公开(公告)号：US11011423B2

公开(公告)日：2021-05-18

申请号：US16204737

申请日：2018-11-29

Applicant: STATS ChipPAC Pte. Ltd.

Inventor： Thomas J. Strothmann ,  Damien M. Pricolo ,  Il Kwon Shim ,  Yaojian Lin ,  Heinz-Peter Wirtz ,  Seung Wook Yoon ,  Pandi C. Marimuthu

IPC: H01L23/522 ,  H01L21/78 ,  H01L23/28 ,  H01L23/31 ,  H01L21/56 ,  H01L23/00 ,  H01L23/498 ,  H01L21/683

Abstract: A semiconductor device has a carrier with a fixed size. A plurality of first semiconductor die is singulated from a first semiconductor wafer. The first semiconductor die are disposed over the carrier. The number of first semiconductor die on the carrier is independent from the size and number of first semiconductor die singulated from the first semiconductor wafer. An encapsulant is deposited over and around the first semiconductor die and carrier to form a reconstituted panel. An interconnect structure is formed over the reconstituted panel while leaving the encapsulant devoid of the interconnect structure. The reconstituted panel is singulated through the encapsulant. The first semiconductor die are removed from the carrier. A second semiconductor die with a size different from the size of the first semiconductor die is disposed over the carrier. The fixed size of the carrier is independent of a size of the second semiconductor die.

公开(公告)号：US10115672B2

公开(公告)日：2018-10-30

申请号：US15816743

申请日：2017-11-17

Applicant: STATS ChipPAC Pte. Ltd.

Inventor： Il Kwon Shim ,  Pandi C. Marimuthu ,  Yaojian Lin

IPC: H01L23/538 ,  H01L21/56 ,  H01L21/683 ,  H01L23/31 ,  H01L25/10 ,  H01L23/00 ,  H01L21/48 ,  H01L25/16

Abstract: A semiconductor device comprises a first conductive layer formed on a carrier over an insulating layer. A portion of the insulating layer is removed prior to forming the first conductive layer. A first semiconductor die is disposed over the first conductive layer. A discrete electrical component is disposed over the first conductive layer adjacent to the first semiconductor die. A first encapsulant is deposited over the first conductive layer and first semiconductor layer. A conductive pillar is formed through the first encapsulant between the first conductive layer and second conductive layer. A second encapsulant is deposited around the first encapsulant, first conductive layer, and first semiconductor die. A second conductive layer is formed over the first semiconductor die, first encapsulant, and second encapsulant opposite the first conductive layer. The carrier is removed after forming the second conductive layer. A semiconductor package is mounted to the first conductive layer.

公开(公告)号：US20170330840A1

公开(公告)日：2017-11-16

申请号：US15664734

申请日：2017-07-31

Applicant: STATS ChipPAC Pte. Ltd.

Inventor： Yaojian Lin ,  Byung Joon Han ,  Rajendra D. Pendse ,  Il Kwon Shim ,  Pandi C. Marimuthu ,  Won Kyoung Choi ,  Linda Pei Ee Chua

IPC: H01L23/552 ,  H01L21/683 ,  H01L23/00 ,  H01L21/56 ,  H01L23/538 ,  H01L23/498

CPC classification number: H01L23/552 ,  H01L21/561 ,  H01L21/568 ,  H01L21/6836 ,  H01L23/49816 ,  H01L23/5386 ,  H01L23/5389 ,  H01L24/19 ,  H01L24/24 ,  H01L24/96 ,  H01L24/97 ,  H01L2221/68327 ,  H01L2221/6834 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/24137 ,  H01L2224/24195 ,  H01L2224/73267 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2924/13091 ,  H01L2924/1815 ,  H01L2924/18162 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/19043 ,  H01L2924/19105 ,  H01L2924/3025 ,  H01L2924/3511 ,  H01L2224/03 ,  H01L2224/82 ,  H01L2924/00

Abstract: A semiconductor device has a first component. A modular interconnect structure is disposed adjacent to the first component. A first interconnect structure is formed over the first component and modular interconnect structure. A shielding layer is formed over the first component, modular interconnect structure, and first interconnect structure. The shielding layer provides protection for the enclosed semiconductor devices against EMI, RFI, or other inter-device interference, whether generated internally or from external semiconductor devices. The shielding layer is electrically connected to an external low-impedance ground point. A second component is disposed adjacent to the first component. The second component includes a passive device. An LC circuit includes the first component and second component. A semiconductor die is disposed adjacent to the first component. A conductive adhesive is disposed over the modular interconnect structure. The modular interconnect structure includes a height less than a height of the first component.

公开(公告)号：US20170098610A1

公开(公告)日：2017-04-06

申请号：US15380788

申请日：2016-12-15

Applicant: STATS ChipPAC Pte. Ltd.

