Abstract:
The present invention provides a continuous process for the production of nitrobenzene by nitration of benzene with mixtures of sulfuric and nitric acid using a stoichiometric excess of benzene, in which the content of aliphatic organic compounds in the feed benzene during the start-up period of the production plant is always maintained at less than 1.5 wt. %, based on the total mass of the feed benzene. This is achieved either by mixing the feed benzene comprising recycled unreacted benzene (recycled benzene) and benzene newly supplied to the reaction (fresh benzene) in appropriate quantitative ratios during the start-up period, depending on the purity of the two streams, or by completely omitting the recycling of unreacted benzene during the start-up period, i.e. the feed benzene consists only of benzene newly supplied to the reaction.
Abstract:
The invention relates to a process for scrubbing a crude mixture comprising dinitrotoluene, nitric acid, nitrogen oxides and sulfuric acid obtained in the nitration of toluene after the nitrating acid has been separated off, which comprises two scrubbing steps (SS-I) and (SS-II), wherein i) in a first scrubbing step (SS-I), the crude mixture is extracted with a scrubbing acid I comprising nitric acid, nitrogen oxides and sulfuric acid in a scrub comprising at least one extraction stage, where the scrubbing acid discharged from the first extraction stage (SS-I-1) of the first scrubbing step (SS-I) has a total acid content of from 20 to 40% by weight and a prescrubbed crude mixture is obtained, ii) in a second scrubbing step (SS-II), the prescrubbed crude mixture comprising dinitrotoluene is extracted with a scrubbing acid II in a scrub comprising at least one extraction stage, where the scrubbing acid discharged from the first extraction stage (SS-II-1) of the second scrubbing step (SS-II) has a pH of less than or equal to 4 and a mixture comprising dinitrotoluene which is essentially free of nitric acid, sulfuric acid and nitrogen oxides is obtained.
Abstract:
An improved preparation process for an aromatic mononitro compound comprising reacting an aromatic compound with mixed acid consisting of nitric acid, sulfuric acid or phosphoric acid and water, wherein these flow to react with each other in a reactor comprising a tube inside of which more than one twisted tabular members are aligned in sequence in a manner that a front margin of a twisted tabular member is substantially perpendicular to an back margin of the preceding member, can resolve a number of problems such as an inadequate mixing efficiency, reduction of a reaction rate, associated voluminal increase/complication of a reactor and difficulty in securing safety as well as provide the aromatic mononitro compound with minimal amount of by-products in a considerably short period.
Abstract:
Opticalls active enantiomers of the formula I ##STR1## where R is a group of the formulae ##STR2## R.sub.1 and R.sub.2, among others, are halogen or CF.sub.3 and Z is a carboxyl, carboxylate, carboxylic acid ester, thioester, carbonamide, carboxylic acid anilide, carbohydrazide or thioamide group, are interesting herbicides the effect of which is considerably superior to that of the optically inactive racemates.
Abstract:
Fungicidal compounds of the formula (I): ##STR1## and stereoisomers thereof, wherein K is oxygen or sulphur; Z is optionally substituted aryl or optionally substituted heteroaryl; X is a specified linking group; and A, B and E, which may be the same or different, are H, hydroxy, halo, C.sub.1-4 alkyl, C.sub.1-4 alkoxy, C.sub.1-4 haloalkyl, C.sub.1-4 haloalkoxy, C.sub.1-4 alkylcarbonyl, C.sub.1-4 alkoxycarbonyl, phenoxy, nitro or cyano; except that when Z is unsubstituted phenyl and X and K are oxygen, A, B and E are not all hydrogen.
Abstract:
Fungicidal compounds of the formula (I): ##STR1## and stereoisomers thereof, wherein R.sup.1 is optionally substituted aryl or optionally substituted heteroaryl; Y is oxygen, sulphur or NR.sup.4 ; R.sup.2, R.sup.3 and R.sup.4, which may be the same or different, are hydrogen, C.sub.1-4 alkyl or C.sub.2-4 alkenyl; X is halogen, C.sub.1-4 alkyl, C.sub.2-4 alkenyl, C.sub.1-4 alkoxy, nitro or cyano; and n is 0 or an integer of 1 to 4; provided that when Y is oxygen, n is 0 and R.sup.1 is unsubstituted phenyl at least one of R.sup.2 and R.sup.3 is other than hydrogen or methyl.
Abstract:
Nitrodiphenyl(thio) ethers in which the nitro group is in the ortho- or para-position with respect to the ether oxygen or ether sulphur can be prepared from halonitrobenzones in which the nitro group is in the ortho- or para-position with respect to the halogen and, alkali metal (thio)phenolates in liquid ammonia, the reaction being carried out under pressure and at a temperature from -30.degree. C. to +140.degree. C. and the ammonia being separated off after the reaction is completed.
Abstract:
This invention relates to derivatives of acrylic acid useful as fungicides, to processes for preparing them, to fungicidal compositions containing them, and to methods of combating fungi, especially fungal infections in plants, using them.
Abstract:
For binding 5-HT.sub.1 receptors and thereby treating central nervous system disorders, novel substituted aminomethyltetralins and their heterocyclic analogues of the formula ##STR1## in which Z--denotes a group of the formula ##STR2## R.sup.1, E and F can be hydrogen or other radicals, or salts thereof.
Abstract:
Selective bromination of alkylarenes to the alpha monobrominated derivative is desirable as a precursor for the selective production of, for example, the corresponding alcohols. The product can be obtained by a photolytic reaction between the substrate, hydrogen peroxide and hydrogen bromide in approximately equimolar ratios in an organic solvent, but improvement in the yield of the product coupled with similar or improved selectivity in its production was either not achieved or was actually impaired by a range of variations in the ratios and by omitting the solvent.The invention employs mole ratios of H.sub.2 O.sub.2 :substrate of 0.1:1 to 0.4:1, preferably 0.2:1 to 0.33:1 and of H.sub.2 O.sub.2 :bromide of 1:1.2 to 1:2, preferably about 1:1.3 to 1:1.8 and progressive introduction of the H.sub.2 O.sub.2, either in the presence or absence of the solvent, while irradiating with light preferably having principal emissions in the range of 250 to 600 nm, and the process thereby achieves either or both of improved yield and improved selectivity of the alpha monobrominated product. The reaction mixture is preferably maintained at 50.degree. to 70.degree. C. The process is especially suitable for deactivated alkylarenes, such as o-nitrotoluene.