公开(公告)号：US09285271B2

公开(公告)日：2016-03-15

申请号：US14313122

申请日：2014-06-24

Applicant: SEIKO EPSON CORPORATION

Inventor： Takahiko Yoshizawa

IPC: H01L31/0352 ,  G01J3/02 ,  H01L29/06 ,  G01J3/36 ,  G01J1/04 ,  G02B5/20 ,  G02B5/28 ,  H01L31/0216 ,  H01L31/0232 ,  H01L31/0236 ,  H01L31/18 ,  G01J3/12

CPC classification number: G01J3/0256 ,  B81B2201/047 ,  B81B2203/0384 ,  G01J1/0488 ,  G01J3/36 ,  G01J2003/1213 ,  G02B5/201 ,  G02B5/285 ,  H01L29/06 ,  H01L31/02165 ,  H01L31/02327 ,  H01L31/02366 ,  H01L31/18

Abstract: A method for manufacturing a sloped structure is disclosed. The method includes the steps of: (a) forming a sacrificial film above a substrate; (b) forming a first film above the sacrificial film, the first film having a first portion connected to the substrate, a second portion located above the sacrificial film, a third portion located between the first portion and the second portion, and a thin region in a portion of the third portion or in a boundary section between the second portion and the third portion and having a thickness smaller than the first portion; (c) removing the sacrificial film; and (d) bending the first film in the thin region, after the step (c), thereby sloping the second portion of the first film with respect to the substrate.

Abstract translation: 公开了一种倾斜结构的制造方法。 该方法包括以下步骤：（a）在衬底上形成牺牲膜; （b）在所述牺牲膜上形成第一膜，所述第一膜具有连接到所述基板的第一部分，位于所述牺牲膜上方的第二部分，位于所述第一部分和所述第二部分之间的第三部分，以及薄区域 在所述第三部分的一部分中或在所述第二部分和所述第三部分之间的边界部分中，并且具有小于所述第一部分的厚度; （c）去除牺牲膜; 以及（d）在步骤（c）之后，在薄区域中弯曲第一膜，从而使第一膜的第二部分相对于基板倾斜。

公开(公告)号：US20160068749A1

公开(公告)日：2016-03-10

申请号：US14442083

申请日：2013-11-07

Applicant: LMS CO., LTD.

Inventor： Doo Hyo Kwon ,  Jeong Og Choi ,  Oh Kwan Kwon

IPC: C09K11/88 ,  H01L33/56 ,  C09K11/02 ,  H01L33/50

CPC classification number: C09K11/883 ,  C09K11/02 ,  C09K11/025 ,  C09K11/7706 ,  F21V3/049 ,  G02B5/0221 ,  G02B5/0278 ,  G02B5/201 ,  G02B6/005 ,  G02B6/0051 ,  G02B6/0053 ,  G02B6/0065 ,  H01L33/507 ,  H01L33/56

Abstract: A composite includes at least one quantum dot, and a wax-based compound that covers a surface of the quantum dot. The composite has remarkable quantum efficiency, a small variation in emission peak even when dispersed in a resin, good dispersion stability, good ultraviolet light stability and good heat/moisture stability.

Abstract translation: 复合材料包括至少一个量子点和覆盖量子点表面的蜡基化合物。 该复合材料具有卓越的量子效率，即使分散在树脂中时发射峰的变化也很小，分散稳定性好，紫外光稳定性好，热稳定性好。

公开(公告)号：US09279923B2

公开(公告)日：2016-03-08

申请号：US13850297

申请日：2013-03-26

Applicant: UNITED MICROELECTRONICS CORPORATION

Inventor： Cheng-Hung Yu

IPC: G02B5/22 ,  G02B5/20 ,  G03F7/00

CPC classification number: G02B5/201 ,  G03F7/0007

Abstract: A method for fabricating a color filter layer, which is applied to an integrated circuit manufacturing process, includes the following steps. Firstly, a substrate is provided, and a groove structure is formed on the substrate. The groove structure includes a plurality of positive photoresist patterns and a plurality of trenches. Then, a first group of color filter patterns is formed in the trenches. The plurality of positive photoresist patterns is removed, so that a portion of a top surface of the substrate is exposed. Then, a second group of color filter patterns is formed on the exposed top surface of the substrate.

