GRID AND NANOSTRUCTURE TRANSPARENT CONDUCTOR FOR LOW SHEET RESISTANCE APPLICATIONS
    21.
    发明申请
    GRID AND NANOSTRUCTURE TRANSPARENT CONDUCTOR FOR LOW SHEET RESISTANCE APPLICATIONS 有权
    用于低电阻应用的网格和纳米结构透明导体

    公开(公告)号:US20150313022A1

    公开(公告)日:2015-10-29

    申请号:US14703830

    申请日:2015-05-04

    Abstract: Transparent conductors and methods of forming same are provided. A transparent conductor can include a nanostructure layer and a low sheet resistance grid disposed on a transfer film surface having an acceptable level of surface roughness. The presence of the low sheet resistance grid lowers the sheet resistance of the transparent conductor to an acceptable level. After release of the transparent conductor from the transfer film, the surface roughness of the transparent conductor will be at least comparable to the surface roughness of the transfer film.

    Abstract translation: 提供了透明导体及其形成方法。 透明导体可以包括设置在具有可接受的表面粗糙度水平的转印膜表面上的纳米结构层和低电阻网格。 低电阻格栅的存在将透明导体的薄层电阻降低到可接受的水平。 在从转印膜释放透明导体之后,透明导体的表面粗糙度至少与转印膜的表面粗糙度相当。

    CONDUCTIVE NANOSTRUCTURE-BASED FILMS WITH IMPROVED ESD PERFORMANCE
    24.
    发明申请
    CONDUCTIVE NANOSTRUCTURE-BASED FILMS WITH IMPROVED ESD PERFORMANCE 有权
    具有改进的ESD性能的基于导电的纳米结构膜

    公开(公告)号:US20140340811A1

    公开(公告)日:2014-11-20

    申请号:US14260888

    申请日:2014-04-24

    Abstract: Optical stacks containing one or more patterned transparent conductor layers may be damaged by electrostatic discharges that occur during the optical stack manufacturing process. Such damage may result in non-conductive conductors within the patterned transparent conductor layer. An electrostatic discharge protected optical stack may include a substrate layer, a first anti-static layer having a sheet resistance of from about 106 ohms per square (Ω/sq) to about 109 Ω/sq, and a patterned transparent conductor layer. Methods of testing and assessing damage to patterned transparent conductors are provided.

    Abstract translation: 包含一个或多个图案化的透明导体层的光学堆叠可能由于在光学堆叠制造过程中发生的静电放电而损坏。 这种损坏可能导致图案化的透明导体层内的非导电导体。 静电放电保护光学堆叠可以包括基底层,具有约106欧姆/平方(约OHgr / sq)至约109&OHgr / sq的薄层电阻的第一抗静电层和图案化的透明导体层。 提供了测试和评估图案化透明导体损坏的方法。

    ELECTRICAL CONTACTS IN LAYERED STRUCTURES
    27.
    发明申请
    ELECTRICAL CONTACTS IN LAYERED STRUCTURES 有权
    层状结构中的电气接触

    公开(公告)号:US20130273315A1

    公开(公告)日:2013-10-17

    申请号:US13839689

    申请日:2013-03-15

    Abstract: Various embodiments of the present disclosure are directed to structures comprising a nanostructure layer that includes a plurality of transparent conductors and coating layer formed on a surface thereof. In some embodiments, the coating layer includes one or more conductive plugs having outer and inner surfaces. The inner surface the plug is placed in electrical communication with the nanostructure layer and the outer surface forms conductive surface contacts proximate an outer surface of the coating layer. In some embodiments, the structure includes a polarizer and is used as a shielding layer in flat panel electrochromic displays, such as liquid crystal displays, touch panels, and the like.

    Abstract translation: 本公开的各种实施例涉及包括纳米结构层的结构,其包括多个透明导体和在其表面上形成的涂层。 在一些实施例中,涂层包括具有外表面和内表面的一个或多个导电塞。 塞子被放置成与纳米结构层电连通并且外表面的内表面在靠近涂层的外表面形成导电表面接触。 在一些实施例中,该结构包括偏振器,并且用作平板电致变色显示器(例如液晶显示器,触摸面板等)中的屏蔽层。

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