中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

20 records (took 0.025 seconds)

    Method of preparing components, prepared component, lithographic apparatus and device manufacturing method
    11.
    发明申请
    Method of preparing components, prepared component, lithographic apparatus and device manufacturing method 失效
    制备组分，制备组分，光刻设备和器件制造方法的方法

    公开(公告)号：US20050008978A1

    公开(公告)日：2005-01-13

    申请号：US10840508

    申请日：2004-05-07

    Applicant: Johannes Adrianus Antonius Dams ,  Mark Kroon ,  Harm-Jan Voorma ,  Carolus Ida Maria Spee

    Inventor： Johannes Adrianus Antonius Dams ,  Mark Kroon ,  Harm-Jan Voorma ,  Carolus Ida Maria Spee

    IPC: G03F7/20 ,  H01L21/027 ,  G03C5/00

    CPC classification number: G03F7/70983 ,  G03F7/70916

    Abstract: A method of preparing components for use in a vacuum chamber of a lithographic apparatus is disclosed. The method includes coating the component with a non-metallic material. The method may further include treating the coating so as to harden the coating. Preferably, the coating material is a hydrogen silsesquioxane (HSQ), which may be applied via spraying, brushing, or spinning and can be treated by heating or by irradiation with an electron beam. The resulting components strongly reduce outgassing of water and hydrocarbons when subjected to a vacuum environment.

    Abstract translation: 公开了一种制备用于光刻设备的真空室中的组件的方法。 该方法包括用非金属材料涂覆该组分。 该方法还可以包括处理涂层以使涂层硬化。 优选地，涂层材料是氢倍半硅氧烷（HSQ），其可以通过喷涂，刷涂或纺丝施加，并且可以通过加热或通过用电子束的照射进行处理。 所产生的组分在经受真空环境时强烈地减少了水和烃的除气。

    Lithographic apparatus, device manufacturing method and variable attenuator
    18.
    发明授权
    Lithographic apparatus, device manufacturing method and variable attenuator 失效
    光刻设备，器件制造方法和可变衰减器

    公开(公告)号：US07145640B2

    公开(公告)日：2006-12-05

    申请号：US10805526

    申请日：2004-03-22

    Applicant: Harm-Jan Voorma ,  Antonius Johannes Josephus Van Dijsseldonk ,  Uwe Mickan

    Inventor： Harm-Jan Voorma ,  Antonius Johannes Josephus Van Dijsseldonk ,  Uwe Mickan

    IPC: G03B27/72 ,  G03B27/42 ,  G03B27/54

    CPC classification number: G03F7/70558

    Abstract: A lithographic apparatus includes an illumination system for providing a projection beam of radiation, a support structure for supporting patterning structure for imparting a pattern to the projection beam, a substrate table for holding a wafer and a projection system for projecting the patterned beam onto a target portion of the wafer. In order to permit control of the radiation dose at the wafer so that the throughput of wafers can be optimised, a variable attenuator is provided to vary the intensity of the projection beam while not changing the position of the beam. The variable attenuator includes two parallel mirrors positioned such that an input beam of radiation is incident on a first of the mirrors by which it is reflected towards a second of the mirrors by which the beam is reflected to produce an output beam of radiation of required intensity for input to the illumination system, and a tilting mechanism for tilting the mirrors such that the mirrors remain parallel to one another and the angles of incidence of the beams on the mirrors are changed so as to vary the intensity of the output beam. This allows the intensity of the projection beam to be varied continuously without changing the position of the beam, whether the input beam is converging, diverging or parallel.

    Abstract translation: 光刻设备包括用于提供投射辐射束的照明系统，用于支撑用于将投影光束赋予图案的图形结构的支撑结构，用于保持晶片的基板台和用于将图案化光束投影到目标上的投影系统 部分晶片。 为了允许控制晶片上的辐射剂量，从而可以优化晶片的生产量，可以提供可变衰减器来改变投射光束的强度，同时不改变光束的位置。 可变衰减器包括两个平行的反射镜，其被定位成使得输入的辐射束入射在第一反射镜上，通过该反射镜被反射到第二反射镜，通过该反射镜反射光束以产生所需强度的辐射输出束 用于输入到照明系统，以及倾斜机构，用于倾斜反射镜，使得反射镜保持彼此平行，并且改变反射镜上的光束的入射角度，以便改变输出光束的强度。 这允许投影光束的强度连续变化而不改变光束的位置，无论输入光束是会聚，发散还是平行。

