公开(公告)号：US20040070760A1

公开(公告)日：2004-04-15

申请号：US10333415

申请日：2003-09-11

Inventor： Jean-Louis Stehle ,  Jean-Philippe Piel ,  Pierre Boher ,  Luc Tantart ,  Jean-Pierre Rey

IPC: G01J004/00

CPC classification number: G01J4/04 ,  G01N21/211

Abstract: The invention concerns an ellipsometer comprising: a source (2) capable of emitting a broadband ray (4), a polarizer (10) for producing a polarised incident beam (12) adapted to illuminate a sample (16) according to at least a selected angle; an analyzer (24) providing an output beam (28) in response to said reflected beam (20) and at least a reflecting optical element (14) arranged between the source (2) and the sample (16) and/or between the sample (16) and the sensor, and capable of focusing the incident beam (12) and/or the reflected beam (20) according to a selected spot The ellipsometer further comprises at least a first refracting optical element (22) arranged between the sample (16) and the sensor and/or between the source (2) and the sample (16) to collect and focus said reflected beam and/or said incident beam, thereby enabling to provide at least a refracting element (22) and a reflecting element (14) on either side of the sample (16) and hence to place the source and the sensor on the same side relative to said spot.

Abstract translation: 本发明涉及一种椭偏仪，包括：能够发射宽带射线（4）的源极（2），用于产生适于根据至少一个所选择的照射样品（16）的偏振入射光束（12）的偏振器（10） 角度; 响应于所述反射光束（20）提供输出光束（28）的分析器（24）和布置在光源（2）和样品（16）之间和/或样品之间的至少一个反射光学元件（14） （16）和传感器，并且能够根据所选择的点聚焦入射光束（12）和/或反射光束（20）。椭偏仪还包括至少第一折射光学元件（22），其布置在样品 16）和传感器和/或在源（2）和样品（16）之间收集和聚焦所述反射光束和/或所述入射光束，从而能够提供至少折射元件（22）和反射元件 （14）在样品（16）的任一侧上，并且因此将源和传感器放置在相对于所述点的相同侧上。

公开(公告)号：US20040046959A1

公开(公告)日：2004-03-11

申请号：US10660984

申请日：2003-09-12

Inventor： Steven W. Meeks ,  Rusmin Kadinar

IPC: G01J004/00 ,  G01B011/28

CPC classification number: G01B11/303 ,  G01B11/065 ,  G01N21/211

Abstract: A system and method for performing a magnetic imaging, optical profiling, and measuring lubricant thickness and degradation, carbon wear, carbon thickness, and surface roughness of thin film magnetic disks and silicon wafers at angles that are not substantially Brewster's angle of the thin film (carbon) protective overcoat is provided. The system and method involve a focused optical light whose polarization can be switched between P or S polarization is incident at an angle to the surface of the thin film magnetic disk. This generates both reflected and scattered light that may be measured to determine various values and properties related to the surface of the disk, including identifying the Kerr-effect in reflected light for determination of point magnetic properties. In addition, the present invention can mark the position of an identified defect.

Abstract translation: 用于以基本上不是薄膜的布鲁斯特角的角度执行磁性成像，光学轮廓和测量润滑剂厚度和降解，碳磨损，碳厚度和薄膜磁盘和硅晶片的表面粗糙度的系统和方法（ 碳）保护罩。 该系统和方法涉及一种聚焦的光，其偏振可以在P或S之间切换，偏振以一定角度入射到薄膜磁盘的表面。 这产生可以测量的反射和散射光，以确定与盘的表面相关的各种值和性质，包括识别用于确定点磁性的反射光中的克尔效应。 此外，本发明可以标识所识别的缺陷的位置。

公开(公告)号：US20040001202A1

公开(公告)日：2004-01-01

申请号：US10398318

申请日：2003-04-07

Inventor： Stephane Caplette ,  Sylvain Cloutier ,  Charles Massicotte ,  Alain Villeneuve

IPC: G01J004/00

CPC classification number: G01M11/00 ,  G01M11/33 ,  G01M11/337

Abstract: This invention provides a method of obtaining accurate measurements of polarization dependent loss and insertion loss during the tests aiming at measuring the polarization properties of optical components. This is achieved by taking into account every polarization disturbance in the line between generation of known states of polarization and the device under test. The method involves computing within a desired range of wavelengths either the transfer matrix of each polarization perturbing element or of all polarization perturbing elements as a whole, and compensating for errors introduced by these polarization perturbing elements.

