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公开(公告)号：US11919071B2
公开(公告)日：2024-03-05
申请号：US17451716
申请日：2021-10-21
Applicant: 6K Inc.
CPC classification number: B22F1/065 , B22F1/05 , B22F9/14 , B22F2202/13 , B22F2302/20 , B22F2304/10
Abstract: Disclosed herein are embodiments of systems and method for processing feedstock materials using microwave plasma processing. Specifically, the feedstock materials disclosed herein pertain to metal powders. Microwave plasma processing can be used to spheroidize the metal powders and form metal nitride or metal carbide powders. The stoichiometry of the metal nitride or metal carbide powders can be controlled by changing the composition of the plasma gas and the residence time of the feedstock materials during plasma processing.
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公开(公告)号：US11590568B2
公开(公告)日：2023-02-28
申请号：US17124284
申请日：2020-12-16
Applicant: 6K Inc.
Inventor： Sunil Bhalchandra Badwe , Scott Joseph Turchetti , Makhlouf Redjdal
Abstract: Disclosed herein are embodiments of methods, devices, and assemblies for processing feedstock materials using microwave plasma processing. Specifically, the feedstock materials disclosed herein pertains to scrap materials, dehydrogenated or non-hydrogenated feed material, recycled used powder, and gas atomized powders. Microwave plasma processing can be used to spheroidize and remove contaminants. Advantageously, microwave plasma processed feedstock can be used in various applications such as additive manufacturing or powdered metallurgy (PM) applications that require high powder flowability.
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公开(公告)号：US20220134431A1
公开(公告)日：2022-05-05
申请号：US17451716
申请日：2021-10-21
Applicant: 6K Inc.
Abstract: Disclosed herein are embodiments of systems and method for processing feedstock materials using microwave plasma processing. Specifically, the feedstock materials disclosed herein pertain to metal powders. Microwave plasma processing can be used to spheroidize the metal powders and form metal nitride or metal carbide powders. The stoichiometry of the metal nitride or metal carbide powders can be controlled by changing the composition of the plasma gas and the residence time of the feedstock materials during plasma processing.
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公开(公告)号：US20210146432A1
公开(公告)日：2021-05-20
申请号：US16950729
申请日：2020-11-17
Applicant: 6K Inc.
Inventor： Sunil Bhalchandra Badwe , Scott Joseph Turchetti , Makhlouf Redjdal
Abstract: Disclosed herein are embodiments of methods, devices, and assemblies for processing feedstock materials using microwave plasma processing. Specifically, the feedstock materials disclosed herein pertains to unique powder feedstocks such as Tantalum, Yttrium Stabilized Zirconia, Aluminum, water atomized alloys, Rhenium, Tungsten, and Molybdenum. Microwave plasma processing can be used to spheroidize and remove contaminants. Advantageously, microwave plasma processed feedstock can be used in various applications such as additive manufacturing or powdered metallurgy (PM) applications that require high powder flowability.
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