Patent search ap:("Alexander Straaijer") AND inv:"Alexander Straaijer" Page 2

11.

发明授权
Lithographic apparatus and device manufacturing method 有权
Title translation: 平版印刷设备和器件制造方法

公开(公告)号：US07199858B2

公开(公告)日：2007-04-03

申请号：US10705804

申请日：2003-11-12

Applicant: Joeri Lof , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen

Inventor： Joeri Lof , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen

IPC: G03B24/42 , G03B27/52

CPC classification number: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

Abstract translation: 公开了一种光刻投影装置，其中投影系统和基板之间的空间填充有液体。边缘密封构件至少部分地围绕衬底台面上的衬底或其它物体，以防止衬底或其他物体的边缘部分例如成像或照亮时的液体损失。

12.

发明申请
Lithographic apparatus and device manufacturing method 有权
Title translation: 平版印刷设备和器件制造方法

公开(公告)号：US20050036121A1

公开(公告)日：2005-02-17

申请号：US10831370

申请日：2004-04-26

Applicant: Christiaan Hoogendam , Sjoerd Donders , Hans Jansen , Jacobus Johannus Leonardus Verspay , Antonius Theodorus Derksen , Joeri Lof , Erik Loopstra , Johannes Catharinus Mulkens , Alexander Straaijer , Bob Streefkerk

Inventor： Christiaan Hoogendam , Sjoerd Donders , Hans Jansen , Jacobus Johannus Leonardus Verspay , Antonius Theodorus Derksen , Joeri Lof , Erik Loopstra , Johannes Catharinus Mulkens , Alexander Straaijer , Bob Streefkerk

IPC: G03F7/20 , G03F9/00 , G03B27/52

CPC classification number: G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088

Abstract: In a lithographic projection apparatus, there is provided a liquid supply system comprising a container at least partly defining a space between the projection system and the substrate, the container having a selectively openable and closeable aperture therein, and a closure configured to selectively close and open the aperture. In an embodiment, the shutter may comprise a channel in a surface of the shutter facing the aperture and/or the shutter may be displaced from the liquid supply system when connected to the liquid supply system. Further, in a lithographic apparatus, there is provided a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between a projection system and a substrate and a controller configured to control application to the projection system of a force related to a weight transfer attributable to a member of the liquid supply system.

Abstract translation: 在光刻投影设备中，提供了一种液体供应系统，其包括至少部分地限定投影系统和基板之间的空间的容器，该容器在其中具有可选择的可开启和关闭的孔，以及关闭构造成选择性地关闭和打开光圈。在一个实施例中，快门可以包括位于快门面向孔的表面中的通道和/或当连接到液体供应系统时活门可以从液体供应系统移位。此外，在光刻设备中，提供了一种液体供应系统，其配置为在投影系统和基板之间的空间中提供待投射的光束的液体，以及被配置为控制对投影系统的应用的控制器与由液体供给系统的构件产生的重量传递有关的力。

13.

发明申请
Lithographic apparatus and device manufacturing method 失效
Title translation: 平版印刷设备和器件制造方法

公开(公告)号：US20050018156A1

公开(公告)日：2005-01-27

申请号：US10873648

申请日：2004-06-23

Applicant: Johannes Catharinus Mulkens , Antonius Theodorus Anna Derksen , Joeri Lof , Klaus Simon , Alexander Straaijer , Bob Streefkerk

Inventor： Johannes Catharinus Mulkens , Antonius Theodorus Anna Derksen , Joeri Lof , Klaus Simon , Alexander Straaijer , Bob Streefkerk

IPC: G03F7/20 , G03F9/00 , H01L21/027 , G03B27/52

CPC classification number: G03F9/7026 , G03F7/70341 , G03F9/7034

Abstract: The pressure and/or height of liquid in a liquid reservoir of an immersion lithography apparatus is obtained by a measurement device. The pressure and/or height can be used to determine the height and/or tilt of the substrate.

Abstract translation: 通过测量装置获得浸没式光刻设备的储液器中的液体的压力和/或高度。压力和/或高度可用于确定基底的高度和/或倾斜度。

14.

发明授权
Scanning-slit exposure device 失效
Title translation: 扫描狭缝曝光装置

公开(公告)号：US5889580A

公开(公告)日：1999-03-30

申请号：US824624

申请日：1997-03-27

Applicant: Johannes C.M. Jasper , Alexander Straaijer

Inventor： Johannes C.M. Jasper , Alexander Straaijer

IPC: G02B5/02 , G03F7/20 , H01L21/027 , G03B27/54

CPC classification number: G03F7/70125 , G03F7/70358 , G03F7/70808

Abstract: A scanning-slit exposure device is provided with a radiation source (1) emitting radiation pulses through an exit window (2). An imaging system (3) images the exit window onto a surface (4) to be exposed by the radiation. The surface is scanned relative to the exit window image in a scan direction. To avoid the banding-type non-uniformities in the exposure, the device comprises a scattering element (12) which scattering element causes a blur of the exit window image only in the scan direction. The scattering element is arranged in the entrance pupil of the imaging system (3).

Abstract translation: 扫描狭缝曝光装置设置有通过出射窗（2）发射辐射脉冲的辐射源（1）。成像系统（3）将出射窗口成像到由辐射暴露的表面（4）上。在扫描方向上相对于出口窗口图像扫描表面。为了避免曝光中的带状不均匀性，该装置包括散射元件（12），散射元件仅在扫描方向上引起出射窗图像的模糊。散射元件布置在成像系统（3）的入射光瞳上。

15.

发明授权
Lithographic apparatus and device manufacturing method involving a member and a fluid opening 有权
Title translation: 涉及构件和流体开口的平版印刷设备和设备制造方法

公开(公告)号：US09152058B2

公开(公告)日：2015-10-06

申请号：US13194136

申请日：2011-07-29

Applicant: Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolensnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen

Inventor： Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolensnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen

IPC: G03F7/20

CPC classification number: G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883

Abstract: An exposure apparatus including a movable table, a member, movably separate from the table and located on a top surface of the table, to provide a surface substantially co-planar with a top surface of an object in or on the table, a projection system configured to project a radiation beam onto a radiation-sensitive target portion of a substrate, and a liquid supply system configured to provide a liquid to a space between the projection system and the object.

Abstract translation: 一种曝光装置，包括可移动工作台，构件，可移动地与工作台分离并且位于工作台的顶表面上，以提供与桌子中或工作台上的物体的顶表面基本共面的表面;投影系统被配置为将辐射束投射到基板的辐射敏感目标部分上，以及液体供应系统，其配置成向投影系统和物体之间的空间提供液体。

16.

发明授权
Lithographic apparatus and device manufacturing method 有权

公开(公告)号：US08913223B2

公开(公告)日：2014-12-16

申请号：US12795513

申请日：2010-06-07

Applicant: Bob Streefkerk , Antonius Theodorus Anna Maria Derksen , Joeri Lof , Klaus Simon , Alexander Straaijer

Inventor： Bob Streefkerk , Antonius Theodorus Anna Maria Derksen , Joeri Lof , Klaus Simon , Alexander Straaijer

IPC: G03B27/52 , G03B27/42 , G03F7/20

CPC classification number: G03F7/70875 , G03F7/70258 , G03F7/70341 , G03F7/70716 , G03F7/70891

Abstract: An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.