-
公开(公告)号：US20170242347A1
公开(公告)日：2017-08-24
申请号：US15448438
申请日：2017-03-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Christiaan Alexander HOOGENDAM , Antonius Theodorus Anna Maria DERKSEN , Sjoerd Nicolaas Lambertus DONDERS , Joeri LOF , Erik Roelof LOOPSTRA , Johannes Catharinus Hubertus MULKENS , Hans JANSEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Alexander STRAAIJER , Bob STREEFKERK
IPC: G03F7/20
CPC classification number: G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
-
公开(公告)号：US20150356233A1
公开(公告)日：2015-12-10
申请号：US14730993
申请日：2015-06-04
Applicant: ASML NETHERLANDS B.V.
Inventor： Christophe David FOUQUET , Bernardo KASTRUP , Arie Jeffrey DEN BOEF , Johannes Catharinus Hubertus MULKENS , James Benedict KAVANAGH , James Patrick KOONMEN , Neal Patrick CALLAN
CPC classification number: G06F17/5081 , G03F7/705 , G03F7/70525 , G03F7/7065 , G06F17/5009 , G06N7/005 , H01L22/20
Abstract: Disclosed herein is a computer-implemented defect prediction method for a device manufacturing process involving processing a portion of a design layout onto a substrate, the method comprising: identifying a hot spot from the portion of the design layout; determining a range of values of a processing parameter of the device manufacturing process for the hot spot, wherein when the processing parameter has a value outside the range, a defect is produced from the hot spot with the device manufacturing process; determining an actual value of the processing parameter; determining or predicting, using the actual value, existence, probability of existence, a characteristic, or a combination thereof, of a defect produced from the hot spot with the device manufacturing process.
Abstract translation: 这里公开了一种用于设备制造过程的计算机实现的缺陷预测方法，该方法涉及将设计布局的一部分处理到衬底上，所述方法包括：从所述设计布局的所述部分中识别热点; 确定所述热点的装置制造过程的处理参数的值的范围，其中当所述处理参数具有超出所述范围的值时，通过所述装置制造过程从所述热点产生缺陷; 确定处理参数的实际值; 使用设备制造过程从热点产生的缺陷确定或预测使用实际值存在，存在概率，特性或其组合。
-
公开(公告)号：US20150338748A1
公开(公告)日：2015-11-26
申请号：US14816997
申请日：2015-08-03
Applicant: ASML NETHERLANDS B.V.
Inventor： Christiaan Alexander HOOGENDAM , Antonius Theodorus Anna Maria DERKSEN , Sjoerd Nicolaas Lambertus DONDERS , Joeri LOF , Erik Roelof LOOPSTRA , Johannes Catharinus Hubertus MULKENS , Hans JANSEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Alexander STRAAIJER , Bob STREEFKERK
IPC: G03F7/20
CPC classification number: G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
Abstract translation: 光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统，被配置为向所述投影系统和所述基板之间的空间提供液体; 以及快门，被配置为隔离所述基板的空间或被基板占据的空间。
-
公开(公告)号：US20200225590A1
公开(公告)日：2020-07-16
申请号：US16707525
申请日：2019-12-09
Applicant: ASML NETHERLANDS B.V.
Inventor： Joeri LOF , Erik Theodorus Maria BIJLAART , Hans BUTLER , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Aleksey Yurievich KOLESNYCHENKO , Erik Roelof LOOPSTRA , Hendricus Johannes Maria MEIJER , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Roelof Aeilko Siebrand RITSEMA , Frank VAN SCHAIK , Timotheus Franciscus SENGERS , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Bob STREEFKERK , Helmar VAN SANTEN , Antonius Theodorus Anna Maria DERKSEN , Hans JANSEN , Jacobus Johannus Leonardus Hendricus VERSPAY
IPC: G03F7/20
Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
-
公开(公告)号：US20190214318A1
公开(公告)日：2019-07-11
申请号：US16328319
申请日：2017-08-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Mark John MASLOW , Johannes Catharinus Hubertus MULKENS , Peter TEN BERGE , Franciscus VAN DE MAST , Jan-Willem GEMMINK , Liesbeth REIJNEN
IPC: H01L21/66 , G03F7/36 , G03F7/20 , H01L21/311 , H01L21/67
CPC classification number: H01L22/20 , G03F7/36 , G03F7/70616 , G03F7/70683 , H01L21/31105 , H01L21/31144 , H01L21/67253
Abstract: A substrate, including a substrate layer; and an etchable layer on the substrate layer, the etchable layer including a patterned region thereon or therein and including a blank region of sufficient size to enable a bulk etch rate of an etch tool for etching the blank region to be determined.