Abstract translation: 应用于集成电路制造工艺的制造滤色器层的方法包括以下步骤。 首先，设置基板，在基板上形成槽结构。 凹槽结构包括多个正光致抗蚀剂图案和多个沟槽。 然后，在沟槽中形成第一组滤色器图案。 去除多个正光致抗蚀剂图案，使得基板的顶表面的一部分被暴露。 然后，在曝光的基板的顶表面上形成第二组滤色器图案。

公开(公告)号：US20160065814A1

公开(公告)日：2016-03-03

申请号：US14694649

申请日：2015-04-23

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Doyoon KIM ,  Ilhwan KIM ,  Jesada UNGNAPATANIN

IPC: H04N5/225 ,  G02B5/20 ,  G02B1/10 ,  H04N9/04

CPC classification number: H04N5/2254 ,  G02B1/10 ,  G02B5/201 ,  H04N9/045 ,  H04N9/07

Abstract: A color filter array, a method of manufacturing the same, and an image sensor including the same are provided. The color filter array includes: a color filter arrangement including a plurality of color filters on a substrate; and an isolation wall which isolates each of the color filters and includes a solid including a plurality of air spaces.

Abstract translation: 提供了滤色器阵列，其制造方法和包括该滤色器阵列的图像传感器。 滤色器阵列包括：在基板上包括多个滤色器的滤色器装置; 以及隔离壁，其隔离每个滤色器并且包括包括多个空气空间的固体。

公开(公告)号：US20160062181A1

公开(公告)日：2016-03-03

申请号：US14475934

申请日：2014-09-03

Applicant: Ronald Steven Cok

Inventor： Ronald Steven Cok

IPC: G02F1/1335 ,  G02B5/20 ,  B29C59/02 ,  B29C35/08 ,  B29C59/00

CPC classification number: H05K1/092 ,  B29C35/0805 ,  B29C59/002 ,  B29C59/022 ,  B29C59/026 ,  B29C2035/0827 ,  B29C2059/023 ,  B29K2105/24 ,  B29K2995/0021 ,  B29L2031/3475 ,  G02B5/003 ,  G02B5/201 ,  G02F1/133514 ,  G02F1/133516 ,  G02F2001/133519 ,  G02F2201/52 ,  G03F7/0002 ,  G03F7/0007 ,  H05K1/111 ,  H05K2201/0108

Abstract: A method of making a filled large-format imprinted structure includes providing a substrate, locating a first curable layer over the substrate, imprinting the first curable layer, and curing the first curable layer to form a first cured layer imprinted with a first micro-cavity having a first micro-cavity width less than or equal to 20 microns. A curable material is located in the first micro-cavity and cured to form cured material in the first micro-cavity. A second curable layer is located on the first cured layer and the first cured material, imprinted and cured to form a second cured layer imprinted with a second micro-cavity having a second micro-cavity width less than or equal to 20 microns. The curable material is located in the second micro-cavity and cured to form cured material in the second micro-cavity, thereby forming a large-format imprinted structure.