    Lithographic apparatus, device manufacturing method, and device manufactured thereby
    19.
    发明授权
    Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
    平版印刷设备，器件制造方法和由此制造的器件

    公开(公告)号：US07098994B2

    公开(公告)日：2006-08-29

    申请号：US10758270

    申请日：2004-01-16

    Applicant: Johannes Hubertus Josephina Moors ,  Uwe Mickan ,  Harm-Jan Voorma ,  Johannes Christiaan Leonardus Franken

    Inventor： Johannes Hubertus Josephina Moors ,  Uwe Mickan ,  Harm-Jan Voorma ,  Johannes Christiaan Leonardus Franken

    IPC: G03B27/72 ,  G03B27/52 ,  G03B27/54

    CPC classification number: B82Y10/00 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70891

    Abstract: A lithographic apparatus includes an illumination system for providing a beam of radiation, a support structure for supporting a patterning device, the patterning device serving to impart the beam with a pattern in its cross-section. The apparatus further includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and a collector which is arranged for transmitting radiation, received from a first radiation source, to the illumination system. The apparatus includes at least a heater for heating the collector when the collector receives substantially no radiation from the first radiation source. Further aspects of the invention relate to a device manufacturing method as well as a device manufactured thereby.

    Abstract translation: 光刻设备包括用于提供辐射束的照明系统，用于支撑图案形成装置的支撑结构，所述图案形成装置用于在其横截面中赋予光束图案。 该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统以及被布置成用于将从第一辐射源接收的辐射传送到照明系统的收集器。 当收集器基本上不接收来自第一辐射源的辐射时，该装置至少包括用于加热集电器的加热器。 本发明的其它方面涉及一种装置制造方法以及由此制造的装置。

    Method for exposing a substrate, patterning device, and lithographic apparatus
    20.
    发明申请
    Method for exposing a substrate, patterning device, and lithographic apparatus 审中-公开
    曝光基板，图案形成装置和光刻装置的方法

    公开(公告)号：US20050134820A1

    公开(公告)日：2005-06-23

    申请号：US10740830

    申请日：2003-12-22

    Applicant: Heine Mulder ,  Antonius Johannes Van Dijsseldonk ,  Erik Loopstra ,  Uwe Mickan ,  Johannes Catharinus Mulkens ,  Harm-Jan Voorma

    Inventor： Heine Mulder ,  Antonius Johannes Van Dijsseldonk ,  Erik Loopstra ,  Uwe Mickan ,  Johannes Catharinus Mulkens ,  Harm-Jan Voorma

    IPC: G03B27/54 ,  G03F7/20

    CPC classification number: G03F7/70075 ,  G03F7/701 ,  G03F7/70425 ,  G03F7/70566

    Abstract: A method using a lithographic apparatus comprising a reflective integrator is claimed that optimizes the exposure of features on a target area of a substrate, when the features make an angle between 5 and 85 degrees with respect to the target area. The method comprises rotating the reflective integrator with respect to the target area providing a rotated mirror-symmetric pupil shape, which is implemented by either rotating the substrate or rotating the reflective integrator with respect to the machine or the patterning device. The patterning device comprises a maximum usable area and a patterned area which are rotated with respect to each other if a rotated substrate is employed. The method can be used in single exposure or double exposure mode. A further advantage of the method of using a rotated wafer is that it can be used for exposing features on a substrate in any direction even when the projection system of the lithographic apparatus shows a preferred polarization direction.

    Abstract translation: 要求使用包括反射积分器的光刻设备的方法，当特征相对于目标区域形成5至85度的角度时，可优化基板目标区域上的特征的曝光。 该方法包括使反射积分器相对于目标区域旋转，从而提供旋转的对称瞳孔形状，其通过旋转基底或相对于机器或图案形成装置旋转反射积分器来实现。 如果使用旋转的衬底，则图案形成装置包括相对于彼此旋转的最大可用面积和图案化区域。 该方法可用于单次曝光或双曝光模式。 使用旋转晶片的方法的另一个优点是，即使当光刻设备的投影系统显示优选的偏振方向时，其可以用于在任何方向上曝光衬底上的特征。

Patent Agency Ranking