（109），其频率被调节为使得当电池（109）提供所述第二类型的发光（L 2）时，电池 温度超过一定水平。

    Lithographic apparatus and device manufacturing method
    112.
    发明授权
    Lithographic apparatus and device manufacturing method 失效
    平版印刷设备和器件制造方法

    公开(公告)号：US07405031B2

    公开(公告)日：2008-07-29

    申请号：US10453889

    申请日：2003-06-04

    Applicant: Ralph Kurt

    Inventor： Ralph Kurt

    IPC: G03B27/54 ,  G03B27/32 ,  G03F7/20

    CPC classification number: G21K1/06 ,  G02B1/105 ,  G02B1/113 ,  G02B1/14 ,  G02B5/0891 ,  G03F7/70233 ,  G03F7/70958 ,  G03F7/70983 ,  G21K2201/067

    Abstract: A multi-optical-layer optical element of a lithographic projection apparatus in which at least one optical layer is comprised of an alloy of Mo and Cr. That layer may form the outer most layer of a Mo/Si layer system with an optional protective outer coating of Ru. Furthermore, the multi-optical-layer optical element may be comprised of a plurality of interposed between Mo/Cr alloyed layers.

    Abstract translation: 光刻投影装置的多光学层光学元件，其中至少一个光学层由Mo和Cr的合金组成。 该层可以形成具有Ru的任选的保护性外涂层的Mo / Si层系统的最外层。 此外，多光学层光学元件可以由Mo / Cr合金化层之间的多个介质构成。

    System for copy protection of an information carrier
    113.
    发明申请
    System for copy protection of an information carrier 失效
    信息载体复制保护系统

    公开(公告)号：US20060281013A1

    公开(公告)日：2006-12-14

    申请号：US10554599

    申请日：2004-04-16

    Applicant: Ralph Kurt ,  Robert Hendriks ,  Levinus Bakker

    Inventor： Ralph Kurt ,  Robert Hendriks ,  Levinus Bakker

    IPC: G03H1/04

    CPC classification number: G11B23/281 ,  G06K19/16 ,  G11B7/00772 ,  G11B7/24044 ,  G11B7/24056 ,  G11B7/252 ,  G11B20/00086 ,  G11B20/00123 ,  G11B20/0021 ,  G11B20/00384 ,  G11B20/00876 ,  G11B2020/1288 ,  G11B2220/2541 ,  G11B2220/2591

    Abstract: The present invention relates to a system for copy protection of an information carrier, said system comprising a diffractive layer for delivering a speckle pattern when illuminated by a light source, a spatial filter, which is aligned with respect to the diffractive layer, for delivering a filtered optical signal from the speckle pattern and a detector array for delivering, when illuminated by said filtered optical signal, an electrical signal. Said system further comprises means for computing a cryptographic key from the electrical signal, and means for decrypting encrypted data contained in the information carrier from the cryptographic key. It finds its application in copy protection of content carriers such as optical discs or in smart cards.

    Abstract translation: 本发明涉及一种用于信息载体的复制保护的系统，所述系统包括用于在由光源照射时传送散斑图案的衍射层，相对于衍射层对准的空间滤光器，用于传送 来自散斑图案的经滤波的光信号和用于当由所述滤波的光信号照亮时传送电信号的检测器阵列。 所述系统还包括用于从电信号计算加密密钥的装置，以及用于从加密密钥对包含在信息载体中的加密数据进行解密的装置。 它可以应用于诸如光盘或智能卡等内容载体的复制保护。

    Use of bi-layer photolithographic resists as new material for optical storage
    116.
    发明申请
    Use of bi-layer photolithographic resists as new material for optical storage 审中-公开
    使用双层光刻抗蚀剂作为光学存储的新材料

    公开(公告)号：US20060233999A1

    公开(公告)日：2006-10-19

    申请号：US10539362

    申请日：2003-11-20

    Applicant: Ralph Kurt ,  Andrei Mijiritskii

    Inventor： Ralph Kurt ,  Andrei Mijiritskii

    IPC: G11B7/24

    CPC classification number: G11B7/258 ,  G11B7/2433

    Abstract: An optical information storage medium (1) comprising a carrier substrate (5), a reflective information layer (10) being positioned on the carrier substrate (5) and comprising at least a first layer (11) of a first inorganic material in a first structural phase, and at least a second layer (12) of at least a second inorganic material in at least a second structural phase is disclosed. Alloy inclusions (6) are formed in the information layer (10) upon exposure to a first electromagnetic radiation and have a microstructure comprising a mixture of the first material in the first structural phase and the at least second material in the at least second structural phase. The optical properties of the alloy inclusions are different from the optical properties of the as-deposited information layer so that a modulation in electromagnetic radiation reflected from the alloy inclusions and from an area comprising the as-deposited information layer, respectively, is provided in response to a second electromagnetic radiation being emitted towards the optical information storage medium (1) to provide a read-out signal. A method of manufacturing and reading such a medium are also provided. High density recording/reading at various radiation wavelengths, including UV, and compatibility with standard CD and DVD media is achieved.

