公开(公告)号：US09536706B2

公开(公告)日：2017-01-03

申请号：US15048004

申请日：2016-02-19

Applicant: CORPORATION FOR NATIONAL RESEARCH INITIATIVES

Inventor： Michael A. Huff ,  Michael Pedersen

IPC: A61N5/00 ,  G03B27/32 ,  G03B27/54 ,  H01J37/317 ,  G03F7/20 ,  H01L21/027 ,  H01L21/67

CPC classification number: H01J37/3175 ,  G03F7/2059 ,  G03F7/70383 ,  H01J37/3177 ,  H01J2237/3175 ,  H01J2237/31754 ,  H01J2237/31774 ,  H01J2237/31789 ,  H01L21/0277 ,  H01L21/67005

Abstract: A dynamic pattern generator (DPG) device and method of making a DPG device are disclosed. The DPG device is used in semiconductor processing tools that require multiple electron-beams, such as direct-write lithography. The device is a self-aligned DPG device that enormously reduces the required tolerances for aligning the various electrode layers, as compared to other design configurations including the non-self-aligned approach and also greatly simplifies the process complexity and cost. A process sequence for both integrated and non-integrated versions of the self-aligned DPG device is described. Additionally, an advanced self-aligned DPG device that eliminates the need for a charge dissipating coating or layer to be used on the device is described. Finally, a fabrication process for the implementation of both integrated and non-integrated versions of the advanced self-aligned DPG device is described.

Abstract translation: 公开了一种动态图案发生器（DPG）装置和制造DPG装置的方法。 DPG器件用于需要多个电子束的半导体处理工具，例如直写光刻。 与其他设计配置（包括非自对准方法）相比，该器件是一种自对准DPG器件，极大地减少了对准各种电极层所需的公差，并大大简化了工艺的复杂性和成本。 描述了自对准DPG设备的集成和非集成版本的处理顺序。 另外，描述了一种先进的自对准DPG器件，其不需要在器件上使用的电荷消散涂层或层。 最后，描述了用于实现高级自对准DPG设备的集成和非集成版本的制造过程。