公开(公告)号：US20200117097A1

公开(公告)日：2020-04-16

申请号：US16716568

申请日：2019-12-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus JEUNINK ,  Laurentius Johannes Adrianus Van Bokhoven ,  Stan Henricus Van Der Meulen ,  Yang-Shan Huang ,  Federico La Torre ,  Bearrach Moest ,  Stefan Carolus Jacobus Antonius Keij ,  Enno Van Den Brink ,  Christine Henriette Schouten ,  Hoite Pieter Theodoor Tolsma

IPC: G03F7/20 ,  G03F1/64 ,  G03F1/62

Abstract: A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.

公开(公告)号：US10571814B2

公开(公告)日：2020-02-25

申请号：US16318191

申请日：2017-06-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus Jeunink ,  Laurentius Johannes Adrianus Van Bokhoven ,  Stan Henricus Van Der Meulen ,  Yang-Shan Huang ,  Federico La Torre ,  Bearrach Moest ,  Stefan Carolus Jacobus Antonius Keij ,  Enno Van Den Brink ,  Christine Henriette Schouten ,  Hoite Pieter Theodoor Tolsma

IPC: G03F7/20 ,  G03F1/62 ,  G03F1/64

Abstract: A lithographic apparatus has a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.

公开(公告)号：US10394139B2

公开(公告)日：2019-08-27

申请号：US16090713

申请日：2017-03-08

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Güneş Nak{dot over (i)}bo{hacek over (g)}lu ,  Lowell Lane Baker ,  Ruud Hendrikus Martinus Johannes Bloks ,  Hakki Ergün Cekli ,  Geoffrey Alan Schultz ,  Laurentius Johannes Adrianus Van Bokhoven ,  Frank Johannes Jacobus Van Boxtel ,  Jean-Philippe Xavier Van Damme ,  Christopher Charles Ward

IPC: G03F7/20

Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.

公开(公告)号：US10222713B2

公开(公告)日：2019-03-05

申请号：US16061043

申请日：2016-11-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Laurentius Johannes Adrianus Van Bokhoven ,  Ruud Hendrikus Martinus Johannes Bloks ,  Günes Nakiboglu ,  Marinus Jan Remie ,  Johan Gertrudis Cornelis Kunnen

IPC: G03F7/20

Abstract: An apparatus and method for controlling temperature of a patterning device in a lithographic apparatus, by flowing gas across the patterning device. A patterning apparatus includes: a patterning device support structure configured to support a patterning device; a patterning device conditioning system including a first gas outlet configured to provide a gas flow over a surface of the patterning device and a second gas outlet configured to provide a gas flow over a part of a surface of the patterning device support structure not supporting the patterning device; and a control system configured to separately control the temperature of the gas exiting the first and second gas outlets such that the gas exiting the second gas outlet is at a higher temperature than the gas exiting the first gas outlet and/or to separately control the temperature and gas flow rate of the gas exiting the first and second gas outlets.

公开(公告)号：US09939740B2

公开(公告)日：2018-04-10

申请号：US15116794

申请日：2015-01-20

Applicant: ASML Netherlands B.V.

Inventor： Günes Nakiboglu ,  Martijn Van Baren ,  Frank Johannes Jacobus Van Boxtel ,  Koen Cuypers ,  Jeroen Gerard Gosen ,  Laurentius Johannes Adrianus Van Bokhoven

IPC: B60R1/06 ,  G03B27/52 ,  G03B27/58 ,  G03B27/62 ,  H02K41/02 ,  G03F7/20

CPC classification number: G03F7/70858 ,  G03F7/70358 ,  G03F7/70716 ,  G03F7/70908

Abstract: A lithographic apparatus including a barrier system and a device manufacturing method using such a lithographic apparatus. The barrier system is used to maintain a protected volume of gas within a barrier. The protected volume may be maintained when different components of the lithographic apparatus move relative to each other. The barrier system may be used in different locations within the lithographic apparatus. The geometry of the barrier affects how efficiently the protected volume is maintained, especially at high speeds. The geometry reduces the amount of ambient gas entering the protected volume from outside the barrier.