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公开(公告)号：US20160061750A1
公开(公告)日：2016-03-03
申请号：US14838268
申请日：2015-08-27
Applicant: Vrije Universiteit Amsterdam , Universiteit van Amsterdam , Stichting voor Fundamenteel Onderzoek der Materie , ASML Netherlands B.V.
Inventor： Arie Jeffrey DEN BOEF , Simon Gijsbert Josephus MATHIJSSEN , Nitesh PANDEY , Stefan Michiel WITTE , Kjeld EIKEMA
IPC: G01N21/956 , G03F7/20 , G01B11/00
CPC classification number: G01N21/956 , G01B11/00 , G01N2201/12 , G03F7/70141 , G03F7/70625 , G03F7/70633 , G03F7/70641 , G03H1/0443 , G03H2001/0033 , G03H2001/0204 , G03H2001/0458
Abstract: Metrology targets are formed on a substrate (W) by a lithographic process. A target (T) comprising one or more grating structures is illuminated with spatially coherent radiation under different conditions. Radiation (650) diffracted by from said target area interferes with reference radiation (652) interferes with to form an interference pattern at an image detector (623). One or more images of said interference pattern are captured. From the captured image(s) and from knowledge of the reference radiation a complex field of the collected scattered radiation at the detector. A synthetic radiometric image (814) of radiation diffracted by each grating is calculated from the complex field. From the synthetic radiometric images (814, 814′) of opposite portions of a diffractions spectrum of the grating, a measure of asymmetry in the grating is obtained. Using suitable targets, overlay and other performance parameters of the lithographic process can be calculated from the measured asymmetry.
Abstract translation: 通过光刻工艺在基板（W）上形成计量目标。 包括一个或多个光栅结构的靶（T）在不同条件下被空间相干辐射照射。 从参考辐射（652）干涉的所述目标区域衍射的辐射（650）干扰以在图像检测器（623）处形成干涉图案。 捕获所述干涉图案的一个或多个图像。 从捕获的图像和参考辐射的知识中，在检测器处收集的散射辐射的复杂场。 从复场计算由每个光栅衍射的辐射的合成辐射图像（814）。 从光栅的衍射光谱的相对部分的合成辐射图像（814,814'）获得光栅中的不对称度。 使用合适的目标，可以从测量的不对称性计算光刻过程的覆盖层和其他性能参数。
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公开(公告)号：US20240012332A1
公开(公告)日：2024-01-11
申请号：US18038601
申请日：2021-11-12
Applicant: ASML Netherlands B.V.
Inventor： Luc Roger Simonne HASPESLAGH , Nitesh PANDEY , Ties Wouter VAN DER WOORD , Halil Gökay YEGEN , Guilherme BRONDANI TORRI , Sebastianus Adrianus GOORDEN , Alexander Ludwig KLEIN , Jim Vincent OVERKAMP , Edgar Alberto OSORIO OLIVEROS
CPC classification number: G03F7/70116 , G02B26/0858 , H02N2/108 , H02N2/009 , H10N30/50 , H10N30/05 , G03F7/70625 , G03F7/7015 , G03F7/706849
Abstract: A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one multilayer piezoelectric actuator for displacing the mirror, wherein the at least one multilayer piezoelectric actuator is connected to the substrate, and wherein the at least one multilayer piezoelectric actuator comprises a plurality of piezoelectric layers of piezoelectric material interleaved with a plurality of electrode layers to form a stack of layers. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.
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13.发明申请公开(公告)号：US20210003924A1
公开(公告)日：2021-01-07
申请号：US17022910
申请日：2020-09-16
Applicant: ASML Netherlands B.V.
Inventor： Patricius Aloysius Jacobus TINNEMANS , Arie Jeffrey DEN BOEF , Armand Eugene Albert KOOLEN , Nitesh PANDEY , Vasco Tomas TENNER , Willem Marie Julia Marcel COENE , Patrick WARNAAR
Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.
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公开(公告)号：US20200089135A1
公开(公告)日：2020-03-19
申请号：US16470905
申请日：2017-11-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Sebastianus Adrianus GOORDEN , Nitesh PANDEY , Duygu AKBULUT , Alessandro POLO , Simon Reinald HUISMAN
Abstract: Disclosed is a metrology sensor system, such as a position sensor. The system comprises an optical collection system configured to collect diffracted or scattered radiation from a metrology mark on a substrate, said collected radiation comprising at least one parameter-sensitive signal and noise signal which is not parameter-sensitive, a processing system operable to process the collected radiation; and a module housing. An optical guide is provided for guiding the at least one parameter-sensitive signal, separated from the noise signal, from the processing system to a detection system outside of the housing. A detector detects the separated at least one parameter-sensitive signal. An obscuration for blocking zeroth order radiation and/or a demagnifying optical system may be provided between the optical guide and the detector.
