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公开(公告)号：US11267694B2
公开(公告)日：2022-03-08
申请号：US16928851
申请日：2020-07-14
Applicant: Stichting VU-VUMC , FOM-Nikhef
Inventor： Eric Hennes , Alessandro Bertolini , Johannes Franciscus Van Den Brand
IPC: B81B3/00 , G01P15/13 , G01P15/08 , G01P15/09 , G01P15/125
Abstract: A MEMS sensor comprising preloaded suspension springs and a method for mechanically preloading suspension springs of a MEMS sensor are described. The MEMS sensor comprises a MEMS support structure; a plurality of suspension springs connected to said support structure; and, a proof mass flexibly suspended by said suspension springs; wherein at least one of said suspension springs is mechanically preloaded with a compressive force for reducing the natural frequency of said proof mass.
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公开(公告)号：US20210102185A1
公开(公告)日：2021-04-08
申请号：US17048284
申请日：2019-04-18
Applicant: Stichting VU
Inventor： Tom Norbert Grossmann , Marta Pelay Gimeno , Sven Hennig , Saskia Antonie Neubacher
IPC: C12N9/52 , C12N15/113
Abstract: The present invention relates to methods and cross-linkers for the macrocyclization of proteins. The invention is useful for increasing the stability of a protein.
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13.发明申请公开(公告)号：US20200232931A1
公开(公告)日：2020-07-23
申请号：US16751104
申请日：2020-01-23
Applicant: ASML Netherlands B.V. , Stichting Nederlandse Wetenschappelijk Onderzoek Instituten , Stichting VU , Universiteit van Amsterdam
Inventor： Stefan Michiel WITTE , Gijsbert Simon Matthijs JANSEN , Lars Christian FREISEM , Kjeld Sijbrand Eduard EIKEMA , Simon Gijsbert Josephus MATHIJSSEN
Abstract: A metrology apparatus (302) includes a higher harmonic generation (HHG) radiation source for generating (310) EUV radiation. Operation of the HHG source is monitored using a wavefront sensor (420) which comprises an aperture array (424, 702) and an image sensor (426). A grating (706) disperses the radiation passing through each aperture so that the image detector captures positions and intensities of higher diffraction orders for different spectral components and different locations across the beam. In this way, the wavefront sensor can be arranged to measure a wavefront tilt for multiple harmonics at each location in said array. In one embodiment, the apertures are divided into two subsets (A) and (B), the gratings (706) of each subset having a different direction of dispersion. The spectrally resolved wavefront information (430) is used in feedback control (432) to stabilize operation of the HGG source, and/or to improve accuracy of metrology results.
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公开(公告)号：US10660068B2
公开(公告)日：2020-05-19
申请号：US14896610
申请日：2014-06-06
Applicant: Stichting VU-VUMC , FOM-Nikhef
Abstract: A method for managing communication in a wireless mesh network comprising a plurality of wireless nodes and a wireless node for use in such network are described, wherein said method may comprise: providing a time slot schedule (frame), preferably a TDMA time slot schedule (frame), comprising one or more time slots, including a transmission time slot enabling a node to transmit a broadcast message, a reception time slot enabling a node to receive a broadcast message from one or more other nodes; and/or a sleep time slot for configuring said node in an idle state; and, assigning said time slots to nodes in said network on the basis of the position of said nodes in said network.
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15.发明申请公开(公告)号：US20200041563A1
公开(公告)日：2020-02-06
申请号：US16527142
申请日：2019-07-31
Applicant: Stichting VU
Inventor： Patricius Aloysius Jacobus TINNEMANS , Patrick WARNAAR , Vasco Tomas Tenner , Maurits Van der schaar
IPC: G01R31/265
Abstract: Disclosed is a method for obtaining a computationally determined interference electric field describing scattering of radiation by a pair of structures comprising a first structure and a second structure on a substrate. The method comprises determining a first electric field relating to first radiation scattered by the first structure; determining a second electric field relating to second radiation scattered by the second structure; and computationally determining the interference of the first electric field and second electric field, to obtain a computationally determined interference electric field.
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Patent Agency Ranking
16.发明申请公开(公告)号：US20190107781A1
公开(公告)日：2019-04-11
申请号：US16150879
申请日：2018-10-03
Applicant: Stichting VU , Stichting Nederlandse Wetenschappelijk Onderzoek Instituten , Universiteit van Amsterdam , ASML Netherlands B.V.
