公开(公告)号：US06734970B2

公开(公告)日：2004-05-11

申请号：US10224391

申请日：2002-08-21

Applicant: Hexin Wang

Inventor： Hexin Wang

IPC: G01B1100

CPC classification number: G01N33/385 ,  G01N33/386

Abstract: A method and a device for determining the resistance of an optical material to radiation damage, wherein several sample volumes (1a, 1b; 1211-1233) within the optical material are simultaneously irradiated with test radiation having differing, measured or preset radiant-energy densities. The radiation employed for all sample volumes comes from a common radiation source (3; 13) and at least one parameter indicative of the resistances to radiation damage of the irradiated sample volumes is measured using measuring radiation. The measuring radiation also comes from the same radiation source that supplies the test radiation and the material's resistance to radiation damage is determined based on a functional relation between its radiation-damage-resistance parameter and the radiant-energy densities, wherein that functional relation is determined using the values of the radiation-damage-resistance parameters measured for the various sample volumes for the various radiant-energy densities employed. Such a method and device have application, e.g., in determining the resistances of CaF2 and other optical materials to damage by ultraviolet laser radiation.

Abstract translation: 一种用于确定光学材料对辐射损伤的电阻的方法和装置，其中光学材料内的几个样本体积（1a，1b; 1211-1233）同时用具有不同的，测量的或预设的辐射能量密度的测试辐射同时照射 。 用于所有样品体积的辐射源自共同的辐射源（3; 13），并且使用测量辐射来测量指示辐照样品体积的辐射损伤的电阻的至少一个参数。 测量辐射也来自提供测试辐射的相同的辐射源，并且基于其辐射损伤抗性参数和辐射能量密度之间的函数关系来确定材料对辐射损伤的抵抗力，其中该功能关系被确定 使用为各种样品体积测量的各种辐射能量密度测量的辐射损伤抗力参数的值。 这种方法和装置具有例如在确定CaF 2和其它光学材料对紫外激光辐射损坏的电阻的应用。