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15.发明申请公开(公告)号：US20200081340A1
公开(公告)日：2020-03-12
申请号：US16556709
申请日：2019-08-30
Applicant: ASML Netherlands B.V.
Inventor： Nitesh PANDEY
Abstract: Disclosed is a method and associated inspection apparatus for measuring a characteristic of interest relating to a structure on a substrate. The inspection apparatus uses measurement radiation comprising a plurality of wavelengths. The method comprises performing a plurality of measurement acquisitions of said structure, each measurement acquisition being performed using measurement radiation comprising a different subset of the plurality of wavelengths, to obtain a plurality of multiplexed measurement signals. The plurality of multiplexed measurement signals are subsequently de-multiplexed into signal components according to each of said plurality of wavelengths, to obtain a plurality of de-multiplexed measurement signals which are separated according to wavelength.
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Patent Agency Ranking
公开(公告)号：US20190383602A1
公开(公告)日：2019-12-19
申请号：US16548981
申请日：2019-08-23
Applicant: ASML Netherlands B.V.
Inventor： Nitesh PANDEY
Abstract: Measurement system comprising a radiation source configured to generate a measurement radiation beam, a polarizer and a grating to receive the measurement radiation beam and provide a polarized measurement radiation beam patterned by the grating, optics to form an image of the grating at a target location on a substrate. The image comprises a first part having a first polarization and a second part having a second polarization, detection optics to receive radiation from the target location of the substrate and form an image of the grating image at a second grating, and a detector to receive radiation transmitted through the second grating and produce a two output signal indicative of the intensity of the transmitted radiation for the first and second parts of the grating image respectively. Topography of the substrate can be determined from the signals.
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17.发明申请公开(公告)号：US20190285993A1
公开(公告)日：2019-09-19
申请号：US16428215
申请日：2019-05-31
Applicant: ASML NETHERLANDS B.V.
Inventor： Nitesh PANDEY , Jin LIAN , Samee Ur REHMAN , Martin Jacobus Johan JAK
Abstract: Methods and apparatuses for measuring a plurality of structures formed on a substrate are disclosed. In one arrangement, a method includes obtaining data from a first measurement process. The first measurement process including individually measuring each of the plurality of structures to measure a first property of the structure. A second measurement process is used to measure a second property of each of the plurality of structures. The second measurement process includes illuminating each structure with radiation having a radiation property that is individually selected for that structure using the measured first property for the structure.
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公开(公告)号：US20190113852A1
公开(公告)日：2019-04-18
申请号：US16159080
申请日：2018-10-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Janneke RAVENSBERGEN , Duygu AKBULUT , Nitesh PANDEY , Jin LIAN
CPC classification number: G03F7/70633 , G01B9/02083 , G01B9/0209 , G03F7/70625
Abstract: A metrology apparatus is disclosed that has an optical system to focus radiation onto a structure and directs redirected radiation from the structure to a detection system. The optical system applies a plurality of different offsets of an optical characteristic to radiation before and/or after redirected by the structure, such that a corresponding plurality of different offsets are provided to redirected radiation derived from a first point of a pupil plane field distribution relative to redirected radiation derived from a second point of the pupil plane field distribution. The detection system detects a corresponding plurality of radiation intensities resulting from interference between the redirected radiation derived from the first point of the pupil plane field distribution and the redirected radiation derived from the second point of the pupil plane field distribution. Each radiation intensity corresponds to a different one of the plurality of different offsets.
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19.发明申请公开(公告)号：US20180364591A1
公开(公告)日：2018-12-20
申请号：US16061209
申请日：2016-11-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Robert John SOCHA , Arie Jeffrey DEN BOEF , Nitesh PANDEY
IPC: G03F7/20 , G01N21/956 , G01N21/88 , G01B11/27
Abstract: A method of adjusting a metrology apparatus, the method including: spatially dividing an intensity distribution of a pupil plane of the metrology apparatus into a plurality of pixels; and reducing an effect of a structural asymmetry in a target on a measurement by the metrology apparatus on the target, by adjusting intensities of the plurality of pixels.
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公开(公告)号：US20180267415A1
公开(公告)日：2018-09-20
申请号：US15764617
申请日：2016-09-06
Applicant: ASML Netherlands B.V.
Inventor： Nitesh PANDEY , Arie Jeffrey DEN BOEF , Heine Melle MULDER , Willem Richard PONGERS , Paulus Antonius Andreas TEUNISSEN
IPC: G03F9/00
CPC classification number: G03F9/7084 , G03F7/70258 , G03F9/7049 , G03F9/7076 , G03F9/7092
Abstract: A topography measurement system comprising a radiation source configured to generate a radiation beam, a spatially coded grating configured to pattern the radiation beam and thereby provide a spatially coded radiation beam, optics configured to form an image of the spatially coded grating at a target location on a substrate, detection optics configured to receive radiation re-fleeted from the target location of the substrate and form an image of the grating image at a second grating, and a detector configured to receive radiation transmitted through the second grating and produce an output signal.
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