Abstract translation: 本发明提供了一种在针对测量光学部件的偏振特性的测试期间获得精确测量偏振相关损耗和插入损耗的方法。 这是通过考虑在已知的极化状态的产生和被测器件之间的线中的每个极化扰动来实现的。 该方法涉及在期望的波长范围内计算每个偏振扰动元件的传递矩阵或者所有极化扰动元件的整体，并补偿由这些偏振扰动元件引入的误差。

公开(公告)号：US20030231311A1

公开(公告)日：2003-12-18

申请号：US10174778

申请日：2002-06-18

Inventor： Rodney S. Tucker

IPC: G01J004/00

CPC classification number: G01M11/33

Abstract: A method and apparatus for determining polarization-resolved scattering parameters of an optical device. A method comprises stimulating a port of the optical device with a stimulation field having at least two polarization states, measuring the optical field emerging from the port in amplitude and phase, and calculating the scattering parameters using the measurements. By stimulating a port of an optical device with a stimulation field having at least two different polarization states, measurements needed to determine scattering parameters of the optical device can be conducted by stimulating the port with only one sweep of a swept optical source.

Abstract translation: 一种用于确定光学器件的偏振分辨散射参数的方法和装置。 一种方法包括用具有至少两个偏振状态的刺激场刺激光学装置的端口，测量在振幅和相位上从端口出现的光场，并使用该测量来计算散射参数。 通过用具有至少两个不同偏振态的刺激场刺激光学装置的端口，可以通过仅扫描扫描光源的一个扫描来刺激端口来进行确定光学装置的散射参数所需的测量。

公开(公告)号：US20030210394A1

公开(公告)日：2003-11-13

申请号：US10462151

申请日：2003-06-16

Inventor： Lanhua Wei

IPC: G01J004/00

CPC classification number: G01B11/0625 ,  G01B11/16

Abstract: A composite metrology tool, measures basic optical parameters of thin films (e.g., thickness, index of refraction, and birefringence) and stress (e.g., wafer displacements, such as bow and warp). These measurements are combined (e.g. in a processor) using optimization techniques to yield accurate overall information of the wafer parameters.

Abstract translation: 复合计量工具，测量薄膜的基本光学参数（例如，厚度，折射率和双折射）和应力（例如，晶片位移，例如弓和翘曲）。 使用优化技术将这些测量结合（例如在处理器中）以产生晶片参数的准确的总体信息。

公开(公告)号：US20030137662A1

公开(公告)日：2003-07-24

申请号：US10056271

申请日：2002-01-23

Inventor： Gary R. Janik ,  Patrick M. Maxton

IPC: G01J004/00

CPC classification number: G01N21/211

Abstract: A system for analyzing a thin film uses an energy beam, such as a laser beam, to remove a portion of a contaminant layer formed on the thin film surface. This cleaning operation removes only enough of the contaminant layer to allow analysis of the underlying thin film, thereby enhancing analysis throughput while minimizing the chances of recontamination and/or damage to the thin film. An energy beam source can be readily incorporated into a conventional thin film analysis tool, thereby minimizing total analysis system footprint. Throughput can be maximized by focusing the probe beam (or probe structure) for the analysis operation at the same location as the energy beam so that repositioning is not required after the cleaning operation. Alternatively, the probe beam (structure) and the energy beam can be directed at different locations to reduce the chances of contamination of the analysis optics.

Abstract translation: 用于分析薄膜的系统使用诸如激光束的能量束来去除形成在薄膜表面上的污染物层的一部分。 这种清洁操作仅去除了足够的污染物层，以便分析下面的薄膜，从而提高分析产量，同时最小化再沉淀和/或损坏薄膜的机会。 能量束源可以容易地结合到传统的薄膜分析工具中，从而最小化总分析系统占用空间。 通过将探测光束（或探针结构）聚焦在与能量束相同的位置处，可以最大化吞吐量，从而在清洁操作之后不需要重新定位。 或者，探针光束（结构）和能量束可以被引导到不同的位置，以减少分析光学器件的污染机会。

公开(公告)号：US20030128360A1

公开(公告)日：2003-07-10

申请号：US10040372

申请日：2002-01-09

Inventor： Dae Gab Gweon ,  Sung Lim Park ,  Jae Wha Jeong

IPC: G01J004/00

CPC classification number: G01N21/211 ,  G01N2021/0339 ,  G01N2021/214

Abstract: An ellipsometer for aligning incident angle comprising: a main frame shaping half circle and flat surface on which a plurality of grooves are radial and circumferential directionally carved; a specimen stage, which is installed at the groove-caved surface of the main frame, for tilting a specimen on a upper surface of the specimen stage with respect to horizontal direction and translating the specimen upward and downward; a polarizing unit, which is capable of fixing and moving on the groove-carved surface of the main frame, for polarizing a light from a light source and outputting the polarized light to the specimen, and moving on the groove-carved surface; and a light detecting unit, which is capable of fixing and moving on the groove-carved surface, for a reflection light from the specimen.

