Nanotweezer and scanning probe microscope equipped with nanotweezer
    11.
    发明授权
    Nanotweezer and scanning probe microscope equipped with nanotweezer 有权
    Nanotweezer和扫描探针显微镜配备了纳米晶体

    公开(公告)号:US07849515B2

    公开(公告)日:2010-12-07

    申请号:US11791262

    申请日:2005-11-22

    Abstract: A nanotweezer (1) according to the present invention includes: a supporting member (25); an observation probe (10) that projects out from the supporting member (25), and is used when observing a surface of a specimen; a movable arm (20) that is arranged next to the observation probe (10) projecting out from the supporting member (25), and makes closed or opened between the observation probe (10) and the movable arm (20) to hold or release the specimen held between the observation probe (10) and the movable arm (20); and a drive mechanism that drives the movable arm (20) so as to make closed or opened between the observation probe (10) and the movable arm (20), and the supporting member (25), the observation probe (10) and the movable arm (20) are each formed by processing a semiconductor wafer (30) through a photolithography process.

    Abstract translation: 根据本发明的纳米锥体(1)包括:支撑构件(25); 观察探针(10),其从所述支撑构件(25)伸出,并且在观察所述试样的表面时使用; 设置在从所述支撑部件(25)突出的所述观察用探针(10)的旁边的可动臂(20),并且在所述观察探针(10)与所述可动臂(20)之间封闭或打开以保持或释放 所述试样保持在所述观察探针(10)和所述可动臂(20)之间; 以及驱动机构,其驱动所述可动臂(20)以在所述观察探针(10)和所述可动臂(20)之间关闭或打开,所述支撑部件(25),所述观察探针(10)和 可移动臂(20)各自通过通过光刻工艺处理半导体晶片(30)而形成。

    PRISMATIC SILICON AND METHOD OF PRODUCING SAME
    12.
    发明申请
    PRISMATIC SILICON AND METHOD OF PRODUCING SAME 审中-公开
    专利硅及其生产方法

    公开(公告)号:US20100129610A1

    公开(公告)日:2010-05-27

    申请号:US12530063

    申请日:2007-05-14

    CPC classification number: H01L21/30608 C30B29/06 C30B33/08 Y10T428/2457

    Abstract: Silicon in prismatic shape is produced by using a silicon wafer with (110) surface and sequentially carrying out an alignment configuration forming step for forming alignment configurations having surfaces that are along two (111) surfaces perpendicular to a substrate surface inside the silicon wafer, a primary anisotropic etching step for forming perpendicular walls having wall surfaces aligned to one of these (111) surfaces, and a secondary anisotropic etching step for forming silicon in the prismatic shape having wall surfaces aligned to the other of these (111) surfaces with respect to the perpendicular walls.

    Abstract translation: 通过使用具有(110)表面的硅晶片并且顺序地进行用于形成具有与硅晶片内的衬底表面垂直的两个(111)表面的表面的对准配置的对准配置来制造棱柱形状的硅, 用于形成具有与这些(111)表面之一对准的壁表面的垂直壁的主要各向异性蚀刻步骤,以及用于形成具有与这些(111)表面中的另一个对准的壁表面的棱形形状的硅的次级各向异性蚀刻步骤相对于 垂直的墙壁。

    NANO-GRIPPER AND METHOD OF PRODUCING SAME
    13.
    发明申请
    NANO-GRIPPER AND METHOD OF PRODUCING SAME 审中-公开
    NANO-GRIPPER及其生产方法

    公开(公告)号:US20080061031A1

    公开(公告)日:2008-03-13

    申请号:US11927976

    申请日:2007-10-30

    Abstract: The nano-gripper of the present invention comprises (i) a pair of arms 71 and 71 disposed side by side, each arm 71 having a face at its front end, the front-end faces of the arms 71 and 71 facing each other, (ii) and a protrusion 72 with a tip formed on the front-end face of each arm, the tips of the protrusions 72 and 72 facing each other, the radius of curvature of each tip being 50 nanometers or less. Each protrusion 72 is a triangular-pyramidal silicon crystal with (001), (100), and (111) side faces.

    Abstract translation: 本发明的纳米夹具包括(i)并排设置的一对臂71和71,每个臂71在其前端具有面,臂71和71的彼此面对的前端面, (ii)和突出部72,其顶端形成在每个臂的前端面上,突出部72和72的前端彼此面对,每个尖端的曲率半径为50纳米或更小。 每个突起72是具有(001),(100)和(111)侧面的三角锥体硅晶体。

    Nano-gripper and method of producing same
    14.
    发明授权
    Nano-gripper and method of producing same 有权
    纳米夹具及其制造方法

    公开(公告)号:US07322622B2

    公开(公告)日:2008-01-29

    申请号:US10834564

    申请日:2004-04-28

    Abstract: The nano-gripper of the present invention comprises (i) a pair of arms 71 and 71 disposed side by side, each arm 71 having a face at its front end, the front-end faces of the arms 71 and 71 facing each other, (ii) and a protrusion 72 with a tip formed on the front-end face of each arm, the tips of the protrusions 72 and 72 facing each other, the radius of curvature of each tip being 50 nanometers or less. Each protrusion 72 is a triangular-pyramidal silicon crystal with (001), (100), and (111) side faces.

    Abstract translation: 本发明的纳米夹具包括(i)并排设置的一对臂71和71,每个臂71在其前端具有面,臂71和71的彼此面对的前端面, (ii)和突出部72,其顶端形成在每个臂的前端面上,突出部72和72的前端彼此面对,每个尖端的曲率半径为50纳米或更小。 每个突起72是具有(001),(100)和(111)侧面的三角锥体硅晶体。

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