    Abstract translation: 一种光学信息存储介质（1），包括载体基板（5），反射信息层（10），其定位在载体基板（5）上，并且包括至少第一层（11）的第一无机材料 公开了在至少第二结构相中的至少第二无机材料的至少第二层（12）。 合金夹杂物（6）在暴露于第一电磁辐射时在信息层（10）中形成，并且具有包含第一结构相中的第一材料和至少第二结构相中的至少第二材料的混合物的微结构 。 合金夹杂物的光学特性与沉积信息层的光学特性不同，从而分别提供从合金夹杂物和包括沉积信息层的区域反射的电磁辐射中的调制 到朝向光学信息存储介质（1）发射的第二电磁辐射以提供读出信号。 还提供了制造和读取这种介质的方法。 实现了在各种辐射波长（包括UV）下的高密度记录/读取以及与标准CD和DVD介质的兼容性。

    Lithographic apparatus and device manufacturing method
    117.
    发明申请
    Lithographic apparatus and device manufacturing method 失效
    平版印刷设备和器件制造方法

    公开(公告)号：US20060215132A1

    公开(公告)日：2006-09-28

    申请号：US11373503

    申请日：2006-03-13

    Applicant: Mark Kroon ,  Michael Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra Owen

    Inventor： Mark Kroon ,  Michael Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra Owen

    IPC: G03B27/52

    CPC classification number: G03F7/70983 ,  G03F7/70808 ,  G03F7/70916 ,  G03F7/70933

    Abstract: A lithographic apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a fluid cleaning system that cleans a fluid to be introduced into a region in between the optical element and the substrate. The fluid cleaning system includes a fluid inlet, a fluid outlet, and a cleaning zone disposed between the inlet and outlet. The cleaning zone includes a nucleated surface provided with a plurality of nucleation sites.

    Abstract translation: 光刻设备包括提供辐射束的辐射系统和支撑图案化结构的支撑结构。 图形结构被配置为根据期望的图案对辐射束进行图案化。 该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。 投影系统包括光学元件，该光学元件具有通过图案化光束通过的每一个的光束出射区域。 该装置还包括清洁被引入到光学元件和基板之间的区域中的流体的流体清洁系统。 流体清洁系统包括流体入口，流体出口和布置在入口和出口之间的清洁区域。 清洁区包括具有多个成核位点的成核表面。

    Lithographic apparatus, device manufacturing method, and device manufactured thereby
    118.
    发明申请
    Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效
    平版印刷设备，器件制造方法和由此制造的器件

    公开(公告)号：US20060176463A1

    公开(公告)日：2006-08-10

    申请号：US11345316

    申请日：2006-02-02

    Applicant: Mark Kroon ,  Michael Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra Owen

    Inventor： Mark Kroon ,  Michael Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra Owen

    IPC: G03B27/72

    CPC classification number: G03F7/70983 ,  G03F7/70808 ,  G03F7/70916 ,  G03F7/70933

    Abstract: A lithographic apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam entry area and an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a nucleated surface that is associated with the projection system on which a plurality of nucleation sites are provided. The surface is disposed away from at least one of the beam entry area and the beam exit area.

    Abstract translation: 公开了一种光刻设备。 该装置包括提供辐射束的辐射系统和支撑图形结构的支撑结构。 图形结构被配置为根据期望的图案对辐射束进行图案化。 该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。 投影系统包括具有光束入射区域的光学元件和具有通过图案化光束通过的每一个的光束出射区域的光学元件。 该装置还包括与投影系统相关联的成核表面，其上设置有多个成核位置。 表面远离光束入射区域和光束出射区域中的至少一个设置。

    Radiation system, contamination barrier, lithographic apparatus, device manufacturing method and device manufactured thereby
    120.
    发明申请
    Radiation system, contamination barrier, lithographic apparatus, device manufacturing method and device manufactured thereby 失效
    辐射系统，污染屏障，光刻设备，器件制造方法和由此制造的器件

    公开(公告)号：US20050077483A1

    公开(公告)日：2005-04-14

    申请号：US10873646

    申请日：2004-06-23

    Applicant: Levinus Bakker ,  Vadim Banine ,  Ralph Kurt ,  Frank Schuurmans ,  Yurii Sidelnikov

    Inventor： Levinus Bakker ,  Vadim Banine ,  Ralph Kurt ,  Frank Schuurmans ,  Yurii Sidelnikov

    IPC: G21K1/00 ,  G03F7/20 ,  G21K1/06 ,  G21K5/02 ,  H01L21/027 ,  H05H1/24 ,  G21G5/00

    CPC classification number: G03F7/70916

    Abstract: A radiation system includes a contamination barrier, e.g., a foil trap, between a collector, for example a normal incidence collector, and a radiation source, such that radiation coming from the source passes the foil trap twice. The radiation passes the contamination barrier once before hitting the collector and a second time after reflection by the collector. The foil trap includes lamellas that are parallel to both the radiation coming from the light source, and to the radiation reflected by the collector. The radiation is thus not obstructed by the foil trap. In this way, a normal incidence collector, which is used with a plasma produced source, can be protected from debris coming from a EUV source.

    Abstract translation: 辐射系统包括在收集器例如正入射收集器和辐射源之间的污染屏障，例如箔阱，使得来自源的辐射通过箔阱两次。 辐射在撞击收集器之前通过污染屏障一次，并在收集器反射之后经过第二次。 箔捕获器包括平行于来自光源的辐射和由收集器反射的辐射的片层。 因此辐射不被箔陷阱阻挡。 以这种方式，可以保护与等离子体产生的源一起使用的正常入射收集器免受来自EUV源的碎片。

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