Charge neutralizer for glass substrate
    21.
    发明授权
    Charge neutralizer for glass substrate 失效
    玻璃基板电荷中和剂

    公开(公告)号:US07529074B2

    公开(公告)日:2009-05-05

    申请号:US11443246

    申请日:2006-05-31

    CPC classification number: H05F3/06 B65G49/061 B65G2249/02 H05K9/0067

    Abstract: The present invention provides a charge neutralizer for accurately irradiating a soft X ray into a narrow gap after a glass substrate is lifted up.A soft X ray is introduced into a gap “d” from a soft X ray charge neutralizer 14, and the soft X ray is detected by a soft X ray optical axis monitor 16. Mounting position adjusting means 15 is adjusted by a detection output from said soft X ray optical axis monitor, and optical axis alignment is performed. Next, according to information from a database 19, a control unit 17 controls gap adjusting means 13, and charge neutralization is performed. Charge neutralization can also be performed by controlling the gap “d” by the gap adjusting means 13 while judging neutralizing conditions as to whether a charged potential measured by an electrometer 18 is within an allowable value by the control unit 17 or not.

    Abstract translation: 本发明提供一种电荷中和剂,用于在将玻璃基板提起之后将软X射线精确地照射到窄间隙中。 软X射线从软X射线电荷中和器14引入间隙“d”,软X射线由软X射线光轴监视器16检测。安装位置调整装置15通过来自 所述软X射线光轴监视器和光轴对准被执行。 接下来,根据来自数据库19的信息,控制单元17控制间隙调节装置13,并执行电荷中和。 还可以通过间隙调节装置13控制间隙“d”,同时判断由静电计18测量的带电电位是否在控制单元17的允许值内的中和条件来执行电荷中和。

    Charge neutralizer for glass substrate
    22.
    发明申请
    Charge neutralizer for glass substrate 失效
    玻璃基板电荷中和剂

    公开(公告)号:US20070188970A1

    公开(公告)日:2007-08-16

    申请号:US11443246

    申请日:2006-05-31

    CPC classification number: H05F3/06 B65G49/061 B65G2249/02 H05K9/0067

    Abstract: The present invention provides a charge neutralizer for accurately irradiating a soft X ray into a narrow gap after a glass substrate is lifted up. A soft X ray is introduced into a gap “d” from a soft X ray charge neutralizer 14, and the soft X ray is detected by a soft X ray optical axis monitor 16. Mounting position adjusting means 15 is adjusted by a detection output from said soft X ray optical axis monitor, and optical axis alignment is performed. Next, according to information from a database 19, a control unit 17 controls gap adjusting means 13, and charge neutralization is performed. Charge neutralization can also be performed by controlling the gap “d” by the gap adjusting means 13 while judging neutralizing conditions as to whether a charged potential measured by an electrometer 18 is within an allowable value by the control unit 17 or not.

    Abstract translation: 本发明提供一种电荷中和剂,用于在将玻璃基板提起之后将软X射线精确地照射到窄间隙中。 软X射线从软X射线电荷中和器14引入间隙“d”,软X射线由软X射线光轴监视器16检测。安装位置调整装置15通过来自 所述软X射线光轴监视器和光轴对准被执行。 接下来,根据来自数据库19的信息,控制单元17控制间隙调节装置13,并执行电荷中和。 还可以通过间隙调节装置13控制间隙“d”,同时判断由静电计18测量的带电电位是否在控制单元17的允许值内的中和条件来执行电荷中和。

    Electrified object contact component
    24.
    发明授权
    Electrified object contact component 失效
    电气化接触部件

    公开(公告)号:US5645943A

    公开(公告)日:1997-07-08

    申请号:US546192

    申请日:1995-10-20

    CPC classification number: H01L21/68707 Y10S148/118 Y10T428/31678

    Abstract: An electrified object contact material characterized in that an oxide film formed in a high purity oxidizing atmosphere with a thickness from several tens to 100 .ANG. is formed at least in a section directly contacting an electrified object. By using the contact component according to the present invention, the electric potential of a wafer can always be suppressed to 50 V or less, and moreover, contamination of a wafer (especially by a metallic material) can completely be eliminated.

    Abstract translation: 一种带电的物体接触材料,其特征在于至少在直接接触带电物体的部分中形成厚度为几十至100埃的高纯度氧化气氛中的氧化膜。 通过使用本发明的接触部件,可以将晶片的电位总是抑制在50V以下,此外,可以完全消除晶片(特别是金属材料)的污染。

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