Abstract translation: 制造填充的大幅面印刷结构的方法包括提供基板，将第一可固化层定位在基板上，压印第一可固化层，以及固化第一可固化层，以形成印有第一微腔的第一固化层 具有小于或等于20微米的第一微腔宽度。 可固化材料位于第一微腔中并固化以在第一微腔中形成固化材料。 第二可固化层位于第一固化层和第一固化材料上，压印并固化以形成第二固化层，该第二固化层印有具有小于或等于20微米的第二微腔宽度的第二微腔。 可固化材料位于第二微腔中并固化以在第二微腔中形成固化材料，从而形成大幅面压印结构。

公开(公告)号：US20160062007A1

公开(公告)日：2016-03-03

申请号：US14475955

申请日：2014-09-03

Applicant: Ronald Steven Cok

Inventor： Ronald Steven Cok

IPC: G02B5/20 ,  G02B5/00

CPC classification number: H05K1/092 ,  B29C35/0805 ,  B29C59/002 ,  B29C59/022 ,  B29C59/026 ,  B29C2035/0827 ,  B29C2059/023 ,  B29K2105/24 ,  B29K2995/0021 ,  B29L2031/3475 ,  G02B5/003 ,  G02B5/201 ,  G02F1/133514 ,  G02F1/133516 ,  G02F2001/133519 ,  G02F2201/52 ,  G03F7/0002 ,  G03F7/0007 ,  H05K1/111 ,  H05K2201/0108

Abstract: A filled large-format imprinted structure includes a substrate, a first cured layer located over the substrate, a first micro-cavity imprinted in the first cured layer, and a first cured material of a first color located in the first micro-cavities. A second cured layer is located over the first cured layer and a second micro-cavity is imprinted in the second cured layer. A second cured material of a second color is located in the second micro-cavities. A third cured layer is located over the second cured layer and a third micro-cavity is imprinted in the third cured layer. A third cured material of a third color is located in the third micro-cavities, thereby defining a large-format imprinted structure.

Abstract translation: 填充的大幅面印刷结构包括基底，位于基底上方的第一固化层，第一固定层中印有的第一微腔和位于第一微腔中的第一颜色的第一固化材料。 第二固化层位于第一固化层之上，第二微腔被印在第二固化层中。 第二颜色的第二固化材料位于第二微腔中。 第三固化层位于第二固化层之上，第三微腔被印在第三固化层中。 第三种颜色的第三固化材料位于第三微孔中，从而限定了大格式的印刷结构。

公开(公告)号：US20160057407A1

公开(公告)日：2016-02-25

申请号：US14765572

申请日：2014-02-12

Applicant: UNIVERSITÄT DES SAARLANDES ,  MAX-PLANCK-GESELLSCHAFT ZUR FÖRDERUNG DER WISSENSCHAFTEN E.V.

Inventor： Oliver KLEHM ,  Ivo IHRKE ,  John RESTREPO ,  Alkhazur MANAKOV ,  Ramon HEGEDÜS

IPC: H04N13/02 ,  G02B5/04 ,  H04N5/225

CPC classification number: H04N13/257 ,  G02B5/0273 ,  G02B5/04 ,  G02B5/201 ,  G02B27/08 ,  H04N5/2254 ,  H04N13/214 ,  H04N13/218 ,  H04N2213/001

Abstract: A plenoptic imaging device according to the invention comprises an image multiplier (130) for obtaining a multitude of optical images of an object or scene and a pick-up system (140) for imaging at least some of the multitude of images to a common image sensor (170) during the same exposure of the sensor.

Abstract translation: 根据本发明的全光成像装置包括用于获得物体或场景的多个光学图像的图像乘法器（130）和用于将至少一些多个图像成像到公共图像的拾取系统（140） 传感器（170）在传感器的相同曝光期间。

公开(公告)号：US20160054620A1

公开(公告)日：2016-02-25

申请号：US14382350

申请日：2013-06-26

Applicant: BOE TECHNOLOGY GROUP CO., LTD. ,  BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.

Inventor： MINGCHAO WANG ,  HONGTAO LIN ,  JUNWEI WANG

IPC: G02F1/1335 ,  G02F1/1339 ,  G02B5/20

CPC classification number: G02F1/133514 ,  G02B5/201 ,  G02F1/133516 ,  G02F1/13394 ,  G02F2001/133354

Abstract: Embodiments of the disclosure provide a color filter substrate and a fabrication method thereof, a display panel and a display device. The color filter substrate comprises a base substrate (4) and a plurality of color filter units (3) disposed on the base substrate (4). The color filter substrate further comprises a mark structure (6) for marking a coordinate of a pixel corresponding to the color filter unit (3).

