公开(公告)号：US09798253B2

公开(公告)日：2017-10-24

申请号：US15306676

申请日：2015-03-25

Applicant: ASML Netherlands B.V.

Inventor： Daan Daniel Johannes Antonius Van Sommeren ,  Thomas Poiesz

IPC: G03F7/20 ,  H01L21/67 ,  H01L21/687

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70866 ,  H01L21/67028 ,  H01L21/67051 ,  H01L21/6875

Abstract: A support table having: a base surface configured to be substantially parallel to a lower surface of a substrate, a plurality of burls each having a respective distal end and a first height above the base surface, the burls arranged to support the substrate by the respective distal ends, and a plurality of elongate raised protrusions protruding above the base surface, each elongate raised protrusion having a second height above the base surface that is less than the first height. The base surface has a plurality of regions within each of which some of the elongate raised protrusions are located. All of the elongate raised protrusions located within each region have substantially the same direction of elongation such that they are substantially parallel to each other so as to form between the elongate raised protrusions at least one gas flow path substantially parallel to the elongate raised protrusions.

公开(公告)号：US11187998B2

公开(公告)日：2021-11-30

申请号：US16761608

申请日：2018-10-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Abraham Alexander Soethoudt ,  Thomas Poiesz

IPC: G03F7/20 ,  H01L21/683

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member; and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.

公开(公告)号：US20210072649A1

公开(公告)日：2021-03-11

申请号：US16952371

申请日：2020-11-19

Applicant: ASML Netherlands B.V.

Inventor： Thomas Poiesz ,  Bert Dirk Scholten ,  Dirk Willem Harberts ,  Lucas Henricus Johannes Stevens ,  Laura Maria Fernandez Diaz ,  Johannes Adrianus Cornelis M Pijnenburg ,  Abraham Alexander Soethoudt ,  Wilhelmus Jacobus Johannes Welters ,  Jimmy Matheus Wilhelmus Van De Winkel

IPC: G03F7/20

Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.

公开(公告)号：US10768535B2

公开(公告)日：2020-09-08

申请号：US16722397

申请日：2019-12-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus Jeunink ,  Robbert De Jong ,  Martinus Hendrikus Antonius Leenders ,  Evelyn Wallis Pacitti ,  Thomas Poiesz ,  Frank Pieter Albert Van Den Berkmortel

IPC: G03B27/52 ,  G03F7/20

Abstract: A support apparatus configured to support an object, the support apparatus includes a support body including an object holder to hold an object; an opening in the support body adjacent to an edge of the object holder; a channel in fluid communication with the opening via each of a plurality of passageways in the support body; and a passageway liner mounted in at least one of the plurality of passageways, the passageway liner being thermally insulating to substantially thermally decouple the support body from fluid in the at least one of the plurality of passageways.

公开(公告)号：US20200142317A1

公开(公告)日：2020-05-07

申请号：US16722397

申请日：2019-12-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus JEUNINK ,  Robert De Jong ,  Martinus Hendrikus Antonius Leenders ,  Evelyn Wallis Pacitti ,  Thomas Poiesz ,  Frank Pieter Albert Van Den Berkmortel

IPC: G03F7/20

Abstract: A support apparatus configured to support an object, the support apparatus includes a support body including an object holder to hold an object; an opening in the support body adjacent to an edge of the object holder; a channel in fluid communication with the opening via each of a plurality of passageways in the support body; and a passageway liner mounted in at least one of the plurality of passageways, the passageway liner being thermally insulating to substantially thermally decouple the support body from fluid in the at least one of the plurality of passageways.

公开(公告)号：US10599053B2

公开(公告)日：2020-03-24

申请号：US16511867

申请日：2019-07-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Abraham Alexander Soethoudt ,  Thomas Poiesz

IPC: G03B27/58 ,  G03F7/20 ,  B01D53/34 ,  B01D53/56 ,  B01D53/79 ,  B05B13/02 ,  B05B13/04 ,  F23J15/00 ,  B05B15/656 ,  B05B15/68 ,  B05B13/06

Abstract: A lithographic apparatus includes a support table and a gas extraction system. The gas extraction system is configured to extract gas from a gap between the base surface of the support table and a substrate through at least one gas extraction opening when the substrate is being lowered onto the support table. The lithographic apparatus is configured such that gas is extracted from the gap at a first loading flow rate when the distance between the substrate and the support plane is greater than a threshold distance and gas is extracted from the gap at a second loading flow rate when the distance between the substrate and the support plane is less than the threshold distance, wherein the second loading flow rate is lower than the first loading flow rate.

