Abstract:
The invention relates to a photocathode for the infra-red range having a plurality of layers of semi-conductive and conductive material. The photocathode is transparent and sensitive in a spectral range of between approx. 1 and 20 .mu.m. This is achieved by the following layer structure:p.sub.1 : a highly doped p-layern.sub.2 : a highly doped n-layeri.sub.3 : an intrinsic layerp.sub.4 : a highly doped p-layerm.sub.5 : a thin metal layer, preferably of an atomic layer of Cs.The spectral sensitivity can be adjusted by applying a negative bias voltage to the layer p.sub.1 with respect to the layer P.sub.4. When this happens, the Fermi level of the layer p.sub.2 is shifted and the work function of the electrons is reduced.
Abstract:
A vitreous semiconductor supporting structure obtained by connecting semiconductor layers to a vitreous support constituted by at least two glasses. The semiconductor layers are constituted by an electrically and optically active n-ary III-V compound layer (3) and optional complementary layers for passivation (4), index adaptation (6), and protection (7). To keep the active layer in a compression state and optimize its electrical properties, the structure includes at least two glasses, an intermediate glass (15) providing thermoelastic properties and a supporting glass (16) providing a high softening temperature.
Abstract:
The photosensitivity of a photomultiplier dynode to white light or infrared radiation is greatly reduced by coating the dynode with a layer of an alkali halide material having good secondary electron emission characteristics. A method of applying the coating to the dynode is also described.
Abstract:
An electron emitting device including an active semiconductor layer having a surface from which electrons are emitted. The layer is doped with impurity atoms at a density which decreases with distance from the surface.
Abstract:
A method of forming a variable sensitivity transmission mode negative eleon affinity (NEA) photocathode in which the sensitivity of the photocathode to white or monochromatic light can be varied by varying the backsurface recombination velocity of the photoemitting material with an electric field. The basic structure of the photocathode is comprised of a Group III-V element photoemitter on a larger bandgap Group III-V element window substrate.
Abstract:
A transmission photodetector operable at wavelengths greater than 0.86 micrometers comprising a substrate transparent to the radiation to be detected, at least one epitaxial intermediate layer comprising (Ga.sub.1-x Al.sub.x).sub.1-y In.sub.y As and an epitaxial p-type Ga.sub.1-y In.sub.y As detector layer. The said one intermediate layer may be p-type. If desired a second epitaxial intermediate layer comprising (Ga.sub.1-x Al.sub.x).sub.1-z In.sub.z As may be provided between the substrate and the said one intermediate layer. In the foregoing 0
Abstract:
Semiconductor photoelectron emission device comprising mixed crystals of two or more different semiconductors forming a heterojunction with direct transition type defining a first region in which may be excited by photoelectrons and an indirect transition type defining a second region whose forbidden band gap is wider than that of the first region and the surface of which is a photoelectron emission surface.
Abstract:
A method of producing a tunnel emitter photocathode consisting of heating aemiconductor layer and then depositing a layer of aluminum oxide on one side thereof at a rapid rate and then baking out the wafer in a hydrogen gas atmosphere. After depositing electrical contacts on each side of the wafer, a metallic emitter layer is evaporated over the aluminum oxide layer with the metallic emitter layer treated with a low work function material such as cesium and oxygen to further increase the emission efficiency.
Abstract:
A cold cathode for an image-type tube such as a vidicon. The cathode features a negative electron affinity surface and a field enhanced electron ejection method. The photons generate electron-hole pairs in a compound semi-conductor structure having Group III and Group V compounds to form a heterojunction.
Abstract:
Group III-V compound substrates are heat cleaned under vacuum conditions by heating above their congruent temperature and subjecting the substrate to at least one molecular beam of the material preferentially evaporating from the substrate thereby maintaining surface stoichiometry. Surfaces so cleaned may then have an epitaxial layer grown thereon under similiar conditions from molecular beams. Alternatively the cleaned surface may be coated with cesium and oxygen to form a photocathode.