Abstract translation: 本发明的实施例提供一种滤色器基板及其制造方法，显示面板和显示装置。 滤色器基板包括基底（4）和设置在基底（4）上的多个滤色器单元（3）。 滤色器基板还包括用于标记与滤色器单元（3）对应的像素的坐标的标记结构（6）。

公开(公告)号：US20160054536A1

公开(公告)日：2016-02-25

申请号：US14548829

申请日：2014-11-20

Applicant: BOE TECHNOLOGY GROUP CO., LTD. ,  BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.

Inventor： Jun LONG ,  Hongkun ZHANG ,  Rui LI ,  Gang YANG

IPC: G02B7/00

CPC classification number: G02B5/201 ,  G02F1/13394 ,  G02F2001/13396 ,  G02F2001/13398

Abstract: Embodiments of the invention provide a color filter substrate and a manufacturing method for the same, and a display device. The color filter substrate comprises a plurality of spacers. The spacer has a cross-sectional shape in a direction parallel to the color filter substrate, and the cross-sectional shape including a first supporting portion extending along a first direction and a second supporting portion extending along a second direction, which is connected to an end portion of the first supporting portion, the first direction being perpendicular to the second direction.

Abstract translation: 本发明的实施例提供一种滤色器基板及其制造方法以及显示装置。 滤色器基板包括多个间隔件。 间隔件在平行于滤色器基板的方向上具有横截面形状，并且横截面形状包括沿着第一方向延伸的第一支撑部分和沿着第二方向延伸的第二支撑部分，该第二支撑部分连接到 第一支撑部分的端部，第一方向垂直于第二方向。

公开(公告)号：US09268218B2

公开(公告)日：2016-02-23

申请号：US14801818

申请日：2015-07-16

Applicant: CHI MEI CORPORATION

Inventor： Jung-Pin Hsu

IPC: G02B5/20 ,  G03F7/033 ,  G02F1/1335 ,  G03F7/00 ,  G02B5/22 ,  G02B1/04 ,  G03F7/30

CPC classification number: G03F7/0007 ,  G02B1/04 ,  G02B5/201 ,  G02B5/223 ,  G02F1/133516 ,  G03F7/027 ,  G03F7/033 ,  G03F7/038 ,  G03F7/0388 ,  G03F7/30 ,  C08L2666/70 ,  C08L33/08 ,  C08L63/00 ,  C08L45/00

Abstract: The present invention relates to a photosensitive resin composition for a color filter and an application thereof. The photosensitive resin composition includes a pigment (A), an alkali-soluble resin (B), a compound having an ethylenically unsaturated group (C), a photo initiator (D) and an organic solvent (E). The alkali-soluble resin (B) includes a first alkali-soluble resin (B-1), and the first alkali-soluble resin (B-1) is copolymerized by a first mixture. The first mixture at least includes an ethylenically unsaturated monomer having a structure of hindered amine (b1-1), an ethylenically unsaturated monomer having an oxetanyl (b1-2) and an ethylenically unsaturated monomer having a carboxylic acid group (b1-3).

Abstract translation: 本发明涉及一种滤色器用感光性树脂组合物及其应用。 感光性树脂组合物包含颜料（A），碱溶性树脂（B），具有烯键式不饱和基团（C）的化合物，光引发剂（D）和有机溶剂（E）。 碱溶性树脂（B）包括第一碱溶性树脂（B-1），第一碱溶性树脂（B-1）通过第一混合物共聚。 第一混合物至少包括具有受阻胺（b1-1）结构的烯键式不饱和单体，具有氧杂环丁烷基（b1-2）的烯属不饱和单体和具有羧酸基团的烯属不饱和单体（b1-3）。