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公开(公告)号：US20220241893A1
公开(公告)日：2022-08-04
申请号：US17658825
申请日：2022-04-12
Applicant: View, Inc.
Inventor： Abhishek Anant Dixit , Todd William Martin , Anshu A. Pradhan , Fabian Strong , Robert T. Rozbicki
IPC: B23K26/0622 , H01L27/144 , G02F1/153 , B23K26/082 , B23K26/402 , B23K26/57 , B23K26/08 , B23K26/38 , E06B9/24 , B23K26/361 , G02F1/1524 , B32B17/06 , C03B33/07 , H01B5/14 , G02F1/155 , G02F1/1523
Abstract: Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.
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公开(公告)号：US10520783B2
公开(公告)日：2019-12-31
申请号：US15537370
申请日：2015-12-15
Applicant: View, Inc.
Inventor： Sridhar Karthik Kailasam , Dhairya Shrivastava , Zhiwei Cai , Robert T. Rozbicki , Dane Thomas Gillaspie , Todd William Martin , Anshu A. Pradhan , Ronald M. Parker
IPC: G02F1/153
Abstract: Methods are provided for fabricating electrochromic devices that mitigate formation of short circuits under a top bus bar without predetermining where top bus bars will be applied on the device. Devices fabricated using such methods may be deactivated under the top bus bar, or may include active material under the top bus bar. Methods of fabricating devices with active material under a top bus bar include depositing a modified top bus bar, fabricating self-healing layers in the electrochromic device, and modifying a top transparent conductive layer of the device prior to applying bus bars.
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公开(公告)号：US20170371218A1
公开(公告)日：2017-12-28
申请号：US15537370
申请日：2015-12-15
Applicant: VIEW, INC.
Inventor： Sridhar Karthik Kailasam , Dhairya Shrivastava , Zhiwei Cai , Robert T. Rozbicki , Dane Thomas Gillaspie , Todd William Martin , Anshu A. Pradhan , Ronald M. Parker
IPC: G02F1/153
Abstract: Methods are provided for fabricating electrochromic devices that mitigate formation of short circuits under a top bus bar without predetermining where top bus bars will be applied on the device. Devices fabricated using such methods may be deactivated under the top bus bar, or may include active material under the top bus bar. Methods of fabricating devices with active material under a top bus bar include depositing a modified top bus bar, fabricating self-healing layers in the electrochromic device, and modifying a top transparent conductive layer of the device prior to applying bus bars.
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公开(公告)号：US11865632B2
公开(公告)日：2024-01-09
申请号：US17658825
申请日：2022-04-12
Applicant: View, Inc.
Inventor： Abhishek Anant Dixit , Todd William Martin , Anshu A. Pradhan , Fabian Strong , Robert T. Rozbicki
IPC: B23K26/0622 , H01L27/144 , G02F1/153 , B23K26/082 , B23K26/402 , B23K26/57 , B23K26/08 , B23K26/38 , E06B9/24 , B23K26/361 , G02F1/1524 , B32B17/06 , C03B33/07 , H01B5/14 , G02F1/155 , G02F1/1523 , B23K103/16 , B23K103/18 , B23K101/40 , B23K103/00
CPC classification number: B23K26/0624 , B23K26/082 , B23K26/0846 , B23K26/361 , B23K26/38 , B23K26/402 , B23K26/57 , B32B17/06 , C03B33/076 , E06B9/24 , G02F1/153 , G02F1/155 , G02F1/1523 , G02F1/1524 , G02F1/1533 , H01B5/14 , H01L27/1443 , B23K2101/40 , B23K2103/172 , B23K2103/18 , B23K2103/54 , E06B2009/2464
Abstract: Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.
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15.发明申请公开(公告)号：US20230074891A1
公开(公告)日：2023-03-09
申请号：US18049626
申请日：2022-10-25
Applicant: View, Inc.
Abstract: Certain embodiments relate to optical devices and methods of fabricating optical devices that pre-treat a sub-layer to enable selective removal of the pre-treated sub-layer and overlying layers. Other embodiments pertain to methods of fabricating an optical device that apply a sacrificial material layer.
