公开(公告)号：US20210082725A1

公开(公告)日：2021-03-18

申请号：US16849631

申请日：2020-04-15

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jaehwang JUNG ,  Gwangsik Park ,  Wookrae Kim ,  Juntaek Oh

IPC: H01L21/67 ,  G02B27/28 ,  G02B27/42 ,  G02B27/30 ,  G01N21/25 ,  G01N21/27 ,  G01N21/21 ,  G01N21/88 ,  G01N21/95 ,  G02B27/10 ,  G06T7/00

Abstract: Provided is a wafer inspection apparatus including a monochromator that extracts monochromatic light, a collimator that outputs the monochromatic light as parallel light, a first polarization assembly that polarizes the parallel light and radiates the polarized light to a wafer, an imaging optical system that condenses light reflected from the wafer, a spectroscope that splits the condensed light into a plurality of spectrums, a first lens that condenses the plurality of spectrums, a second polarization assembly that outputs the plurality of spectrums as a plurality of polarized lights having different diffraction orders and a difference of 90°, a second lens that condenses the plurality of polarized lights, a third polarization assembly that outputs common polarized light based on the plurality of polarized interfering with each other, a camera that generates a phase difference image based on the common polarized light, and a signal processor that analyzes the phase difference image.