Inventor： Il Kwon Shim ,  Jun Mo Koo ,  Pandi C. Marimuthu ,  Yaojian Lin ,  See Chian Lim

IPC: H01L23/538 ,  H01L23/00 ,  H01L23/31

CPC classification number: H01L23/5384 ,  H01L21/486 ,  H01L21/568 ,  H01L23/3128 ,  H01L23/3171 ,  H01L23/3192 ,  H01L23/481 ,  H01L23/49816 ,  H01L23/5386 ,  H01L23/5389 ,  H01L24/11 ,  H01L24/13 ,  H01L24/19 ,  H01L24/20 ,  H01L24/32 ,  H01L24/48 ,  H01L24/73 ,  H01L24/96 ,  H01L24/97 ,  H01L25/105 ,  H01L25/50 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/04105 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/1145 ,  H01L2224/11462 ,  H01L2224/11464 ,  H01L2224/11849 ,  H01L2224/11901 ,  H01L2224/12105 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48106 ,  H01L2224/48227 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/9222 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2225/0651 ,  H01L2225/0652 ,  H01L2225/06568 ,  H01L2225/06572 ,  H01L2225/1035 ,  H01L2225/1052 ,  H01L2225/1058 ,  H01L2924/00014 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/18162 ,  H01L2924/00012 ,  H01L2924/00 ,  H01L2924/01082 ,  H01L2224/03 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: A semiconductor device has a substrate including a base and a plurality of conductive posts extending from the base. The substrate can be a wafer-shape, panel, or singulated form. The conductive posts can have a circular, rectangular, tapered, or narrowing intermediate shape. A semiconductor die is disposed through an opening in the base between the conductive posts. The semiconductor die extends above the conductive posts or is disposed below the conductive posts. An encapsulant is deposited over the semiconductor die and around the conductive posts. The base and a portion of the encapsulant is removed to electrically isolate the conductive posts. An interconnect structure is formed over the semiconductor die, encapsulant, and conductive posts. An insulating layer is formed over the semiconductor die, encapsulant, and conductive posts. A semiconductor package is disposed over the semiconductor die and electrically connected to the conductive posts.

公开(公告)号：US20230012958A1

公开(公告)日：2023-01-19

申请号：US17936714

申请日：2022-09-29

Applicant: STATS ChipPAC Pte. Ltd.

Inventor： Yaojian Lin ,  Pandi C. Marimuthu ,  Il Kwon Shim ,  Byung Joon Han

IPC: H01L23/00 ,  H01L23/31 ,  H01L21/56 ,  H01L21/786 ,  H01L21/784 ,  H01L21/782 ,  H01L21/82 ,  H01L21/78

Abstract: A semiconductor device includes a semiconductor die and an encapsulant deposited over and around the semiconductor die. A semiconductor wafer includes a plurality of semiconductor die and a base semiconductor material. A groove is formed in the base semiconductor material. The semiconductor wafer is singulated through the groove to separate the semiconductor die. The semiconductor die are disposed over a carrier with a distance of 500 micrometers (μm) or less between semiconductor die. The encapsulant covers a sidewall of the semiconductor die. A fan-in interconnect structure is formed over the semiconductor die while the encapsulant remains devoid of the fan-in interconnect structure. A portion of the encapsulant is removed from a non-active surface of the semiconductor die. The device is singulated through the encapsulant while leaving encapsulant disposed covering a sidewall of the semiconductor die. The encapsulant covering the sidewall includes a thickness of 50 μm or less.

公开(公告)号：US11024561B2

公开(公告)日：2021-06-01

申请号：US16885640

申请日：2020-05-28

Applicant: STATS ChipPAC Pte. Ltd.

Inventor： Il Kwon Shim ,  Yaojian Lin ,  Pandi C. Marimuthu ,  Kang Chen ,  Yu Gu

IPC: H01L23/48 ,  H01L23/00 ,  H01L23/31 ,  H01L23/498 ,  H01L21/56 ,  H01L25/10 ,  H01L25/00 ,  H01L23/538

Abstract: A semiconductor device has a semiconductor package and an interposer disposed over the semiconductor package. The semiconductor package has a first semiconductor die and a modular interconnect unit disposed in a peripheral region around the first semiconductor die. A second semiconductor die is disposed over the interposer opposite the semiconductor package. An interconnect structure is formed between the interposer and the modular interconnect unit. The interconnect structure is a conductive pillar or stud bump. The modular interconnect unit has a core substrate and a plurality of vertical interconnects formed through the core substrate. A build-up interconnect structure is formed over the first semiconductor die and modular interconnect unit. The vertical interconnects of the modular interconnect unit are exposed by laser direct ablation. An underfill is deposited between the interposer and semiconductor package. A total thickness of the semiconductor package and build-up interconnect structure is less than 0.4 millimeters.

公开(公告)号：US20200294890A1

公开(公告)日：2020-09-17

申请号：US16885640

申请日：2020-05-28

Applicant: STATS ChipPAC Pte. Ltd.