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Patent Agency Ranking
公开(公告)号：US11559852B2
公开(公告)日：2023-01-24
申请号：US16947841
申请日：2020-08-19
Applicant: View, Inc.
Inventor： Abhishek Anant Dixit , Todd William Martin , Anshu A. Pradhan , Fabian Strong , Robert T. Rozbicki
IPC: B23K26/082 , B23K26/0622 , H01L27/144 , G02F1/153 , B23K26/402 , B23K26/57 , B23K26/08 , B23K26/38 , E06B9/24 , B23K26/361 , G02F1/1524 , B32B17/06 , C03B33/07 , H01B5/14 , G02F1/155 , G02F1/1523 , B23K103/16 , B23K103/18 , B23K101/40 , B23K103/00
Abstract: Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.
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公开(公告)号：US20220244609A1
公开(公告)日：2022-08-04
申请号：US17658432
申请日：2022-04-07
Applicant: View, Inc.
Inventor： Abhishek Anant Dixit , Todd William Martin , Anshu A. Pradhan , Gordon E. Jack , Yashraj Bhatnagar
Abstract: Bus bar configurations and fabrication methods for non-rectangular shaped (e.g., triangular, trapezoidal, circular, pentagonal, hexagonal, arched, etc.) optical devices.
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公开(公告)号：US10802371B2
公开(公告)日：2020-10-13
申请号：US15539650
申请日：2015-12-24
Applicant: View, Inc. , Abhishek Anant Dixit , Todd William Martin , Anshu A. Pradhan , Fabian Strong
Inventor： Abhishek Anant Dixit , Todd William Martin , Anshu A. Pradhan , Fabian Strong , Robert T. Rozbicki
IPC: G02F1/153 , G02F1/1523 , G02F1/155 , H01L27/144 , B23K26/082 , B23K26/402 , B23K26/57 , B23K26/08 , B23K26/0622 , B23K26/38 , E06B9/24 , B23K26/361 , B32B17/06 , C03B33/07 , H01B5/14 , B23K103/18 , B23K101/40 , B23K103/00 , B23K103/16
Abstract: Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.
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公开(公告)号：US20190339579A1
公开(公告)日：2019-11-07
申请号：US16453891
申请日：2019-06-26
Applicant: View, Inc.
Inventor： Sridhar Karthik Kailasam , Dhairya Shrivastava , Zhiwei Cai , Robert T. Rozbicki , Dane Thomas Gillaspie , Todd William Martin , Anshu A. Pradhan , Ronald M. Parker
IPC: G02F1/153
Abstract: Methods are provided for fabricating electrochromic devices that mitigate formation of short circuits under a top bus bar without predetermining where top bus bars will be applied on the device. Devices fabricated using such methods may be deactivated under the top bus bar, or may include active material under the top bus bar. Methods of fabricating devices with active material under a top bus bar include depositing a modified top bus bar, fabricating self-healing layers in the electrochromic device, and modifying a top transparent conductive layer of the device prior to applying bus bars.
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公开(公告)号：US20190171076A1
公开(公告)日：2019-06-06
申请号：US16249822
申请日：2019-01-16
Applicant: View, Inc.
Inventor： Sridhar Karthik Kailasam , Dhairya Shrivastava , Zhiwei Cai , Robert T. Rozbicki , Dane Thomas Gillaspie , Todd William Martin , Anshu A. Pradhan , Ronald M. Parker
IPC: G02F1/153
Abstract: Methods are provided for fabricating electrochromic devices that mitigate formation of short circuits under a top bus bar without predetermining where top bus bars will be applied on the device. Devices fabricated using such methods may be deactivated under the top bus bar, or may include active material under the top bus bar. Methods of fabricating devices with active material under a top bus bar include depositing a modified top bus bar, fabricating self-healing layers in the electrochromic device, and modifying a top transparent conductive layer of the device prior to applying bus bars.
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