公开(公告)号：US20170219930A1

公开(公告)日：2017-08-03

申请号：US15502466

申请日：2015-06-25

Applicant: ASML Netherlands B.V.

Inventor： Günes NAKIBOGLU ,  Suzanne Johanna Antonetta Geertruda GOSIJNS ,  Anne Willemijn Bertine QUIST ,  Lukasz SOSNIAK ,  Frank Johannes Jacobus VAN BOXTEL ,  Engelbertus Antonius Fransiscu VAN DER PASCH

IPC: G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70775 ,  G03F7/709

Abstract: A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.

公开(公告)号：US20170160653A1

公开(公告)日：2017-06-08

申请号：US15325987

申请日：2015-06-08

Applicant: ASML Netherlands B.V.

Inventor： Günes NAKIBOGLU ,  Frank Johannes Jacobus VAN BOXTEL ,  Thomas Petrus Hendricus WARMERDAM ,  Jan Steven Christiaan WESTERLAKEN ,  Johannes Pieter KROES

IPC: G03F7/20

CPC classification number: G03F7/70933 ,  G03F7/70716 ,  G03F7/70858 ,  G03F7/70866

Abstract: A lithographic apparatus including: a projection system with an optical axis; an enclosure with an ambient gas; and a physical component accommodated in the enclosure, wherein: the lithographic apparatus is configured to cause the physical component to undergo movement relative to the enclosure, in a predetermined direction and in a plane perpendicular to the optical axis; the lithographic apparatus is configured to let the physical component maintain a predetermined orientation with respect to the enclosure during the movement; the movement induces a flow of the ambient gas relative to the component; the physical component has a surface oriented perpendicularly to the optical axis; the component includes a flow direction system configured to direct the flow of ambient gas away from the surface.

公开(公告)号：US20250021022A1

公开(公告)日：2025-01-16

申请号：US18682883

申请日：2021-07-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Tiannan GUAN ,  Zhuangxiong HUANG ,  Johannes Bernardus Charles ENGELEN ,  Günes NAKIBOGLU ,  Matthias KRUIZINGA ,  Petrus Jacobus Maria VAN GILS ,  Aldo TRALLI ,  Sjoerd Frans DE VRIES ,  Marcel Maria Cornelius Franciscus TEUNISSEN ,  Richard Joseph BRULS ,  Frits VAN DER MEULEN

IPC: G03F7/00

Abstract: The invention relates to an electrostatic holder comprising: a body, and a clamping element attached to the body, said clamping element comprising an electrode for applying an attractive force between the clamping element and a first to be clamped object, wherein an outer edge of the body is configured to provide a gap between the outer edge of the body and the first to be clamped object, which gap is configured for outputting a fluid for reducing dust particles reaching the first to be clamped object or a second to be clamped object on an opposite side of the holder.

公开(公告)号：US20200183287A1

公开(公告)日：2020-06-11

申请号：US15779804

申请日：2016-11-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Günes NAKIBOGLU ,  Coen Hubertus Matheus BALTIS ,  Siegfried Alexander TROMP ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Bert Dirk SCHOLTEN ,  Daan Daniel Johannes Antonius VAN SOMMEREN ,  Mark Johannes Hermanus FRENCKEN

IPC: G03F7/20 ,  H01L21/687 ,  H01L21/027

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.

公开(公告)号：US20200166845A1

公开(公告)日：2020-05-28

申请号：US16061553

申请日：2016-12-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Christianus Wilhelmus Johannes BERENDSEN ,  Günes NAKIBOGLU ,  Daan Daniel Johannes Antonius VAN SOMMEREN ,  Gijsbert RISPENS ,  Johan Franciscus Maria BECKERS ,  Theodorus Johannes Antonius RENCKENS

IPC: G03F7/20 ,  G03F7/16

Abstract: A method of processing a substrate includes: providing a substrate with a layer of photosensitive material on a surface of the substrate; and removing at least part of the photosensitive material from around an outer edge of the layer of photosensitive material so as to generate an edge, having a radial width, around the layer of photosensitive material remaining on the surface of the substrate, wherein the photosensitive material varies in thickness forming a thickness profile across the radial width and the removing is controlled so as to generate variation in the thickness profile along the length of the edge, and/or wherein the removing is controlled so as to generate a rough edge around the layer of photosensitive material remaining on the surface of the substrate.

公开(公告)号：US20190196345A1

公开(公告)日：2019-06-27

申请号：US16289875

申请日：2019-03-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Laurentius Johannes Adrianus VAN BOKHOVEN ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Günes NAKIBOGLU ,  Marinus Jan REMIE ,  Johan Gertrudis Cornelis KUNNEN

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70716 ,  G03F7/70783 ,  G03F7/70858 ,  G03F7/70933

Abstract: An apparatus and method for controlling temperature of a patterning device in a lithographic apparatus, by flowing gas across the patterning device. A patterning apparatus includes: a patterning device support structure configured to support a patterning device; a patterning device conditioning system including a first gas outlet configured to provide a gas flow over a surface of the patterning device and a second gas outlet configured to provide a gas flow over a part of a surface of the patterning device support structure not supporting the patterning device; and a control system configured to separately control the temperature of the gas exiting the first and second gas outlets such that the gas exiting the second gas outlet is at a higher temperature than the gas exiting the first gas outlet and/or to separately control the temperature and gas flow rate of the gas exiting the first and second gas outlets.

公开(公告)号：US20180364584A1

公开(公告)日：2018-12-20

申请号：US15781813

申请日：2016-11-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Daan Daniel Johannes Antonius VAN SOMMEREN ,  Coen Hubertus Matheus BALTIS ,  Harold Sebastiaan BUDDENBERG ,  Giovanni Luca GATTOBIGIO ,  Johannes Cornelis Paulus MELMAN ,  Günes NAKIBOGLU ,  Theodorus Wilhelmus POLET ,  Walter Theodorus Matheus STALS ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Josephus Peter VAN LIESHOUT ,  Jorge Alverto VIEYRA SALAS ,  Aleksandar Nikolov ZDRAVKOV

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70716

Abstract: A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface, wherein at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.

公开(公告)号：US20180239258A1

公开(公告)日：2018-08-23

申请号：US15959115

申请日：2018-04-20

Applicant: ASML Netherlands B.V.

Inventor： Günes NAKIBOGLU ,  Suzanne Johanna Antonetta Geertruda COSIJNS ,  Anne Willemijn Bertine QUIST ,  Lukasz SOSNIAK ,  Frank Johannes Jacobus VAN BOXTEL ,  Engelbertus Antonius Fransiscus VAN DER PASCH

IPC: G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70775 ,  G03F7/709

Abstract: A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.