公开(公告)号：US20100271605A1

公开(公告)日：2010-10-28

申请号：US12834996

申请日：2010-07-13

Applicant: Matthew Lipson ,  Taras Shvets ,  Richard Bruls

Inventor： Matthew Lipson ,  Taras Shvets ,  Richard Bruls

IPC: G03B27/52

CPC classification number: G03F7/70341 ,  G02B1/105 ,  G02B1/14 ,  G02B5/003 ,  G02B7/025 ,  Y10T156/10

Abstract: A method for protecting a wet lens element from liquid degradation is provided. The method includes applying a thin coating of an organoxy-metallic compound to the side portions of a wet lens element to leave behind an optically inert, light absorbing metal oxide film. A liquid shield coating is applied on top of the metal oxide coating. The two coating layers protect the wet lens element from liquid degradation when the side portion of the wet lens element is submerged into a liquid. In an embodiment, the wet lens element is an immersion lithography wet lens element and the liquid is an immersion lithography liquid.

Abstract translation: 提供了一种用于保护湿透镜元件免于液体劣化的方法。 所述方法包括将有机氧化金属化合物的薄涂层施加到湿透镜元件的侧部以留下光学惰性的光吸收金属氧化物膜。 将液体屏蔽涂层施加在金属氧化物涂层的顶部。 当湿透镜元件的侧部被浸入液体中时，两个涂层保护湿透镜元件免于液体劣化。 在一个实施例中，湿透镜元件是浸没光刻湿透镜元件，液体是浸没式光刻液。

公开(公告)号：US20080174054A1

公开(公告)日：2008-07-24

申请号：US11626747

申请日：2007-01-24

Applicant: Matthew Lipson ,  Robert D. Harned ,  Geoffrey O'Connor ,  Timothy O'Neil

Inventor： Matthew Lipson ,  Robert D. Harned ,  Geoffrey O'Connor ,  Timothy O'Neil

IPC: B28B1/00

CPC classification number: H01L21/68757 ,  G03F7/707 ,  Y10T156/10 ,  Y10T156/1089 ,  Y10T428/24744

Abstract: A wafer chuck for use in a lithographic apparatus, which includes a low-thermal expansion glass ceramic substrate, a silicon silicon carbide layer, and a bonding layer comprising silicate having a strength of at least about 5 megapascals, the bonding layer attaching the silicon silicon carbide layer to the substrate is described. Also, a method of forming a wafer chuck for use in a lithographic apparatus, which includes coating a portion of one or both of a low-thermal expansion glass ceramic substrate and a silicon silicon carbide layer with a bonding solution, and contacting the substrate and the silicon silicon carbide layer to bond the substrate and the silicon silicon carbide layer together is described.

Abstract translation: 一种用于光刻设备的晶片卡盘，其包括低热膨胀玻璃陶瓷基板，硅碳化硅层和包括具有至少约5兆帕的强度的硅酸盐的粘合层，所述粘合层将硅硅 描述了到基底的碳化物层。 另外，一种形成用于光刻设备的晶片卡盘的方法，其包括用粘合溶液涂覆低热膨胀玻璃陶瓷基板和硅碳化硅中的一个或两个的一部分，并使基板和 描述了将基板和硅碳化硅层结合在一起的硅碳化硅层。

公开(公告)号：US07180573B2

公开(公告)日：2007-02-20

申请号：US10965025

申请日：2004-10-15

Applicant: Matthew Lipson ,  Christopher J. Mason ,  Justin L. Kreuzer

Inventor： Matthew Lipson ,  Christopher J. Mason ,  Justin L. Kreuzer

IPC: G03B27/42 ,  G03B27/54

CPC classification number: G03B27/42

Abstract: A system and method include a pattern generating portion that is used to pattern an object via a projection system. The pattern generating portion includes active and inactive areas. The pattern generating portion patterns light traveling towards the active areas and the projection system projects the patterned light onto the object. The pattern generating portion directs light traveling towards inactive areas away from the object.

Abstract translation: 系统和方法包括用于经由投影系统对对象进行图案化的图案生成部。 图案生成部分包括主动和非活动区域。 图案生成部分图案向着有源区域传播的光线，并且投影系统将图案化的光投射到物体上。 图案生成部分将朝着不活动区域行驶的光引导远离物体。

公开(公告)号：US07129006B2

公开(公告)日：2006-10-31

申请号：US10194448

申请日：2002-07-11

Applicant: Lambertus Hesselink ,  Brian H. Cumpston ,  Matthew Lipson

Inventor： Lambertus Hesselink ,  Brian H. Cumpston ,  Matthew Lipson

IPC: G03H1/04

CPC classification number: B82Y10/00 ,  C01P2004/61 ,  C09C1/56 ,  G03F7/001 ,  G03H2001/303 ,  G03H2260/12 ,  G11B7/00455 ,  G11B7/0052 ,  G11B7/0065 ,  G11B7/24 ,  G11B7/26

