公开(公告)号：US20200180190A1

公开(公告)日：2020-06-11

申请号：US16703423

申请日：2019-12-04

Applicant: IO Tech Group Ltd.

Inventor： Michael Zenou ,  Ziv Gilan ,  Daniel Liptz ,  Yuval Shai

IPC: B29C35/02 ,  B29C35/08 ,  B29C59/04

Abstract: Systems and methods that prevent oxygen inhibition of a light-initiated polymerization reaction by forcing the oxygen away from the reaction surfaces. In some embodiments, oxygen is purged by bringing a planarizing surface (e.g., a thin transparent film and/or a transparent planar surface) into contact with a layer of UV curable material disposed on a workpiece and then moving the planarizing surface away from the workpiece one the UV material is cured.

公开(公告)号：US20200023582A1

公开(公告)日：2020-01-23

申请号：US16509121

申请日：2019-07-11

Applicant: IO Tech Group, Ltd.

Inventor： Ziv Gilan ,  Daniel Liptz ,  Michael Zenou

IPC: B29C64/245 ,  B29C64/268 ,  B29C64/379

Abstract: A leveling system for a 3D printing system for laser dispensing includes inner and outer frames, each supported at its corners by respective actuators of first and second sets of actuators. The outer frame supports an optical plane within which material to be dispensed by laser irradiation is disposed. The inner frame supports a receiving medium plane within which a substrate on which said material to be dispensed by laser irradiation is disposed. Each actuator operates independently to displace a respective frame corner in the vertical direction. The inner and outer frames each is attached at their respective corners to a respective actuator by a rod, thus allowing the inner and outer frames to freely rotate with respect to one another. An additional frame may support sensors for monitoring the 3D printing system.

公开(公告)号：US11673328B2

公开(公告)日：2023-06-13

申请号：US17453292

申请日：2021-11-02

Applicant: IO Tech Group Ltd.

Inventor： Michael Zenou ,  Ziv Gilan ,  Daniel Liptz ,  Yuval Shai

IPC: B29C64/264 ,  B29C64/245 ,  B29C64/106 ,  B29C64/371 ,  B29C35/02 ,  B29C35/08 ,  B29C59/04 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y40/00

CPC classification number: B29C64/264 ,  B29C35/0288 ,  B29C35/0805 ,  B29C59/04 ,  B29C64/106 ,  B29C64/245 ,  B29C64/371 ,  B29C2035/0827 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y40/00

Abstract: Methods that prevent oxygen inhibition of a light-initiated polymerization reaction by purging the oxygen from reaction surfaces using inert gas flow. In some embodiments, oxygen is purged using a gas diffusion system that introduces, via a diffuser, an inert gas into a workspace between a UV light source and a UV curable layer of a workpiece. The diffuser may be made of a transparent or diffuse material to allow UV light to pass through it, and includes an array of micro-holes for the gas to pass through towards the workpiece. The inert gas flow may be heated to maintain a desired and uniform reaction temperature.

公开(公告)号：US11453164B2

公开(公告)日：2022-09-27

申请号：US16703423

申请日：2019-12-04

Applicant: IO Tech Group Ltd.

Inventor： Michael Zenou ,  Ziv Gilan ,  Daniel Liptz ,  Yuval Shai

IPC: B29C64/264 ,  B29C64/245 ,  B29C64/106 ,  B29C64/371 ,  B29C35/02 ,  B29C35/08 ,  B29C59/04 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y40/00

Abstract: Systems and methods that prevent oxygen inhibition of a light-initiated polymerization reaction by forcing the oxygen away from the reaction surfaces. In some embodiments, oxygen is purged by bringing a planarizing surface (e.g., a thin transparent film and/or a transparent planar surface) into contact with a layer of UV curable material disposed on a workpiece and then moving the planarizing surface away from the workpiece once the UV material is cured.

公开(公告)号：US11285667B2

公开(公告)日：2022-03-29

申请号：US16949113

申请日：2020-10-14

Applicant: IO Tech Group Ltd.

Inventor： Ziv Gilan ,  Daniel Liptz

IPC: B29C64/209 ,  B33Y30/00 ,  B29C64/227 ,  B33Y10/00

Abstract: Systems for material deposition. One such system includes a number of containers arranged relative to one another in a conical or other shape, pointing toward a common deposition point. When not actively depositing material, the containers are held at a distance from the deposition point. Another system has a rod disposed within a container and a flexible tip on the rod seals a material exit of the container when biased closed. Pressurized gas introduced into the container forces the rod away from the material exit and material from the container. In yet another system, a container includes a barrel adapter having a one-way air valve that seals the container and creates a vacuum, preventing material from leaking from the container. Upon application of a pressurized gas, the one-way valve is forced open and material is deposited from the container. The valve closes automatically in the absence of the gas.

公开(公告)号：US11203154B2

公开(公告)日：2021-12-21

申请号：US16703417

申请日：2019-12-04

Applicant: IO Tech Group Ltd.

Inventor： Michael Zenou ,  Ziv Gilan ,  Daniel Liptz ,  Yuval Shai

IPC: B29C64/264 ,  B29C64/245 ,  B29C64/106 ,  B29C64/371 ,  B29C35/02 ,  B29C35/08 ,  B29C59/04 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y40/00

Abstract: Systems and methods that prevent oxygen inhibition of a light-initiated polymerization reaction by purging the oxygen from reaction surfaces using inert gas flow. In some embodiments, oxygen is purged using a gas diffusion system that introduces, via a diffuser, an inert gas into a workspace between a UV light source and a UV curable layer of a workpiece. The diffuser may be made of a transparent or diffuse material to allow UV light to pass through it, and includes an array of micro-holes for the gas to pass through towards the workpiece. The inert gas flow may be heated to maintain a desired and uniform reaction temperature.

公开(公告)号：US20210129433A1

公开(公告)日：2021-05-06

申请号：US16949113

申请日：2020-10-14

Applicant: IO Tech Group Ltd.

Inventor： Ziv Gilan ,  Daniel Liptz

IPC: B29C64/209 ,  B29C64/227 ,  B33Y30/00

Abstract: Systems for material deposition. One such system includes a number of containers arranged relative to one another in a conical or other shape, pointing toward a common deposition point. When not actively depositing material, the containers are held at a distance from the deposition point. Another system has a rod disposed within a container and a flexible tip on the rod seals a material exit of the container when biased closed. Pressurized gas introduced into the container forces the rod away from the material exit and material from the container. In yet another system, a container includes a barrel adapter having a one-way air valve that seals the container and creates a vacuum, preventing material from leaking from the container. Upon application of a pressurized gas, the one-way valve is forced open and material is deposited from the container. The valve closes automatically in the absence of the gas.