Abstract:
A process for manufacturing a vacuum enclosure for a semiconductor device formed on a substrate with leads extending peripherally. Assembly of the enclosure is compatible with known batch fabrication techniques and is carried out at pressures required for optimal device operation. In a first embodiment, an intrinsic silicon shell is sealed to the substrate via electrostatic or anodic bonding with the leads diffusing into the shell. In a second embodiment, a thin interface layer of silicon or polysilicon is deposited on the substrate prior to electrostatic bonding a glass shell thereon. In a third embodiment, tunnels are formed between a lower peripheral edge of the shell and the substrate, allowing leads to pass thereunder. The tunnels are sealed by a dielectric material applied over the enclosure.
Abstract:
Methods and structures are provided which support spacer walls in a position which facilitates installation of the spacer walls between a faceplate structure and a backplate structure of a flat panel display. In one embodiment, spacer feet are formed at opposing ends of the spacer wall. These spacer feet can be formed of materials such as ceramic, glass and/or glass frit. The spacer feet support the corresponding spacer wall on the faceplate (or backplate) structure. Tacking electrodes can be provided on the faceplate (or backplate) structure to assert an electrostatic force on the spacer feet, thereby holding the spacer feet in place during installation of the spacer wall. The spacer wall can be mechanically and/or thermally expanded prior to attaching both ends of the spacer wall to the faceplate (or backplate) structure. The spacer wall is then allowed to contract, thereby introducing tension into the spacer wall which tends to straighten any inherent waviness in the spacer wall. Alternatively, spacer clips can be clamped onto opposing ends of a spacer wall to support the spacer wall during installation. The spacer clips can provide electrical connections to face electrodes located on the spacer wall.
Abstract:
A micro-machined absolute pressure sensor and process for making the same. A semiconductor membrane having a welled portion connected to a planar periphery is formed in recess in a silicon substrate through etching and boron diffusion. A dielectric pad is formed on a portion of the planar periphery, and a bonding layer of polysilicon or amorphous silicon is deposited over the semiconductor membrane and the dielectric pad. After an etching process that defines the outline of the semiconductor membrane, the bonding layer is bonded to a nonconductive substrate in a vacuum using electrostatic bonding or wafer bonding, forming a vacuum-sealed reference cavity. A first and a second conductor are disposed on an upper surface of the nonconductive substrate. The first conductor serves as a capacitor plate disposed within the reference cavity and is connected to a transfer lead that passes from the cavity. The transfer lead is electrically isolated from the semiconductor membrane by the dielectric pad. The second conductor is electrically connected to the semiconductor membrane. The semiconductor membrane and the capacitor plate store an electrical charge that varies as a function of the distance between the capacitor plate and the semiconductor membrane. The semiconductor membrane flexes in response to pressure, changing the capacitance and the charge, so as to indicate the pressure of external fluid acting on the semiconductor membrane.
Abstract:
A monolithic flow controller for controlling the rate at which a medicinal liquid is administered to a patient. The monolithic flow controller includes one or more virtual valves that, because of their relatively small opening size (less than 0.5 &mgr;m in diameter), only permit fluid to flow through the valve when a forward bias voltage is applied. If a reverse bias voltage or no voltage is applied, fluid flow through the opening is inhibited. The fluid rate through the device is monitored using two pressure sensors or a differential pressure sensor that determine the differential pressure along the flow path through the device or relative to the external ambient pressure. The flow through the device is equal to the product of the differential pressure and the conductance of the channel in the flow controller. A capacitive bubble sensor is optionally provided to detect bubbles in the medicinal liquid being administered to the patient. The flow controller can be made sufficiently small to be injected into a patient's cardiovascular system or other portion of the patient's body through a hypodermic syringe and needle, or it can be implanted in the patient's body at a desired site. The medicinal liquid can be contained within an integral pressurized fluid reservoir, administered by gravity feed, or conveyed by a pump to an inlet port of the flow controller.
Abstract:
A high-performance switched-capacitor circuit for electronic read-out of a pressure sensor-based ultrasensitive microflow transducer. The microflow transducer uses a differential capacitive pressure sensor to measure flow. Read-out electronics associated with the transducer feature a clocking speed of 100 KHz and drive loads up to 35 pF. The read-out electronics include a high DC gain that nulls out stray input capacitance, which is beneficial for the multichip realization of the microflow transducer disclosed herein. The uncompensated linearity of the overall read-out electronics is 10 bits, and the pressure/flow resolution is 12 bits. An ultrasensitive membrane associated with the pressure sensor does not respond to a pulsed waveform for frequencies above 50 KHz. But for lower frequencies, it deflects in response to the time-average voltage applied across the capacitor plates of the pressure sensor. A self-test mode is provided which employs an extremely long pre-charge pulse. An integrated flowmeter package including transducer and circuitry, and a second circuit for extending the range of the microflowmeter circuitry are also disclosed.