公开(公告)号：US20210011380A1

公开(公告)日：2021-01-14

申请号：US17036576

申请日：2020-09-29

Applicant: FUJIFILM Corporation

Inventor： Wataru NIHASHI ,  Michihiro SHIRAKAWA ,  Michihiro OGAWA

IPC: G03F7/038 ,  G03F7/004 ,  G03F7/20 ,  G03F7/32

Abstract: The present invention provides a negative tone photosensitive composition for EUV light, capable of forming a pattern, in which occurrence of missing defects is suppressed and pattern collapse is suppressed. The present invention also provides a pattern forming method and a method for manufacturing an electronic device. The negative tone photosensitive composition for EUV light of an embodiment of the present invention includes a resin A having a repeating unit having an acid-decomposable group with a polar group being protected with a protective group that is eliminated by the action of an acid, and a photoacid generator, in which a ClogP value of the resin after elimination of the protective group from the resin A is 1.4 or less, a value x calculated by Expression (1) is 1.2 or more, and the value x calculated by Expression (1) and a value y calculated by Expression (2) satisfy a relationship of Expression (3).

公开(公告)号：US20200183280A1

公开(公告)日：2020-06-11

申请号：US16794442

申请日：2020-02-19

Applicant: FUJIFILM Corporation

Inventor： Michihiro OGAWA ,  Akihiro KANEKO ,  Takashi KAWASHIMA ,  Tomotaka TSUCHIMURA

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038 ,  C08L33/06 ,  C08L33/16

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition is an actinic ray-sensitive or radiation-sensitive resin composition including a compound that generates an acid upon irradiation with actinic rays or radiation and a resin capable of increasing polarity by the action of an acid, in which the resin includes a repeating unit represented by General Formula (B-1) and at least one halogen atom selected from the group consisting of a fluorine atom and an iodine atom.