公开(公告)号：US20140293251A1

公开(公告)日：2014-10-02

申请号：US14305110

申请日：2014-06-16

Applicant: ASML Netherlands B.V.

Inventor： Hans Butler ,  Robertus Johannes Marinus De Jongh ,  Hendrik Koevoets ,  Marco Hendrikus Hermanu Oude Nijhuis ,  Robertus Leonardus Tousain ,  Marc Wilhelmus Maria Van Der Wijst ,  Cornelius Adrianus Lambertus De Hoon

IPC: G03F9/00

CPC classification number: G03F9/7096 ,  G03F7/70516 ,  G03F7/7055

Abstract: A projection system is provided that includes a sensor system that measures at least one parameter that relates to the physical deformation of a frame that supports the optical elements within the projection system, and a control system that, based on the measurements from the sensor system, determines an expected deviation of the position of the beam of radiation projected by the projection system that is caused by the physical deformation of the frame.

Abstract translation: 提供一种投影系统，该投影系统包括测量与支撑投影系统内的光学元件的框架的物理变形有关的至少一个参数的传感器系统;以及控制系统，其基于来自传感器系统的测量结果， 确定由框架的物理变形引起的由投影系统投射的辐射束的位置的预期偏差。

公开(公告)号：US10114299B2

公开(公告)日：2018-10-30

申请号：US15311544

申请日：2015-05-07

Applicant: ASML Netherlands B.V.

Inventor： Günes Nakiboglu ,  Mark Constant Johannes Baggen ,  Gerard Johannes Boogaard ,  Nicolaas Rudolf Kemper ,  Sander Kerssemakers ,  Robertus Mathijs Gerardus Rijs ,  Frank Johannes Jacobus Van Boxtel ,  Erwin Antonius Henricus Franciscus Van Den Boogaert ,  Marc Wilhelmus Maria Van Der Wijst ,  Martinus Van Duijnhoven ,  Jessica Henrica Anna Verdonschot ,  Hendrikus Herman Marie Cox

IPC: G10K11/168 ,  G03F7/20 ,  G10K11/16

Abstract: A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber (100) in communication with the compartment and a perforated plate (101), having a plurality of through-holes (102), between the chamber and the compartment.

公开(公告)号：US09696630B2

公开(公告)日：2017-07-04

申请号：US14852952

申请日：2015-09-14

Applicant: ASML Netherlands B.V. ,  Carl Zeiss SMT GmbH

Inventor： Marc Wilhelmus Maria Van Der Wijst ,  Hans Butler ,  Erik Roelof Loopstra ,  Bernhard Geuppert ,  Marco Hendrikus Hermanus Oude Nijhuis ,  Rodolfo Guglielmi Rabe ,  Yim Bun Patrick Kwan ,  Dick Antonius Hendrikus Laro

IPC: G03F7/20 ,  F16F15/02 ,  F16F15/08

CPC classification number: G03F7/70141 ,  F16F15/022 ,  F16F15/08 ,  G03F7/708 ,  G03F7/709

Abstract: Lithography apparatus and device manufacturing methods are disclosed in which means are provided for reducing the extent to which vibrations propagate between a first element of a projection system and a second element of a projection system. Approaches disclosed include the use of plural resilient members in series as part of a vibration isolation system, plural isolation frames for separately supporting first and second projection system frames, and modified connection positions for the interaction between the first and second projection system frames and the isolation frame(s).

公开(公告)号：US09494869B2

公开(公告)日：2016-11-15

申请号：US14357530

申请日：2012-12-05

Applicant: ASML Netherlands B.V.

Inventor： Hans Butler ,  Arno Jan Bleeker ,  Pieter Renaat Maria Hennus ,  Martinus Hendricus Henricus Hoeks ,  Sven Antoin Johan Hol ,  Harmen Klaas Van Der Schoot ,  Bernardus Antonius Slaghekke ,  Patricius Aloysius Jacobus Tinnemans ,  Marc Wilhelmus Maria Van Der Wijst ,  Koen Jacobus Johannes Maria Zaal ,  Theodorus Petrus Maria Cadee ,  Ruud Antonius Catharina Maria Beerens ,  Olof Martinus Josephus Fischer ,  Wilhelmus Henricus Theodorus Maria Aangenent ,  Niels Johannes Maria Bosch

IPC: G03B27/32 ,  G03B27/44 ,  G03B27/54 ,  H02K5/24 ,  G03F7/20

CPC classification number: G03F7/70258 ,  G03F7/70275 ,  G03F7/70366 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70558 ,  G03F7/70816 ,  G03F7/709

Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.

Abstract translation: 一种曝光装置，包括：投影系统，被配置为将多个辐射束投影到目标上; 至少可绕轴旋转的可移动框架; 以及致动器系统，其构造成将可移动框架移动到远离与可移动框架的几何中心对应的轴线的轴线上，并使框架围绕通过框架的质心的轴线旋转。