公开(公告)号：US11953837B2

公开(公告)日：2024-04-09

申请号：US17423818

申请日：2019-11-05

Applicant: ASML Netherlands B.V.

Inventor： Thomas Poiesz ,  Michel Ben Isel Habets ,  Abraham Alexander Soethoudt ,  Herman Marquart

IPC: G03F7/00

CPC classification number: G03F7/70783 ,  G03F7/70033

Abstract: The present invention provides a testing substrate (W) for estimating stress in production substrates due to a substrate support, said testing substrate having a support surface (SS) divided into predefined portions, wherein the predefined portions comprise at least one first portion (1) having a first coefficient of friction being substantially uniform across the at least one first portion, and at least one second portion (2) having a second coefficient of friction being substantially uniform across the at least one second portion, wherein the second coefficient of friction is different to the first coefficient of friction. The present invention also provides a method for estimating stress in a substrate due to a substrate support and a system for making such an estimation.

公开(公告)号：US11664264B2

公开(公告)日：2023-05-30

申请号：US16075754

申请日：2016-12-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus Jeunink ,  Robby Franciscus Josephus Martens ,  Youssef Karel Maria De Vos ,  Ringo Petrus Cornelis Van Dorst ,  Gerhard Albert Ten Brinke ,  Dirk Jerome Andre Senden ,  Coen Hubertus Matheus Baltis ,  Justin Johannes Hermanus Gerritzen ,  Jelmer Mattheüs Kamminga ,  Evelyn Wallis Pacitti ,  Thomas Poiesz ,  Arie Cornelis Scheiberlich ,  Bert Dirk Scholten ,  André Schreuder ,  Abraham Alexander Soethoudt ,  Siegfried Alexander Tromp ,  Yuri Johannes Gabriël Van De Vijver

IPC: H01L21/683 ,  H01L21/687 ,  G03F7/20 ,  B25B11/00

CPC classification number: H01L21/6838 ,  B25B11/005 ,  G03F7/707 ,  G03F7/70733 ,  H01L21/68742

Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.

公开(公告)号：US11086234B2

公开(公告)日：2021-08-10

申请号：US16758917

申请日：2018-10-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Thomas Poiesz ,  Satish Achanta ,  Jeroen Bouwknegt ,  Abraham Alexander Soethoudt

IPC: G03B27/58 ,  G03F7/20

Abstract: A substrate holder, a method of manufacturing of the substrate holder and a lithographic apparatus having the substrate holder. In one arrangement, a substrate holder is for use in a lithographic apparatus. The substrate holder is configured to support a lower surface of a substrate. The substrate holder has a main body, a plurality of burls and a coating. The main body has a substrate-facing face. The plurality of burls protrudes from the substrate-facing face. Each burl has a distal end configured to engage with the substrate. The distal ends are configured for supporting the substrate. The coating is on the substrate-facing face between the burls. Between the burls the substrate-facing face has an arrangement of areas. Adjacent areas are separated by a step-change in distance below the support plane. Each step-change is greater than a thickness of the coating.

公开(公告)号：US09939736B2

公开(公告)日：2018-04-10

申请号：US15111455

申请日：2014-11-20

Applicant: ASML Netherlands B.V.

Inventor： Martijn Houben ,  Thomas Poiesz

IPC: G03F7/20 ,  H01L21/687 ,  H01L21/683

CPC classification number: G03F7/707 ,  G03F7/70783 ,  H01L21/6831 ,  H01L21/68742 ,  H01L21/6875

Abstract: A substrate table supports a substrate holder to which a substrate is clamped for exposure. The substrate table has a plurality of e-pins spaced apart from and distributed around the center of the substrate holder to receive, and lower, a substrate onto the substrate holder prior to exposure, and to raise a substrate off the substrate holder after exposure. Tip portions of the e-pins and the corresponding apertures in the substrate holder have a shape in plan including at least one re-entrant, e.g. a cross shape.