Abstract translation: 一种用于对准入射角的椭圆光度计，包括：成形半圆形的主框架和平坦表面，多个凹槽在其上沿径向和周向定向雕刻; 安装在主框架的凹槽凹部的表面上的试样台，用于使试样台的上表面相对于水平方向倾斜试样并使试样上下移动; 偏光单元，其能够固定和移动在主框架的凹槽表面上，用于使来自光源的光偏振并将偏振光输出到样本，并且在凹槽表面上移动; 以及光检测单元，其能够在凹槽表面上固定和移动来自样本的反射光。

公开(公告)号：US20030117625A1

公开(公告)日：2003-06-26

申请号：US10322840

申请日：2002-12-18

Applicant: Ando Electric Co., Ltd.

Inventor： Kiyohisa Fujita

IPC: G01J004/00

CPC classification number: G01M11/337

Abstract: Wavelength dependent measurement is made by launching light into an object 8 to be measured and receiving transmitted light from the object 8 while continuously changing wavelengths of output light. Next, peak wavelength detection processing for detecting a wavelength at the time when loss or gain of the transmitted light from the object 8 becomes maximum based on a wavelength dependent measurement result is performed. Then, polarization dependent loss measurement processing for measuring polarization dependent loss of the object 8 is performed by measuring the transmitted light from the object 8 while launching light of a measurement wavelength detected into the object 8 and randomly changing a polarization state of the light. Further, a control circuit processes associating a wavelength dependent analysis result with a PDL measurement result, and displays its result on a display part 2.

Abstract translation: 通过将光发射到待测量的对象8中并且在连续改变输出光的波长的同时接收来自对象8的透射光而进行波长依赖测量。 接着，进行基于波长相关测量结果来检测来自对象8的透射光的损失或增益变为最大时的波长的峰值波长检测处理。 然后，通过在检测到对象8的测量波长的光的同时测量来自对象8的透射光并随机改变光的偏振状态来进行用于测量对象8的偏振相关损耗的偏振相关损耗测量处理。 此外，控制电路处理将波长相关分析结果与PDL测量结果相关联，并将其结果显示在显示部分2上。

公开(公告)号：US20030090658A1

公开(公告)日：2003-05-15

申请号：US10272357

申请日：2002-10-15

Applicant: The Regents of The University of California

Inventor： Xiangdong Zhu

IPC: G01J004/00

CPC classification number: G01N21/211

Abstract: Methods and instruments are provided for measuring differences in fractional reflectivity changes between transverse electric (TE or s-polarized) and transverse magnetic (TM or p-polarized components of an obliquely incident light with high sensitivity and low noise. Also provided are high sensitivity, low noise methods and instruments for measuring differences in fractional reflectivity changes between R-polarized (right-circularly polarized) and L-polarized (left-circularly polarized) components of a near-normal incident light. The methods take advantage of a nulling step to minimize harmonics of the optical signal derived from a first sample. Determination of odd and even harmonics of the optical signal derived from a second sample allows determination of refractive index and optical absorption coefficient differences between two samples to be determined with high sensitivity and low noise.

Abstract translation: 提供了用于测量横向电（TE或s极化）与横向磁性（TM或P偏振成分的倾斜入射光的高灵敏度和低噪声）之间的分数反射率变化差异的方法和仪器，还提供了高灵敏度， 低噪声方法和仪器，用于测量近正态入射光的R极化（右圆极化）和L-极化（左圆极化）分量之间的分数反射率变化的差异，该方法利用了归零步骤 使从第一样本得到的光信号的谐波最小化确定从第二样本导出的光信号的奇次谐波和偶次谐波允许以高灵敏度和低噪声确定两个样本之间的折射率和光吸收系数差。

公开(公告)号：US20030081210A1

公开(公告)日：2003-05-01

申请号：US10280806

申请日：2002-10-25

Inventor： Fumitaro Masaki ,  Akira Miyake

IPC: G01J004/00

CPC classification number: G03F7/70566 ,  G01N21/21 ,  G01N23/20

Abstract: An optical apparatus that measures a polarization dependent characteristic of a measured object includes a light source for emitting non-linearly polarized light in an extreme ultraviolet region or an X-ray region, and a rotary polarizer for reflecting the light emitted from the light source, the polarizer including a set of mirrors repeating three or more reflections and being arranged such that an optical axis of incident light and that of outgoing light are aligned with the same straight line.

Abstract translation: 测量被测物体的偏振相关特性的光学装置包括用于发射极紫外区域或X射线区域的非线性偏振光的光源和用于反射从光源发出的光的旋转偏振器， 所述偏振器包括重复三个或更多个反射的一组反射镜并且被布置成使得入射光的光轴和出射光的光轴与相同的直线对准。