公开(公告)号：US20230002529A1

公开(公告)日：2023-01-05

申请号：US17871632

申请日：2022-07-22

Applicant: Align Technology, Inc.

Inventor： Michael Christopher COLE

IPC: C08F220/18 ,  B33Y80/00 ,  B33Y70/00 ,  B33Y10/00 ,  C08F218/04 ,  C08F2/44 ,  C08F2/48 ,  B29C64/106 ,  A61C7/08 ,  C08F220/14 ,  G03F7/029 ,  G03F7/20

Abstract: Provided herein are processes for the generation of composite polymer materials utilizing a single resin. The processes utilize diffusion between a region undergoing a polymerization reaction preferentially polymerizing one monomer component and an unreactive region. Diffusion and subsequent/concurrent polymerization results in a higher concentration of the more reactive monomer component in the reacting region and a higher concentration of the less reactive monomer components in the unreactive region. The unreactive region may be later polymerized. In embodiments, photopolymerization is used and the regions are generated by a mask or other mechanism to pattern the light.

公开(公告)号：US20220380502A1

公开(公告)日：2022-12-01

申请号：US17728865

申请日：2022-04-25

Applicant: Align Technology, Inc.

Inventor： Umesh Upendra CHOUDHARY ,  Jessica Kalay SU ,  Jennifer Marie CHAVEZ ,  Michael Christopher COLE ,  Raymond Bao THAI

IPC: C08F220/30 ,  C08F2/50

Abstract: The present disclosure provides photo-polymerizable monomers, photo-curable resins comprising one or more of such monomers, as well as polymeric materials formed from the photo-curable resins. Further provided herein are methods of producing the compositions and using the same for the fabrication of medical devices, such as orthodontic appliances.

公开(公告)号：US20210147672A1

公开(公告)日：2021-05-20

申请号：US17083641

申请日：2020-10-29

Applicant: Align Technology, Inc.

Inventor： Michael Christopher COLE ,  Jennifer Chavez

IPC: C08L67/04 ,  C08F299/02 ,  C08L67/02 ,  A61C7/08 ,  A61C7/10 ,  B33Y70/00 ,  B33Y80/00

Abstract: This disclosure provides polymeric materials comprising polymer crystals, methods and resins for making the same, and objects and appliances made from said polymeric materials. Polymeric materials having polymer crystals provide favorable properties, such as enhanced durability and rigidity. This disclosure also provides polymeric materials comprising a crystalline phase comprising at least one polymer crystal, as well as an amorphous phase comprising at least one amorphous polymer. The crystalline phase can confer rigidity to the polymeric material, while the amorphous phase can confer elasticity and flexibility.

公开(公告)号：US20210078357A1

公开(公告)日：2021-03-18

申请号：US17008295

申请日：2020-08-31

Applicant: ALIGN TECHNOLOGY, INC.

Inventor： Sriram VENKATASANTHANAM ,  Ramin HEYDARPOUR ,  John Y. MORTON ,  Jun SATO ,  Michael Christopher COLE ,  Mehdi MOJDEH ,  Prashanth VANCHY ,  Natalia Lysaya POWERS ,  Sibel NARIN ,  Jeremy RILEY

IPC: B44C3/02 ,  C09D11/101 ,  B41M5/00 ,  B32B38/00 ,  B32B7/06 ,  B32B7/12 ,  B32B27/20

Abstract: The present disclosure relates to ornamental indicia carrier and method of producing the same. In some embodiments, the ornamental indicia carrier comprises an ultraviolet light (“UV”) cured ink printed on a thin flexible film and combined with an adhesive layer. The ornamental indicia carrier is capable of enduring the conditions inside the mouth for an extended period of time and can be used in conjunction with a dental appliance.

公开(公告)号：US20210077225A1

公开(公告)日：2021-03-18

申请号：US16948670

申请日：2020-09-28

Applicant: ALIGN TECHNOLOGY, INC.

Inventor： Sriram VENKATASANTHANAM ,  Ramin HEYDARPOUR ,  John Y. MORTON ,  Jun SATO ,  Michael Christopher COLE ,  Mehdi MOJDEH ,  Prashanth VANCHY ,  Natalia Lysaya POWERS ,  Sibel NARIN ,  Jeremy RILEY

IPC: A61C7/08 ,  A61C13/00

Abstract: The present disclosure relates to ornamental indicia carrier and method of producing the same. In some embodiments, the ornamental indicia carrier comprises an ultraviolet light (“UV”) cured ink printed on a thin flexible film and combined with an adhesive layer. The ornamental indicia carrier is capable of enduring the conditions inside the mouth for an extended period of time and can be used in conjunction with a dental appliance.

公开(公告)号：US20210030516A1

公开(公告)日：2021-02-04

申请号：US16942330

申请日：2020-07-29

Applicant: ALIGN TECHNOLOGY, INC.