Abstract: An optical storage system and method having separate, independent format hologram writing and data writing mechanisms to allow optimization of data writing separately from format hologram recording. In its most general terms, the invention comprises an optical medium having a first, photoactive material responsive to a first, format hologram recording condition and a second photo-active material, responsive to a second, data writing condition, which is dispersed or dissolved in the first photoactive material. The second photoactive material may additionally be “erasable” under a third, erasing condition. The second photoactive material is preferably in the form of microparticles, microdroplets or microcapsules which are dispersed throughout the first photoactive material. The format hologram is recorded in the first photoactive material when the optical medium is subject to the first, format hologram recording condition, and the data writing is subsequently carried out separately, in connection with the second photoactive material, under the second, data writing condition. The separate format hologram recording and bit writing functions provided by the diferent conditions make them orthogonal.

Abstract translation: 一种光学存储系统和方法具有独立的独立格式全息图写入和数据写入机制，以允许与格式全息图记录分开的数据写入的优化。 在其最一般的术语中，本发明包括光学介质，其具有响应于第一格式全息图记录条件的第一光活性材料和第二光活性材料，响应于分散或溶解于其中的第二数据写入条件 第一种光敏材料。 在第三，擦除状态下，第二光敏材料可以另外为“可擦除”。 第二光活性材料优选为分散在整个第一光活性材料中的微粒，微滴或微胶囊的形式。 当光学介质经受第一格式全息图记录条件时，格式全息图被记录在第一光活性材料中，并且随后在第二个数据写入条件下与第二光敏材料相关地进行数据写入 。 由不同条件提供的单独格式全息图记录和位写入功能使它们正交。

公开(公告)号：US09195148B2

公开(公告)日：2015-11-24

申请号：US12834996

申请日：2010-07-13

Applicant: Matthew Lipson ,  Taras Shvets ,  Richard Bruls

Inventor： Matthew Lipson ,  Taras Shvets ,  Richard Bruls

IPC: G03B27/52 ,  G03B27/54 ,  G03B27/32 ,  G03F7/20 ,  G02B1/10 ,  G02B5/00 ,  G02B7/02

CPC classification number: G03F7/70341 ,  G02B1/105 ,  G02B1/14 ,  G02B5/003 ,  G02B7/025 ,  Y10T156/10

Abstract: A method for protecting a wet lens element from liquid degradation is provided. The method includes applying a thin coating of an organoxy-metallic compound to the side portions of a wet lens element to leave behind an optically inert, light absorbing metal oxide film. A liquid shield coating is applied on top of the metal oxide coating. The two coating layers protect the wet lens element from liquid degradation when the side portion of the wet lens element is submerged into a liquid. In an embodiment, the wet lens element is an immersion lithography wet lens element and the liquid is an immersion lithography liquid.

Abstract translation: 提供了一种用于保护湿透镜元件免于液体劣化的方法。 所述方法包括将有机氧化金属化合物的薄涂层施加到湿透镜元件的侧部以留下光学惰性的光吸收金属氧化物膜。 将液体屏蔽涂层施加在金属氧化物涂层的顶部。 当湿透镜元件的侧部被浸入液体中时，两个涂层保护湿透镜元件免于液体劣化。 在一个实施例中，湿透镜元件是浸没光刻湿透镜元件，液体是浸没式光刻液。

公开(公告)号：US08755027B2

公开(公告)日：2014-06-17

申请号：US13226037

申请日：2011-09-06

Applicant: Matthew Lipson ,  Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Catharinus Hubertus Mulkens ,  Bob Streefkerk ,  Ronald Wilklow ,  Roel De Jonge

Inventor： Matthew Lipson ,  Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Catharinus Hubertus Mulkens ,  Bob Streefkerk ,  Ronald Wilklow ,  Roel De Jonge

IPC: G03B27/52 ,  G03B27/32

CPC classification number: G03F7/70341

Abstract: A fluid system to provide a fluid including liquid in a part of a lithographic apparatus, the fluid system including a manifold to mix a first liquid component and a second component to form the fluid in the part of the lithographic apparatus, a controller to control a physical property of the fluid by controlling the amount of the first and/or second component used to form the fluid, and a measuring device to measure a property of the fluid and to make feedback available to the controller, wherein the controller is configured to control the physical property of the fluid based on the measured property.