Inventor： Il Kwon Shim ,  Yaojian Lin ,  Pandi C. Marimuthu ,  Kang Chen ,  Yu Gu

IPC: H01L23/48 ,  H01L23/00 ,  H01L23/31 ,  H01L23/498 ,  H01L21/56 ,  H01L25/10 ,  H01L25/00 ,  H01L23/538

Abstract: A semiconductor device has a semiconductor package and an interposer disposed over the semiconductor package. The semiconductor package has a first semiconductor die and a modular interconnect unit disposed in a peripheral region around the first semiconductor die. A second semiconductor die is disposed over the interposer opposite the semiconductor package. An interconnect structure is formed between the interposer and the modular interconnect unit. The interconnect structure is a conductive pillar or stud bump. The modular interconnect unit has a core substrate and a plurality of vertical interconnects formed through the core substrate. A build-up interconnect structure is formed over the first semiconductor die and modular interconnect unit. The vertical interconnects of the modular interconnect unit are exposed by laser direct ablation. An underfill is deposited between the interposer and semiconductor package. A total thickness of the semiconductor package and build-up interconnect structure is less than 0.4 millimeters.

公开(公告)号：US20200227383A1

公开(公告)日：2020-07-16

申请号：US16827363

申请日：2020-03-23

Applicant: STATS ChipPAC Pte. Ltd.

Inventor： Byung Joon Han ,  Il Kwon Shim ,  Yaojian Lin ,  Pandi C. Marimuthu

IPC: H01L23/00 ,  H01L21/56 ,  H01L23/31 ,  H01L21/78

Abstract: A semiconductor device includes a standardized carrier. A semiconductor wafer includes a plurality of semiconductor die and a base semiconductor material. The semiconductor wafer is singulated through a first portion of the base semiconductor material to separate the semiconductor die. The semiconductor die are disposed over the standardized carrier. A size of the standardized carrier is independent from a size of the semiconductor die. An encapsulant is deposited over the standardized carrier and around the semiconductor die. An interconnect structure is formed over the semiconductor die while leaving the encapsulant devoid of the interconnect structure. The semiconductor device is singulated through the encapsulant. Encapsulant remains disposed on a side of the semiconductor die. Alternatively, the semiconductor device is singulated through a second portion of the base semiconductor and through the encapsulant to remove the second portion of the base semiconductor and encapsulant from the side of the semiconductor die.

公开(公告)号：US10707150B2

公开(公告)日：2020-07-07

申请号：US16030668

申请日：2018-07-09

Applicant: STATS ChipPAC Pte. Ltd.

Inventor： Il Kwon Shim ,  Yaojian Lin ,  Pandi C. Marimuthu ,  Kang Chen ,  Yu Gu

IPC: H01L23/48 ,  H01L23/00 ,  H01L23/31 ,  H01L23/498 ,  H01L21/56 ,  H01L25/10 ,  H01L25/00 ,  H01L23/538

Abstract: A semiconductor device has a semiconductor package and an interposer disposed over the semiconductor package. The semiconductor package has a first semiconductor die and a modular interconnect unit disposed in a peripheral region around the first semiconductor die. A second semiconductor die is disposed over the interposer opposite the semiconductor package. An interconnect structure is formed between the interposer and the modular interconnect unit. The interconnect structure is a conductive pillar or stud bump. The modular interconnect unit has a core substrate and a plurality of vertical interconnects formed through the core substrate. A build-up interconnect structure is formed over the first semiconductor die and modular interconnect unit. The vertical interconnects of the modular interconnect unit are exposed by laser direct ablation. An underfill is deposited between the interposer and semiconductor package. A total thickness of the semiconductor package and build-up interconnect structure is less than 0.4 millimeters.

公开(公告)号：US20200090954A1

公开(公告)日：2020-03-19

申请号：US16687865

申请日：2019-11-19

Applicant: STATS ChipPAC Pte. Ltd.

Inventor： Yaojian Lin ,  Heinz-Peter Wirtz ,  Seung Wook Yoon ,  Pandi C. Marimuthu

IPC: H01L21/56 ,  H01L23/28 ,  H01L21/78 ,  H01L23/00 ,  H01L23/31 ,  H01L21/3105

Abstract: A semiconductor device has a semiconductor wafer including a plurality of semiconductor die. An insulating layer is formed over the semiconductor wafer. A portion of the insulating layer is removed by LDA to expose a portion of an active surface of the semiconductor die. A first conductive layer is formed over a contact pad on the active surface of the semiconductor die. The semiconductor wafer is singulated to separate the semiconductor die. The semiconductor die is disposed over a carrier with the active surface of the semiconductor die offset from the carrier. An encapsulant is deposited over the semiconductor die and carrier to cover a side of the semiconductor die and the exposed portion of the active surface. An interconnect structure is formed over the first conductive layer. Alternatively, a MUF material is deposited over a side of the semiconductor die and the exposed portion of the active surface.