Inventor： Siobhan O'LEARY ,  Peter WEBBER ,  Michael Christopher COLE

IPC: A61C7/00 ,  B29C64/124 ,  B29C64/393 ,  B33Y10/00 ,  B33Y50/02 ,  B33Y80/00 ,  A61C7/14 ,  A61C7/08

Abstract: Strategies that reduce shrinkage and ultimately warping of parts that are directly fabricated from photopolymer resins. This increases the accuracy of directly fabricated parts, which is essential for patient specific applications. Implementing these strategies can reduce the need for directly fabricated parts to have supporting structures, which can reduce pre-processing and post-processing steps and facilitate an easier route for production level scale of additive manufacturing.

公开(公告)号：US20210011385A1

公开(公告)日：2021-01-14

申请号：US17034869

申请日：2020-09-28

Applicant: Align Technology, Inc.

Inventor： Michael Christopher COLE

IPC: G03F7/20 ,  B33Y80/00 ,  B33Y70/00 ,  B33Y10/00 ,  C08F220/18 ,  C08F218/04 ,  C08F2/44 ,  C08F2/48 ,  B29C64/106 ,  A61C7/08 ,  C08F220/14 ,  C08F222/14 ,  G03F7/029

Abstract: Provided herein are processes for the generation of composite polymer materials utilizing a single resin. The processes utilize diffusion between a region undergoing a polymerization reaction preferentially polymerizing one monomer component and an unreactive region. Diffusion and subsequent/concurrent polymerization results in a higher concentration of the more reactive monomer component in the reacting region and a higher concentration of the less reactive monomer components in the unreactive region. The unreactive region may be later polymerized. In embodiments, photopolymerization is used and the regions are generated by a mask or other mechanism to pattern the light.

公开(公告)号：US20190033719A1

公开(公告)日：2019-01-31

申请号：US16024555

申请日：2018-06-29

Applicant: Align Technology, Inc.

Inventor： Michael Christopher COLE

IPC: G03F7/20 ,  G03F7/029 ,  C08F222/14 ,  C08F220/14 ,  A61C7/08 ,  B33Y10/00 ,  B33Y70/00 ,  B29C64/106

Abstract: Provided herein are processes for the generation of composite polymer materials utilizing a single resin. The processes utilize diffusion between a region undergoing a polymerization reaction preferentially polymerizing one monomer component and an unreactive region. Diffusion and subsequent/concurrent polymerization results in a higher concentration of the more reactive monomer component in the reacting region and a higher concentration of the less reactive monomer components in the unreactive region. The unreactive region may be later polymerized. In embodiments, photopolymerization is used and the regions are generated by a mask or other mechanism to pattern the light.

公开(公告)号：US20240123680A1

公开(公告)日：2024-04-18

申请号：US18091306

申请日：2023-12-04

Applicant: Align Technology, Inc.

Inventor： Viswanath MEENAKSHISUNDARAM ,  Jennifer CHAVEZ ,  Michael Christopher COLE

IPC: B29C64/218 ,  B29C64/295

CPC classification number: B29C64/218 ,  B29C64/295

Abstract: The present disclosure provides photo-polymerizable components, photo-curable resins comprising one or more of such monomers, as well as polymeric materials formed from the photo-curable resins. Further provided herein are methods of producing the compositions and using the same for the fabrication of medical devices, such as orthodontic appliances.

公开(公告)号：US20240084161A1

公开(公告)日：2024-03-14

申请号：US18498709

申请日：2023-10-31

Applicant: Align Technology, Inc.

Inventor： Michael Christopher COLE

IPC: C09D133/06 ,  A61C7/08 ,  A61C7/10 ,  B33Y70/00 ,  C08F220/18 ,  C09D4/00

CPC classification number: C09D133/062 ,  A61C7/08 ,  A61C7/10 ,  B33Y70/00 ,  C08F220/1804 ,  C09D4/00 ,  C08F2800/20 ,  C08F2810/20

Abstract: This disclosure provides polymeric materials comprising weak crosslinking covalent bonds and/or weak crosslinking units comprising a weak covalent bond. Weak covalent bonds can be used in place of hydrogen bonds present in traditional polymeric materials (e.g., polyurethanes). Advantageously, the toughness can be controlled by varying the strength of weak covalent bonds and/or by varying the number of weak covalent crosslinks. Crosslinked materials applying the weak covalent crosslinking bonds can be used to create tough materials able to resist stress relaxation. Further, the present disclosure provides polymer chains and polymeric materials comprising inchain loops (also referred to herein as rings). The inchain loops comprise weak bonds and/or weak bridges comprising at least one weak bond. This disclosure also provides compositions comprising the polymer chains, materials comprising the polymer chains, monomer units that can react to form inchain loop-comprising polymer chains, resins comprising the monomer units, and related materials, appliances, and uses.