Abstract translation: 一种用于在光刻设备的一部分中提供包括液体的流体的流体系统，所述流体系统包括歧管以混合第一液体组分和第二组分以在所述光刻设备的所述部分中形成所述流体;控制器， 通过控制用于形成流体的第一和/或第二部件的量来控制流体的物理性质;以及测量装置，用于测量流体的性质并使反馈可用于控制器，其中控制器被配置成控制 基于测量属性的流体的物理性质。

公开(公告)号：US08208123B2

公开(公告)日：2012-06-26

申请号：US10927531

申请日：2004-08-27

Applicant: Erik Roelof Loopstra ,  Johannes Jacobus Matheus Baselmans ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Christiaan Maria Jasper ,  Hendricus Johannes Maria Meijer ,  Uwe Mickan ,  Johannes Catharinus Hubertus Mulkens ,  Matthew Lipson ,  Tammo Utterdijk

Inventor： Erik Roelof Loopstra ,  Johannes Jacobus Matheus Baselmans ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Christiaan Maria Jasper ,  Hendricus Johannes Maria Meijer ,  Uwe Mickan ,  Johannes Catharinus Hubertus Mulkens ,  Matthew Lipson ,  Tammo Utterdijk

IPC: G03B27/54

CPC classification number: G03F7/70966 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70983 ,  Y10S430/162

Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.

公开(公告)号：US07335398B2

公开(公告)日：2008-02-26

申请号：US10898160

申请日：2004-07-26

Applicant: Matthew Lipson ,  Ronald A. Wilklow

Inventor： Matthew Lipson ,  Ronald A. Wilklow

IPC: C23C16/00 ,  B05D5/00

CPC classification number: C23C14/044 ,  C23C14/24 ,  C23C16/042 ,  C23C16/482 ,  G03F1/00 ,  G03F1/50 ,  G03F7/70291 ,  G03F7/70475

Abstract: Systems and methods are used to modify a layer on a substrate that is used to form a pattern generator, so that light reflecting from the modified substrate has a trapezoidal or other custom profile. The layer is modified using various vapor deposition techniques in conjunction with moving or positioning the substrate a desired distance from a blocking device and/or at a desired rate or speed.

Abstract translation: 系统和方法用于修改用于形成图案发生器的衬底上的层，使得从改性衬底反射的光具有梯形或其它定制轮廓。 使用各种气相沉积技术来改变层，结合将基底与阻挡装置和/或以期望的速率或速度移动或定位所需的距离。

公开(公告)号：US20080038456A1

公开(公告)日：2008-02-14

申请号：US11826197

申请日：2007-07-12

Applicant: Matthew Lipson

Inventor： Matthew Lipson

IPC: B05D5/06

CPC classification number: B05D1/322

Abstract: A system and method that can be used to cover a portion (e.g., a clear aperture) of an optical element (e.g., a lens) during coating of another portion (e.g., a circumferential portion) of the optical element. This can be done to protect the clear aperture during coating of an adhesive protection layer proximate a circumferential edge of the lens without damaging or altering the clear aperture. The method can include the following steps. An optical element is held so that a first portion of the optical element is covered and a second portion of the optical element is exposed. A first coating is provided on the second portion of the optical element. The optical element is released from being held. A second coating is provided on the optical element. The first and second coatings are removed from the second portion of the optical element.

Abstract translation: 一种可用于在光学元件的另一部分（例如，圆周部分）的涂覆期间覆盖光学元件（例如，透镜）的部分（例如，透明孔径）的系统和方法。 这可以在粘合剂保护层在透镜的周缘边缘附近的涂覆期间保护透明孔径而不损坏或改变透明孔径。 该方法可以包括以下步骤。 保持光学元件使得光学元件的第一部分被覆盖，并且光学元件的第二部分被暴露。 第一涂层设置在光学元件的第二部分上。 光学元件被释放而不被保持。 在光学元件上设置第二涂层。 从光学元件的第二部分去除第一和第二涂层。

公开(公告)号：US20060072088A1

公开(公告)日：2006-04-06

申请号：US10957751

申请日：2004-10-05

Applicant: Matthew Lipson ,  Marcel Mathijs Dierichs ,  Sjoerd Nicolaas Donders ,  Johannes Catharinus Mulkens ,  Bob Streefkerk ,  Ronald Wilklow ,  Roel De Jonge

Inventor： Matthew Lipson ,  Marcel Mathijs Dierichs ,  Sjoerd Nicolaas Donders ,  Johannes Catharinus Mulkens ,  Bob Streefkerk ,  Ronald Wilklow ,  Roel De Jonge

IPC: G03B27/42

CPC classification number: G03F7/70341

Abstract: A lithographic apparatus is provided in which exposure is carried out by projecting through an aqueous solution of alkali metal halide(s), the solution being in contact with the substrate to be exposed.

Abstract translation: 提供了一种光刻设备，其中通过突出通过碱金属卤化物的水溶液进行曝光，该溶液与待暴露的基板接触。