-
Patent Agency Ranking
公开(公告)号：US20180307135A1
公开(公告)日：2018-10-25
申请号：US15769338
申请日：2016-09-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Peter TEN BERGE , Everhardus Cornelis MOS , Richard Johannes Franciscus VAN HAREN , Peter Hanzen WARDENIER , Erik JENSEN , Bernardo KASTRUP , Michael KUBIS , Johannes Catharinus Hubertus MULKENS , Davis Frans Simon DECKERS , Wolfgang Helmut HENKE , Joungchel LEE
CPC classification number: G03F1/72 , G03B27/68 , G03F7/70425 , G03F7/705 , G03F7/70625 , G03F7/70633
Abstract: A method including obtaining a measurement and/or simulation result of a pattern after being processed by an etch tool of a patterning system, determining a patterning error due to an etch loading effect based on the measurement and/or simulation result, and creating, by a computer system, modification information for modifying a patterning device and/or for adjusting a modification apparatus upstream in the patterning system from the etch tool based on the patterning error, wherein the patterning error is converted to a correctable error and/or reduced to a certain range, when the patterning device is modified according to the modification information and/or the modification apparatus is adjusted according to the modification information.
-
公开(公告)号：US20180299770A1
公开(公告)日：2018-10-18
申请号：US15769337
申请日：2016-09-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Peter TEN BERGE , Johannes Catharinus Hubertus MULKENS , Bernardo KASTRUP , Richard Johannes Franciscus VAN HAREN
Abstract: A method including identifying that an area of a first substrate includes a hotspot based on a measurement and/or simulation result pertaining to a patterning device in a patterning system, determining first error information at the hotspot, and creating first modification information for modifying the patterning device (e.g., the information to be transmitted with the patterning device to a patterning modification tool) based on the first error information to obtain a modified patterning device.
-
公开(公告)号：US20180129143A1
公开(公告)日：2018-05-10
申请号：US15862604
申请日：2018-01-04
Applicant: ASML NETHERLANDS B.V.
Inventor： Christiaan Alexander HOOGENDAM , Antonius Theodorus Anna Maria DERKSEN , Sjoerd Nicolaas Lambertus DONDERS , Joeri LOF , Erik Roelof LOOPSTRA , Johannes Catharinus Hubertus MULKENS , Hans JANSEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Alexander STRAAIJER , Bob STREEFKERK
IPC: G03F7/20
Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
-
公开(公告)号：US20170205714A1
公开(公告)日：2017-07-20
申请号：US15479084
申请日：2017-04-04
Applicant: ASML NETHERLANDS B.V.
Inventor： Johannes Catharinus Hubertus MULKENS , Bob STREEFKERK
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/2041 , G03F7/70058 , G03F7/70108 , G03F7/70225 , G03F7/70358 , G03F2007/2067
Abstract: In an embodiment, a lithographic projection apparatus has an off-axis image field and a concave refractive lens as the final element of the projection system. The concave lens can be cut-away in parts not used optically to prevent bubbles from being trapped under the lens.
-
公开(公告)号：US20170045830A1
公开(公告)日：2017-02-16
申请号：US15338116
申请日：2016-10-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Christiaan Alexander HOOGENDAM , Bob STREEFKERK , Johannes Catharinus Hubertus MULKENS , Erik Theodorus Maria BIJLAART , Aleksey Yurievich KOLESNYCHENKO , Erik Roelof LOOPSTRA , Jeroen Johannes Sophia Maria MERTENS , Bernardus Antonius SLAGHEKKE , Patricius Aloysius Jacobus TINNEMANS , Helmar VAN SANTEN
IPC: G03F7/20
CPC classification number: G03F7/70866 , G03F7/70341 , G03F7/70808
Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
Abstract translation: 通过入口将液体供给到投影系统和基板之间的空间。 在一个实施例中，溢流区域去除高于给定水平的液体。 溢流区域可以布置在入口的上方，因此液体可以不断刷新，并且液体中的压力可能保持基本恒定。
-
-
-
-
-
-
-
-
-
Search Results
43
records
(took 0.022 seconds)