Inventor： Patricius Aloysius Jacobus TINNEMANS , Arie Jeffrey Den Boef , Armand Eugene Albert Koolen , Nitesh Pandey , Vasco Tomas Tenner , Willem Marie Julia Marcel Coene , Patrick Warnaar
Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.
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公开(公告)号：US20170322215A1
公开(公告)日：2017-11-09
申请号：US15528322
申请日：2015-11-18
Applicant: Stichting Katholieke Universiteit , Stichting VU-Vumc
IPC: G01N33/574 , G01N33/74 , C07K14/71 , C12Q1/68
CPC classification number: G01N33/5748 , A61K2039/505 , C07K14/71 , C07K16/2863 , C12Q1/6883 , C12Q1/6886 , C12Q2600/106 , C12Q2600/156 , G01N33/574 , G01N33/74 , G01N2333/71
Abstract: The present invention relates to the fields of medicine and molecular diagnostics. In particular, it relates to a novel method for the treatment, prevention and/or delay of cancer and to a diagnostic method involving detection of a novel auto-active and intracellular mutant of MET.
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公开(公告)号：US20170269482A1
公开(公告)日：2017-09-21
申请号：US15453049
申请日：2017-03-08
Applicant: Stichting VU , Universiteit van Amsterdam , Stichting voor Fundamenteel Onderzoek der Materie , ASML Netherlands B.V.
IPC: G03F7/20 , G01B11/00 , G01N21/956 , G01N21/47
CPC classification number: G03F7/7065 , G01B11/00 , G01N21/4788 , G01N21/956 , G01N2201/061 , G01N2201/0635 , G02B21/16 , G03F7/70625 , G03F7/70633 , H05G2/003 , H05G2/008
Abstract: In an inspection apparatus, a target on the surface is illuminated with illuminating radiation that comprises first and second illuminating components. The illuminating components form one or more periodic illuminating patterns on the surface. A plurality of scattered radiation patterns formed by the illuminating radiation after scattering by the target is captured at a detector for a number of values of a controllable characteristic of at least one of the illuminating components. The captured radiation is then used to reconstruct data describing the target.
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公开(公告)号：US20160305945A1
公开(公告)日：2016-10-20
申请号：US15102075
申请日：2014-12-02
Applicant: Stichting VU-VUmc
IPC: G01N33/574 , G01N15/14 , G01N33/50
CPC classification number: G01N33/57426 , G01N15/14 , G01N33/5011 , G01N33/5073 , G01N33/57492 , G01N2015/0065 , G01N2015/1006 , G01N2015/149 , G01N2800/52
Abstract: The present invention relates to a method for identifying Leukemic stem cells (LSC), based on measurement of the presence of a specific set of markers. The invention further relates to a container for use in performing the method. Also provided is application of the method for predicting response to therapy and/or chance of relapse of Acute Myeloid Leukemia, and application of the method in the context of screening for compounds that specifically eradicate Leukemic cells and not benign cells.
Abstract translation: 本发明涉及一种用于鉴别白血病干细胞（LSC）的方法，该方法是基于特定标记物组的存在的测量。 本发明还涉及一种用于执行该方法的容器。 还提供了预测对急性骨髓性白血病的治疗反应和/或复发机率的方法的应用，以及在筛选特异性根除白血病细胞而不是良性细胞的化合物的上下文中应用该方法。
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20.发明申请公开(公告)号：US20150234170A1
公开(公告)日：2015-08-20
申请号：US14424700
申请日：2013-08-27
Applicant: STICHTING VU-VUMC
Inventor： Stefan Michiel Witte , Kjeld Sijbrand Eduard Eikema
CPC classification number: G02B21/367 , G02B21/06 , G02B21/16 , G02B21/365 , G03F7/70616
Abstract: A microscopic imaging apparatus to provide an image of a sample. The apparatus includes an illumination system to provide an illumination beam with radiation; and a sensor constructed and arranged to receive: a first image of a first diffraction pattern created by diffraction of the illumination beam on the sample; and a second image of a second diffraction pattern created by diffraction of the illumination beam on the sample.
Abstract translation: 一种用于提供样品图像的显微成像装置。 该装置包括用于向辐射提供照明光束的照明系统; 以及传感器，被构造和布置成接收：通过所述样品上的所述照射光束的衍射而产生的第一衍射图案的第一图像; 以及由样品上的照明光束衍射产生的第二衍射图案的第二图像。
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